JP2008503038A - ガス拡散電極、膜電極アセンブリー及びその製造方法 - Google Patents
ガス拡散電極、膜電極アセンブリー及びその製造方法 Download PDFInfo
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Abstract
【選択図】 図1
Description
本発明の目的は、先行技術の限界を克服するガス拡散電極を提供することである。別の局面において、本発明の目的は、低い白金ローディングを伴い且つ高い性能のガス拡散媒体(好ましくは、アイオノマーフルオロカーボン成分を有さない)の直接的な金属化によって得られたガス拡散電極及びこれを組み込む膜電極アセンブリーを提供することである。
最初の局面において、本発明のガス拡散電極は、デュアルIBAD堆積によって貴金属コーティングが備えられたアイオノマー成分を含まないガス拡散媒体からなる。本発明者らは、驚くべきことに、スパッタリング又はPVDのような他の直接的な金属化技術と比べ、デュアルIBADが、下の基板にダメージを与えることなく且つ優れた電気化学的特性を伴って、薄く且つ滑らかな貴金属コーティング(特に白金コーティング)を形成し得ることを見いだした。さらに驚くべきことに、触媒利用率(catalyst utilisation factor)(これは、堆積された貴金属コーティングの触媒有効性の尺度である)が、先行技術の電極における利用率よりもずっと高いだけでなく、US4,876,115の教示に従うプロトン伝導材料にたよることなく達成される。更に驚くべきことに、本発明者らは、US4,876,115の教示に従うプロトン伝導材料の懸濁液の任意の添加が、殆どの場合において、性能にとって有害であることを見いだした:本発明に従って白金でコーティングされた本発明の電極のボルタンメトリーによるキャラクタライゼーションにより、Liquid Nafionの0.5mg/cm2層の添加は、Pt表面のアベイラビリティーを非常に著しい程度に減少させることを示している。デュアルIBAD適用貴金属コーティングの平滑性及び密度は、高性能の電極を得るために、大きな重要性をもつ:特に白金の場合、最も良い結果は、ガス拡散媒体の表面を清浄化し且つテクスチャー加工するための100〜500eVの第一低エネルギービーム、並びに、5〜500nm間を好ましく含む厚さ及び0.01〜0.1mg/cm2間を好ましく含むローディングを有するコーティグを得るための、気化された金属イオンの好ましくは500〜2000eVの第二高エネルギービームを用いることにより得られる。本書の記載において、白金は、本発明のガス拡散電極のための例示的な触媒物質として記載されるが、全ての他の貴金属又は異なる金属の組み合わせ(貴及び非貴(noble and non noble))も使用され得る。
上記記載は、本発明を限定するものとして理解されるものではなく、本発明はその範囲から逸脱することなく異なる実施形態に従って実施され得、また、その範囲は添付の特許請求の範囲によって単に定義される。本願の明細書及び特許請求の範囲において、用語「含む(comprise)」並びに「含んでいる(comprising)」及び「含まれる(comprised)」といったそのバリエーションは、他のエレメント又は更なる成分の存在を排除することを意図しない。
Claims (16)
- 導電性ウェブを、500eVより高くないエネルギーを有する第一イオンビーム及び少なくとも1種の貴金属のイオンを含む少なくとも500eVのエネルギーを有する第二ビームに供することを包含する、実質的にアイオノマー成分のないガス拡散媒体上に貴金属コーティングを形成するための方法。
- 得られる貴金属コーティングが、5〜500nm間に含まれる厚さと0.01〜0.1mg/cm2のローディングを有する、請求項1に記載の方法。
- 前記第一イオンビームが100〜500eV間に含まれるエネルギーを有し、且つ、前記第二イオンビームが500〜2000eV間に含まれるエネルギーを有する、請求項1に記載の方法。
- 少なくとも1種の前記貴金属が白金である、先の請求項のいずれか1項に記載の方法。
- 前記導電性ウェブに、少なくとも1種の導電性フィラーと少なくとも1種のバインダーを含む貴金属のないガス拡散層(a noble metal-free gas diffusion layer)が予め備わっている、請求項1に記載の方法。
- 前記導電性フィラーが、カーボン粒子(必要に応じてアセチレンブラックカーボン粒子)を含有する、請求項5に記載の方法。
- 前記バインダーが、必要に応じてフッ素化された疎水性バインダーである、請求項5又は6に記載の方法。
- 前記ガス拡散層が少なくとも1000ガーレー秒(Gurley seconds)の平滑性を有する、請求項5〜7のいずれか1項に記載の方法。
- 導電性ウェブ、少なくとも1種の導電性フィラーと少なくとも1種のバインダーを含む非触媒ガス拡散層、並びに、請求項1〜5のいずれか1項に記載の方法により得られた貴金属コーティングを備える、ガス拡散電極。
- 導電性ウェブが、金属或いはカーボンクロス又はカーボン紙である、請求項9に記載のガス拡散電極。
- 前記少なくとも1種の導電性フィラーが、カーボン粒子(必要に応じてアセチレンブラックカーボン粒子)を含む、請求項9に記載のガス拡散電極。
- 前記少なくとも1種のバインダーが、疎水性であり必要に応じてフッ素化されている、請求項9に記載のガス拡散電極。
- 前記ガス拡散層が、少なくとも1000ガーレー秒の平滑性を有する、請求項9に記載のガス拡散電極。
- 請求項9〜13のいずれか1項に記載の少なくとも1種のガス拡散電極とイオン交換膜を備える、膜電極アセンブリー。
- 前記少なくとも1種のガス拡散電極と前記イオン交換膜が、互いにホットプレスで接着されている、請求項14に記載の膜電極アセンブリー。
- 前記イオン交換膜がフッ素化されておらず、且つ、アイオノマーフッ素化成分が存在しない、請求項14又は15に記載の膜電極アセンブリー。
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CN101273484B (zh) * | 2005-07-01 | 2011-01-19 | 巴斯夫燃料电池有限责任公司 | 气体扩散电极、膜电极组件及其制造方法 |
GB0711882D0 (en) | 2007-06-20 | 2007-07-25 | Johnson Matthey Plc | Catalyst layer |
EP2869382B1 (en) | 2013-10-30 | 2018-12-12 | Basf Se | Improved membrane electrode assemblies |
CN114899417B (zh) * | 2022-04-28 | 2023-12-29 | 一汽解放汽车有限公司 | 一种燃料电池气体扩散层及其制备方法 |
CN114725420B (zh) * | 2022-04-28 | 2023-06-09 | 一汽解放汽车有限公司 | 气体扩散层及其制备方法、及膜电极组件和燃料电池 |
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BRPI0512248A (pt) | 2008-02-19 |
EP1797610A1 (en) | 2007-06-20 |
US7419546B2 (en) | 2008-09-02 |
US20050279643A1 (en) | 2005-12-22 |
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