JP2008044952A5 - - Google Patents

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JP2008044952A5
JP2008044952A5 JP2007241012A JP2007241012A JP2008044952A5 JP 2008044952 A5 JP2008044952 A5 JP 2008044952A5 JP 2007241012 A JP2007241012 A JP 2007241012A JP 2007241012 A JP2007241012 A JP 2007241012A JP 2008044952 A5 JP2008044952 A5 JP 2008044952A5
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mono
substituted
halogen atom
lower alkoxy
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Claims (2)

  1. 式(I)
    Figure 2008044952

    [式中、XはS又はOを表す。
    1はニトロ基、アミノ基、ヒドロキシル基、ホルミル基、カルバモイル基、シアノ基、カルボキシル基、低級アルコキシカルボニル基、ハロゲン原子、低級アルキル基、ヒドロキシ低級アルキル基、低級アルコキシ基、モノ若しくはジ低級アルキルアミノ基、モノ若しくはジ低級アルカノイルアミノ基、低級アルキルチオ基、低級アルキルスルホニル基、低級アルキルスルフィニル基、スルファモイル基及びモノ若しくはジ低級アルキルスルファモイル基から選ばれる少なくとも1つの基で置換されていてもよい複素環式基を表す。
    2は、カルボキシル基、又は低級アルコキシカルボニル基で置換されている低級アルキル基を表す。
    3はニトロ基、アミノ基、ヒドロキシル基、カルバモイル基、シアノ基、カルボキシル基、トリフルオロメチル基、低級アルコキシカルボニル基、ハロゲン原子、低級アルキル基、ヒドロキシ低級アルキル基、低級アルコキシ基、低級アルコキシ−低級アルコキシ基、モノ若しくはジ低級アルキルアミノ基、モノ若しくはジ低級アルカノイルアミノ基、低級アルキルチオ基、低級アルキルスルホニル基、低級アルキルスルフィニル基、スルファモイル基、モノ若しくはジ低級アルキルスルファモイル基、低級アルキルスルホニルアミノ基、及びフェニル低級アルコキシ基から選ばれる少なくとも1つの基で置換されていてもよいアリール基を表す。

    で示される含窒素5員複素環化合物又はその薬理的に許容し得る塩。
  2. 1が、ハロゲン原子、及び、低級アルコキシ基から選ばれる少なくとも1つの基で置換されているチオフェニル基であり、
    2が、カルボキシメチルであり、
    3が、ハロゲン原子、及び、低級アルコキシ基から選ばれる少なくとも1つの基で置換されているフェニル基である請求項1記載の含窒素5員複素環化合物又はその薬理的に許容し得る塩。
JP2007241012A 2001-04-16 2007-09-18 高コンダクタンス型カルシウム感受性kチャネル開口薬 Pending JP2008044952A (ja)

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JP2001116436 2001-04-16
JP2001249671 2001-08-20
JP2007241012A JP2008044952A (ja) 2001-04-16 2007-09-18 高コンダクタンス型カルシウム感受性kチャネル開口薬

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JP2008044952A5 true JP2008044952A5 (ja) 2008-06-26

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US (2) US7759373B2 (ja)
EP (1) EP1432690A2 (ja)
JP (2) JP4073786B2 (ja)
KR (1) KR100863659B1 (ja)
CN (2) CN101519386A (ja)
AR (1) AR035828A1 (ja)
AU (1) AU2002246397B2 (ja)
BR (1) BR0208956A (ja)
CA (1) CA2444596A1 (ja)
CZ (1) CZ20032829A3 (ja)
HU (1) HUP0303829A3 (ja)
IL (1) IL158168A0 (ja)
MX (1) MXPA03009440A (ja)
NZ (1) NZ529043A (ja)
PL (1) PL367325A1 (ja)
TW (2) TW201006831A (ja)
WO (1) WO2002083111A2 (ja)

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