JP2008254331A5 - - Google Patents

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Publication number
JP2008254331A5
JP2008254331A5 JP2007099332A JP2007099332A JP2008254331A5 JP 2008254331 A5 JP2008254331 A5 JP 2008254331A5 JP 2007099332 A JP2007099332 A JP 2007099332A JP 2007099332 A JP2007099332 A JP 2007099332A JP 2008254331 A5 JP2008254331 A5 JP 2008254331A5
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JP
Japan
Prior art keywords
intaglio
diamond
carbon
convex pattern
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007099332A
Other languages
English (en)
Japanese (ja)
Other versions
JP4967765B2 (ja
JP2008254331A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2007099332A external-priority patent/JP4967765B2/ja
Priority to JP2007099332A priority Critical patent/JP4967765B2/ja
Priority to US12/439,685 priority patent/US8673428B2/en
Priority to CN201310317241.4A priority patent/CN103465525B/zh
Priority to PCT/JP2007/075205 priority patent/WO2008081904A1/ja
Priority to KR1020097012064A priority patent/KR101581265B1/ko
Priority to CN201210270651.3A priority patent/CN102765218B/zh
Priority to EP07860426A priority patent/EP2098362A4/en
Priority to CN200780045844.6A priority patent/CN101557927B/zh
Priority to TW96150687A priority patent/TWI466779B/zh
Publication of JP2008254331A publication Critical patent/JP2008254331A/ja
Publication of JP2008254331A5 publication Critical patent/JP2008254331A5/ja
Publication of JP4967765B2 publication Critical patent/JP4967765B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007099332A 2006-12-27 2007-04-05 凹版及びその製造方法 Expired - Fee Related JP4967765B2 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2007099332A JP4967765B2 (ja) 2007-04-05 2007-04-05 凹版及びその製造方法
EP07860426A EP2098362A4 (en) 2006-12-27 2007-12-27 ENGRAVED PLATE AND BASE MATERIAL WITH CONCRETE STRUCTURE AND ENGRAVED PLATE
TW96150687A TWI466779B (zh) 2006-12-27 2007-12-27 Gravure and use of its substrate with a conductive layer pattern
PCT/JP2007/075205 WO2008081904A1 (ja) 2006-12-27 2007-12-27 凹版及びこれを用いた導体層パターン付き基材
KR1020097012064A KR101581265B1 (ko) 2006-12-27 2007-12-27 오목판 및 오목판을 이용하는 도체층 패턴을 갖는 기재
CN201210270651.3A CN102765218B (zh) 2006-12-27 2007-12-27 凹版和使用该凹版的带有导体层图形的基材
US12/439,685 US8673428B2 (en) 2006-12-27 2007-12-27 Engraved plate and substrate with conductor layer pattern using the same
CN200780045844.6A CN101557927B (zh) 2006-12-27 2007-12-27 凹版和使用该凹版的带有导体层图形的基材
CN201310317241.4A CN103465525B (zh) 2006-12-27 2007-12-27 凹版和使用该凹版的带有导体层图形的基材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007099332A JP4967765B2 (ja) 2007-04-05 2007-04-05 凹版及びその製造方法

Publications (3)

Publication Number Publication Date
JP2008254331A JP2008254331A (ja) 2008-10-23
JP2008254331A5 true JP2008254331A5 (enrdf_load_stackoverflow) 2011-09-08
JP4967765B2 JP4967765B2 (ja) 2012-07-04

Family

ID=39978404

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007099332A Expired - Fee Related JP4967765B2 (ja) 2006-12-27 2007-04-05 凹版及びその製造方法

Country Status (1)

Country Link
JP (1) JP4967765B2 (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009167523A (ja) * 2007-12-18 2009-07-30 Hitachi Chem Co Ltd めっき用導電性基材、その製造方法及びそれを用いた導体層パターン若しくは導体層パターン付き基材の製造方法、導体層パターン付き基材および透光性電磁波遮蔽部材
JP2012154964A (ja) * 2011-01-21 2012-08-16 Think Laboratory Co Ltd パターン付ロール及びその製造方法
EP2514594A1 (en) * 2011-04-18 2012-10-24 KBA-NotaSys SA Intaglio printing plate, method of manufacturing the same and use thereof
JP5835947B2 (ja) * 2011-05-30 2015-12-24 セーレン株式会社 金属膜パターンが形成された樹脂基材
KR101978666B1 (ko) * 2011-06-10 2019-05-15 미래나노텍(주) 터치 스크린 센서 기판, 터치 스크린 센서 및 이를 포함하는 패널
CN104137657A (zh) * 2012-06-22 2014-11-05 株式会社新克 印刷电路基板及其制造装置和制造方法
JP5840585B2 (ja) * 2012-09-11 2016-01-06 株式会社シンク・ラボラトリー パターン付ロール全自動製造システム
JP2014077164A (ja) * 2012-10-10 2014-05-01 Tocalo Co Ltd パターン形成部材、及びパターン形成方法
KR102132298B1 (ko) * 2012-12-31 2020-07-09 쓰리엠 이노베이티브 프로퍼티즈 캄파니 롤-투-롤 공정에서 고 릴리이프 스탬프를 사용하는 미세접촉 인쇄
WO2015083259A1 (ja) * 2013-12-04 2015-06-11 三菱電機株式会社 太陽電池セルの製造方法
CN109940910A (zh) * 2017-12-21 2019-06-28 均贺科技股份有限公司 脉冲光镭射处理的隐形眼镜转印模块
JP7576922B2 (ja) 2020-03-30 2024-11-01 成康 町田 塗工ロール

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0104611D0 (en) * 2001-02-23 2001-04-11 Koninkl Philips Electronics Nv Printing plates
JP2006168297A (ja) * 2004-12-20 2006-06-29 Sony Corp 印刷版および印刷版の製造方法
JPWO2007135900A1 (ja) * 2006-05-23 2009-10-01 株式会社シンク・ラボラトリー グラビア製版ロール及びその製造方法

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