JP2008072139A5 - - Google Patents

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Publication number
JP2008072139A5
JP2008072139A5 JP2007300911A JP2007300911A JP2008072139A5 JP 2008072139 A5 JP2008072139 A5 JP 2008072139A5 JP 2007300911 A JP2007300911 A JP 2007300911A JP 2007300911 A JP2007300911 A JP 2007300911A JP 2008072139 A5 JP2008072139 A5 JP 2008072139A5
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JP
Japan
Prior art keywords
annular
fluid supply
cover means
gas
partial vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007300911A
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English (en)
Japanese (ja)
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JP2008072139A (ja
JP5064979B2 (ja
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Publication date
Priority claimed from US10/873,650 external-priority patent/US7057702B2/en
Application filed filed Critical
Publication of JP2008072139A publication Critical patent/JP2008072139A/ja
Publication of JP2008072139A5 publication Critical patent/JP2008072139A5/ja
Application granted granted Critical
Publication of JP5064979B2 publication Critical patent/JP5064979B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007300911A 2004-06-23 2007-11-20 リソグラフィ装置およびデバイス製造方法 Expired - Fee Related JP5064979B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/873650 2004-06-23
US10/873,650 US7057702B2 (en) 2004-06-23 2004-06-23 Lithographic apparatus and device manufacturing method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2005181472A Division JP2006013502A (ja) 2004-06-23 2005-06-22 リソグラフィ装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008072139A JP2008072139A (ja) 2008-03-27
JP2008072139A5 true JP2008072139A5 (https=) 2010-11-25
JP5064979B2 JP5064979B2 (ja) 2012-10-31

Family

ID=34938361

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2005181472A Pending JP2006013502A (ja) 2004-06-23 2005-06-22 リソグラフィ装置およびデバイス製造方法
JP2007300911A Expired - Fee Related JP5064979B2 (ja) 2004-06-23 2007-11-20 リソグラフィ装置およびデバイス製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2005181472A Pending JP2006013502A (ja) 2004-06-23 2005-06-22 リソグラフィ装置およびデバイス製造方法

Country Status (7)

Country Link
US (1) US7057702B2 (https=)
EP (1) EP1610183A3 (https=)
JP (2) JP2006013502A (https=)
KR (1) KR100695553B1 (https=)
CN (2) CN1713075B (https=)
SG (2) SG118391A1 (https=)
TW (1) TWI277837B (https=)

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WO2004090634A2 (en) 2003-04-10 2004-10-21 Nikon Corporation Environmental system including vaccum scavange for an immersion lithography apparatus
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TWI347741B (en) * 2003-05-30 2011-08-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI515770B (zh) 2003-06-19 2016-01-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
EP3376523A1 (en) * 2004-01-05 2018-09-19 Nikon Corporation Exposure apparatus, exposure method, and device producing method
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
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US7522261B2 (en) * 2004-09-24 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7119876B2 (en) * 2004-10-18 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US7432513B2 (en) * 2005-10-21 2008-10-07 Asml Netherlands B.V. Gas shower, lithographic apparatus and use of a gas shower
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US7728952B2 (en) * 2007-01-25 2010-06-01 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for closing plate take-over in immersion lithography
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US8654305B2 (en) * 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
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JP2009094145A (ja) * 2007-10-04 2009-04-30 Canon Inc 露光装置、露光方法およびデバイス製造方法
NL2005586A (en) * 2009-12-02 2011-06-06 Asml Netherlands Bv Lithographic apparatus and sealing device for a lithographic apparatus.
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
US9341942B2 (en) * 2010-08-24 2016-05-17 Nikon Research Corporation Of America Vacuum chamber assembly for supporting a workpiece
NL2008199A (en) 2011-02-28 2012-08-29 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2008695A (en) * 2011-05-25 2012-11-27 Asml Netherlands Bv Lithographic apparatus comprising substrate table.
WO2013075878A1 (en) * 2011-11-22 2013-05-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2010916A (en) 2012-07-06 2014-01-07 Asml Netherlands Bv A lithographic apparatus.
US9568828B2 (en) * 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
JP6537194B2 (ja) * 2014-07-04 2019-07-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びリソグラフィ装置を用いてデバイスを製造する方法
US11397385B2 (en) 2016-06-17 2022-07-26 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus and a method of forming a particle shield
CN107783283B (zh) * 2016-08-30 2020-01-24 上海微电子装备（集团）股份有限公司 镜片防污染装置及方法
CN109283797B (zh) * 2017-07-21 2021-04-30 上海微电子装备（集团）股份有限公司 物镜保护装置、物镜系统以及光刻设备
EP3620858B1 (en) * 2018-09-10 2023-11-01 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing article
KR102894806B1 (ko) * 2019-04-26 2025-12-04 에이에스엠엘 홀딩 엔.브이. 리소그래피 장치 및 조명 균일성 보정 시스템
EP4018262B1 (en) 2019-08-20 2023-06-21 ASML Netherlands B.V. Substrate holder and lithographic apparatus
EP3918421B1 (en) * 2019-12-26 2024-05-15 Nanjing ZongAn Semiconductor Equipment Ltd Tool architecture for wafer geometry measurement in semiconductor industry
EP3919978A1 (en) * 2020-06-05 2021-12-08 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and a method of forming a particle shield
US11740564B2 (en) * 2020-06-18 2023-08-29 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography apparatus and method using the same
CN113262956B (zh) * 2021-07-21 2021-10-15 四川洪芯微科技有限公司 一种半导体晶圆表面处理装置
DE102023204744A1 (de) * 2023-05-22 2024-05-16 Carl Zeiss Smt Gmbh Optisches system und projektionsbelichtungsanlage

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JP2001358056A (ja) * 2000-06-15 2001-12-26 Canon Inc 露光装置
TWI222668B (en) * 2001-12-21 2004-10-21 Nikon Corp Gas purging method and exposure system, and device production method
US6788477B2 (en) * 2002-10-22 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for method for immersion lithography
EP1420298B1 (en) 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
DE60335595D1 (de) * 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
EP1429188B1 (en) * 2002-11-12 2013-06-19 ASML Netherlands B.V. Lithographic projection apparatus
CN101872135B (zh) * 2002-12-10 2013-07-31 株式会社尼康 曝光设备和器件制造法
EP1503244A1 (en) * 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method

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