JP2008162877A - Downward type method for thinning glass - Google Patents

Downward type method for thinning glass Download PDF

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JP2008162877A
JP2008162877A JP2007041918A JP2007041918A JP2008162877A JP 2008162877 A JP2008162877 A JP 2008162877A JP 2007041918 A JP2007041918 A JP 2007041918A JP 2007041918 A JP2007041918 A JP 2007041918A JP 2008162877 A JP2008162877 A JP 2008162877A
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glass
etching solution
display panel
downward
thinning
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JP4794475B2 (en
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Mun-Yon Park
ムン−ヨン パク
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CHEE CHAN GYU
CHEE CHAN-GYU
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CHEE CHAN GYU
CHEE CHAN-GYU
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a downward type method for thinning glass, in which desired etching of glass is attained by naturally flowing an etching solution along the surface of the glass from an upper part to a lower part by the gravity and by which production of particles can be drastically reduced and at the same time, a display panel can be made ultra-thin. <P>SOLUTION: Glass is arranged vertically and made thinner by uniformly flowing an etching solution from the upper part of the glass to a lower part. An HF solution is used as the etching solution. Since desired glass etching can be attained by naturally flowing the etching solution by the gravity, the generation of particles can be drastically reduced and at the same time, the glass can be made ultra-thin. Further, even in the case when glass is made ultra-thin, high quality extremely thin glass can be provided because the generation of a scratch on the surface of the glass can be prevented. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、下向き式ガラス薄型化方法に係り、より詳細には、重力によってエッチング液をグラスの上部から下部にグラス表面に沿って自然に流して所望のガラスのエッチングを達成することによって、パーティクルの発生を顕著に低減すると同時にガラス厚を超薄型化できる下向き式ガラス薄型化方法に関する。   The present invention relates to a downward-type glass thinning method, and more specifically, by flowing an etching solution naturally from the upper part to the lower part of the glass along the glass surface by gravity, thereby achieving the desired glass etching. The present invention relates to a downward-type glass thinning method capable of significantly reducing the occurrence of glass and simultaneously making the glass thickness ultra thin.

ディスプレイに使われるガラスには、ＳｉＯ２にアルカリイオンが必要な時に添加されるソーダライムガラスと、高温でも変化が少ないアルカリフリー（無アルカリ）ガラスとがある。ソーダライムガラスは、温度による物性変化点は低いが、安価な点から、低温工程を用いるＳＴＮ ＬＣＤ（Ｓｕｐｅｒ−Ｔｗｉｓｔｅｄ Ｎｅｍａｔｉｃ Ｌｉｑｕｉｄ Ｃｙｓｔａｌ Ｄｉｓｐｌａｙ）やＰＭ ＯＬＥＤ（Ｐａｓｓｉｖｅ Ｍａｔｒｉｘ Ｏｒｇａｎｉｃ Ｌｉｇｈｔ Ｅｍｉｔｔｉｎｇ Ｄｉｏｄｅ：受動有機電界発光素子）に多く使用されており、アルカリフリー（無アルカリ）ガラスは、温度による物性変化点が高いことからＴＦＴ（Ｔｈｉｎ Ｆｉｌｍ Ｔｒａｎｓｉｓｔｏｒ）アレイの形成に用いられる高温工程に適合しており、よって、ＴＦＴ−ＬＣＤやＡＭ ＯＬＥＤ（Ａｃｔｉｖｅ ｍａｔｒｉｘ ＯＬＥＤ：能動有機電界発光素子）に多く使用されている。 Glass used for the display includes soda lime glass added when alkali ions are required for SiO 2 and alkali-free (non-alkali) glass that hardly changes even at high temperatures. Although soda lime glass has a low physical property change point due to temperature, it is inexpensive, and therefore, a low-temperature process such as STN LCD (Super-Twisted Liquid Liquid Display) or PM OLED (Passive Matrix Organic Light Emitting Element: Light Emitting Element). The alkali-free (non-alkali) glass is suitable for a high temperature process used for forming a TFT (Thin Film Transistor) array because of its high physical property change point due to temperature. It is often used in LCDs and AM OLEDs (Active matrix OLEDs).

近来、半導体及びディスプレイ装備産業の発展と軽薄短小な製品を追求する消費者の要求に応じて、ガラスが合着された形態に製造されるディスプレイパネルを薄型化する技術の発展も切実に要求されている。すなわち、ＬＣＤの基板などに用いられるガラスの厚さは、装備の薄型化に伴って超薄型化が要求されており、このようなディスプレイ基板の薄型化は、ディスプレイパネルのエッチングによって達成してきた。   In recent years, in response to the development of the semiconductor and display equipment industry and the demands of consumers seeking light, thin, and small products, there is an urgent need for the development of technology for thinning display panels that are manufactured in a glass-bonded form. ing. That is, the thickness of the glass used for the substrate of the LCD is required to be ultra-thin with the thinning of the equipment, and such thinning of the display substrate has been achieved by etching the display panel. .

従来のガラス薄型化技術には、浸漬法（Ｄｉｐ）、噴射法（Ｓｐｒａｙ）、浸漬及び噴射法（Ｄｉｐ＆Ｓｐｒａｙ）がよく知られている。   As conventional glass thinning techniques, a dipping method (Dip), a spraying method (Spray), and a dipping and spraying method (Dip & Spray) are well known.

添付の図面を参照しつつ、従来のガラス薄型化方法について具体的に説明する。   A conventional glass thinning method will be specifically described with reference to the accompanying drawings.

図１ａは、浸漬法１００を用いる従来のガラス薄型化方法を示す図である。図１ａを参照すると、外部のハウジング１５０の内部に隔壁１２０で区画されるセル領域１１０が存在し、セル領域１１０の内部においてディスプレイパネル１３０がそれぞれのセルに配置される。なお、外部のハウジング１５０にはエッチング液が入っており、それぞれのセルにもエッチング液が投入されている。以降、ハウジング１５０の下端からバブル（Ｂｕｂｂｌｅ）１４０を上部に向かって強く投入することによって、各セルに入っているディスプレイパネルが薄型化する。この方法は、工程が簡易で、且つ、多数のガラスを同時に薄型化できるという長所がある。しかし、この方法は、ガラスを薄型化する工程に時間がかかる他、ガラス間に残留物が発生し、該残留物がバブルの投入と共にガラスにぶつかるか、色々なパーティクルが発生してガラスの表面にスクラッチを発生させるか、ガラスの内面にもパーティクルを生成するという問題点があった。   FIG. 1 a is a diagram illustrating a conventional glass thinning method using the dipping method 100. Referring to FIG. 1 a, a cell region 110 defined by a partition wall 120 exists in an external housing 150, and a display panel 130 is disposed in each cell in the cell region 110. The external housing 150 contains an etching solution, and the etching solution is also charged into each cell. Thereafter, the bubble 140 is strongly thrown upward from the lower end of the housing 150, so that the display panel in each cell is thinned. This method has advantages in that the process is simple and a large number of glasses can be made thin simultaneously. However, in this method, it takes time to thin the glass, and a residue is generated between the glasses, and the residue hits the glass when a bubble is introduced, or various particles are generated to generate a surface of the glass. There is a problem of generating scratches on the glass or generating particles on the inner surface of the glass.

図１ｂは、噴射法２００を用いる従来のガラス薄型化方法を示す図である。図１ｂを参照すると、ディスプレイパネル２１０の両側に配置されたノズル２２０からエッチング液を強くディスプレイパネル２１０の表面に噴射させてエッチングすることで、ガラスを薄型化する。この方法では、浸漬法のように残留物が多く発生することがなく、大型ガラスにも容易に薄型化工程作業を行うことができるが、強い噴射圧によってガラス表面にディンプル形状のスクラッチが発生し、また、複雑な作業工程が要求されるという問題点があった。   FIG. 1 b is a diagram showing a conventional glass thinning method using the injection method 200. Referring to FIG. 1 b, the glass is thinned by etching by spraying an etching solution strongly onto the surface of the display panel 210 from the nozzles 220 disposed on both sides of the display panel 210. This method does not generate much residue like the dipping method, and can easily perform the thinning process even for large glass, but dimple-shaped scratches are generated on the glass surface due to strong spray pressure. In addition, there is a problem that a complicated work process is required.

図１ｃは、浸漬法と噴射法を併合した浸漬及び噴射法３００を用いる従来のガラス薄型化方法を示す図である。図１ｃを参照すると、エッチング液３３０の入っている装備にディスプレイパネル３１０を浸漬した後、ディスプレイパネル３１０の左右から強くエッチング液を噴射してガラス基板を薄型化する。しかし、この方法も同様に、極めて複雑な工程が要求され、高コストがかかり、メンテナンスが難しいという難題があるだけでなく、依然としてガラス表面にスクラッチが発生する問題が残る。   FIG. 1c is a diagram showing a conventional glass thinning method using a dipping and spraying method 300 that combines a dipping method and a spraying method. Referring to FIG. 1C, after the display panel 310 is immersed in equipment containing the etchant 330, the etchant is strongly sprayed from the left and right sides of the display panel 310 to thin the glass substrate. However, this method similarly requires a very complicated process, is expensive, is difficult to maintain, and still has a problem of scratching the glass surface.

このようなスクラッチはいくら微細であっても、ディスプレイパネルなどの先端装備において致命的な誤りを招き、その商品価値を顕著に落とすため、いくら微細なスクラッチを持つディスプレイパネルであっても廃棄されてしまう。   No matter how fine these scratches are, they can cause fatal errors in advanced equipment such as display panels and significantly reduce the value of their products, so even display panels with fine scratches are discarded. End up.

すなわち、上述した従来のいずれの技術を用いる場合であっても、外部のエッチング液を用いてバブルやスプレイでベアガラスをエッチングすると、ガラス表面に微細なスクラッチやパーティクルによるき損が発生し、これは、高精度を要求するディスプレイ等の装備では致命的な品質欠陥につながるため、製造済みの薄型化したディスプレイパネルであっても、スクラッチが少しでも存在するものは全部廃棄され、莫大な費用損失を招くという問題点があった。   That is, even if any of the above-described conventional techniques is used, if the bare glass is etched with bubbles or sprays using an external etching solution, damage due to fine scratches or particles occurs on the glass surface. Equipment such as displays that require high accuracy will lead to fatal quality defects, so even thin display panels that have been manufactured will be discarded if there are any scratches, even if they are scratched, causing enormous cost loss. There was a problem.

本発明は、上記の問題点を解決するためのもので、その目的は、重力によってエッチング液をガラスの上部から下部にガラス表面に沿って自然に流して所望のガラスのエッチングを達成することによって、パーティクルの発生を顕著に低減すると同時にディスプレイパネルを超薄型化できる下向き式ガラス薄型化方法を提供することにある。   The present invention is to solve the above-mentioned problems, and its purpose is to achieve etching of a desired glass by naturally flowing an etching solution from the upper part to the lower part of the glass along the glass surface by gravity. An object of the present invention is to provide a downward-type glass thinning method capable of remarkably reducing the generation of particles and simultaneously making the display panel ultra thin.

上記の目的を達成するために、本発明は、ガラスを垂直に立て、前記ガラスの上部から下部にガラス表面に沿ってエッチング液を均一に流して前記ガラスを薄型化することを特徴とする下向き式ガラス薄型化方法を提供する。これにより、外部圧によるガラス表面への破損を防ぎ、パーティクルの発生無しに所望の厚さのガラスを薄型化できる。   In order to achieve the above object, the present invention is characterized in that the glass is made vertically by standing vertically and thinning the glass by flowing an etching solution uniformly along the glass surface from the upper part to the lower part of the glass. A method for thinning a glass is provided. Thereby, damage to the glass surface due to external pressure can be prevented, and the glass having a desired thickness can be thinned without generation of particles.

また、本発明は、前記エッチング液を、前記ガラスの上部の両側表面から均一にまたは変化を与えながら前記ガラスの下部に流すことを特徴とする下向き式ガラス薄型化方法を提供する。したがって、ディスプレイパネルの上部両側から均一にエッチング液を両側表面に沿って重力によって流すことができ、より高精度にエッチング厚を調節することができる。   The present invention also provides a downward-type glass thinning method, characterized in that the etching solution is allowed to flow from the both side surfaces of the upper portion of the glass to the lower portion of the glass uniformly or while changing. Therefore, the etchant can be made to flow uniformly from both sides of the upper part of the display panel along the surfaces of both sides, and the etching thickness can be adjusted with higher accuracy.

また、本発明は、前記エッチング液がＨＦ溶液であることを特徴とする下向き式ガラス薄型化方法を提供する。これにより、低コストを図ることができる。   The present invention also provides a downward glass thinning method, wherein the etching solution is an HF solution. Thereby, low cost can be aimed at.

また、本発明は、前記ガラスを固定する固定部と、前記エッチング液の流量を均一に調節する流量調節部を用いて前記ガラスを薄型化することを特徴とする下向き式ガラス薄型化方法を提供する。これにより、ガラスの動きによるエッチング厚の変動を防ぎ、所望の厚さにディスプレイパネルを薄型化することができる。   The present invention also provides a downward glass thinning method characterized in that the glass is thinned using a fixing part for fixing the glass and a flow rate adjusting part for uniformly adjusting the flow rate of the etching solution. To do. Thereby, the variation of the etching thickness due to the movement of the glass can be prevented, and the display panel can be thinned to a desired thickness.

また、本発明は、前記エッチング液が流れ出る入口の長さを調節可能な流路部を用いて前記エッチング液の流幅を調節することを特徴とする下向き式ガラス薄型化方法を提供する。これにより、ディスプレイパネルの幅に応じて、流れるエッチング液の幅を調節でき、ガラス全体面において同時に均一にエッチングがなされる。   The present invention also provides a downward-type glass thinning method, wherein the flow width of the etching solution is adjusted using a flow path part capable of adjusting the length of the inlet through which the etching solution flows. As a result, the width of the flowing etchant can be adjusted according to the width of the display panel, and the entire glass surface is uniformly etched simultaneously.

本発明によれば、重力によってエッチング液を自然に流して所望のガラスエッチングを達成できるため、パーティクルの発生を顕著に低減すると同時にディスプレイパネルを超薄型化することが可能になる。   According to the present invention, since the desired glass etching can be achieved by naturally flowing an etching solution by gravity, it is possible to remarkably reduce the generation of particles and to make the display panel ultra thin.

また、ディスプレイパネルを超薄型化する場合にも、ガラスの表面におけるスクラッチの発生を防止できるため、高い品質で薄型化したガラスを提供することが可能になる。   In addition, even when the display panel is made ultra-thin, it is possible to prevent generation of scratches on the surface of the glass, so that it is possible to provide a thin glass with high quality.

以下、添付図面を参照しつつ、本発明の構成と作用について説明する。   The configuration and operation of the present invention will be described below with reference to the accompanying drawings.

図２は、本発明の一実施例による下向き式ガラス薄型化方法を示す側面図である。図２を参照すると、薄型化すべきディスプレイパネル１０の上部からディスプレイパネル１０の両側面に沿って均一にエッチング液３０をディスプレイパネル１０の下部へ流す。本実施例では、ディスプレイパネルの両側面に沿って上部から下部へエッチング液を流すとしたが、ディスプレイパネルの上部から下部へ重力によってエッチング液を流してガラスを薄型化する技術要旨はいずれも本願発明の技術要旨に含まれる。   FIG. 2 is a side view illustrating a downward glass thinning method according to an embodiment of the present invention. Referring to FIG. 2, the etching solution 30 is made to flow uniformly from the upper part of the display panel 10 to be thinned along the both side surfaces of the display panel 10 to the lower part of the display panel 10. In this embodiment, the etching solution is flowed from the upper part to the lower part along both side surfaces of the display panel. However, the technical points of thinning the glass by flowing the etching solution by gravity from the upper part to the lower part of the display panel are all described in this application. It is included in the technical summary of the invention.

具体的には、ガラス基板やディスプレイパネルの上部に１つあるいは複数個のノズル部を設置してエッチング液が流れるようにすることができる。すなわち、１つのノズル部をガラスなどの上部面に設置し、ガラスやディスプレイパネルの両側表面に沿ってエッチング液が分岐して流れるようにしても良く、複数個のノズルを設置し、ガラスやディスプレイパネルの上部両側からそれぞれ両側表面に沿ってエッチング液が流れるようにしても良い。なお、エッチング液の流れは均一にしても良いが、使用者の工程上の必要に応じて、エッチング液の流量を変化させつつガラスの下部に流すことによって、より効率的に薄型化を図ることができる。   Specifically, one or a plurality of nozzles may be installed on the top of the glass substrate or the display panel so that the etching solution can flow. That is, one nozzle part may be installed on the upper surface of glass or the like, and the etchant may branch and flow along both surfaces of the glass or display panel. The etchant may flow along both surfaces from both sides of the upper part of the panel. Although the flow of the etching solution may be uniform, it can be made thinner more efficiently by flowing it under the glass while changing the flow rate of the etching solution as required by the user's process. Can do.

なお、本発明では、ガラスをエッチングできるいずれのエッチング液も使用可能であるが、好ましくは、ＨＦ溶液を使用することが費用面で有利である。また、本発明では、エッチング液を流す際に、使用者がエッチング液の流量を、要求されるエッチング程度に調節できるようにする流量調節部（図示せず）を備えることが好ましく、この流量調節部は、自動化装備と連結されて時間とエッチング厚を自動に調節するように構成することが好ましい。   In the present invention, any etching solution capable of etching glass can be used, but it is preferable to use an HF solution in terms of cost. In the present invention, it is preferable to provide a flow rate adjusting unit (not shown) that allows the user to adjust the flow rate of the etching solution to the required etching level when flowing the etching solution. The part is preferably configured to be automatically connected to the automation equipment to automatically adjust the time and the etching thickness.

なお、エッチング液をディスプレイパネルの表面に沿って上部から下部に流下する下向き式の方式とするものの、エッチング液が流れ出る流量調節部の入口である流路部（図示せず）を、その幅が調節可能なように構成することが好ましい。これにより、ディスプレイパネルの大きさに応じて流路部の幅を拡大または縮小でき、より高効率で汎用の下向き式ガラス薄型化工程が可能となる。   In addition, although it is a downward type system in which the etching liquid flows down from the upper part to the lower part along the surface of the display panel, the width of the flow path part (not shown) that is the inlet of the flow rate adjustment part from which the etching liquid flows out is It is preferable that the configuration is adjustable. Thereby, the width | variety of a flow-path part can be expanded or reduced according to the magnitude | size of a display panel, and a general-purpose downward type | formula glass thinning process becomes possible with higher efficiency.

図３は、ベアガラス状態の写真（ａ）、従来の薄型化方式によるガラスのＳＥＭ Ｐｉｃｔｕｒｅ（×１０，０００）の写真（ｂ）、及び本発明による下向き式ガラス薄型化過程によるガラス写真（ｃ）である。従来の技術による薄型化工程の後には、中間の写真のようにスクラッチが発生する。このようなスクラッチは、いくら微細であっても、ディスプレイパネルなどの先端装備には致命的な誤りを招き、その商品価値を顕著に落とすため、いくら微細なスクラッチを持つディスプレイパネルであっても廃棄されてしまう。これに対し、図３の下向き式ガラス薄型化過程によるガラス写真（ｃ）では、スクラッチが全く生じず、完璧な表面状態を維持している。   FIG. 3 shows a bare glass state photograph (a), a conventional SEM picture (× 10,000) photograph of glass by a thinning method (b), and a glass photograph (c) of a downward glass thinning process according to the present invention. It is. After the thinning process according to the conventional technique, scratches are generated as in the intermediate photograph. No matter how fine the scratches are, they can be fatal to leading-edge equipment such as display panels and significantly reduce the value of their products. Will be. On the other hand, in the glass photograph (c) by the downward glass thinning process of FIG. 3, no scratch is generated and a perfect surface state is maintained.

したがって、本発明によれば、スクラッチの発生を完全に防止し、品質面において既存のガラス薄型化技術とは次元を異にする下向き式ガラス薄型化方法を提供することが可能になる。したがって、本発明によれば、ガラス品質を上昇させることは勿論、従来の廃棄処分されてきたスクラッチを有するガラスをリペアでき、費用再創出の効果ももたらす。   Therefore, according to the present invention, it is possible to provide a downward-type glass thinning method that completely prevents the generation of scratches and has a different dimension from existing glass thinning technology in terms of quality. Therefore, according to the present invention, it is possible to repair the glass having scratches that have been disposed of in the past as well as improving the quality of the glass, which also brings about an effect of cost re-creation.

以上では具体的な実施例に挙げて本発明を説明してきたが、本発明は、上記の実施例に限定されず、本発明の範ちゅうを逸脱しない限度内で様々に変形可能である。したがって、本発明の技術的思想は、上記の実施例によって限定されてはいけなく、特許請求の範囲とその均等物によって定められるべきである。   Although the present invention has been described with reference to specific embodiments, the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the scope of the present invention. Therefore, the technical idea of the present invention should not be limited by the above-described embodiments, but should be defined by the claims and their equivalents.

従来の浸漬（ｄｉｐ）技術によるガラス薄型化方法を示す概略断面図である。It is a schematic sectional drawing which shows the glass thinning method by the conventional immersion (dip) technique. 従来の噴射(spray)技術によるガラス薄型化方法を示す概略断面図である。It is a schematic sectional drawing which shows the glass thinning method by the conventional spray technique (spray). 従来の浸漬（ｄｉｐ）及び噴射（ｓｐｒａｙ）技術によるガラス薄型化方法を示す概略断面図である。It is a schematic sectional drawing which shows the glass thinning method by the conventional immersion (dip) and spraying (spray) technique. 本発明の一実施例による下向き式ガラス薄型化方法を示す側面図である。It is a side view which shows the downward type glass thinning method by one Example of this invention. 従来の技術と本発明によって薄型化したガラスの表面を拡大した写真である。It is the photograph which expanded the surface of the glass thinned by the prior art and this invention.

符号の説明Explanation of symbols

１０、１３０、２１０、３１０ ディスプレイパネル
３０、３３０ エッチング液
１００ 浸漬法
１１０ セル領域
１２０ 隔壁
１４０ バブル
１５０ 外部のハウジング
２００、３００ 噴射法
２２０ ノズル 10, 130, 210, 310 Display panel 30, 330 Etching solution 100 Immersion method 110 Cell region 120 Partition 140 Bubble 150 External housing 200, 300 Injection method 220 Nozzle

Claims (5)

ガラスやディスプレイパネルを垂直に立て、前記ガラスの上部から下部にガラスの表面に沿ってエッチング液を均一にまたはエッチング液の流量に変化を与えながら流して、前記ガラスやディスプレイパネルを薄型化することを特徴とする下向き式ガラス薄型化方法。   The glass or display panel is set up vertically, and the glass or display panel is thinned by flowing the etchant uniformly or while changing the flow rate of the etchant along the surface of the glass from the top to the bottom of the glass. A method for thinning a downward glass characterized by the following. 前記ガラス基板やディスプレイパネルの上部に１つあるいは複数個のノズル部を設置し、１つのノズル部が前記ガラスやディスプレイパネルの両側に分岐して設置されるか、あるいは、前記複数個のノズルが前記ガラスやディスプレイパネルの両側にそれぞれ設置され、前記ノズルから前記ガラスやディスプレイパネルの両側表面に沿って均一にまたはエッチング液の流量に変化を与えながらエッチング液を下部に流れるようにすることを特徴とする請求項１に記載の下向き式ガラス薄型化方法。   One or a plurality of nozzle parts are installed on the glass substrate or the display panel, and one nozzle part is branched and installed on both sides of the glass or the display panel, or the plurality of nozzles It is respectively installed on both sides of the glass or display panel, and the etching solution flows downward from the nozzle along the both side surfaces of the glass or display panel or while changing the flow rate of the etching solution. The downward-type glass thinning method according to claim 1. 前記エッチング液は、ＨＦ溶液であることを特徴とする請求項２に記載の下向き式ガラス薄型化方法。   The downward glass thinning method according to claim 2, wherein the etching solution is an HF solution. 前記ガラスやディスプレイパネルを固定する固定部と、前記エッチング液の流量を均一に調節する流量調節部を備えることを特徴とする請求項２または３に記載の下向き式ガラス薄型化方法。   4. The downward glass thinning method according to claim 2, further comprising: a fixing unit that fixes the glass and the display panel; and a flow rate adjusting unit that uniformly adjusts the flow rate of the etching solution. 前記エッチング液が流れ出る入口の幅を調節可能な流路部を用いて前記エッチング液の流幅を調節することを特徴とする請求項１または２に記載の下向き式ガラス薄型化方法。   3. The downward glass thinning method according to claim 1, wherein the flow width of the etching solution is adjusted by using a flow path portion capable of adjusting a width of an inlet through which the etching solution flows.
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