JP2007515077A - 化学的酸化物除去(ChemicalOxideRemoval)処理システム及び方法 - Google Patents
化学的酸化物除去(ChemicalOxideRemoval)処理システム及び方法 Download PDFInfo
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Abstract
Description
本出願は、2003年3月17に出願され発明の名称が「基材処理のための処理システム及び方法」とされた継続する米国仮出願番号60/454,597;2003年3月17日に出願され発明の名称が「化学的な基材処理のための処理システム及び方法」とされた継続する米国仮出願番号60/454,642;2003年3月17に出願され発明の名称が「基材を熱処理する処理システム及び方法」とされた継続する米国仮出願番号60/454,641;及び、2003年3月17に出願され発明の名称が「近傍温度に制御された各チャンバを断熱するための方法及び装置」とされた継続する米国仮出願番号60/454,644に関連する。これら全ての仮出願の全体の内容は、本明細書中にそのまま組み込まれる。
Claims (44)
- 少ないメンテナンスで基材を処理する処理システムであって:
内表面の少なくとも一部分上に形成された保護バリアを有する温度制御された化学処理チャンバを備え、基材上の露出表面層を化学的に変化させる化学処理システムと;
内表面の少なくとも一部分上に形成された保護バリアを有する温度制御された熱処理チャンバを備え、化学変化された基材上の前記表面層を熱処理する熱処理システムと;
前記熱処理システムおよび前記化学処理システムに接続された断熱組立体と;
を備えている処理システム。 - 請求項1記載の処理システムにおいて、
前記断熱組立体は、少なくとも一つの露出表面上に、保護バリアを備えている処理システム。 - 請求項1記載の処理システムにおいて、
前記化学処理システムは、前記化学処理チャンバ内に取り付けられるとともに、露出表面の少なくとも一部分上に形成された保護バリアを有する温度制御された基材ホルダと、前記化学処理チャンバに接続された真空吸引システムと、露出表面の少なくとも一部分上に形成された保護バリアを有する複数のガス噴射オリフィスを備えるとともに、前記化学処理チャンバ内にプロセスガスを導入する温度制御されたガス分配システムに接続され、その露出表面の少なくとも一部分上に形成された保護バリアを有するガス分配板とを備え;
前記熱処理システムは、前記熱処理チャンバ内に取り付けられるとともに、露出表面の少なくとも一部分上に形成された保護バリアを有する温度制御された基材ホルダと、前記熱処理チャンバに接続された真空吸引システムとを備え;
前記化学処理システム及び前記熱処理システムに接続されるとともに、化学処理チャンバ温度、化学処理ガス分配システム温度、化学処理基材ホルダ温度、化学処理基材温度、化学処理プロセス圧力、化学処理ガス流量、熱処理チャンバ温度、熱処理基材ホルダ温度、熱処理基材温度、熱処理プロセス圧力および熱処理ガス流量のうちの少なくとも一つを制御するように構成された制御システムを備えている処理システム。 - 請求項1記載の処理システムにおいて、
前記化学処理チャンバの内表面上の前記保護バリアは、PTFE及び/又はTFEが含浸された陽極酸化金属を備えている処理システム。 - 請求項4記載の処理システムにおいて、
前記化学処理チャンバの内表面上の前記保護バリアは、TFE及び/又はPTFEが含浸された硬質陽極酸化金属を備えている処理システム。 - 請求項4記載の処理システムにおいて、
前記金属は、アルミニウム及びアルミ合金の少なくとも一つを含む処理システム。 - 請求項1記載の処理システムにおいて、
前記化学処理チャンバの内表面上の前記保護バリアは、Al2O3、Y2O3、Sc2O3、Sc2F3、YF3、La2O3、CeO2、Eu2O3、及びDyO3のうちの少なくとも一つを含む処理システム。 - 請求項1記載の処理システムにおいて、
前記化学処理システムは、その少なくとも一部分上に形成された保護バリアを有する温度制御された基材ホルダを備え、
前記化学処理チャンバ内に取り付けられ、温度制御された前記基材ホルダ上の前記保護バリアは、PTFE及び/又はTFEが含浸された陽極酸化金属を備えている処理システム。 - 請求項1記載の処理システムにおいて、
前記化学処理システムは、その少なくとも一部分上に形成された保護バリアを有する温度制御された基材ホルダを備え、
前記化学処理チャンバ内に取り付けられ、温度制御された前記基材ホルダ上の前記保護バリアは、Al2O3、Y2O3、Sc2O3、Sc2F3、YF3、La2O3、CeO2、Eu2O3、及びDyO3のうちの少なくとも一つを含む処理システム。 - 請求項1記載の処理システムにおいて、
前記化学処理システムは、露出表面の少なくとも一部分上に形成された保護バリアを有する複数のガス噴射オリフィスを備えるとともに、前記化学処理チャンバ内にプロセスガスを導入する温度制御されたガス分配システムに接続され、その露出表面の少なくとも一部分上に形成された保護バリアを有するガス分配板を備え、
該ガス分散板上の保護バリアおよび前記各オリフィス上の保護バリアは、PTFE及び/又はTFEが含浸された陽極酸化金属を備えている処理システム。 - 請求項10記載の処理システムにおいて、
前記ガス分散板の露出表面上の保護バリアおよび前記各オリフィスの露出表面上の保護バリアは、TFE及び/又はPTFEが含浸された硬質陽極酸化金属を備えている処理システム。 - 請求項10記載の処理システムにおいて、
前記金属は、アルミニウム及びアルミ合金の少なくとも一つを含む処理システム。 - 請求項1記載の処理システムにおいて、
前記化学処理システムは、露出表面の少なくとも一部分上に形成された保護バリアを有する複数のガス噴射オリフィスを備えるとともに、前記化学処理チャンバ内にプロセスガスを導入する温度制御されたガス分配システムに接続され、その露出表面の少なくとも一部分上に形成された保護バリアを有するガス分配板を備え、
該ガス分散板上の保護バリアおよび前記各オリフィス上の保護バリアは、Al2O3、Y2O3、Sc2O3、Sc2F3、YF3、La2O3、CeO2、Eu2O3、及びDyO3のうちの少なくとも一つを含む処理システム。 - 請求項1記載の処理システムにおいて、
温度制御された前記熱処理チャンバの内表面上の前記保護バリアは、PTFE及び/又はTFEが含浸された陽極酸化金属を備えている処理システム。 - 請求項14記載の処理システムにおいて、
温度制御された前記熱処理チャンバの内表面上の前記保護バリアは、TFE及び/又はPTFEが含浸された硬質陽極酸化金属を備えている処理システム。 - 請求項14記載の処理システムにおいて、
前記金属は、アルミニウム及びアルミ合金の少なくとも一つを含む処理システム。 - 請求項1記載の処理システムにおいて、
温度制御された前記熱処理チャンバの内表面上の前記保護バリアは、Al2O3、Y2O3、Sc2O3、Sc2F3、YF3、La2O3、CeO2、Eu2O3、及びDyO3のうちの少なくとも一つを含む処理システム。 - 請求項1記載の処理システムにおいて、
前記熱処理システムは、前記熱処理チャンバ内に取り付けられると共に、露出表面の少なくとも一部分上に形成された保護バリアを有する温度制御された基材ホルダを備え、
温度制御された前記熱処理チャンバ内に取り付けられ温度制御された基材ホルダの露出表面上の前記保護バリアは、PTFE及び/又はTFEが含浸された陽極酸化金属を備えている処理システム。 - 請求項1記載の処理システムにおいて、
前記熱処理システムは、前記熱処理チャンバ内に取り付けられると共に、露出表面の少なくとも一部分上に形成された保護バリアを有する温度制御された基材ホルダを備え、
温度制御された前記熱処理チャンバ内に取り付けられ温度制御された基材ホルダの露出表面上の前記保護バリアは、Al2O3、Y2O3、Sc2O3、Sc2F3、YF3、La2O3、CeO2、Eu2O3、及びDyO3のうちの少なくとも一つを含む処理システム。 - 請求項1記載の処理システムにおいて、
前記断熱組立体は、ゲートバルブ組立体を備えており、
該ゲートバルブ組立体の露出表面の少なくとも一部分上に形成に、保護バリアが形成されている処理システム。 - 請求項20記載の処理システムにおいて、
前記ゲートバルブ組立体の露出表面上の前記保護バリアは、PTFE及び/又はTFEが含浸された陽極酸化金属を備えている処理システム。 - 請求項20記載の処理システムにおいて、
前記ゲートバルブ組立体の露出表面上の前記保護バリアは、Al2O3、Y2O3、Sc2O3、Sc2F3、YF3、La2O3、CeO2、Eu2O3、及びDyO3のうちの少なくとも一つを含む処理システム。 - 請求項10記載の処理システムにおいて、
前記プロセスガスは、第1ガス及び第2ガスを含む処理システム。 - 請求項23記載の処理システムにおいて、
前記第1ガスは、NH3,HF,H2,O2,CO,CO2,Ar,Heのうちの少なくとも一つを含む処理システム。 - 請求項23記載の処理システムにおいて、
前記第2ガスは、NH3,HF,H2,O2,CO,CO2,Ar,Heのうちの少なくとも一つを含む処理システム。 - 請求項23記載の処理システムにおいて、
複数の前記オリフィスは、第1ガスを処理空間に接続するオリフィスの第1配列と、第2ガスを処理空間に接続するオリフィスの第2配列とを備えている処理システム。 - 請求項1記載の処理システムにおいて、
前記熱処理システムは、前記熱処理チャンバに接続されるとともに、輸送面と前記基材ホルダとの間で基材を垂直方向に輸送する基材リフタ組立体を備えている処理システム。 - 請求項27記載の処理システムにおいて、
前記基材リフタ組立体は、基材を受け取るための2又は3以上のタブを有するとともに、露出表面の少なくとも一部分上に形成された保護バリアを有するブレードと、前記基材ホルダと輸送面との間で基材を垂直方向に輸送する駆動システムとを備えている処理システム。 - 請求項28記載の処理システムにおいて、
前記ブレードの露出表面の少なくとも一部分上の前記保護バリアは、PTFE及び/又はTFEが含浸された陽極酸化金属を備えている処理システム。 - 請求項28記載の処理システムにおいて、
前記ブレードの露出表面の少なくとも一部分上の前記保護バリアは、Al2O3、Y2O3、Sc2O3、Sc2F3、YF3、La2O3、CeO2、Eu2O3、及びDyO3のうちの少なくとも一つを含む処理システム。 - 基材上の露出表面層を化学的に変化させる化学処理システムであって:
内表面の少なくとも一部分上に形成された保護バリアを有する温度制御された化学処理チャンバと;
該化学処理チャンバ内に取り付けられた温度制御された基材ホルダと;
前記化学処理チャンバに接続された真空吸引システムと;
前記化学処理チャンバ内にプロセスガスを導入する温度制御されたガス分配システムに接続され、複数のガス噴射オリフィスを備えたガス分配板と;
を備えている化学処理システム。 - 請求項31記載の化学処理システムにおいて、
前記化学処理チャンバの内表面上の前記保護バリアは、PTFE及び/又はTFEが含浸された陽極酸化金属を備えている化学処理システム。 - 請求項32記載の化学処理システムにおいて、
前記化学処理チャンバの内表面上の前記保護バリアは、TFE及び/又はPTFEが含浸された硬質陽極酸化金属を備えている化学処理システム。 - 請求項32記載の化学処理システムにおいて、
前記金属は、アルミニウム及びアルミ合金の少なくとも一つを含む化学処理システム。 - 請求項31記載の化学処理システムにおいて、
前記化学処理チャンバの内表面上の前記保護バリアは、Al2O3、Y2O3、Sc2O3、Sc2F3、YF3、La2O3、CeO2、Eu2O3、及びDyO3のうちの少なくとも一つを含む化学処理システム。 - 請求項31記載の化学処理システムにおいて、
前記基材ホルダは、露出表面の少なくとも一部分上に形成された保護バリアを有している化学処理システム。 - 請求項31記載の化学処理システムにおいて、
保護バリアが、前記ガス分配板の露出表面の少なくとも一部分上に、及び、前記各オリフィスの露出表面の少なくとも一部分上に、形成されている化学処理システム。 - 基材上の化学変化した表面層を熱処理する熱処理システムであって:
内表面の少なくとも一部分上に形成された保護バリアを有する温度制御された熱処理チャンバと;
該熱処理チャンバ内に取り付けられた温度制御された基材ホルダと;
前記熱処理チャンバに接続された真空吸引システムと;
前記熱処理チャンバに接続された温度制御された情報組立体と;
を備えている熱処理システム。 - 請求項38記載の熱処理システムにおいて、
前記熱処理チャンバの内表面上の前記保護バリアは、PTFE及び/又はTFEが含浸された陽極酸化金属を備えている熱処理システム。 - 請求項39記載の熱処理システムにおいて、
前記熱処理チャンバの内表面上の前記保護バリアは、TFE及び/又はPTFEが含浸された硬質陽極酸化金属を備えている熱処理システム。 - 請求項39記載の熱処理システムにおいて、
前記金属は、アルミニウム及びアルミ合金の少なくとも一つを含む熱処理システム。 - 請求項38記載の熱処理システムにおいて、
前記熱処理チャンバの内表面上の前記保護バリアは、Al2O3、Y2O3、Sc2O3、Sc2F3、YF3、La2O3、CeO2、Eu2O3、及びDyO3のうちの少なくとも一つを含む熱処理システム。 - 請求項38記載の熱処理システムにおいて、
前記基材ホルダは、少なくとも一つの露出表面上に形成された保護バリアを有している熱処理システム。 - 処理チャンバを処理する方法であって:
処理チャンバの内表面の少なくとも一部分を陽極酸化処理し;
陽極酸化された表面に、PTFE及び/又はTFEを含浸させ、これにより保護バリアを形成する処理チャンバを処理する方法。
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WO2005062336A2 (en) | 2005-07-07 |
KR20130009877A (ko) | 2013-01-23 |
US8409399B2 (en) | 2013-04-02 |
KR20060126977A (ko) | 2006-12-11 |
CN100511576C (zh) | 2009-07-08 |
US20090226633A1 (en) | 2009-09-10 |
WO2005062336A3 (en) | 2005-11-17 |
KR20120091380A (ko) | 2012-08-17 |
CN1898772A (zh) | 2007-01-17 |
US20040182315A1 (en) | 2004-09-23 |
JP2011176365A (ja) | 2011-09-08 |
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