JP2008153402A5 - - Google Patents

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Publication number
JP2008153402A5
JP2008153402A5 JP2006339204A JP2006339204A JP2008153402A5 JP 2008153402 A5 JP2008153402 A5 JP 2008153402A5 JP 2006339204 A JP2006339204 A JP 2006339204A JP 2006339204 A JP2006339204 A JP 2006339204A JP 2008153402 A5 JP2008153402 A5 JP 2008153402A5
Authority
JP
Japan
Prior art keywords
substrate
shutter
exposure apparatus
information
control unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006339204A
Other languages
English (en)
Japanese (ja)
Other versions
JP5025250B2 (ja
JP2008153402A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006339204A priority Critical patent/JP5025250B2/ja
Priority claimed from JP2006339204A external-priority patent/JP5025250B2/ja
Priority to TW096145155A priority patent/TWI388938B/zh
Priority to KR1020070130571A priority patent/KR100972879B1/ko
Priority to US11/956,597 priority patent/US8223317B2/en
Publication of JP2008153402A publication Critical patent/JP2008153402A/ja
Publication of JP2008153402A5 publication Critical patent/JP2008153402A5/ja
Application granted granted Critical
Publication of JP5025250B2 publication Critical patent/JP5025250B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006339204A 2006-12-15 2006-12-15 露光装置及びデバイス製造方法 Expired - Fee Related JP5025250B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006339204A JP5025250B2 (ja) 2006-12-15 2006-12-15 露光装置及びデバイス製造方法
TW096145155A TWI388938B (zh) 2006-12-15 2007-11-28 曝光設備及裝置製造方法
KR1020070130571A KR100972879B1 (ko) 2006-12-15 2007-12-14 노광장치 및 디바이스 제조방법
US11/956,597 US8223317B2 (en) 2006-12-15 2007-12-14 Exposure apparatus and device manufacturing method controlling shutter based on intensity of reflected light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006339204A JP5025250B2 (ja) 2006-12-15 2006-12-15 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008153402A JP2008153402A (ja) 2008-07-03
JP2008153402A5 true JP2008153402A5 (https=) 2010-02-12
JP5025250B2 JP5025250B2 (ja) 2012-09-12

Family

ID=39526727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006339204A Expired - Fee Related JP5025250B2 (ja) 2006-12-15 2006-12-15 露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US8223317B2 (https=)
JP (1) JP5025250B2 (https=)
KR (1) KR100972879B1 (https=)
TW (1) TWI388938B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5100088B2 (ja) * 2006-11-07 2012-12-19 キヤノン株式会社 露光装置及びデバイス製造方法
JP5173650B2 (ja) 2008-07-29 2013-04-03 キヤノン株式会社 露光装置およびデバイス製造方法
KR101652887B1 (ko) 2009-12-04 2016-09-02 삼성디스플레이 주식회사 기판의 노광방법, 이를 수행하기 위한 기판의 노광장치 및 이를 이용한 표시기판의 제조방법
JP5221611B2 (ja) * 2010-09-13 2013-06-26 株式会社東芝 ドーズデータ生成装置、露光システム、ドーズデータ生成方法および半導体装置の製造方法
WO2013023876A1 (en) 2011-08-18 2013-02-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101633761B1 (ko) 2012-01-17 2016-06-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
JP6929142B2 (ja) * 2017-06-19 2021-09-01 キヤノン株式会社 露光装置、および物品の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5771132A (en) 1980-10-21 1982-05-01 Canon Inc Exposure controlling system
JPH0782981B2 (ja) * 1986-02-07 1995-09-06 株式会社ニコン 投影露光方法及び装置
JPH0513292A (ja) * 1991-07-02 1993-01-22 Nikon Corp 露光装置
JPH0864510A (ja) * 1994-08-19 1996-03-08 Oki Electric Ind Co Ltd 露光量制御方法及びその装置
JPH08236429A (ja) * 1995-02-23 1996-09-13 Nikon Corp 投影露光装置
JPH08250398A (ja) * 1995-03-14 1996-09-27 Nikon Corp 投影露光装置
JPH0945604A (ja) * 1995-07-28 1997-02-14 Nec Corp 露光方法及び露光装置
JPH09213619A (ja) * 1996-01-31 1997-08-15 Nikon Corp 露光方法及び露光装置
JPH10294262A (ja) * 1997-04-18 1998-11-04 Nikon Corp 投影露光装置
KR20000050395A (ko) * 1999-01-08 2000-08-05 윤종용 반사광 검출기를 포함하는 노광장치 및 이를 이용한 노광방법
JP2001144004A (ja) * 1999-11-16 2001-05-25 Nikon Corp 露光方法、露光装置、及びデバイス製造方法
JP2001203137A (ja) * 2000-01-19 2001-07-27 Mitsubishi Electric Corp レジストパターン形成方法およびそれを使用して製造される半導体装置
JP3807933B2 (ja) * 2000-12-14 2006-08-09 株式会社ルネサステクノロジ 投影露光装置及び投影露光方法
JP4622568B2 (ja) * 2005-02-14 2011-02-02 株式会社ニコン 露光方法、露光装置、反射板、反射率計測センサの校正方法及びマイクロデバイスの製造方法

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