JP2008147632A5 - - Google Patents
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- Publication number
- JP2008147632A5 JP2008147632A5 JP2007290164A JP2007290164A JP2008147632A5 JP 2008147632 A5 JP2008147632 A5 JP 2008147632A5 JP 2007290164 A JP2007290164 A JP 2007290164A JP 2007290164 A JP2007290164 A JP 2007290164A JP 2008147632 A5 JP2008147632 A5 JP 2008147632A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- organic ferroelectric
- forming
- crystallinity
- ferroelectric film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 14
- 239000011344 liquid material Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 8
- 239000013078 crystal Substances 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- 238000003860 storage Methods 0.000 claims description 6
- 238000007493 shaping process Methods 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 4
- 230000005684 electric field Effects 0.000 claims description 2
- 230000009477 glass transition Effects 0.000 claims description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 claims 2
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical group FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 238000003825 pressing Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007290164A JP2008147632A (ja) | 2006-11-13 | 2007-11-07 | 有機強誘電体膜の形成方法、記憶素子の製造方法、記憶装置、および電子機器 |
| US11/937,197 US20080135900A1 (en) | 2006-11-13 | 2007-11-08 | Method of forming organic ferroelectric film, method of manufacturing memory element, memory device, and electronic apparatus |
| KR1020070114744A KR20080043239A (ko) | 2006-11-13 | 2007-11-12 | 유기 강유전체막의 형성 방법, 기억 소자의 제조 방법,기억 장치, 및 전자 기기 |
| US12/578,481 US20100022032A1 (en) | 2006-11-13 | 2009-10-13 | Method of forming organic ferroelectric film, method of manufacturing memory element, memory device, and electronic apparatus |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006307153 | 2006-11-13 | ||
| JP2007290164A JP2008147632A (ja) | 2006-11-13 | 2007-11-07 | 有機強誘電体膜の形成方法、記憶素子の製造方法、記憶装置、および電子機器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008147632A JP2008147632A (ja) | 2008-06-26 |
| JP2008147632A5 true JP2008147632A5 (https=) | 2010-11-18 |
Family
ID=39480511
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007290164A Withdrawn JP2008147632A (ja) | 2006-11-13 | 2007-11-07 | 有機強誘電体膜の形成方法、記憶素子の製造方法、記憶装置、および電子機器 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2008147632A (https=) |
| KR (1) | KR20080043239A (https=) |
| CN (1) | CN101188198A (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5957648B2 (ja) * | 2009-09-14 | 2016-07-27 | 株式会社イデアルスター | フッ化ビニリデンと、トリフルオロエチレン又はテトラフルオロエチレンとの共重合体とフラーレンとの混合膜及びその製造方法 |
| JP2011159848A (ja) * | 2010-02-02 | 2011-08-18 | Toshiba Corp | 固体撮像装置およびその製造方法 |
| KR101276560B1 (ko) * | 2011-03-17 | 2013-06-24 | 한국과학기술원 | 강유전체 폴리머 나노도트 소자 및 그 제조를 위한 디웨팅 프로세스 |
| JP5926903B2 (ja) * | 2011-08-22 | 2016-05-25 | 株式会社クレハ | 所望のキュリー温度を有するポリマーの製造方法 |
| CN103999207B (zh) * | 2011-11-09 | 2017-07-28 | 国立研究开发法人科学技术振兴机构 | 固体电子装置 |
| WO2014158956A1 (en) * | 2013-03-14 | 2014-10-02 | Saudi Basic Industries Corporation | Ferroelectric capacitor with improved fatigue and breakdown properties |
| JP6229532B2 (ja) * | 2014-02-21 | 2017-11-15 | 国立研究開発法人産業技術総合研究所 | 有機強誘電体薄膜の製造方法 |
| JP2016171152A (ja) * | 2015-03-12 | 2016-09-23 | ペクセル・テクノロジーズ株式会社 | ペロブスカイト化合物を用いた強誘電体メモリ素子およびその製造方法 |
-
2007
- 2007-11-07 JP JP2007290164A patent/JP2008147632A/ja not_active Withdrawn
- 2007-11-12 KR KR1020070114744A patent/KR20080043239A/ko not_active Withdrawn
- 2007-11-13 CN CNA2007101681560A patent/CN101188198A/zh active Pending
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