JP2008277824A5 - - Google Patents
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- Publication number
- JP2008277824A5 JP2008277824A5 JP2008115543A JP2008115543A JP2008277824A5 JP 2008277824 A5 JP2008277824 A5 JP 2008277824A5 JP 2008115543 A JP2008115543 A JP 2008115543A JP 2008115543 A JP2008115543 A JP 2008115543A JP 2008277824 A5 JP2008277824 A5 JP 2008277824A5
- Authority
- JP
- Japan
- Prior art keywords
- exposure apparatus
- gas
- specific object
- moving body
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 20
- 230000003068 static effect Effects 0.000 claims 17
- 238000001514 detection method Methods 0.000 claims 15
- 238000007789 sealing Methods 0.000 claims 4
- 230000002706 hydrostatic effect Effects 0.000 claims 3
- 230000005540 biological transmission Effects 0.000 claims 2
- 238000013507 mapping Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 230000008602 contraction Effects 0.000 claims 1
- 230000002452 interceptive effect Effects 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000000717 retained effect Effects 0.000 claims 1
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US92405907P | 2007-04-27 | 2007-04-27 | |
| US92406007P | 2007-04-27 | 2007-04-27 | |
| US92413707P | 2007-05-01 | 2007-05-01 | |
| US92414307P | 2007-05-01 | 2007-05-01 | |
| US92414207P | 2007-05-01 | 2007-05-01 | |
| US12/109,069 US8749753B2 (en) | 2007-04-27 | 2008-04-24 | Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008277824A JP2008277824A (ja) | 2008-11-13 |
| JP2008277824A5 true JP2008277824A5 (enExample) | 2011-05-26 |
Family
ID=39638887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008115543A Pending JP2008277824A (ja) | 2007-04-27 | 2008-04-25 | 移動体装置、露光装置及び光学系ユニット、並びにデバイス製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8749753B2 (enExample) |
| JP (1) | JP2008277824A (enExample) |
| WO (1) | WO2008140027A1 (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7550743B1 (en) * | 2007-03-23 | 2009-06-23 | Kla-Tencor Corporation | Chamberless substrate handling |
| US7550744B1 (en) * | 2007-03-23 | 2009-06-23 | Kla-Tencor Corporation | Chamberless substrate handling |
| US20090304537A1 (en) * | 2008-06-06 | 2009-12-10 | Hung Kuo-Yu | Pneumatic chemical pump |
| JP5315100B2 (ja) * | 2009-03-18 | 2013-10-16 | 株式会社ニューフレアテクノロジー | 描画装置 |
| KR101670640B1 (ko) * | 2009-08-07 | 2016-10-28 | 가부시키가이샤 니콘 | 이동체 장치, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법 |
| US20110032495A1 (en) * | 2009-08-07 | 2011-02-10 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| NL2005586A (en) * | 2009-12-02 | 2011-06-06 | Asml Netherlands Bv | Lithographic apparatus and sealing device for a lithographic apparatus. |
| JP5422416B2 (ja) * | 2010-01-28 | 2014-02-19 | 株式会社日立製作所 | 試料搬送装置 |
| JP5140103B2 (ja) * | 2010-03-17 | 2013-02-06 | 株式会社日立ハイテクノロジーズ | リニアモータ対、移動ステージ、及び電子顕微鏡 |
| WO2012027406A2 (en) * | 2010-08-24 | 2012-03-01 | Nikon Corporation | Vacuum chamber assembly for supporting a workpiece |
| CN102789136B (zh) * | 2011-05-19 | 2014-08-20 | 上海微电子装备有限公司 | 气浮支撑系统 |
| TW201337469A (zh) | 2011-09-12 | 2013-09-16 | Mapper Lithography Ip Bv | 具有基底板之真空腔室 |
| NL2007423C2 (en) * | 2011-09-15 | 2013-03-18 | Mapper Lithography Ip Bv | Vacuum chamber with base plate. |
| KR20130092843A (ko) * | 2012-02-13 | 2013-08-21 | 삼성전자주식회사 | 빛의 인텐시티를 컨트롤할 수 있는 컨트롤 모듈 미러를 갖는 반사형 포토리소그래피 설비 |
| US9422978B2 (en) * | 2013-06-22 | 2016-08-23 | Kla-Tencor Corporation | Gas bearing assembly for an EUV light source |
| JP5532175B1 (ja) * | 2013-07-02 | 2014-06-25 | 日本精工株式会社 | テーブル装置、及び搬送装置 |
| CN103592824B (zh) * | 2013-11-29 | 2015-04-22 | 中国科学院光电技术研究所 | 一种二自由度高精度大行程气浮工件台 |
| KR102221592B1 (ko) * | 2013-12-06 | 2021-03-02 | 엘지디스플레이 주식회사 | 평판표시패널용 노광장치 |
| JP6525567B2 (ja) * | 2014-12-02 | 2019-06-05 | キヤノン株式会社 | インプリント装置及び物品の製造方法 |
| CN110892333B (zh) * | 2017-07-28 | 2023-05-16 | Asml荷兰有限公司 | 颗粒抑制系统和方法 |
| WO2019020450A1 (en) | 2017-07-28 | 2019-01-31 | Asml Netherlands B.V. | SYSTEMS AND METHODS FOR DEPLETING PARTICLES |
| DE102018201845A1 (de) * | 2018-02-06 | 2019-08-08 | Thyssenkrupp Ag | Lageranordnung mit selbststellenden und störungsunempfindlichen Kraftelementen |
| KR20240030249A (ko) | 2022-08-30 | 2024-03-07 | 삼성전자주식회사 | 조명 보정 장치 및 이를 포함하는 euv 노광 장치 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4425508A (en) * | 1982-05-07 | 1984-01-10 | Gca Corporation | Electron beam lithographic apparatus |
| US4801352A (en) * | 1986-12-30 | 1989-01-31 | Image Micro Systems, Inc. | Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation |
| US4818838A (en) * | 1988-01-11 | 1989-04-04 | The Perkin-Elmer Corporation | Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems |
| US5103102A (en) * | 1989-02-24 | 1992-04-07 | Micrion Corporation | Localized vacuum apparatus and method |
| US5559584A (en) * | 1993-03-08 | 1996-09-24 | Nikon Corporation | Exposure apparatus |
| US5997963A (en) * | 1998-05-05 | 1999-12-07 | Ultratech Stepper, Inc. | Microchamber |
| US6031598A (en) * | 1998-09-25 | 2000-02-29 | Euv Llc | Extreme ultraviolet lithography machine |
| US6727981B2 (en) * | 1999-07-19 | 2004-04-27 | Nikon Corporation | Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method |
| JP2001118783A (ja) * | 1999-10-21 | 2001-04-27 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
| TW480372B (en) * | 1999-11-05 | 2002-03-21 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method |
| US6287004B1 (en) * | 1999-11-22 | 2001-09-11 | Nikon Corporation | Fluid bearing operable in a vacuum region |
| US6300630B1 (en) * | 1999-12-09 | 2001-10-09 | Etec Systems, Inc. | Annular differential seal for electron beam apparatus using isolation valve and additional differential pumping |
| JP2001319873A (ja) * | 2000-02-28 | 2001-11-16 | Nikon Corp | 投影露光装置、並びにその製造方法及び調整方法 |
| JP4689064B2 (ja) * | 2000-03-30 | 2011-05-25 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP2002075827A (ja) * | 2000-08-29 | 2002-03-15 | Nikon Corp | X線投影露光装置およびx線投影露光方法および半導体デバイス |
| EP1271605A4 (en) * | 2000-11-02 | 2009-09-02 | Ebara Corp | ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING SAID APPARATUS |
| JP2002151400A (ja) * | 2000-11-15 | 2002-05-24 | Canon Inc | 露光装置、その保守方法並びに同装置を用いた半導体デバイス製造方法及び半導体製造工場 |
| JP2002257998A (ja) * | 2001-02-28 | 2002-09-11 | Sony Corp | 電子ビーム照射装置及び電子ビーム照射装置における真空シール方法 |
| JP2002343706A (ja) * | 2001-05-18 | 2002-11-29 | Nikon Corp | ステージ装置及びステージの駆動方法、露光装置及び露光方法、並びにデバイス及びその製造方法 |
| JP4028255B2 (ja) | 2002-02-26 | 2007-12-26 | ソニー株式会社 | 電子ビーム照射装置及び電子ビーム照射方法 |
| US6899765B2 (en) * | 2002-03-29 | 2005-05-31 | Applied Materials Israel, Ltd. | Chamber elements defining a movable internal chamber |
| TWI338323B (en) * | 2003-02-17 | 2011-03-01 | Nikon Corp | Stage device, exposure device and manufacguring method of devices |
| JP4370924B2 (ja) * | 2003-08-27 | 2009-11-25 | 株式会社ニコン | 真空装置、真空装置の運転方法、露光装置、及び露光装置の運転方法 |
| JP4063201B2 (ja) * | 2003-11-18 | 2008-03-19 | ソニー株式会社 | 電子ビーム照射装置 |
| JP4383911B2 (ja) * | 2004-02-03 | 2009-12-16 | キヤノン株式会社 | 露光装置及び半導体デバイスの製造方法 |
| JP2005276932A (ja) | 2004-03-23 | 2005-10-06 | Nikon Corp | 露光装置及びデバイス製造方法 |
| JP2006049815A (ja) * | 2004-07-02 | 2006-02-16 | Canon Inc | 露光装置 |
| US7394076B2 (en) * | 2004-08-18 | 2008-07-01 | New Way Machine Components, Inc. | Moving vacuum chamber stage with air bearing and differentially pumped grooves |
| US20060181689A1 (en) * | 2005-02-14 | 2006-08-17 | Nikon Corporation | Lithographic-optical systems including isolatable vacuum chambers, and lithography apparatus comprising same |
| US7428850B2 (en) * | 2005-02-24 | 2008-09-30 | Applied Materials, Israel,Ltd. | Integrated in situ scanning electronic microscope review station in semiconductor wafers and photomasks optical inspection system |
-
2008
- 2008-04-24 US US12/109,069 patent/US8749753B2/en active Active
- 2008-04-25 WO PCT/JP2008/058583 patent/WO2008140027A1/en not_active Ceased
- 2008-04-25 JP JP2008115543A patent/JP2008277824A/ja active Pending
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