JP2008198930A - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
- Publication number
- JP2008198930A JP2008198930A JP2007034927A JP2007034927A JP2008198930A JP 2008198930 A JP2008198930 A JP 2008198930A JP 2007034927 A JP2007034927 A JP 2007034927A JP 2007034927 A JP2007034927 A JP 2007034927A JP 2008198930 A JP2008198930 A JP 2008198930A
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- Chemical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
基板処理装置に於いて、基板保持具が垂下された昇降軸で片持支持された場合に、振動、揺れを抑制し、基板移載時の搬送、移載精度の向上を図る。
【解決手段】
基板保持具4に保持された基板を収納し、処理する処理室6と、該処理室下方に連設される予備室9と、前記基板保持具を支持し、前記処理室を閉塞する炉口蓋12と、該炉口蓋を支持する炉口蓋支持部22と、該炉口蓋支持部を支持する昇降軸21と、該昇降軸を吊下げ支持しつつ昇降させる昇降手段14と、前記基板保持具に基板を搬入出する基板移載手段29とを備え、前記基板保持具に基板を搬入出する際に、前記炉口蓋支持部の振動を抑制する振動抑制手段を前記予備室内に設けた。
【選択図】 図1
Description
又、本発明は以下の実施の態様を含む。
5 処理炉
6 処理室
7 反応管
14 ボートエレベータ
21 昇降軸
22 炉口蓋支持部
24 振動抑制片
25 振動抑制手段
26 ローラ
29 基板移載機
39 抑制片固定金具
41 調整螺子
71 ウェーハ
Claims (1)
- 基板保持具に保持された基板を収納し、処理する処理室と、該処理室下方に連設される予備室と、前記基板保持具を支持し、前記処理室を閉塞する炉口蓋と、該炉口蓋を支持する炉口蓋支持部と、該炉口蓋支持部を支持する昇降軸と、該昇降軸を吊下げ支持しつつ昇降させる昇降手段と、前記基板保持具に基板を搬入出する基板移載手段とを備え、前記基板保持具に基板を搬入出する際に、前記炉口蓋支持部の振動を抑制する振動抑制手段を前記予備室内に設けたことを特徴とする基板処理装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007034927A JP5183934B2 (ja) | 2007-02-15 | 2007-02-15 | 基板処理装置及び基板処理方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007034927A JP5183934B2 (ja) | 2007-02-15 | 2007-02-15 | 基板処理装置及び基板処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008198930A true JP2008198930A (ja) | 2008-08-28 |
JP5183934B2 JP5183934B2 (ja) | 2013-04-17 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2007034927A Active JP5183934B2 (ja) | 2007-02-15 | 2007-02-15 | 基板処理装置及び基板処理方法 |
Country Status (1)
Country | Link |
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JP (1) | JP5183934B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140147061A (ko) | 2013-06-18 | 2014-12-29 | 주식회사 엘지화학 | 경화성 조성물 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06216053A (ja) * | 1993-01-13 | 1994-08-05 | Tokyo Electron Tohoku Ltd | 縦型処理装置 |
JPH1174205A (ja) * | 1997-08-27 | 1999-03-16 | Sony Corp | 半導体製造装置 |
JP2003258063A (ja) * | 2002-03-06 | 2003-09-12 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2004071618A (ja) * | 2002-08-01 | 2004-03-04 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2005056905A (ja) * | 2003-08-05 | 2005-03-03 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2006253448A (ja) * | 2005-03-11 | 2006-09-21 | Hitachi Kokusai Electric Inc | 基板処理装置 |
-
2007
- 2007-02-15 JP JP2007034927A patent/JP5183934B2/ja active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06216053A (ja) * | 1993-01-13 | 1994-08-05 | Tokyo Electron Tohoku Ltd | 縦型処理装置 |
JPH1174205A (ja) * | 1997-08-27 | 1999-03-16 | Sony Corp | 半導体製造装置 |
JP2003258063A (ja) * | 2002-03-06 | 2003-09-12 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2004071618A (ja) * | 2002-08-01 | 2004-03-04 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2005056905A (ja) * | 2003-08-05 | 2005-03-03 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2006253448A (ja) * | 2005-03-11 | 2006-09-21 | Hitachi Kokusai Electric Inc | 基板処理装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140147061A (ko) | 2013-06-18 | 2014-12-29 | 주식회사 엘지화학 | 경화성 조성물 |
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JP5183934B2 (ja) | 2013-04-17 |
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