JP2008060446A5 - - Google Patents
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- Publication number
- JP2008060446A5 JP2008060446A5 JP2006237389A JP2006237389A JP2008060446A5 JP 2008060446 A5 JP2008060446 A5 JP 2008060446A5 JP 2006237389 A JP2006237389 A JP 2006237389A JP 2006237389 A JP2006237389 A JP 2006237389A JP 2008060446 A5 JP2008060446 A5 JP 2008060446A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film resistor
- conductive member
- semiconductor device
- connection hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims 14
- 239000010408 film Substances 0.000 claims 7
- 239000004065 semiconductor Substances 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 1
- 238000001312 dry etching Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000001020 plasma etching Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006237389A JP2008060446A (ja) | 2006-09-01 | 2006-09-01 | 半導体装置の製造方法及び半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006237389A JP2008060446A (ja) | 2006-09-01 | 2006-09-01 | 半導体装置の製造方法及び半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008060446A JP2008060446A (ja) | 2008-03-13 |
| JP2008060446A5 true JP2008060446A5 (enExample) | 2009-09-24 |
Family
ID=39242809
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006237389A Pending JP2008060446A (ja) | 2006-09-01 | 2006-09-01 | 半導体装置の製造方法及び半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008060446A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5616822B2 (ja) * | 2011-03-03 | 2014-10-29 | セイコーインスツル株式会社 | 半導体装置の製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0555520A (ja) * | 1991-08-26 | 1993-03-05 | Sharp Corp | 半導体装置の製造方法 |
| JPH06232351A (ja) * | 1993-01-30 | 1994-08-19 | Sony Corp | BiCMOS型半導体装置及びその製造方法 |
| JP4446771B2 (ja) * | 2004-03-23 | 2010-04-07 | 株式会社リコー | 半導体装置 |
| JP2007149965A (ja) * | 2005-11-28 | 2007-06-14 | Seiko Npc Corp | 薄膜抵抗素子 |
-
2006
- 2006-09-01 JP JP2006237389A patent/JP2008060446A/ja active Pending
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