JP2008041327A - マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法 - Google Patents
マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法 Download PDFInfo
- Publication number
- JP2008041327A JP2008041327A JP2006211269A JP2006211269A JP2008041327A JP 2008041327 A JP2008041327 A JP 2008041327A JP 2006211269 A JP2006211269 A JP 2006211269A JP 2006211269 A JP2006211269 A JP 2006211269A JP 2008041327 A JP2008041327 A JP 2008041327A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- light emitting
- emitting layer
- opening
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 23
- 229920005989 resin Polymers 0.000 claims description 19
- 239000011347 resin Substances 0.000 claims description 19
- 238000000151 deposition Methods 0.000 claims description 17
- 238000007740 vapor deposition Methods 0.000 claims description 17
- 230000008021 deposition Effects 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 238000005401 electroluminescence Methods 0.000 claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- 229920001187 thermosetting polymer Polymers 0.000 claims description 6
- 238000003466 welding Methods 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 claims description 3
- 230000001070 adhesive effect Effects 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- 239000011800 void material Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 105
- 150000001875 compounds Chemical class 0.000 description 12
- 239000000463 material Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006211269A JP2008041327A (ja) | 2006-08-02 | 2006-08-02 | マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006211269A JP2008041327A (ja) | 2006-08-02 | 2006-08-02 | マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008041327A true JP2008041327A (ja) | 2008-02-21 |
| JP2008041327A5 JP2008041327A5 (enExample) | 2009-06-25 |
Family
ID=39176126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006211269A Pending JP2008041327A (ja) | 2006-08-02 | 2006-08-02 | マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008041327A (enExample) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011033624A1 (ja) | 2009-09-16 | 2011-03-24 | 三菱電機株式会社 | 全熱交換素子 |
| JP2013028835A (ja) * | 2011-07-28 | 2013-02-07 | Kyocera Crystal Device Corp | 膜形成方法 |
| WO2016158407A1 (ja) * | 2015-04-02 | 2016-10-06 | コニカミノルタ株式会社 | 有機エレクトロルミネッセンス素子、及び、有機エレクトロルミネッセンス素子の製造方法 |
| WO2018138824A1 (ja) * | 2017-01-26 | 2018-08-02 | シャープ株式会社 | 蒸着用マスク、蒸着用マスクの製造方法及び有機el表示装置の製造方法 |
| EP3617341A3 (en) * | 2018-08-29 | 2020-07-01 | Samsung Display Co., Ltd. | Mask assembly, and apparatus and method for manufacturing display apparatus including the mask assembly |
| CN112575286A (zh) * | 2019-09-27 | 2021-03-30 | 旭晖应用材料股份有限公司 | 金属遮罩 |
| WO2021145523A1 (ko) * | 2020-01-15 | 2021-07-22 | 삼성디스플레이 주식회사 | 마스크 |
| US20220399531A1 (en) * | 2021-06-14 | 2022-12-15 | Samsung Display Co., Ltd. | Mask and method for manufacturing the same |
| KR102895634B1 (ko) * | 2020-01-15 | 2025-12-05 | 삼성디스플레이 주식회사 | 마스크 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5726163A (en) * | 1980-07-23 | 1982-02-12 | Hitachi Ltd | Mask for forming thin film and its manufacture |
| JP2001355058A (ja) * | 2000-06-12 | 2001-12-25 | Nippon Sheet Glass Co Ltd | 透明導電膜付き基板及びその製造方法 |
| JP2002030415A (ja) * | 2000-07-17 | 2002-01-31 | Toray Ind Inc | 導電膜パターン化用マスク |
| JP2002038254A (ja) * | 2000-07-24 | 2002-02-06 | Toray Ind Inc | 導電膜パターン化用マスク |
| WO2006009103A1 (ja) * | 2004-07-16 | 2006-01-26 | Kabushiki Kaisha Toyota Jidoshokki | 有機エレクトロルミネッセンス素子の製造方法 |
-
2006
- 2006-08-02 JP JP2006211269A patent/JP2008041327A/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5726163A (en) * | 1980-07-23 | 1982-02-12 | Hitachi Ltd | Mask for forming thin film and its manufacture |
| JP2001355058A (ja) * | 2000-06-12 | 2001-12-25 | Nippon Sheet Glass Co Ltd | 透明導電膜付き基板及びその製造方法 |
| JP2002030415A (ja) * | 2000-07-17 | 2002-01-31 | Toray Ind Inc | 導電膜パターン化用マスク |
| JP2002038254A (ja) * | 2000-07-24 | 2002-02-06 | Toray Ind Inc | 導電膜パターン化用マスク |
| WO2006009103A1 (ja) * | 2004-07-16 | 2006-01-26 | Kabushiki Kaisha Toyota Jidoshokki | 有機エレクトロルミネッセンス素子の製造方法 |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011033624A1 (ja) | 2009-09-16 | 2011-03-24 | 三菱電機株式会社 | 全熱交換素子 |
| JP2013028835A (ja) * | 2011-07-28 | 2013-02-07 | Kyocera Crystal Device Corp | 膜形成方法 |
| WO2016158407A1 (ja) * | 2015-04-02 | 2016-10-06 | コニカミノルタ株式会社 | 有機エレクトロルミネッセンス素子、及び、有機エレクトロルミネッセンス素子の製造方法 |
| JPWO2016158407A1 (ja) * | 2015-04-02 | 2018-01-25 | コニカミノルタ株式会社 | 有機エレクトロルミネッセンス素子、及び、有機エレクトロルミネッセンス素子の製造方法 |
| US10711338B2 (en) | 2017-01-26 | 2020-07-14 | Sharp Kabushiki Kaisha | Vapor deposition mask and manufacturing method for organic EL display device |
| WO2018138824A1 (ja) * | 2017-01-26 | 2018-08-02 | シャープ株式会社 | 蒸着用マスク、蒸着用マスクの製造方法及び有機el表示装置の製造方法 |
| EP3617341A3 (en) * | 2018-08-29 | 2020-07-01 | Samsung Display Co., Ltd. | Mask assembly, and apparatus and method for manufacturing display apparatus including the mask assembly |
| US10903459B2 (en) | 2018-08-29 | 2021-01-26 | Samsung Display Co., Ltd. | Mask assembly, and apparatus and method for manufacturing display apparatus including the mask assembly |
| CN112575286A (zh) * | 2019-09-27 | 2021-03-30 | 旭晖应用材料股份有限公司 | 金属遮罩 |
| CN112575286B (zh) * | 2019-09-27 | 2022-09-23 | 旭晖应用材料股份有限公司 | 金属遮罩 |
| WO2021145523A1 (ko) * | 2020-01-15 | 2021-07-22 | 삼성디스플레이 주식회사 | 마스크 |
| CN114945866A (zh) * | 2020-01-15 | 2022-08-26 | 三星显示有限公司 | 掩模 |
| KR102895634B1 (ko) * | 2020-01-15 | 2025-12-05 | 삼성디스플레이 주식회사 | 마스크 |
| US20220399531A1 (en) * | 2021-06-14 | 2022-12-15 | Samsung Display Co., Ltd. | Mask and method for manufacturing the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3641963B2 (ja) | 有機el素子とその製造方法 | |
| US7990055B2 (en) | Electroluminescent arrangement having detached electrode and method of fabricating the same | |
| WO2012053451A1 (ja) | 有機elパネル、およびその製造方法 | |
| JP5697972B2 (ja) | 有機発光表示装置及びその製造方法 | |
| US7148624B2 (en) | Uniform deposition of organic layer | |
| KR20120098817A (ko) | 유기 전계발광 디바이스 | |
| JP2008041327A (ja) | マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法 | |
| JPH11224781A (ja) | 有機elディスプレイ及びその製造方法 | |
| JP5980343B2 (ja) | 光電子素子の製造方法 | |
| JP2012003988A (ja) | 有機エレクトロルミネッセンスパネルの製造方法 | |
| US20130001595A1 (en) | Method of manufacturing an oled device with spatially isolated light-emitting areas | |
| CN102668162B (zh) | 有机电致发光器件 | |
| EP2437327A2 (en) | Fabrication method of organic electroluminescence display device having a getter layer | |
| JP2008108482A (ja) | 有機el表示装置 | |
| JP2008041327A5 (enExample) | ||
| JPH11307268A (ja) | 有機薄膜発光素子およびその製造方法 | |
| JP5303199B2 (ja) | 有機el素子及び有機el素子の製造方法 | |
| US20090294157A1 (en) | Electro-optic device and method for manufacturing the same | |
| JP2001326076A (ja) | 有機el素子の製造方法 | |
| JP5177570B2 (ja) | 有機elパネルの製造方法 | |
| JP2008287889A (ja) | 有機elパネルの製造方法及び有機elパネル | |
| JP2008010243A (ja) | 有機el素子およびその製造方法 | |
| JP4747868B2 (ja) | 電気光学装置の製造方法 | |
| EP3743952A1 (en) | Method for mask-free oled deposition and manufacture | |
| JP2007335105A (ja) | 発光素子とその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090508 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20090508 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101105 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101116 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20110329 |