JP2007526351A5 - - Google Patents

Download PDF

Info

Publication number
JP2007526351A5
JP2007526351A5 JP2006517640A JP2006517640A JP2007526351A5 JP 2007526351 A5 JP2007526351 A5 JP 2007526351A5 JP 2006517640 A JP2006517640 A JP 2006517640A JP 2006517640 A JP2006517640 A JP 2006517640A JP 2007526351 A5 JP2007526351 A5 JP 2007526351A5
Authority
JP
Japan
Prior art keywords
group
optionally substituted
polymer
substituted
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006517640A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007526351A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2004/020346 external-priority patent/WO2005000923A1/en
Publication of JP2007526351A publication Critical patent/JP2007526351A/ja
Publication of JP2007526351A5 publication Critical patent/JP2007526351A5/ja
Pending legal-status Critical Current

Links

JP2006517640A 2003-06-26 2004-06-25 リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物 Pending JP2007526351A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US48339003P 2003-06-26 2003-06-26
US48331003P 2003-06-26 2003-06-26
PCT/US2004/020346 WO2005000923A1 (en) 2003-06-26 2004-06-25 Photoresist polymers and compositions having acrylic- or methacrylic-based polymeric resin prepared by a living free radical process

Publications (2)

Publication Number Publication Date
JP2007526351A JP2007526351A (ja) 2007-09-13
JP2007526351A5 true JP2007526351A5 (enExample) 2008-05-08

Family

ID=33555604

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006517640A Pending JP2007526351A (ja) 2003-06-26 2004-06-25 リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物

Country Status (4)

Country Link
EP (1) EP1641849A1 (enExample)
JP (1) JP2007526351A (enExample)
KR (1) KR20060088478A (enExample)
WO (1) WO2005000923A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696292B2 (en) 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
KR101010757B1 (ko) * 2008-06-09 2011-01-25 주식회사 동부하이텍 사슬 전이제, 이를 이용한 반사방지막 수지의 제조방법
KR101579730B1 (ko) * 2008-12-23 2015-12-24 주식회사 동진쎄미켐 감광성 고분자 및 이를 포함하는 포토레지스트 조성물
US20130109816A1 (en) 2011-10-28 2013-05-02 E.I. Du Pont De Nemours And Company Processes for removing sulfur-containing end groups from polymers
CA2860861A1 (en) 2012-01-18 2013-07-25 Iowa State University Research Foundation, Inc. Thermoplastic elastomers via atom transfer radical polymerization of plant oil
WO2014150700A1 (en) 2013-03-15 2014-09-25 E. I. Du Pont De Nemours And Company Polymerization process protection means
EP3632942A1 (en) 2013-05-20 2020-04-08 Iowa State University Research Foundation, Inc. Thermoplastic elastomers via reversible addition-fragmentation chain transfer polymerization of triglycerides
KR102377565B1 (ko) * 2018-12-13 2022-03-21 주식회사 엘지화학 아크릴계 공중합체, 이의 제조방법 및 이를 포함하는 아크릴계 공중합체 조성물

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69709110T2 (de) * 1996-07-10 2002-04-25 Commonwealth Scientific And Industrial Research Organisation, Clayton Polymerisation mit "living" kennzeichen
IL136389A0 (en) * 1997-12-18 2001-06-14 Du Pont Polymerization process with living characteristics and polymers made therefrom
US20030180662A1 (en) * 1998-05-25 2003-09-25 Daicel Chemical Industries, Ltd. Acid-sensitive compound and resin composition for photoresist
JP4282185B2 (ja) * 1999-11-02 2009-06-17 株式会社東芝 フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
JP2004220009A (ja) * 2002-12-28 2004-08-05 Jsr Corp 感放射線性樹脂組成物

Similar Documents

Publication Publication Date Title
JP4725739B2 (ja) フォトレジストポリマー組成物
JP4877306B2 (ja) 感放射線性樹脂組成物
TWI468856B (zh) Sensitive radiation linear resin compositions and compounds
US7531286B2 (en) Radiation-sensitive resin composition
JP4345326B2 (ja) 感放射線性樹脂組成物
KR20100014831A (ko) 레지스트 패턴 형성 방법 및 그에 사용하는 레지스트 패턴 불용화 수지 조성물
KR20120032024A (ko) 감방사선성 수지 조성물
JP2009114381A (ja) （メタ）アクリル酸エステル樹脂
JP5264654B2 (ja) 感活性光線性又は感放射線性樹脂組成物、及びそれを用いたパターン形成方法
JP2007526351A5 (enExample)
JP2007526351A (ja) リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物
JP4232577B2 (ja) 感放射線性樹脂組成物
EP1953595A1 (en) Radiation-sensitive resin composition
JP3975790B2 (ja) 感放射線性樹脂組成物
JP5444668B2 (ja) レジストパターン形成方法
JP4036320B2 (ja) 感放射線性樹脂組成物
JP5723854B2 (ja) 感活性光線性又は感放射線性樹脂組成物、並びに、それを用いた感活性光線性又は感放射線性膜及びパターン形成方法
JP4051963B2 (ja) ラクトン系共重合樹脂および感放射線性樹脂組成物
JP2004118136A (ja) 感放射線性樹脂組成物
JP2003241384A (ja) 感放射線性樹脂組成物
JP4114354B2 (ja) 感放射線性樹脂組成物
JP2010096992A (ja) レジストパターン形成方法及びそれに用いるポジ型感放射線性樹脂組成物
JP4093402B2 (ja) 感放射線性樹脂組成物
JP2004012545A (ja) 感放射線性樹脂組成物
JP2007052459A (ja) 感放射線性樹脂組成物