JP2007506136A - カラーフィルタの直接描画システム及び直接描画方法 - Google Patents

カラーフィルタの直接描画システム及び直接描画方法 Download PDF

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Publication number
JP2007506136A
JP2007506136A JP2006526809A JP2006526809A JP2007506136A JP 2007506136 A JP2007506136 A JP 2007506136A JP 2006526809 A JP2006526809 A JP 2006526809A JP 2006526809 A JP2006526809 A JP 2006526809A JP 2007506136 A JP2007506136 A JP 2007506136A
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JP
Japan
Prior art keywords
pattern
laser beam
scanning
photosensitized
panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2006526809A
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English (en)
Japanese (ja)
Inventor
グロス、アブラハム
アディン、ラーナン
カツィール、イーガル
フィッシュ、デイビッド
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オーボテック リミテッド
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Publication date
Application filed by オーボテック リミテッド filed Critical オーボテック リミテッド
Publication of JP2007506136A publication Critical patent/JP2007506136A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Printer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2006526809A 2003-09-22 2004-09-22 カラーフィルタの直接描画システム及び直接描画方法 Pending JP2007506136A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US50388703P 2003-09-22 2003-09-22
PCT/IL2004/000882 WO2005029178A2 (fr) 2003-09-22 2004-09-22 Systeme et procede pour l'imagerie directe de filtres couleur

Publications (1)

Publication Number Publication Date
JP2007506136A true JP2007506136A (ja) 2007-03-15

Family

ID=34375412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006526809A Pending JP2007506136A (ja) 2003-09-22 2004-09-22 カラーフィルタの直接描画システム及び直接描画方法

Country Status (4)

Country Link
JP (1) JP2007506136A (fr)
KR (1) KR20060097711A (fr)
TW (1) TWI249083B (fr)
WO (1) WO2005029178A2 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011089867A1 (fr) * 2010-01-22 2011-07-28 パナソニック株式会社 Dispositif de rendu et procédé de rendu
CN102645809A (zh) * 2011-02-22 2012-08-22 元太科技工业股份有限公司 彩色电泳显示装置的制造方法
US8808486B2 (en) 2010-06-01 2014-08-19 E Ink Holdings Inc. Method for manufacturing color electrophoretic display device
JP2019023764A (ja) * 2014-04-01 2019-02-14 株式会社ニコン 基板処理方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10149390B2 (en) 2012-08-27 2018-12-04 Mycronic AB Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs
WO2014140047A2 (fr) * 2013-03-12 2014-09-18 Micronic Mydata AB Procédé et dispositif d'écriture de masques photographiques avec réduction des erreurs mura

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07288276A (ja) * 1994-02-22 1995-10-31 Nikon Corp 基板の位置決め装置
JPH08236419A (ja) * 1995-02-24 1996-09-13 Nikon Corp 位置決め方法
WO2002054837A2 (fr) * 2001-01-04 2002-07-11 Laser Imaging Systems Gmbh & Co. Kg Dispositif de formation directe de motifs
US6552779B2 (en) * 2000-05-25 2003-04-22 Ball Semiconductor, Inc. Flying image of a maskless exposure system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6624433B2 (en) * 1994-02-22 2003-09-23 Nikon Corporation Method and apparatus for positioning substrate and the like
US5853924A (en) * 1994-12-26 1998-12-29 Alps Electric Co., Ltd. Method of manufacturing color filters
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6560248B1 (en) * 2000-06-08 2003-05-06 Mania Barco Nv System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07288276A (ja) * 1994-02-22 1995-10-31 Nikon Corp 基板の位置決め装置
JPH08236419A (ja) * 1995-02-24 1996-09-13 Nikon Corp 位置決め方法
US6552779B2 (en) * 2000-05-25 2003-04-22 Ball Semiconductor, Inc. Flying image of a maskless exposure system
WO2002054837A2 (fr) * 2001-01-04 2002-07-11 Laser Imaging Systems Gmbh & Co. Kg Dispositif de formation directe de motifs

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011089867A1 (fr) * 2010-01-22 2011-07-28 パナソニック株式会社 Dispositif de rendu et procédé de rendu
US8808486B2 (en) 2010-06-01 2014-08-19 E Ink Holdings Inc. Method for manufacturing color electrophoretic display device
CN102645809A (zh) * 2011-02-22 2012-08-22 元太科技工业股份有限公司 彩色电泳显示装置的制造方法
JP2019023764A (ja) * 2014-04-01 2019-02-14 株式会社ニコン 基板処理方法

Also Published As

Publication number Publication date
WO2005029178A3 (fr) 2006-09-14
WO2005029178A2 (fr) 2005-03-31
TWI249083B (en) 2006-02-11
WO2005029178A8 (fr) 2006-04-13
KR20060097711A (ko) 2006-09-14

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