JP2007527429A5 - - Google Patents
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- Publication number
- JP2007527429A5 JP2007527429A5 JP2007501965A JP2007501965A JP2007527429A5 JP 2007527429 A5 JP2007527429 A5 JP 2007527429A5 JP 2007501965 A JP2007501965 A JP 2007501965A JP 2007501965 A JP2007501965 A JP 2007501965A JP 2007527429 A5 JP2007527429 A5 JP 2007527429A5
- Authority
- JP
- Japan
- Prior art keywords
- heteroatoms
- silicon oxide
- ionic liquid
- ring members
- anhydrous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 6
- 125000005842 heteroatoms Chemical group 0.000 claims 4
- 239000002608 ionic liquid Substances 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims 4
- -1 heterocyclic amine Chemical class 0.000 claims 3
- 229910052757 nitrogen Inorganic materials 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N HF Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 239000011255 nonaqueous electrolyte Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
Claims (5)
- 少なくとも1種の複素環式アミンと、アミン窒素1モルあたり約2.8モル〜約3.2モルの無水フッ化水素との反応により形成される、約100℃未満の融点を有するイオン液体。
- 複素環式アミンが、5〜7個の環員を含有し、1〜3個の環員がヘテロ原子である、単環式化合物であるか、又は、8〜14個の環員を含有し、1〜3個の環員がヘテロ原子である、多環縮合環構造であり、その際、前記ヘテロ原子が、窒素、酸素及び硫黄からなる群から選択され、前記ヘテロ原子の少なくとも1個が窒素である、請求項1記載のイオン液体。
- 正極及び負極を含み、その両方が、請求項1記載のイオン液体を含む非水電解液と導電接触している、電気化学デバイス。
- 少なくとも1種の無水溶媒中に溶解された有効量の請求項1記載のイオン液体を含む、酸化ケイ素を除去するための無水エッチング溶液。
- 半導体基板から酸化ケイ素層を除去するための方法であって、請求項4記載の無水エッチング溶液を半導体基板の表面上の酸化ケイ素層と該酸化ケイ素層の一部が除去されるまで接触させることを含む、前記方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US55047104P | 2004-03-05 | 2004-03-05 | |
US60/550,471 | 2004-03-05 | ||
PCT/US2005/006863 WO2005092859A1 (en) | 2004-03-05 | 2005-03-04 | Ionic liquids of heterocyclic amines |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007527429A JP2007527429A (ja) | 2007-09-27 |
JP2007527429A5 true JP2007527429A5 (ja) | 2007-12-13 |
JP4964119B2 JP4964119B2 (ja) | 2012-06-27 |
Family
ID=34961514
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007501965A Expired - Fee Related JP4964119B2 (ja) | 2004-03-05 | 2005-03-04 | 複素環式アミン類のイオン液体 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8148533B2 (ja) |
EP (1) | EP1720834A1 (ja) |
JP (1) | JP4964119B2 (ja) |
KR (1) | KR101214059B1 (ja) |
CN (1) | CN1950338B (ja) |
TW (1) | TW200602323A (ja) |
WO (1) | WO2005092859A1 (ja) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
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US7955738B2 (en) * | 2004-03-05 | 2011-06-07 | Honeywell International, Inc. | Polymer ionic electrolytes |
US7888412B2 (en) * | 2004-03-26 | 2011-02-15 | Board Of Trustees Of The University Of Alabama | Polymer dissolution and blend formation in ionic liquids |
US8715521B2 (en) | 2005-02-04 | 2014-05-06 | E I Du Pont De Nemours And Company | Absorption cycle utilizing ionic liquid as working fluid |
US8883193B2 (en) | 2005-06-29 | 2014-11-11 | The University Of Alabama | Cellulosic biocomposites as molecular scaffolds for nano-architectures |
CA2614117A1 (en) * | 2005-06-29 | 2007-01-11 | The University Of Alabama | Ionic liquid reconstituted cellulose composites as solid support matrices |
AR058054A1 (es) * | 2005-09-22 | 2008-01-23 | Du Pont | Utilizacion de liquidos ionicos para la separacion de hidrofluorocarburos |
US20070129568A1 (en) * | 2005-12-06 | 2007-06-07 | Ngimat, Co. | Ionic liquids |
US8506839B2 (en) | 2005-12-14 | 2013-08-13 | E I Du Pont De Nemours And Company | Absorption cycle utilizing ionic liquids and water as working fluids |
CN101616882A (zh) | 2006-11-08 | 2009-12-30 | 纳幕尔杜邦公司 | 使用离子液体从二氧化碳分离四氟乙烯的方法 |
US8668807B2 (en) | 2008-02-19 | 2014-03-11 | Board Of Trustees Of The University Of Alabama | Ionic liquid systems for the processing of biomass, their components and/or derivatives, and mixtures thereof |
DE102008021271A1 (de) | 2008-04-29 | 2010-01-28 | Merck Patent Gmbh | Reaktive ionische Flüssigkeiten |
US9278134B2 (en) | 2008-12-29 | 2016-03-08 | The Board Of Trustees Of The University Of Alabama | Dual functioning ionic liquids and salts thereof |
US9096743B2 (en) | 2009-06-01 | 2015-08-04 | The Board Of Trustees Of The University Of Alabama | Process for forming films, fibers, and beads from chitinous biomass |
US8647526B2 (en) | 2009-06-04 | 2014-02-11 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Two component etching |
WO2011010116A2 (en) * | 2009-07-24 | 2011-01-27 | Invista Technologies S.À.R.L. | Synthesis method using ionic liquids |
WO2011011322A1 (en) | 2009-07-24 | 2011-01-27 | The Board Of Trustees Of The University Of Alabama | Conductive composites prepared using ionic liquids |
US9951008B2 (en) * | 2009-11-03 | 2018-04-24 | University Of Notre Dame Du Lac | Ionic liquids comprising heteraromatic anions |
KR101312261B1 (ko) * | 2010-12-30 | 2013-09-27 | 삼성전자주식회사 | 리튬 이차 전지용 전해질 및 이를 포함하는 리튬 이차 전지 |
US9394375B2 (en) | 2011-03-25 | 2016-07-19 | Board Of Trustees Of The University Of Alabama | Compositions containing recyclable ionic liquids for use in biomass processing |
CN102952092B (zh) * | 2011-08-30 | 2014-11-05 | 海洋王照明科技股份有限公司 | 唑烷类离子液体及其制备方法和应用 |
CN102993119B (zh) * | 2011-09-19 | 2015-04-29 | 海洋王照明科技股份有限公司 | 含咪唑离子液体及其制备方法、电解液及其应用 |
CN102993120B (zh) * | 2011-09-19 | 2015-04-01 | 海洋王照明科技股份有限公司 | 含吗啉离子液体及其制备方法、电解液及其应用 |
CN102993118B (zh) * | 2011-09-19 | 2015-04-29 | 海洋王照明科技股份有限公司 | 含哌啶离子液体及其制备方法、电解液及其应用 |
US20130299355A1 (en) * | 2012-05-14 | 2013-11-14 | United Technologies Corporation | Surface cleaning and activation for electrodeposition in ionic liquids |
US10100131B2 (en) | 2014-08-27 | 2018-10-16 | The Board Of Trustees Of The University Of Alabama | Chemical pulping of chitinous biomass for chitin |
US10982381B2 (en) | 2014-10-06 | 2021-04-20 | Natural Fiber Welding, Inc. | Methods, processes, and apparatuses for producing welded substrates |
US10011931B2 (en) | 2014-10-06 | 2018-07-03 | Natural Fiber Welding, Inc. | Methods, processes, and apparatuses for producing dyed and welded substrates |
KR101963179B1 (ko) * | 2015-07-30 | 2019-03-29 | 삼성디스플레이 주식회사 | 식각액 조성물 및 이를 이용한 박막 트랜지스터 기판의 제조방법 |
CN105449276B (zh) * | 2015-12-25 | 2018-07-17 | 中南大学 | 一种哌嗪离子液体锂离子电池电解液 |
CN114657730A (zh) | 2016-03-25 | 2022-06-24 | 天然纤维焊接股份有限公司 | 用于生产焊接基质的方法、工艺和设备 |
US11085133B2 (en) | 2016-05-03 | 2021-08-10 | Natural Fiber Welding, Inc. | Methods, processes, and apparatuses for producing dyed and welded substrates |
US10927191B2 (en) | 2017-01-06 | 2021-02-23 | The Board Of Trustees Of The University Of Alabama | Coagulation of chitin from ionic liquid solutions using kosmotropic salts |
US10941258B2 (en) | 2017-03-24 | 2021-03-09 | The Board Of Trustees Of The University Of Alabama | Metal particle-chitin composite materials and methods of making thereof |
CN109865320A (zh) * | 2017-12-04 | 2019-06-11 | 北京市合众创能光电技术有限公司 | 去除离子液体中痕量水的方法 |
CN108987811B (zh) * | 2018-07-19 | 2020-07-10 | 辽宁九夷锂能股份有限公司 | 一种全离子液体电解液及含有该电解液的锂电池 |
US12012540B2 (en) | 2021-05-26 | 2024-06-18 | Entegris, Inc. | Compositions and methods for selectively etching silicon nitride films |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5792502A (en) | 1980-11-28 | 1982-06-09 | Asahi Glass Co Ltd | Method for storage and transportation of hydrofluoric acid |
US5073674A (en) * | 1990-04-20 | 1991-12-17 | Olah George A | Environmentally safe catalytic alkyation using liquid onium poly (hydrogen fluorides) |
JP3301210B2 (ja) | 1994-04-21 | 2002-07-15 | 三菱化学株式会社 | 脂肪族酸フルオライドの製造方法 |
JPH08239787A (ja) | 1995-03-02 | 1996-09-17 | Shiratori Seiyaku Kk | 4−フルオロ−2−アゼチジノン誘導体の製造法 |
US5965054A (en) * | 1997-08-12 | 1999-10-12 | Covalent Associates, Inc. | Nonaqueous electrolyte for electrical storage devices |
GB9906829D0 (en) * | 1999-03-24 | 1999-05-19 | Univ Leicester | Ionic liquids |
US6096922A (en) * | 1999-11-01 | 2000-08-01 | Air Products And Chemicals, Inc. | Process for the synthesis of dialkyl, diaryl, and arylalkyl aminosulfur trifluorides |
US6534413B1 (en) * | 2000-10-27 | 2003-03-18 | Air Products And Chemicals, Inc. | Method to remove metal and silicon oxide during gas-phase sacrificial oxide etch |
DE10104663A1 (de) | 2001-02-02 | 2002-08-08 | Solvay Fluor & Derivate | Herstellung von Fluorverbindungen |
KR20030085063A (ko) * | 2001-03-26 | 2003-11-01 | 닛신보세키 가부시키 가이샤 | 이온성 액체, 축전 디바이스용 전해질염, 축전 디바이스용전해액, 전기 2중층 캐패시터, 및 2차전지 |
DE10203044A1 (de) | 2002-01-26 | 2003-07-31 | Solvay Fluor & Derivate | Extraktionsverfahren |
JP2003313181A (ja) | 2002-04-22 | 2003-11-06 | Central Glass Co Ltd | フッ素化フタリド類の製造方法 |
WO2005007657A2 (de) | 2003-07-11 | 2005-01-27 | Solvay Fluor Gmbh | Verwendung von dbn und dbu-salzen als ionische flüssigkeiten |
-
2005
- 2005-03-04 CN CN2005800136941A patent/CN1950338B/zh not_active Expired - Fee Related
- 2005-03-04 WO PCT/US2005/006863 patent/WO2005092859A1/en active Application Filing
- 2005-03-04 EP EP05724410A patent/EP1720834A1/en not_active Withdrawn
- 2005-03-04 TW TW094106635A patent/TW200602323A/zh unknown
- 2005-03-04 JP JP2007501965A patent/JP4964119B2/ja not_active Expired - Fee Related
- 2005-03-04 US US11/072,964 patent/US8148533B2/en not_active Expired - Fee Related
-
2006
- 2006-10-04 KR KR1020067020884A patent/KR101214059B1/ko not_active IP Right Cessation
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