JP2007312516A - 駆動装置、露光装置及びデバイス製造方法 - Google Patents

駆動装置、露光装置及びデバイス製造方法 Download PDF

Info

Publication number
JP2007312516A
JP2007312516A JP2006139465A JP2006139465A JP2007312516A JP 2007312516 A JP2007312516 A JP 2007312516A JP 2006139465 A JP2006139465 A JP 2006139465A JP 2006139465 A JP2006139465 A JP 2006139465A JP 2007312516 A JP2007312516 A JP 2007312516A
Authority
JP
Japan
Prior art keywords
coil
region
exposure
swap
drive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006139465A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007312516A5 (enExample
Inventor
Nobushige Korenaga
伸茂 是永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2006139465A priority Critical patent/JP2007312516A/ja
Priority to US11/746,797 priority patent/US7508099B2/en
Priority to TW096117076A priority patent/TW200813643A/zh
Priority to KR1020070047380A priority patent/KR100872082B1/ko
Publication of JP2007312516A publication Critical patent/JP2007312516A/ja
Publication of JP2007312516A5 publication Critical patent/JP2007312516A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K41/00Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02Linear motors; Sectional motors
    • H02K41/03Synchronous motors; Motors moving step by step; Reluctance motors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274Photolithographic processes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70758Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K2201/00Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18Machines moving with multiple degrees of freedom

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Linear Motors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006139465A 2006-05-18 2006-05-18 駆動装置、露光装置及びデバイス製造方法 Pending JP2007312516A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006139465A JP2007312516A (ja) 2006-05-18 2006-05-18 駆動装置、露光装置及びデバイス製造方法
US11/746,797 US7508099B2 (en) 2006-05-18 2007-05-10 Driving apparatus, exposure apparatus, and device manufacturing method
TW096117076A TW200813643A (en) 2006-05-18 2007-05-14 Driving apparatus, exposure apparatus, and device manufacturing method
KR1020070047380A KR100872082B1 (ko) 2006-05-18 2007-05-16 구동장치, 노광 장치 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006139465A JP2007312516A (ja) 2006-05-18 2006-05-18 駆動装置、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2007312516A true JP2007312516A (ja) 2007-11-29
JP2007312516A5 JP2007312516A5 (enExample) 2009-07-02

Family

ID=38711360

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006139465A Pending JP2007312516A (ja) 2006-05-18 2006-05-18 駆動装置、露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US7508099B2 (enExample)
JP (1) JP2007312516A (enExample)
KR (1) KR100872082B1 (enExample)
TW (1) TW200813643A (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8823294B2 (en) 2007-06-27 2014-09-02 Brooks Automation, Inc. Commutation of an electromagnetic propulsion and guidance system
US9752615B2 (en) 2007-06-27 2017-09-05 Brooks Automation, Inc. Reduced-complexity self-bearing brushless DC motor
KR101660894B1 (ko) 2007-06-27 2016-10-10 브룩스 오토메이션 인코퍼레이티드 다차원 위치 센서
WO2009003195A1 (en) 2007-06-27 2008-12-31 Brooks Automation, Inc. Motor stator with lift capability and reduced cogging characteristics
US8283813B2 (en) 2007-06-27 2012-10-09 Brooks Automation, Inc. Robot drive with magnetic spindle bearings
WO2009003193A1 (en) * 2007-06-27 2008-12-31 Brooks Automation, Inc. Position feedback for self bearing motor
KR101825595B1 (ko) 2007-07-17 2018-02-05 브룩스 오토메이션 인코퍼레이티드 챔버 벽들에 일체화된 모터들을 갖는 기판 처리 장치
US8358039B2 (en) 2008-10-17 2013-01-22 Massachusetts Institute Of Technology High-scan rate positioner for scanned probe microscopy
NL2006714A (en) * 2010-06-07 2011-12-08 Asml Netherlands Bv Displacement device, lithographic apparatus and positioning method.
US8593016B2 (en) * 2010-12-03 2013-11-26 Sri International Levitated micro-manipulator system
NL2022467B1 (en) * 2019-01-28 2020-08-18 Prodrive Tech Bv Position sensor for long stroke linear permanent magnet motor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004254489A (ja) * 2002-12-27 2004-09-09 Canon Inc 位置決め装置、及びその位置決め装置を利用した露光装置
JP2005277030A (ja) * 2004-03-24 2005-10-06 Canon Inc ステージ装置および露光装置
JP2005327993A (ja) * 2004-05-17 2005-11-24 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
JP2005353969A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6228146A (ja) * 1985-07-26 1987-02-06 Hiroshi Teramachi リニアモ−タ付xyテ−ブル
DE19601018A1 (de) * 1995-01-27 1996-08-01 Zeiss Carl Fa Linear verstellbarer Präzisionstisch
JP3815750B2 (ja) 1995-10-09 2006-08-30 キヤノン株式会社 ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法
JP3155936B2 (ja) 1997-06-26 2001-04-16 キヤノン株式会社 リニアモータとステージ装置及びこれを用いた走査型露光装置やデバイス製造方法
JPH1198811A (ja) 1997-09-24 1999-04-09 Canon Inc リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法
JPH11287880A (ja) 1998-04-01 1999-10-19 Canon Inc ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JP3907357B2 (ja) 1998-11-12 2007-04-18 キヤノン株式会社 段差付きコイル製造方法
JP2001118773A (ja) * 1999-10-18 2001-04-27 Nikon Corp ステージ装置及び露光装置
JP2001230305A (ja) 2000-02-18 2001-08-24 Canon Inc 支持装置
JP4474020B2 (ja) * 2000-06-23 2010-06-02 キヤノン株式会社 移動装置及び露光装置
JP2003022960A (ja) 2001-07-09 2003-01-24 Canon Inc ステージ装置及びその駆動方法
EP1300932B1 (en) 2001-10-05 2013-12-18 Canon Kabushiki Kaisha Linear motor, stage apparatus, and exposure apparatus
JP3977086B2 (ja) 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP4323759B2 (ja) 2002-05-27 2009-09-02 キヤノン株式会社 露光装置およびデバイス製造方法
JP3849932B2 (ja) 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
US6841956B2 (en) * 2002-09-17 2005-01-11 Nikon Corporation Actuator to correct for off center-of-gravity line of force
JP2004172557A (ja) 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法
JP4194383B2 (ja) 2003-02-13 2008-12-10 キヤノン株式会社 リニアモータ
JP2005005393A (ja) 2003-06-10 2005-01-06 Canon Inc ステージ装置、露光装置、およびデバイス製造方法
JP2005142501A (ja) 2003-11-10 2005-06-02 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
JP2005253179A (ja) 2004-03-03 2005-09-15 Canon Inc 位置決め装置、露光装置およびデバイス製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004254489A (ja) * 2002-12-27 2004-09-09 Canon Inc 位置決め装置、及びその位置決め装置を利用した露光装置
JP2005277030A (ja) * 2004-03-24 2005-10-06 Canon Inc ステージ装置および露光装置
JP2005327993A (ja) * 2004-05-17 2005-11-24 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
JP2005353969A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置

Also Published As

Publication number Publication date
KR20070112001A (ko) 2007-11-22
KR100872082B1 (ko) 2008-12-05
US20070267920A1 (en) 2007-11-22
TW200813643A (en) 2008-03-16
US7508099B2 (en) 2009-03-24

Similar Documents

Publication Publication Date Title
JP4227452B2 (ja) 位置決め装置、及びその位置決め装置を利用した露光装置
KR100872082B1 (ko) 구동장치, 노광 장치 및 디바이스 제조 방법
US6414742B1 (en) Stage apparatus, and exposure apparatus and device manufacturing method using the same
JP4639517B2 (ja) ステージ装置、リソグラフィーシステム、位置決め方法、及びステージ装置の駆動方法
JPH11191585A (ja) ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法
US10261419B2 (en) Magnet array for moving magnet planar motor
US6870284B2 (en) Linear motor and stage apparatus, exposure apparatus, and device manufacturing method using the same
US20100090545A1 (en) Planar motor with wedge shaped magnets and diagonal magnetization directions
WO2000033318A1 (en) Stage device and method of manufacturing the same, and aligner and method of manufacturing the same
JP2002112526A (ja) 平面モータ、ステージ位置決めシステム、露光装置
JP4702958B2 (ja) 位置決め装置
US20040245861A1 (en) Linear motor, stage device having this linear motor, exposure device, and device manufacturing method
US20080012431A1 (en) Monolithic stage devices providing motion in six degrees of freedom
KR101380702B1 (ko) 평면 모터 및 평면 모터를 포함하는 리소그래피 장치
US7378764B2 (en) Positioning apparatus, exposure apparatus using thereof and device manufacturing method
JP2008228406A (ja) 平面モータ、位置決め装置、露光装置及びデバイス製造方法
JP4418710B2 (ja) ステージ装置
JP2006246570A (ja) リニアモータ及びリニアモータを利用した露光装置
CN115668719A (zh) 磁体组件、线圈组件、平面马达、定位装置和光刻设备
US20090290138A1 (en) Pulse motor, positioning apparatus, exposure apparatus, and device manufacturing method
TWI890046B (zh) 載台裝置、轉印裝置以及物品製造方法
TW202541133A (zh) 載台裝置、轉印裝置以及物品製造方法
JP2006034051A (ja) ステージ装置、露光装置及びデバイス製造方法
JP2009055780A (ja) 平面パルスモータ、露光装置及びデバイス製造方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090513

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090513

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110815

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110818

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20111209