JP2007533165A - バルクヘテロ接合を有する光電子装置の製造方法 - Google Patents
バルクヘテロ接合を有する光電子装置の製造方法 Download PDFInfo
- Publication number
- JP2007533165A JP2007533165A JP2007508585A JP2007508585A JP2007533165A JP 2007533165 A JP2007533165 A JP 2007533165A JP 2007508585 A JP2007508585 A JP 2007508585A JP 2007508585 A JP2007508585 A JP 2007508585A JP 2007533165 A JP2007533165 A JP 2007533165A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- optoelectronic device
- manufacturing
- electrode
- depositing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005693 optoelectronics Effects 0.000 title claims abstract description 94
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 55
- 239000000463 material Substances 0.000 claims abstract description 131
- 238000000151 deposition Methods 0.000 claims abstract description 84
- 150000003384 small molecules Chemical class 0.000 claims abstract description 36
- 238000009792 diffusion process Methods 0.000 claims abstract description 35
- 238000001947 vapour-phase growth Methods 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims description 90
- 238000000034 method Methods 0.000 claims description 61
- 229910052751 metal Inorganic materials 0.000 claims description 42
- 239000002184 metal Substances 0.000 claims description 42
- 230000008021 deposition Effects 0.000 claims description 37
- 239000004065 semiconductor Substances 0.000 claims description 18
- 230000006798 recombination Effects 0.000 claims description 16
- 238000005215 recombination Methods 0.000 claims description 16
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 238000001704 evaporation Methods 0.000 claims description 14
- 230000008020 evaporation Effects 0.000 claims description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 11
- 230000000903 blocking effect Effects 0.000 claims description 10
- 229920000642 polymer Polymers 0.000 claims description 9
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 5
- 238000005286 illumination Methods 0.000 claims description 4
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 claims 2
- 239000010410 layer Substances 0.000 description 298
- 239000010408 film Substances 0.000 description 36
- 230000032258 transport Effects 0.000 description 33
- 239000011368 organic material Substances 0.000 description 27
- 238000001878 scanning electron micrograph Methods 0.000 description 19
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 17
- 238000002207 thermal evaporation Methods 0.000 description 16
- 230000005670 electromagnetic radiation Effects 0.000 description 14
- 238000004770 highest occupied molecular orbital Methods 0.000 description 14
- 230000001965 increasing effect Effects 0.000 description 14
- 239000010409 thin film Substances 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 238000010586 diagram Methods 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 238000010494 dissociation reaction Methods 0.000 description 11
- 230000005593 dissociations Effects 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 10
- 239000012159 carrier gas Substances 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 239000012044 organic layer Substances 0.000 description 10
- 238000004528 spin coating Methods 0.000 description 9
- 239000002800 charge carrier Substances 0.000 description 8
- 230000005684 electric field Effects 0.000 description 8
- 230000006870 function Effects 0.000 description 8
- 238000005191 phase separation Methods 0.000 description 8
- 238000000137 annealing Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 238000013086 organic photovoltaic Methods 0.000 description 7
- 239000003973 paint Substances 0.000 description 7
- 229920003023 plastic Polymers 0.000 description 7
- 239000004033 plastic Substances 0.000 description 7
- 230000007547 defect Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 5
- 238000011049 filling Methods 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 241000894007 species Species 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 4
- 238000007641 inkjet printing Methods 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- 238000001000 micrograph Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000010791 quenching Methods 0.000 description 4
- 230000000171 quenching effect Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- GGNDPFHHUHTCIO-UHFFFAOYSA-N 1h-benzimidazole;perylene-3,4,9,10-tetracarboxylic acid Chemical compound C1=CC=C2NC=NC2=C1.C1=CC=C2NC=NC2=C1.C=12C3=CC=C(C(O)=O)C2=C(C(O)=O)C=CC=1C1=CC=C(C(O)=O)C2=C1C3=CC=C2C(=O)O GGNDPFHHUHTCIO-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 208000002599 Smear Layer Diseases 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000000089 atomic force micrograph Methods 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000412 dendrimer Substances 0.000 description 2
- 229920000736 dendritic polymer Polymers 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910003472 fullerene Inorganic materials 0.000 description 2
- 230000005283 ground state Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910000765 intermetallic Inorganic materials 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000002073 nanorod Substances 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 238000013087 polymer photovoltaic Methods 0.000 description 2
- 238000006862 quantum yield reaction Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 238000000927 vapour-phase epitaxy Methods 0.000 description 2
- STTGYIUESPWXOW-UHFFFAOYSA-N 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline Chemical compound C=12C=CC3=C(C=4C=CC=CC=4)C=C(C)N=C3C2=NC(C)=CC=1C1=CC=CC=C1 STTGYIUESPWXOW-UHFFFAOYSA-N 0.000 description 1
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229920000144 PEDOT:PSS Polymers 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 238000002083 X-ray spectrum Methods 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000002322 conducting polymer Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- HRHKULZDDYWVBE-UHFFFAOYSA-N indium;oxozinc;tin Chemical compound [In].[Sn].[Zn]=O HRHKULZDDYWVBE-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Inorganic materials [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000002082 metal nanoparticle Substances 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004776 molecular orbital Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000002071 nanotube Substances 0.000 description 1
- IYRGXJIJGHOCFS-UHFFFAOYSA-N neocuproine Chemical compound C1=C(C)N=C2C3=NC(C)=CC=C3C=CC2=C1 IYRGXJIJGHOCFS-UHFFFAOYSA-N 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 238000005424 photoluminescence Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229960002796 polystyrene sulfonate Drugs 0.000 description 1
- 239000011970 polystyrene sulfonate Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000935 solvent evaporation Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- OPSWAWSNPREEFQ-UHFFFAOYSA-K triphenoxyalumane Chemical compound [Al+3].[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1 OPSWAWSNPREEFQ-UHFFFAOYSA-K 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 230000005428 wave function Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/10—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising heterojunctions between organic semiconductors and inorganic semiconductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/211—Fullerenes, e.g. C60
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/311—Phthalocyanine
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/621—Aromatic anhydride or imide compounds, e.g. perylene tetra-carboxylic dianhydride or perylene tetracarboxylic di-imide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Electromagnetism (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
- Led Devices (AREA)
Abstract
Description
蒸気:下式(1a)
[実験:]
[実施例1:]
[実施例2:]
[実施例3:]
[実施例4:]
[実施例5:]
[実施例6:]
[実施例7:]
[実施例8]
[比較例]
a照度は、全4つの装置に対してAM1.5Gでシミュレートした1sun(100 mW/cm2)である。
410 基板
420 第1電極
430 第1層
440 第2層
450 第2電極
Claims (27)
- 第1電極上に、突出部を有する第1層を堆積すること;
第2層が第1層に物理的に接触するように、第1層上に第2層を堆積すること;
光電子装置を形成するために第2層上に第2電極を堆積すること;の処理を含み、
前記第1層は第1有機小分子材料を含み、
前記突出部の最小の側面寸法は、前記第1有機小分子材料の励起子拡散長の1倍から5倍の間である、光電子装置の製造方法。 - 前記第2層は、ポリマー又は半導体材料を含む、請求項1に記載の光電子装置の製造方法。
- 前記突出部間の間隔は、前記第2層の励起子拡散長の1倍から5倍の間である、請求項2に記載の光電子装置の製造方法。
- 前記第2層は、金属を含む、請求項1に記載の光電子装置の製造方法。
- 前記突出部を有する第1層は、第1電極上に有機蒸気相堆積によって堆積され、
前記突出部の最小側面寸法は、前記装置の厚さの少なくとも5%未満であり、
前記第1層及び前記第2層の界面は、バルクヘテロ接合を形成し、
前記第2層は、平坦な表面を含む、請求項1に記載の光電子装置の製造方法。 - 前記第1層は電子ドナー層であり、前記第1電極はアノードであり、前記第2層は電子アクセプタ層であり、前記第2電極はカソードである、請求項5に記載の光電子装置の製造方法。
- 前記第1層は電子アクセプタ層であり、前記第1電極はカソードであり、前記第2層は電子ドナー層であり、前記第2電極はアノードである、請求項5に記載の光電子装置の製造方法。
- 前記第1電極はITOを含み、前記第1層はCuPcを含み、前記第2層はPTCBIを含む、請求項6に記載の光電子装置の製造方法。
- 前記第1層の堆積のための供給源蒸発温度は、少なくとも400℃である、請求項8に記載の光電子装置の製造方法。
- 内在している前記基板における前記第1層の堆積のための温度は、40℃未満である、請求項8に記載の光電子装置の製造方法。
- 前記第1層の堆積のための窒素ガスキャリア流速は、10sccmから200sccmの範囲である、請求項8に記載の光電子装置の製造方法。
- 前記第1層の堆積のためのチャンバ圧力は、0.15Torr−0.80Torrである、請求項8に記載の光電子装置の製造方法。
- 前記第2層の堆積のための供給源蒸発温度は、少なくとも400℃である、請求項8に記載の光電子装置の製造方法。
- 前記第2層の堆積のための前記基板温度は、25℃未満である、請求項8に記載の光電子装置の製造方法。
- 前記第1層の堆積のための窒素ガスキャリア流速は、少なくとも100sccmである、請求項8に記載の光電子装置の製造方法。
- 前記チャンバ圧力は、少なくとも0.50Torrである、請求項8に記載の光電子装置の製造方法。
- 前記第2電極が第3層上に堆積されるように、前記第2層上に第3層を堆積すること、をさらに含む、請求項6に記載の光電子装置の製造方法。
- 前記第3層は、励起子遮断層である、請求項17に記載の光電子装置の製造方法。
- 前記第3層は、BCPを含む、請求項18に記載の光電子装置の製造方法。
- 前記第1電極はITOを含み、前記第1層はCuPcを含み、前記第2層はC60を含む、請求項6に記載の光電子装置の製造方法。
- 前記第1層は、基板上に堆積する処理をさらに含む、請求項5に記載の光電子装置の製造方法。
- 前記装置は、9(mA/cm2)より大きい電流密度Jscを有し、0.4ボルトと1ボルトの間の開回路電圧Vocを有する、請求項5に記載の光電子装置の製造方法。
- 前記装置は、10Ωcm2未満の直列抵抗を有する、請求項5に記載の光電子装置の製造方法。
- 前記装置は、100mW/cm2(AM1.5G)照明下において少なくとも1.5%の外部電力変換効率を有する、請求項5に記載の光電子装置の製造方法。
- 前記第2層上に電荷再結合層を堆積すること;
突出部を有する第3層を、有機蒸気相堆積によって前記第2電極上に堆積すること;
第4層が第3層に物理的に接触するように、第3層上に第4層を堆積すること;
光電子装置を形成するために第2層上に第3電極を堆積すること;の処理を含み、
前記第3層は、第3有機小分子材料を含み、
前記突出部の最小の側面寸法は、前記装置の厚さの少なくとも5%未満であり、
前記第4層及び前記第3層の界面は、バルクヘテロ接合を形成し、
前記第4層は、平坦な表面を含む、請求項5に記載の光電子装置の製造方法。 - 前記第3層上に電子−ホール再結合領域を堆積すること;
前記電子−ホール再結合領域上に有機蒸気相堆積によって第4層を堆積すること;
第5層が第4層に物理的に接触するように、第4層上に第5層を堆積すること;
前記第5層上に励起子遮断層を堆積すること;
光電子装置を形成するために第5層上に第2電極を堆積すること;の処理を含み、
前記第4層は第4有機小分子材料を含み、
前記第4層上の前記第5層の界面は、バルクヘテロ接合を形成し、
前記第5層は、平坦な表面を含む、請求項17に記載の光電子装置の製造方法。 - 前記突出部の高さは、前記突出部の最小の側面寸法の少なくとも半分に等しい、請求項1に記載の光電子装置の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/824,288 US7419846B2 (en) | 2004-04-13 | 2004-04-13 | Method of fabricating an optoelectronic device having a bulk heterojunction |
US10/999,716 US7435617B2 (en) | 2004-04-13 | 2004-11-30 | Method of fabricating an optoelectronic device having a bulk heterojunction |
PCT/US2005/012928 WO2005101524A2 (en) | 2004-04-13 | 2005-04-13 | Method of fabricating an optoelectronic device having a bulk heterojunction |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013150789A Division JP2013214777A (ja) | 2004-04-13 | 2013-07-19 | バルクヘテロ接合を有する光電子装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007533165A true JP2007533165A (ja) | 2007-11-15 |
JP2007533165A5 JP2007533165A5 (ja) | 2014-09-25 |
Family
ID=35150645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007508585A Pending JP2007533165A (ja) | 2004-04-13 | 2005-04-13 | バルクヘテロ接合を有する光電子装置の製造方法 |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP1735841B1 (ja) |
JP (1) | JP2007533165A (ja) |
KR (1) | KR101416989B1 (ja) |
AR (1) | AR048605A1 (ja) |
AU (1) | AU2005234514B2 (ja) |
BR (1) | BRPI0508779A (ja) |
CA (1) | CA2562486C (ja) |
WO (1) | WO2005101524A2 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007194557A (ja) * | 2006-01-23 | 2007-08-02 | Toppan Printing Co Ltd | 複合光電変換素子及びその製造方法 |
JP2007194559A (ja) * | 2006-01-23 | 2007-08-02 | National Institute For Materials Science | 複合光電変換素子及びその製造方法 |
JP2010004022A (ja) * | 2008-06-18 | 2010-01-07 | Korea Advanced Inst Of Science & Technology | 有機太陽電池及びその製造方法 |
JP2010041022A (ja) * | 2008-07-08 | 2010-02-18 | Sumitomo Chemical Co Ltd | 光電変換素子 |
JP2010147135A (ja) * | 2008-12-17 | 2010-07-01 | Konica Minolta Holdings Inc | 有機光電変換素子の製造方法 |
JP2012238661A (ja) * | 2011-05-10 | 2012-12-06 | Ulvac Japan Ltd | 有機薄膜太陽電池の成膜装置 |
JP2013519215A (ja) * | 2009-07-27 | 2013-05-23 | ザ リージェンツ オブ ザ ユニヴァシティ オブ ミシガン | 視射角蒸着により製造されるバルクヘテロジャンクション型有機太陽電池 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8017863B2 (en) | 2005-11-02 | 2011-09-13 | The Regents Of The University Of Michigan | Polymer wrapped carbon nanotube near-infrared photoactive devices |
US8013240B2 (en) | 2005-11-02 | 2011-09-06 | The Trustees Of Princeton University | Organic photovoltaic cells utilizing ultrathin sensitizing layer |
US7947897B2 (en) * | 2005-11-02 | 2011-05-24 | The Trustees Of Princeton University | Organic photovoltaic cells utilizing ultrathin sensitizing layer |
JP2007258263A (ja) * | 2006-03-20 | 2007-10-04 | Pioneer Electronic Corp | 有機太陽電池 |
US11031567B2 (en) * | 2006-07-11 | 2021-06-08 | The Regents Of The University Of Michigan | Efficient solar cells using all-organic nanocrystalline networks |
US7638356B2 (en) * | 2006-07-11 | 2009-12-29 | The Trustees Of Princeton University | Controlled growth of larger heterojunction interface area for organic photosensitive devices |
US7955889B1 (en) * | 2006-07-11 | 2011-06-07 | The Trustees Of Princeton University | Organic photosensitive cells grown on rough electrode with nano-scale morphology control |
CA2696110A1 (en) * | 2007-08-24 | 2009-03-05 | The Regents Of The University Of Michigan | Growth of ordered crystalline organic films |
WO2010051258A1 (en) | 2008-10-27 | 2010-05-06 | The Regents Of The University Of Michigan | Inverted organic photosensitive devices |
CN111883667B (zh) * | 2020-08-28 | 2022-06-10 | 电子科技大学 | 一种基于负热膨胀效应的柔性光电探测器及其制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06511603A (ja) * | 1992-07-29 | 1994-12-22 | アスラブ ソシエテ アノニム | 光電池 |
JP2001523768A (ja) * | 1997-11-17 | 2001-11-27 | ザ、トラスティーズ オブ プリンストン ユニバーシティ | 有機薄膜の低圧蒸着 |
WO2002101838A1 (en) * | 2001-06-11 | 2002-12-19 | The Trustees Of Princeton University | Organic photovoltaic devices |
JP2003298152A (ja) * | 2002-04-01 | 2003-10-17 | Sharp Corp | ヘテロ接合素子 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1028475A1 (en) * | 1999-02-09 | 2000-08-16 | Sony International (Europe) GmbH | Electronic device comprising a columnar discotic phase |
US7432116B2 (en) * | 2001-02-21 | 2008-10-07 | Semiconductor Energy Laboratory Co., Ltd. | Method and apparatus for film deposition |
US6657378B2 (en) | 2001-09-06 | 2003-12-02 | The Trustees Of Princeton University | Organic photovoltaic devices |
-
2005
- 2005-04-13 JP JP2007508585A patent/JP2007533165A/ja active Pending
- 2005-04-13 AU AU2005234514A patent/AU2005234514B2/en not_active Ceased
- 2005-04-13 AR ARP050101455A patent/AR048605A1/es not_active Application Discontinuation
- 2005-04-13 KR KR1020067023480A patent/KR101416989B1/ko active IP Right Grant
- 2005-04-13 WO PCT/US2005/012928 patent/WO2005101524A2/en active Application Filing
- 2005-04-13 BR BRPI0508779-1A patent/BRPI0508779A/pt not_active Application Discontinuation
- 2005-04-13 EP EP05738604.7A patent/EP1735841B1/en not_active Not-in-force
- 2005-04-13 CA CA2562486A patent/CA2562486C/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06511603A (ja) * | 1992-07-29 | 1994-12-22 | アスラブ ソシエテ アノニム | 光電池 |
JP2001523768A (ja) * | 1997-11-17 | 2001-11-27 | ザ、トラスティーズ オブ プリンストン ユニバーシティ | 有機薄膜の低圧蒸着 |
WO2002101838A1 (en) * | 2001-06-11 | 2002-12-19 | The Trustees Of Princeton University | Organic photovoltaic devices |
JP2003298152A (ja) * | 2002-04-01 | 2003-10-17 | Sharp Corp | ヘテロ接合素子 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007194557A (ja) * | 2006-01-23 | 2007-08-02 | Toppan Printing Co Ltd | 複合光電変換素子及びその製造方法 |
JP2007194559A (ja) * | 2006-01-23 | 2007-08-02 | National Institute For Materials Science | 複合光電変換素子及びその製造方法 |
JP2010004022A (ja) * | 2008-06-18 | 2010-01-07 | Korea Advanced Inst Of Science & Technology | 有機太陽電池及びその製造方法 |
JP2010041022A (ja) * | 2008-07-08 | 2010-02-18 | Sumitomo Chemical Co Ltd | 光電変換素子 |
JP2010147135A (ja) * | 2008-12-17 | 2010-07-01 | Konica Minolta Holdings Inc | 有機光電変換素子の製造方法 |
JP2013519215A (ja) * | 2009-07-27 | 2013-05-23 | ザ リージェンツ オブ ザ ユニヴァシティ オブ ミシガン | 視射角蒸着により製造されるバルクヘテロジャンクション型有機太陽電池 |
JP2012238661A (ja) * | 2011-05-10 | 2012-12-06 | Ulvac Japan Ltd | 有機薄膜太陽電池の成膜装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20070004959A (ko) | 2007-01-09 |
WO2005101524A2 (en) | 2005-10-27 |
AR048605A1 (es) | 2006-05-10 |
BRPI0508779A (pt) | 2007-09-04 |
CA2562486C (en) | 2014-07-29 |
AU2005234514B2 (en) | 2011-04-14 |
KR101416989B1 (ko) | 2014-07-08 |
AU2005234514A1 (en) | 2005-10-27 |
EP1735841A2 (en) | 2006-12-27 |
WO2005101524A3 (en) | 2006-04-13 |
EP1735841B1 (en) | 2016-11-02 |
CA2562486A1 (en) | 2005-10-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2015073124A (ja) | バルクヘテロ接合を有する光電子装置の製造方法 | |
KR101416989B1 (ko) | 벌크 이형접합부를 갖는 광전자 장치의 제조 방법 | |
JP5555402B2 (ja) | ナノスケールでモルフォロジー制御された粗い電極上に成長した有機感光性デバイス | |
JP5313422B2 (ja) | 励起子阻止層をもつ有機感光性オプトエレクトロニクス素子 | |
Cui et al. | Coaxial Organic p‐n Heterojunction Nanowire Arrays: One‐Step Synthesis and Photoelectric Properties | |
KR101086129B1 (ko) | 개선된 태양 전지 | |
EP2628198B1 (en) | Materials for controlling the epitaxial growth of photoactive layers in photovoltaic devices | |
JP5461775B2 (ja) | 感光光電子素子 | |
TWI528607B (zh) | 反向有機感光裝置 | |
JP5612084B2 (ja) | 長距離秩序を有する有機膜を有した有機電子デバイスの構造テンプレーティング | |
KR20120083294A (ko) | 시사각 침착에 의해 제조된 벌크 이종접합 유기 광전지 | |
Liu et al. | Pd/V. sub. 2O. sub. 5 device for colorimetric H. sub. 2 detection |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080409 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101228 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110329 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110629 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120313 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120613 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20130319 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140728 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140801 |
|
A524 | Written submission of copy of amendment under article 19 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20140808 |