JP2008511167A5 - - Google Patents

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Publication number
JP2008511167A5
JP2008511167A5 JP2007529849A JP2007529849A JP2008511167A5 JP 2008511167 A5 JP2008511167 A5 JP 2008511167A5 JP 2007529849 A JP2007529849 A JP 2007529849A JP 2007529849 A JP2007529849 A JP 2007529849A JP 2008511167 A5 JP2008511167 A5 JP 2008511167A5
Authority
JP
Japan
Prior art keywords
gas
etching process
coating
tera
process gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2007529849A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008511167A (ja
Filing date
Publication date
Priority claimed from US10/926,404 external-priority patent/US20060049139A1/en
Application filed filed Critical
Publication of JP2008511167A publication Critical patent/JP2008511167A/ja
Publication of JP2008511167A5 publication Critical patent/JP2008511167A5/ja
Withdrawn legal-status Critical Current

Links

JP2007529849A 2004-08-26 2005-06-30 ゲート・スタックをエッチングするための方法およびシステム Withdrawn JP2008511167A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/926,404 US20060049139A1 (en) 2004-08-26 2004-08-26 Method and system for etching a gate stack
PCT/US2005/023943 WO2006025944A1 (en) 2004-08-26 2005-06-30 Method and system for etching a gate stack

Publications (2)

Publication Number Publication Date
JP2008511167A JP2008511167A (ja) 2008-04-10
JP2008511167A5 true JP2008511167A5 (https=) 2008-07-31

Family

ID=35058277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007529849A Withdrawn JP2008511167A (ja) 2004-08-26 2005-06-30 ゲート・スタックをエッチングするための方法およびシステム

Country Status (5)

Country Link
US (1) US20060049139A1 (https=)
JP (1) JP2008511167A (https=)
KR (1) KR20070051846A (https=)
TW (1) TWI286840B (https=)
WO (1) WO2006025944A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8092695B2 (en) * 2006-10-30 2012-01-10 Applied Materials, Inc. Endpoint detection for photomask etching
US9028924B2 (en) * 2010-03-25 2015-05-12 Novellus Systems, Inc. In-situ deposition of film stacks
US8741394B2 (en) 2010-03-25 2014-06-03 Novellus Systems, Inc. In-situ deposition of film stacks
US9165788B2 (en) 2012-04-06 2015-10-20 Novellus Systems, Inc. Post-deposition soft annealing
US9117668B2 (en) 2012-05-23 2015-08-25 Novellus Systems, Inc. PECVD deposition of smooth silicon films
US9388491B2 (en) 2012-07-23 2016-07-12 Novellus Systems, Inc. Method for deposition of conformal films with catalysis assisted low temperature CVD

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3729728A (en) * 1971-05-10 1973-04-24 Spearhead Inc Capacitive switching device
US3986372A (en) * 1976-01-16 1976-10-19 Whirlpool Corporation Appliance programmer including a safety circuit
US4748296A (en) * 1986-12-03 1988-05-31 General Electric Company Push-to-start control switch
US5161393A (en) * 1991-06-28 1992-11-10 General Electric Company Electronic washer control including automatic load size determination, fabric blend determination and adjustable washer means
IT226476Z2 (it) * 1992-04-14 1997-06-24 Whirlpool Italia Dispositivo atto a controllare e comandare il funzionamento di una lavabiancheria o similare o altro elettrodomestico quale piano di cottura forno o similare con manopola servoassistita
US5301523A (en) * 1992-08-27 1994-04-12 General Electric Company Electronic washer control including automatic balance, spin and brake operations
US5464955A (en) * 1993-04-15 1995-11-07 Emerson Electric Co. Backlit appliance control console
JP3193265B2 (ja) * 1995-05-20 2001-07-30 東京エレクトロン株式会社 プラズマエッチング装置
US5668359A (en) * 1996-03-01 1997-09-16 Eaton Corporation Multiple switch assembly including spring biased rotary cam with concentric cam tracks for selectively operating switches
US6316167B1 (en) * 2000-01-10 2001-11-13 International Business Machines Corporation Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereof
DE19928229A1 (de) * 1999-06-19 2000-12-21 Mannesmann Vdo Ag Versenkbarer Drehknopf
EP1520346B1 (de) * 2001-02-24 2008-01-23 Marquardt GmbH Einrichtung zur drehwinkeleinstellung
US7196604B2 (en) * 2001-05-30 2007-03-27 Tt Electronics Technology Limited Sensing apparatus and method
US6862482B2 (en) * 2001-08-06 2005-03-01 Emerson Electric Co. Appliance control system with LED operation indicators
US6813524B2 (en) * 2001-08-06 2004-11-02 Emerson Electric Co. Appliance control system with auxiliary inputs
US6727443B2 (en) * 2001-08-06 2004-04-27 Emerson Electric Co. Appliance control system with knob control assembly
JP2003124189A (ja) * 2001-10-10 2003-04-25 Fujitsu Ltd 半導体装置の製造方法
DE10203509B4 (de) * 2002-01-30 2005-01-13 Whirlpool Corp., Benton Harbor Rastvorrichtung für einen mehrstufigen Drehschalter
KR100915231B1 (ko) * 2002-05-17 2009-09-02 삼성전자주식회사 저유전율 절연막의 증착방법, 이를 이용한 박막트랜지스터및 그 제조방법
US6630395B1 (en) * 2002-10-24 2003-10-07 International Business Machines Corporation Methods for fabricating electrical connections to semiconductor structures incorporating low-k dielectric materials
US6869542B2 (en) * 2003-03-12 2005-03-22 International Business Machines Corporation Hard mask integrated etch process for patterning of silicon oxide and other dielectric materials
US7199046B2 (en) * 2003-11-14 2007-04-03 Tokyo Electron Ltd. Structure comprising tunable anti-reflective coating and method of forming thereof

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