JP2008505363A5 - - Google Patents

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Publication number
JP2008505363A5
JP2008505363A5 JP2007519451A JP2007519451A JP2008505363A5 JP 2008505363 A5 JP2008505363 A5 JP 2008505363A5 JP 2007519451 A JP2007519451 A JP 2007519451A JP 2007519451 A JP2007519451 A JP 2007519451A JP 2008505363 A5 JP2008505363 A5 JP 2008505363A5
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JP
Japan
Prior art keywords
pixel
data
pixels
square
array
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JP2007519451A
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English (en)
Japanese (ja)
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JP4753941B2 (ja
JP2008505363A (ja
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Priority claimed from US10/883,210 external-priority patent/US7407252B2/en
Application filed filed Critical
Publication of JP2008505363A publication Critical patent/JP2008505363A/ja
Publication of JP2008505363A5 publication Critical patent/JP2008505363A5/ja
Application granted granted Critical
Publication of JP4753941B2 publication Critical patent/JP4753941B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007519451A 2004-07-01 2005-07-01 ラスタ走査型印刷におけるエリア・ベースの光学近接効果補正 Expired - Fee Related JP4753941B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/883,210 US7407252B2 (en) 2004-07-01 2004-07-01 Area based optical proximity correction in raster scan printing
US10/883,210 2004-07-01
PCT/US2005/023374 WO2006007536A1 (en) 2004-07-01 2005-07-01 Area based optical proximity correction in raster scan printing

Publications (3)

Publication Number Publication Date
JP2008505363A JP2008505363A (ja) 2008-02-21
JP2008505363A5 true JP2008505363A5 (enExample) 2008-08-14
JP4753941B2 JP4753941B2 (ja) 2011-08-24

Family

ID=35427738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007519451A Expired - Fee Related JP4753941B2 (ja) 2004-07-01 2005-07-01 ラスタ走査型印刷におけるエリア・ベースの光学近接効果補正

Country Status (4)

Country Link
US (2) US7407252B2 (enExample)
EP (1) EP1766572A1 (enExample)
JP (1) JP4753941B2 (enExample)
WO (1) WO2006007536A1 (enExample)

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US20030233630A1 (en) * 2001-12-14 2003-12-18 Torbjorn Sandstrom Methods and systems for process control of corner feature embellishment
US7495722B2 (en) 2003-12-15 2009-02-24 Genoa Color Technologies Ltd. Multi-color liquid crystal display
US7407252B2 (en) * 2004-07-01 2008-08-05 Applied Materials, Inc. Area based optical proximity correction in raster scan printing
US7529421B2 (en) * 2004-07-01 2009-05-05 Applied Materials, Inc. Optical proximity correction in raster scan printing based on corner matching templates
US7317510B2 (en) * 2004-12-27 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101407913B1 (ko) * 2005-09-26 2014-06-17 마이크로닉 마이데이터 아베 설계 데이터의 다중 형태에 기반한 패턴 발생 방법 및시스템
WO2007060672A2 (en) * 2005-11-28 2007-05-31 Genoa Color Technologies Ltd. Sub-pixel rendering of a multiprimary image
JP2009109550A (ja) * 2007-10-26 2009-05-21 Adtec Engineeng Co Ltd 直描露光装置
WO2010063827A1 (en) * 2008-12-05 2010-06-10 Micronic Laser Systems Ab Gradient assisted image resampling in micro-lithographic printing
US8539395B2 (en) 2010-03-05 2013-09-17 Micronic Laser Systems Ab Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
US8453076B2 (en) * 2010-03-16 2013-05-28 International Business Machines Corporation Wavefront engineering of mask data for semiconductor device design
JP5736666B2 (ja) * 2010-04-05 2015-06-17 セイコーエプソン株式会社 電気光学装置、電気光学装置の駆動方法、電気光学装置の制御回路、電子機器
FR2959026B1 (fr) * 2010-04-15 2012-06-01 Commissariat Energie Atomique Procede de lithographie a optimisation combinee de l'energie rayonnee et de la geometrie de dessin
FR2959029B1 (fr) * 2010-04-15 2013-09-20 Commissariat Energie Atomique Procede de lithographie electronique avec correction des arrondissements de coins
CN102135725B (zh) * 2011-03-20 2012-07-04 北京理工大学 Pbopc优化掩膜图形的分割矩形总数的获取方法
JP2013165121A (ja) * 2012-02-09 2013-08-22 Canon Inc 描画装置、生成方法、プログラム及び物品の製造方法
KR101485166B1 (ko) * 2013-04-25 2015-01-22 삼성디스플레이 주식회사 유기 발광 표시 장치 및 마스크 유닛
JP7111466B2 (ja) * 2014-08-01 2022-08-02 アプライド マテリアルズ インコーポレイテッド ３ｄパターン形成のためのデジタルグレイトーンリソグラフィ
CN104485298A (zh) * 2014-11-28 2015-04-01 上海华力微电子有限公司 检测采样系统及检测采样方法
US10522472B2 (en) 2016-09-08 2019-12-31 Asml Netherlands B.V. Secure chips with serial numbers
US10418324B2 (en) * 2016-10-27 2019-09-17 Asml Netherlands B.V. Fabricating unique chips using a charged particle multi-beamlet lithography system
JP7126367B2 (ja) * 2018-03-29 2022-08-26 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
US10614340B1 (en) * 2019-09-23 2020-04-07 Mujin, Inc. Method and computing system for object identification
JP2023030230A (ja) * 2020-02-19 2023-03-08 株式会社ニコン マスクデータ生成方法、およびマスクデータ生成プログラム
EP3989002A1 (en) 2020-10-20 2022-04-27 Mycronic Ab Device and method for setting relative laser intensities
EP4098970B1 (en) * 2021-05-31 2024-09-04 Essilor International Method for measuring a distance separating a camera from a reference object
TWI788967B (zh) * 2021-08-24 2023-01-01 瑞昱半導體股份有限公司 影像處理方法與影像處理電路

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JP3120767B2 (ja) * 1998-01-16 2000-12-25 日本電気株式会社 外観検査装置、外観検査方法及び外観検査プログラムを記録した記録媒体
US6556702B1 (en) * 1999-01-06 2003-04-29 Applied Materials, Inc. Method and apparatus that determines charged particle beam shape codes
US6259106B1 (en) * 1999-01-06 2001-07-10 Etec Systems, Inc. Apparatus and method for controlling a beam shape
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US20030233630A1 (en) 2001-12-14 2003-12-18 Torbjorn Sandstrom Methods and systems for process control of corner feature embellishment
US7407252B2 (en) * 2004-07-01 2008-08-05 Applied Materials, Inc. Area based optical proximity correction in raster scan printing
US7930653B2 (en) * 2007-04-17 2011-04-19 Micronic Laser Systems Ab Triangulating design data and encoding design intent for microlithographic printing

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