JP2007312516A - 駆動装置、露光装置及びデバイス製造方法 - Google Patents
駆動装置、露光装置及びデバイス製造方法 Download PDFInfo
- Publication number
- JP2007312516A JP2007312516A JP2006139465A JP2006139465A JP2007312516A JP 2007312516 A JP2007312516 A JP 2007312516A JP 2006139465 A JP2006139465 A JP 2006139465A JP 2006139465 A JP2006139465 A JP 2006139465A JP 2007312516 A JP2007312516 A JP 2007312516A
- Authority
- JP
- Japan
- Prior art keywords
- coil
- region
- exposure
- swap
- drive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Combustion & Propulsion (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Linear Motors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006139465A JP2007312516A (ja) | 2006-05-18 | 2006-05-18 | 駆動装置、露光装置及びデバイス製造方法 |
| US11/746,797 US7508099B2 (en) | 2006-05-18 | 2007-05-10 | Driving apparatus, exposure apparatus, and device manufacturing method |
| TW096117076A TW200813643A (en) | 2006-05-18 | 2007-05-14 | Driving apparatus, exposure apparatus, and device manufacturing method |
| KR1020070047380A KR100872082B1 (ko) | 2006-05-18 | 2007-05-16 | 구동장치, 노광 장치 및 디바이스 제조 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006139465A JP2007312516A (ja) | 2006-05-18 | 2006-05-18 | 駆動装置、露光装置及びデバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007312516A true JP2007312516A (ja) | 2007-11-29 |
| JP2007312516A5 JP2007312516A5 (enExample) | 2009-07-02 |
Family
ID=38711360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006139465A Pending JP2007312516A (ja) | 2006-05-18 | 2006-05-18 | 駆動装置、露光装置及びデバイス製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7508099B2 (enExample) |
| JP (1) | JP2007312516A (enExample) |
| KR (1) | KR100872082B1 (enExample) |
| TW (1) | TW200813643A (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8823294B2 (en) | 2007-06-27 | 2014-09-02 | Brooks Automation, Inc. | Commutation of an electromagnetic propulsion and guidance system |
| US9752615B2 (en) | 2007-06-27 | 2017-09-05 | Brooks Automation, Inc. | Reduced-complexity self-bearing brushless DC motor |
| KR101660894B1 (ko) | 2007-06-27 | 2016-10-10 | 브룩스 오토메이션 인코퍼레이티드 | 다차원 위치 센서 |
| WO2009003195A1 (en) | 2007-06-27 | 2008-12-31 | Brooks Automation, Inc. | Motor stator with lift capability and reduced cogging characteristics |
| US8283813B2 (en) | 2007-06-27 | 2012-10-09 | Brooks Automation, Inc. | Robot drive with magnetic spindle bearings |
| WO2009003193A1 (en) * | 2007-06-27 | 2008-12-31 | Brooks Automation, Inc. | Position feedback for self bearing motor |
| KR101825595B1 (ko) | 2007-07-17 | 2018-02-05 | 브룩스 오토메이션 인코퍼레이티드 | 챔버 벽들에 일체화된 모터들을 갖는 기판 처리 장치 |
| US8358039B2 (en) | 2008-10-17 | 2013-01-22 | Massachusetts Institute Of Technology | High-scan rate positioner for scanned probe microscopy |
| NL2006714A (en) * | 2010-06-07 | 2011-12-08 | Asml Netherlands Bv | Displacement device, lithographic apparatus and positioning method. |
| US8593016B2 (en) * | 2010-12-03 | 2013-11-26 | Sri International | Levitated micro-manipulator system |
| NL2022467B1 (en) * | 2019-01-28 | 2020-08-18 | Prodrive Tech Bv | Position sensor for long stroke linear permanent magnet motor |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004254489A (ja) * | 2002-12-27 | 2004-09-09 | Canon Inc | 位置決め装置、及びその位置決め装置を利用した露光装置 |
| JP2005277030A (ja) * | 2004-03-24 | 2005-10-06 | Canon Inc | ステージ装置および露光装置 |
| JP2005327993A (ja) * | 2004-05-17 | 2005-11-24 | Canon Inc | 位置決め装置、露光装置及びデバイス製造方法 |
| JP2005353969A (ja) * | 2004-06-14 | 2005-12-22 | Canon Inc | 露光装置 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6228146A (ja) * | 1985-07-26 | 1987-02-06 | Hiroshi Teramachi | リニアモ−タ付xyテ−ブル |
| DE19601018A1 (de) * | 1995-01-27 | 1996-08-01 | Zeiss Carl Fa | Linear verstellbarer Präzisionstisch |
| JP3815750B2 (ja) | 1995-10-09 | 2006-08-30 | キヤノン株式会社 | ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法 |
| JP3155936B2 (ja) | 1997-06-26 | 2001-04-16 | キヤノン株式会社 | リニアモータとステージ装置及びこれを用いた走査型露光装置やデバイス製造方法 |
| JPH1198811A (ja) | 1997-09-24 | 1999-04-09 | Canon Inc | リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法 |
| JPH11287880A (ja) | 1998-04-01 | 1999-10-19 | Canon Inc | ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法 |
| JP3907357B2 (ja) | 1998-11-12 | 2007-04-18 | キヤノン株式会社 | 段差付きコイル製造方法 |
| JP2001118773A (ja) * | 1999-10-18 | 2001-04-27 | Nikon Corp | ステージ装置及び露光装置 |
| JP2001230305A (ja) | 2000-02-18 | 2001-08-24 | Canon Inc | 支持装置 |
| JP4474020B2 (ja) * | 2000-06-23 | 2010-06-02 | キヤノン株式会社 | 移動装置及び露光装置 |
| JP2003022960A (ja) | 2001-07-09 | 2003-01-24 | Canon Inc | ステージ装置及びその駆動方法 |
| EP1300932B1 (en) | 2001-10-05 | 2013-12-18 | Canon Kabushiki Kaisha | Linear motor, stage apparatus, and exposure apparatus |
| JP3977086B2 (ja) | 2002-01-18 | 2007-09-19 | キヤノン株式会社 | ステージシステム |
| JP4323759B2 (ja) | 2002-05-27 | 2009-09-02 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP3849932B2 (ja) | 2002-08-12 | 2006-11-22 | キヤノン株式会社 | 移動ステージ装置 |
| US6841956B2 (en) * | 2002-09-17 | 2005-01-11 | Nikon Corporation | Actuator to correct for off center-of-gravity line of force |
| JP2004172557A (ja) | 2002-11-22 | 2004-06-17 | Canon Inc | ステージ装置及びその制御方法 |
| JP4194383B2 (ja) | 2003-02-13 | 2008-12-10 | キヤノン株式会社 | リニアモータ |
| JP2005005393A (ja) | 2003-06-10 | 2005-01-06 | Canon Inc | ステージ装置、露光装置、およびデバイス製造方法 |
| JP2005142501A (ja) | 2003-11-10 | 2005-06-02 | Canon Inc | ステージ装置および露光装置ならびにデバイス製造方法 |
| JP2005253179A (ja) | 2004-03-03 | 2005-09-15 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
-
2006
- 2006-05-18 JP JP2006139465A patent/JP2007312516A/ja active Pending
-
2007
- 2007-05-10 US US11/746,797 patent/US7508099B2/en not_active Expired - Fee Related
- 2007-05-14 TW TW096117076A patent/TW200813643A/zh unknown
- 2007-05-16 KR KR1020070047380A patent/KR100872082B1/ko not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004254489A (ja) * | 2002-12-27 | 2004-09-09 | Canon Inc | 位置決め装置、及びその位置決め装置を利用した露光装置 |
| JP2005277030A (ja) * | 2004-03-24 | 2005-10-06 | Canon Inc | ステージ装置および露光装置 |
| JP2005327993A (ja) * | 2004-05-17 | 2005-11-24 | Canon Inc | 位置決め装置、露光装置及びデバイス製造方法 |
| JP2005353969A (ja) * | 2004-06-14 | 2005-12-22 | Canon Inc | 露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070112001A (ko) | 2007-11-22 |
| KR100872082B1 (ko) | 2008-12-05 |
| US20070267920A1 (en) | 2007-11-22 |
| TW200813643A (en) | 2008-03-16 |
| US7508099B2 (en) | 2009-03-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090513 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20090513 |
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| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110815 |
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| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110818 |
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| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20111209 |