JP2007526351A - リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物 - Google Patents

リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物 Download PDF

Info

Publication number
JP2007526351A
JP2007526351A JP2006517640A JP2006517640A JP2007526351A JP 2007526351 A JP2007526351 A JP 2007526351A JP 2006517640 A JP2006517640 A JP 2006517640A JP 2006517640 A JP2006517640 A JP 2006517640A JP 2007526351 A JP2007526351 A JP 2007526351A
Authority
JP
Japan
Prior art keywords
group
optionally substituted
polymer
substituted
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006517640A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007526351A5 (enExample
Inventor
ディディエ ベノワ，
アダム サファー，
ハン−ティン チャン，
ドミニク シャルモ，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Symyx Technologies Inc
Original Assignee
Symyx Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Symyx Technologies Inc filed Critical Symyx Technologies Inc
Publication of JP2007526351A publication Critical patent/JP2007526351A/ja
Publication of JP2007526351A5 publication Critical patent/JP2007526351A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
JP2006517640A 2003-06-26 2004-06-25 リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物 Pending JP2007526351A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US48339003P 2003-06-26 2003-06-26
US48331003P 2003-06-26 2003-06-26
PCT/US2004/020346 WO2005000923A1 (en) 2003-06-26 2004-06-25 Photoresist polymers and compositions having acrylic- or methacrylic-based polymeric resin prepared by a living free radical process

Publications (2)

Publication Number Publication Date
JP2007526351A true JP2007526351A (ja) 2007-09-13
JP2007526351A5 JP2007526351A5 (enExample) 2008-05-08

Family

ID=33555604

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006517640A Pending JP2007526351A (ja) 2003-06-26 2004-06-25 リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物

Country Status (4)

Country Link
EP (1) EP1641849A1 (enExample)
JP (1) JP2007526351A (enExample)
KR (1) KR20060088478A (enExample)
WO (1) WO2005000923A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021515078A (ja) * 2018-12-13 2021-06-17 エルジー・ケム・リミテッド アクリル系共重合体、その製造方法、およびそれを含むアクリル系共重合体組成物

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696292B2 (en) 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
KR101010757B1 (ko) * 2008-06-09 2011-01-25 주식회사 동부하이텍 사슬 전이제, 이를 이용한 반사방지막 수지의 제조방법
KR101579730B1 (ko) * 2008-12-23 2015-12-24 주식회사 동진쎄미켐 감광성 고분자 및 이를 포함하는 포토레지스트 조성물
US20130109816A1 (en) 2011-10-28 2013-05-02 E.I. Du Pont De Nemours And Company Processes for removing sulfur-containing end groups from polymers
CA2860861A1 (en) 2012-01-18 2013-07-25 Iowa State University Research Foundation, Inc. Thermoplastic elastomers via atom transfer radical polymerization of plant oil
WO2014150700A1 (en) 2013-03-15 2014-09-25 E. I. Du Pont De Nemours And Company Polymerization process protection means
EP3632942A1 (en) 2013-05-20 2020-04-08 Iowa State University Research Foundation, Inc. Thermoplastic elastomers via reversible addition-fragmentation chain transfer polymerization of triglycerides

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000515181A (ja) * 1996-07-10 2000-11-14 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー リビング特性を持つ重合
JP2001131232A (ja) * 1999-11-02 2001-05-15 Toshiba Corp フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
JP2002508409A (ja) * 1997-12-18 2002-03-19 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー リビング性を有する重合方法およびその方法で製造されるポリマー
JP2004220009A (ja) * 2002-12-28 2004-08-05 Jsr Corp 感放射線性樹脂組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030180662A1 (en) * 1998-05-25 2003-09-25 Daicel Chemical Industries, Ltd. Acid-sensitive compound and resin composition for photoresist

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000515181A (ja) * 1996-07-10 2000-11-14 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー リビング特性を持つ重合
JP2002508409A (ja) * 1997-12-18 2002-03-19 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー リビング性を有する重合方法およびその方法で製造されるポリマー
JP2001131232A (ja) * 1999-11-02 2001-05-15 Toshiba Corp フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
JP2004220009A (ja) * 2002-12-28 2004-08-05 Jsr Corp 感放射線性樹脂組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021515078A (ja) * 2018-12-13 2021-06-17 エルジー・ケム・リミテッド アクリル系共重合体、その製造方法、およびそれを含むアクリル系共重合体組成物
JP7055214B2 (ja) 2018-12-13 2022-04-15 エルジー・ケム・リミテッド アクリル系共重合体、その製造方法、およびそれを含むアクリル系共重合体組成物

Also Published As

Publication number Publication date
EP1641849A1 (en) 2006-04-05
KR20060088478A (ko) 2006-08-04
WO2005000923A1 (en) 2005-01-06

Similar Documents

Publication Publication Date Title
JP4725739B2 (ja) フォトレジストポリマー組成物
JP4877306B2 (ja) 感放射線性樹脂組成物
US7531286B2 (en) Radiation-sensitive resin composition
TWI468856B (zh) Sensitive radiation linear resin compositions and compounds
JP4345326B2 (ja) 感放射線性樹脂組成物
KR20120032024A (ko) 감방사선성 수지 조성물
JP2009114381A (ja) （メタ）アクリル酸エステル樹脂
JP5264654B2 (ja) 感活性光線性又は感放射線性樹脂組成物、及びそれを用いたパターン形成方法
JP2007526351A (ja) リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物
JP2007526351A5 (enExample)
JP4232577B2 (ja) 感放射線性樹脂組成物
EP1953595A1 (en) Radiation-sensitive resin composition
JP5444668B2 (ja) レジストパターン形成方法
JP4036320B2 (ja) 感放射線性樹脂組成物
JP5723854B2 (ja) 感活性光線性又は感放射線性樹脂組成物、並びに、それを用いた感活性光線性又は感放射線性膜及びパターン形成方法
JP4051963B2 (ja) ラクトン系共重合樹脂および感放射線性樹脂組成物
JP2003241384A (ja) 感放射線性樹脂組成物
JP2004118136A (ja) 感放射線性樹脂組成物
JP4114354B2 (ja) 感放射線性樹脂組成物
JP4093402B2 (ja) 感放射線性樹脂組成物
JP2004012545A (ja) 感放射線性樹脂組成物
JP2013218115A (ja) 感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜及びパターン形成方法
JP2007052459A (ja) 感放射線性樹脂組成物
JP2007112899A (ja) 共重合体及び感放射線性樹脂組成物
JP2003322962A (ja) 感放射線性樹脂組成物

Legal Events

Date Code Title Description
A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20080317

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20091111

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091113

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20100112

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20100112

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20100212

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20100222

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20100312

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20100326

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20100608