JP2008514545A5 - - Google Patents

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Publication number
JP2008514545A5
JP2008514545A5 JP2007534868A JP2007534868A JP2008514545A5 JP 2008514545 A5 JP2008514545 A5 JP 2008514545A5 JP 2007534868 A JP2007534868 A JP 2007534868A JP 2007534868 A JP2007534868 A JP 2007534868A JP 2008514545 A5 JP2008514545 A5 JP 2008514545A5
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JP
Japan
Prior art keywords
film
layer
precursor
copper
metal
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JP2007534868A
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English (en)
Japanese (ja)
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JP2008514545A (ja
JP5415696B2 (ja
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Priority claimed from PCT/US2005/035521 external-priority patent/WO2006137898A2/en
Publication of JP2008514545A publication Critical patent/JP2008514545A/ja
Publication of JP2008514545A5 publication Critical patent/JP2008514545A5/ja
Application granted granted Critical
Publication of JP5415696B2 publication Critical patent/JP5415696B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2007534868A 2004-10-01 2005-09-30 機能が向上された厚膜超伝導フィルム Expired - Lifetime JP5415696B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US61528904P 2004-10-01 2004-10-01
US60/615,289 2004-10-01
US70383605P 2005-07-29 2005-07-29
US60/703,836 2005-07-29
PCT/US2005/035521 WO2006137898A2 (en) 2004-10-01 2005-09-30 Thick superconductor films with improved performance

Publications (3)

Publication Number Publication Date
JP2008514545A JP2008514545A (ja) 2008-05-08
JP2008514545A5 true JP2008514545A5 (cg-RX-API-DMAC7.html) 2013-08-22
JP5415696B2 JP5415696B2 (ja) 2014-02-12

Family

ID=38687498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007534868A Expired - Lifetime JP5415696B2 (ja) 2004-10-01 2005-09-30 機能が向上された厚膜超伝導フィルム

Country Status (3)

Country Link
JP (1) JP5415696B2 (cg-RX-API-DMAC7.html)
KR (1) KR100910601B1 (cg-RX-API-DMAC7.html)
CN (1) CN101258618B (cg-RX-API-DMAC7.html)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5562615B2 (ja) * 2009-11-24 2014-07-30 公益財団法人国際超電導産業技術研究センター 希土類系酸化物超電導線材の製造方法
JP5273561B2 (ja) * 2009-12-09 2013-08-28 独立行政法人産業技術総合研究所 超電導膜の製造方法
US8865628B2 (en) * 2009-12-09 2014-10-21 National Institute Of Advanced Industrial Science And Technology Solution for forming rare-earth superconductive film and production method thereof
CN102568694A (zh) * 2010-12-23 2012-07-11 吴仕驹 高温超导体及其制备方法
CN102255041B (zh) * 2011-07-13 2013-07-03 中国科学院电工研究所 一种ybco超导薄膜的制备方法
CN102584204A (zh) * 2012-02-12 2012-07-18 中国科学院电工研究所 一种ybco超导复合薄膜的制备方法
KR20160006829A (ko) 2014-07-09 2016-01-20 서울대학교산학협력단 초전도체, 초전도 선재, 및 초전도체 형성방법
WO2017035290A1 (en) * 2015-08-26 2017-03-02 American Superconductor Corporation Long length high temperature superconducting wires with uniform ion implanted pinning microstructures
KR101719266B1 (ko) * 2016-06-27 2017-04-06 서울대학교산학협력단 초전도체, 초전도 선재, 및 초전도체 형성방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01160857A (ja) * 1987-12-18 1989-06-23 Mitsui Mining & Smelting Co Ltd 超伝導セラミックスおよびその製造法
JPH01219019A (ja) * 1988-02-29 1989-09-01 Nec Corp 酸化物超伝導体膜の製造方法
US5231074A (en) * 1990-04-17 1993-07-27 Massachusetts Institute Of Technology Preparation of highly textured oxide superconducting films from mod precursor solutions
NZ502030A (en) * 1997-06-18 2002-12-20 Massachusetts Inst Technology Controlled conversion of metal oxyfluorides into superconducting oxides
WO2001008236A1 (en) * 1999-07-23 2001-02-01 American Superconductor Corporation Coated conductor thick film precursor
JP2003526905A (ja) * 1999-07-23 2003-09-09 アメリカン スーパーコンダクター コーポレイション 多層体及びその製造方法
DE60040391D1 (de) * 1999-07-23 2008-11-13 American Superconductor Corp Eiterartikels
US6332967B1 (en) * 1999-11-23 2001-12-25 Midwest Research Institute Electro-deposition of superconductor oxide films
JP3548801B2 (ja) * 2001-03-27 2004-07-28 独立行政法人産業技術総合研究所 特定の金属種に特定の配位子を配位させた金属錯体を含む溶液組成物、希土類超電導膜製造用溶液組成物、特定金属錯体の非結晶固形物、特定の金属種に特定の配位子を配位させた金属錯体を含む溶液の製造方法、希土類超電導膜製造用溶液の製造方法、及び超電導薄膜の形成方法。
JP4771632B2 (ja) * 2001-10-12 2011-09-14 富士通株式会社 高温超伝導体膜の形成方法
JP3851948B2 (ja) * 2002-05-10 2006-11-29 独立行政法人産業技術総合研究所 超電導体の製造方法
JP2004155618A (ja) * 2002-11-07 2004-06-03 Hitachi Ltd 酸化物系超伝導部材とその製造方法

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Beauquis et al. Scaling‐up of High‐Tc Tapes by MOCVD, Spray Pyrolysis and MOD Processes