JP2008122844A5 - - Google Patents
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- Publication number
- JP2008122844A5 JP2008122844A5 JP2006309100A JP2006309100A JP2008122844A5 JP 2008122844 A5 JP2008122844 A5 JP 2008122844A5 JP 2006309100 A JP2006309100 A JP 2006309100A JP 2006309100 A JP2006309100 A JP 2006309100A JP 2008122844 A5 JP2008122844 A5 JP 2008122844A5
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- film
- resist pattern
- protective film
- phototool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001681 protective effect Effects 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 229910000679 solder Inorganic materials 0.000 claims 2
- 238000005476 soldering Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 238000002835 absorbance Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 230000007261 regionalization Effects 0.000 claims 1
- 229920001169 thermoplastic Polymers 0.000 claims 1
- 239000004416 thermosoftening plastic Substances 0.000 claims 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006309100A JP5079310B2 (ja) | 2006-11-15 | 2006-11-15 | ソルダーレジスト露光用フォトツール及びそれを用いて露光処理されるソルダーレジストパターンの形成方法 |
| TW96142700A TWI426351B (zh) | 2006-11-15 | 2007-11-12 | Photolithography (Phototool) and the formation of resistance to resistance pattern |
| CN 200710187256 CN101183212B (zh) | 2006-11-15 | 2007-11-15 | 光工具以及阻焊图案的形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006309100A JP5079310B2 (ja) | 2006-11-15 | 2006-11-15 | ソルダーレジスト露光用フォトツール及びそれを用いて露光処理されるソルダーレジストパターンの形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008122844A JP2008122844A (ja) | 2008-05-29 |
| JP2008122844A5 true JP2008122844A5 (cg-RX-API-DMAC7.html) | 2010-01-07 |
| JP5079310B2 JP5079310B2 (ja) | 2012-11-21 |
Family
ID=39448532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006309100A Active JP5079310B2 (ja) | 2006-11-15 | 2006-11-15 | ソルダーレジスト露光用フォトツール及びそれを用いて露光処理されるソルダーレジストパターンの形成方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP5079310B2 (cg-RX-API-DMAC7.html) |
| CN (1) | CN101183212B (cg-RX-API-DMAC7.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101810435B1 (ko) | 2010-09-29 | 2017-12-20 | 가부시키가이샤 가네카 | 신규한 감광성 수지 조성물 제작 키트 및 그 이용 |
| CN103901722B (zh) * | 2014-04-28 | 2017-02-22 | 无锡德贝尔光电材料有限公司 | 一种碱性显像型感光树脂组合物及其制备方法 |
| WO2018225544A1 (ja) * | 2017-06-06 | 2018-12-13 | 日本化薬株式会社 | 光硬化性組成物及び電子部品用接着剤 |
| JP7039229B2 (ja) * | 2017-09-28 | 2022-03-22 | 富士フイルム株式会社 | 転写フィルムの製造方法、レジストパターンの形成方法、及び、導電性配線パターンの製造方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0717737B2 (ja) * | 1987-11-30 | 1995-03-01 | 太陽インキ製造株式会社 | 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法 |
| JP3574524B2 (ja) * | 1996-02-23 | 2004-10-06 | 積水化学工業株式会社 | フォトマスク保護用粘着フィルムの製造方法 |
| TWI226814B (en) * | 1999-12-16 | 2005-01-11 | Matsushita Electric Industrial Co Ltd | A removable film, a substrate with film, a process for forming the removable film and a process for the manufacturing of the circuit board |
| JP2001296666A (ja) * | 2000-04-12 | 2001-10-26 | Orc Mfg Co Ltd | 基板露光方法および露光装置 |
| JP2003029417A (ja) * | 2001-07-12 | 2003-01-29 | Matsushita Electric Ind Co Ltd | プリント配線板の製造方法 |
| JP3876991B2 (ja) * | 2002-08-07 | 2007-02-07 | 三菱化学株式会社 | 青紫色レーザー感光性レジスト材層を有する画像形成材及びそのレジスト画像形成方法 |
| TW200417294A (en) * | 2002-11-28 | 2004-09-01 | Taiyo Ink Mfg Co Ltd | Photo- and thermo-setting resin composition and printed wiring boards made by using the same |
| JP4852225B2 (ja) * | 2003-10-20 | 2012-01-11 | 大日本印刷株式会社 | 露光装置および露光方法 |
| TW200519535A (en) * | 2003-11-27 | 2005-06-16 | Taiyo Ink Mfg Co Ltd | Hardenable resin composition, hardened body thereof, and printed circuit board |
| US7682775B2 (en) * | 2004-03-05 | 2010-03-23 | E. I. Du Pont De Nemours And Company | Process for preparing a flexographic printing plate |
| TWI403761B (zh) * | 2005-02-15 | 2013-08-01 | Fujifilm Corp | 透光性導電性膜之製法 |
| JP2008122845A (ja) * | 2006-11-15 | 2008-05-29 | Taiyo Ink Mfg Ltd | ソルダーレジストパターンの形成方法 |
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2006
- 2006-11-15 JP JP2006309100A patent/JP5079310B2/ja active Active
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2007
- 2007-11-15 CN CN 200710187256 patent/CN101183212B/zh active Active