JP2008144236A - 摺動性および耐食性に優れたNiメッキ鋼板およびその製造方法 - Google Patents
摺動性および耐食性に優れたNiメッキ鋼板およびその製造方法 Download PDFInfo
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- JP2008144236A JP2008144236A JP2006333807A JP2006333807A JP2008144236A JP 2008144236 A JP2008144236 A JP 2008144236A JP 2006333807 A JP2006333807 A JP 2006333807A JP 2006333807 A JP2006333807 A JP 2006333807A JP 2008144236 A JP2008144236 A JP 2008144236A
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- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 46
- 239000010959 steel Substances 0.000 title claims abstract description 46
- 230000007797 corrosion Effects 0.000 title claims abstract description 40
- 238000005260 corrosion Methods 0.000 title claims abstract description 40
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000007747 plating Methods 0.000 claims abstract description 64
- 239000007864 aqueous solution Substances 0.000 claims abstract description 14
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000007789 sealing Methods 0.000 claims abstract description 9
- 150000004645 aluminates Chemical class 0.000 claims abstract description 8
- 238000009792 diffusion process Methods 0.000 claims description 26
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 16
- 238000012360 testing method Methods 0.000 claims description 12
- 229910019142 PO4 Inorganic materials 0.000 claims description 7
- 239000010452 phosphate Substances 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 3
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims 1
- 238000005868 electrolysis reaction Methods 0.000 abstract description 7
- -1 triphosphoric acid alkali salt Chemical class 0.000 abstract description 7
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 229940048102 triphosphoric acid Drugs 0.000 abstract description 2
- 239000000243 solution Substances 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 62
- 239000010410 layer Substances 0.000 description 51
- 238000000034 method Methods 0.000 description 17
- 230000000694 effects Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 239000011734 sodium Substances 0.000 description 9
- 238000005238 degreasing Methods 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 238000005096 rolling process Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 238000005554 pickling Methods 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 229910052758 niobium Inorganic materials 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 3
- 229910018104 Ni-P Inorganic materials 0.000 description 3
- 229910018536 Ni—P Inorganic materials 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000004135 Bone phosphate Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 238000010191 image analysis Methods 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000655 Killed steel Inorganic materials 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000005078 molybdenum compound Substances 0.000 description 1
- 150000002752 molybdenum compounds Chemical class 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- HWGNBUXHKFFFIH-UHFFFAOYSA-I pentasodium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O HWGNBUXHKFFFIH-UHFFFAOYSA-I 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 125000005402 stannate group Chemical group 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 235000011178 triphosphate Nutrition 0.000 description 1
- 239000001226 triphosphate Substances 0.000 description 1
- 150000003658 tungsten compounds Chemical class 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
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Abstract
【解決手段】 メッキ表面にAl,Si,Pから選ばれる1種以上の元素を含む酸化膜を有し、かつメッキピンホールが封孔されたことを特徴とする摺動性、耐食性に優れたNiメッキ鋼板である。前記の酸化膜の形成およびメッキピンホールの封孔はアノード電解処理によりなされたものであることが望ましい。また本発明は、Niメッキ鋼板を、第三リン酸アルカリ塩を必須として更にケイ酸塩及びまたはアルミン酸塩を含有する水溶液中でアノード電解処理することを特徴とするものである。
【選択図】図1
Description
メッキ表面にAl、Si、Pから選ばれる1種以上の元素を含む酸化膜を有し、かつメッキピンホールが封孔されたことを特徴とする摺動性、耐食性に優れたNiメッキ鋼板である。前記の酸化膜の形成およびメッキピンホールの封孔はアノード電解処理によりなされたものであることが望ましい。
冷間圧延、再結晶焼鈍した低炭素Alキルド鋼を原板として、脱脂、酸洗処理の後、watt浴による電気メッキで付着量25g/m2のNiメッキを形成し、調質圧延により表面粗度を調整した。その後、表1に示す各種水溶液中で、60℃、電流密度30A/dm2、10secのアノード電解処理を行い供試材とした。なお、実施例2では、watt浴に市販のアセチレン系半光沢添加剤を0.5%添加してNiメッキを行なった。また実施例3では、watt浴に亜リン酸を添加し、P4.5%含有のNi−P合金メッキ(付着量はNiで20g/m2)を行なった。比較例1では、Niメッキの付着量を50g/m2とし、アノード電解処理は行わなかった。
酸化膜解析;AES(オージェ電子分析)により表層から深さ方向の元素分析を行い、O強度がアトミック%で5%となる深さを酸化膜厚みとした。また同じくAESにより、酸化膜中に検出される元素を同定した。
摺動性;20mg/m2の極薄塗油したサンプルを10mm幅の平板金型で加重1200kgにて圧着し、500mm/minにて引き抜き、摩擦係数を測定した。0.13未満を「○」、0.13〜0.17未満を「△」、0.17以上を「×」と評価した。
冷間圧延したNb、Ti−SULC鋼の未再結晶材を原板として、脱脂、酸洗処理の後、watt浴による電気メッキで付着量18g/m2のNiメッキを形成した。次いで、無酸化雰囲気にて800℃、60secの鋼板焼鈍とNiメッキの熱拡散処理を兼ねる処理を行い、Fe−Ni拡散層とその上層に再結晶軟質化したNi層を形成した。その後、第三リン酸Na:0.8M+オルトケイ酸Na:0.2Mの水溶液にて、アノード電解処理を行った。アノード電解処理の条件は表2に示すように種々変更した。最後に調質圧延により表面粗度を調整して供試材とした。比較例3ではアノード電解処理を行わない以外は同様にサンプルを調整した。
冷間圧延したNb、Ti−SULC鋼の未再結晶材を原板として、脱脂、酸洗処理の後、watt浴による電気メッキで付着量18g/m2のNiメッキを形成した。その後、第三リン酸Na:0.8M+オルトケイ酸Na:0.2Mの水溶液にて、表2に示すアノード電解処理を行った。次いで、無酸化雰囲気にて800℃、60secの鋼板焼鈍とNiメッキの熱拡散処理を兼ねる処理を行い、Fe−Ni拡散層とその上層に再結晶軟質化したNi層を形成した。最後に調質圧延により表面粗度を調整して供試材とした。
冷間圧延したNb、Ti−SULC鋼の未再結晶材を原板として、脱脂、酸洗処理の後、watt浴による電気メッキで表3に示す付着量のNiメッキを形成した。次いで、最表層までFe−Ni拡散層となるように、無酸化雰囲気、820℃にて鋼板焼鈍とNiメッキの熱拡散処理を兼ねる処理を行った。調質圧延により表面粗度を調整し、脱脂処理の後、第三リン酸Na:0.5M+オルトケイ酸Na:0.1M+ホウ酸Na:0.1Mの水溶液にて、50℃、電流密度20A/dm2、50secのアノード電解処理を行った。比較例4ではアノード電解処理を行わない以外は同様にサンプルを調整した。
冷間圧延したNb、Ti−SULC鋼の未再結晶材を原板として、脱脂、酸洗処理の後、watt浴による電気メッキで表3に示す付着量5g/m2のNiメッキを形成した。その後、第三リン酸Na:0.5M+オルトケイ酸Na:0.1M+ホウ酸Na:0.1Mの水溶液にて、50℃、電流密度20A/dm2、50secのアノード電解処理を行った。次いで、無酸化雰囲気にて820℃、60secの鋼板焼鈍とNiメッキの熱拡散処理を兼ねる処理を行い、最表層までFe−Ni拡散層とした。最後に調質圧延により表面粗度を調整して供試材とした。
ピンホール;2個/cm2未満を「◎」、2〜5個/cm2未満を「○」、5〜10個/cm2未満を「△」、10個/cm2超を「×」と評価した。
耐食性(平板、加工とも);3%未満を「◎」、3〜10%未満を「○」、10〜30%未満を「△」、30%超を「×」と評価した。
Claims (10)
- メッキ表面にAl、Si、Pから選ばれる1種以上の元素を含む酸化膜を有し、かつメッキピンホールが封孔されたことを特徴とする摺動性および耐食性に優れたNiメッキ鋼板。
- 酸化膜の形成およびメッキピンホールの封孔がアノード電解処理によりなされたものであることを特徴とする請求項1に記載の摺動性および耐食性に優れたNiメッキ鋼板。
- 酸化膜厚みが5nm〜200nmであることを特徴とする請求項1または2に記載の摺動性および耐食性に優れたNiメッキ鋼板。
- メッキ付着量がNiとして片面当たり15g/m2以上45g/m2以下であり、メッキピンホールの封孔度合いとして、JIS−H−8617にて規定するフェロキシル試験におけるピンホール数が、1cm2当たり1個未満であることを特徴とする請求項1〜3のいずれかに記載の摺動性および耐食性に優れたNiメッキ鋼板。
- メッキ付着量がNiとして片面当たり5g/m2以上15g/m2未満であり、メッキピンホールの封孔度合いとして、JIS−H−8617にて規定するフェロキシル試験におけるピンホール数が、1cm2当たり5個未満であることを特徴とする請求項1〜3のいずれかに記載の摺動性および耐食性に優れたNiメッキ鋼板。
- Niメッキ鋼板が、Fe−Ni拡散層を有することを特徴とする請求項1〜5のいずれかに記載の摺動性および耐食性に優れたNiメッキ鋼板。
- Niメッキ鋼板が、再結晶軟質化されたNi層を有することを特徴とする請求項6に記載の摺動性および耐食性に優れたNiメッキ鋼板。
- Niメッキ鋼板を、第三リン酸アルカリ塩を必須として更にケイ酸塩及びまたはアルミン酸塩を含有する水溶液中でアノード電解処理することを特徴とする請求項1〜7のいずれかに記載の摺動性および耐食性に優れたNiメッキ鋼板の製造方法。
- 鋼板にNiメッキを施した後、熱拡散処理を行い、ついで、第三リン酸アルカリ塩を必須として更にケイ酸塩及びまたはアルミン酸塩を含有する水溶液中でアノード電解処理することを特徴とする請求項1〜7のいずれかに記載の摺動性および耐食性に優れたNiメッキ鋼板の製造方法。
- 鋼板にNiメッキを施した後、第三リン酸アルカリ塩を必須として更にケイ酸塩及びまたはアルミン酸塩を含有する水溶液中でアノード電解処理し、次いで熱拡散処理を行うことを特徴とする請求項1〜7のいずれかに記載の摺動性および耐食性に優れたNiメッキ鋼板の製造方法。
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