JP2008283099A - マスクブランクの製造方法及びフォトマスクの製造方法 - Google Patents

マスクブランクの製造方法及びフォトマスクの製造方法 Download PDF

Info

Publication number
JP2008283099A
JP2008283099A JP2007127634A JP2007127634A JP2008283099A JP 2008283099 A JP2008283099 A JP 2008283099A JP 2007127634 A JP2007127634 A JP 2007127634A JP 2007127634 A JP2007127634 A JP 2007127634A JP 2008283099 A JP2008283099 A JP 2008283099A
Authority
JP
Japan
Prior art keywords
coated
resist solution
coating nozzle
liquid contact
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007127634A
Other languages
English (en)
Japanese (ja)
Inventor
Takashi Asakawa
敬司 浅川
Ryoji Miyata
涼司 宮田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Hoya Electronics Malaysia Sdn Bhd
Original Assignee
Hoya Corp
Hoya Electronics Malaysia Sdn Bhd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Malaysia Sdn Bhd filed Critical Hoya Corp
Priority to JP2007127634A priority Critical patent/JP2008283099A/ja
Priority to TW097117547A priority patent/TW200910418A/zh
Priority to KR1020080043717A priority patent/KR20080100776A/ko
Priority to CNA2008100991600A priority patent/CN101308325A/zh
Publication of JP2008283099A publication Critical patent/JP2008283099A/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007127634A 2007-05-14 2007-05-14 マスクブランクの製造方法及びフォトマスクの製造方法 Pending JP2008283099A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007127634A JP2008283099A (ja) 2007-05-14 2007-05-14 マスクブランクの製造方法及びフォトマスクの製造方法
TW097117547A TW200910418A (en) 2007-05-14 2008-05-13 Method of manufacturing a mask blank and method of manufacturing a photomask
KR1020080043717A KR20080100776A (ko) 2007-05-14 2008-05-13 마스크 블랭크의 제조 방법 및 포토마스크의 제조 방법
CNA2008100991600A CN101308325A (zh) 2007-05-14 2008-05-14 掩模坯料的制造方法及光掩模的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007127634A JP2008283099A (ja) 2007-05-14 2007-05-14 マスクブランクの製造方法及びフォトマスクの製造方法

Publications (1)

Publication Number Publication Date
JP2008283099A true JP2008283099A (ja) 2008-11-20

Family

ID=40124823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007127634A Pending JP2008283099A (ja) 2007-05-14 2007-05-14 マスクブランクの製造方法及びフォトマスクの製造方法

Country Status (4)

Country Link
JP (1) JP2008283099A (ko)
KR (1) KR20080100776A (ko)
CN (1) CN101308325A (ko)
TW (1) TW200910418A (ko)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011013321A (ja) * 2009-06-30 2011-01-20 Hoya Corp フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
JP2017183374A (ja) * 2016-03-29 2017-10-05 アルバック成膜株式会社 塗布装置、マスクブランクの製造方法
JP2020202228A (ja) * 2019-06-07 2020-12-17 アルバック成膜株式会社 マスクブランクの製造方法、塗布装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011013321A (ja) * 2009-06-30 2011-01-20 Hoya Corp フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
JP2017183374A (ja) * 2016-03-29 2017-10-05 アルバック成膜株式会社 塗布装置、マスクブランクの製造方法
JP2020202228A (ja) * 2019-06-07 2020-12-17 アルバック成膜株式会社 マスクブランクの製造方法、塗布装置

Also Published As

Publication number Publication date
KR20080100776A (ko) 2008-11-19
TW200910418A (en) 2009-03-01
CN101308325A (zh) 2008-11-19

Similar Documents

Publication Publication Date Title
US7517560B2 (en) Method of manufacturing substrate having resist film
JP5073375B2 (ja) マスクブランクの製造方法及びフォトマスクの製造方法
US6838215B2 (en) Graytone mask producing method, graytone mask and pattern transfer method
JP2008283099A (ja) マスクブランクの製造方法及びフォトマスクの製造方法
JP2008177443A (ja) リフロー処理方法およびｔｆｔの製造方法
KR20110001945A (ko) 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 도포 장치
JP4974363B2 (ja) マスクブランクの製造方法及びフォトマスクの製造方法
JP2008283098A (ja) マスクブランクの製造方法及びフォトマスクの製造方法
JP2009258152A (ja) マスクブランクの製造方法及びフォトマスクの製造方法
JP2008065066A (ja) パターン修正方法およびパターン修正装置
JP6659422B2 (ja) 塗布装置、マスクブランクの製造方法
JP2005051220A (ja) レジスト膜付基板の製造方法
JP5086714B2 (ja) マスクブランクの製造方法及びフォトマスクの製造方法
JP2020202228A (ja) マスクブランクの製造方法、塗布装置
JP2010120797A (ja) ガラス基板およびこれを用いたフラットパネルディスプレイ並びにガラス基板の製造方法
JP2009123857A (ja) 着色フォトレジストの塗布方法及び塗布装置
JP2009010245A (ja) マスクブランクの製造方法及び塗布装置
JP2024060379A (ja) スリットコータ
JP5185096B2 (ja) フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
JP3981879B2 (ja) 半導体装置の製造方法
JP2008281603A (ja) パターン修正方法
KR20090108548A (ko) 마스크 블랭크의 제조 방법 및 포토마스크의 제조 방법
US20070166850A1 (en) Pattern forming apparatus and manufacturing apparatus using the same
KR20140124152A (ko) 포토레지스트 도포 방법
JP2009142749A (ja) フォトマスクブランク、フォトマスク及びそれらの製造方法並びに塗布装置