TW200813643A - Driving apparatus, exposure apparatus, and device manufacturing method - Google Patents
Driving apparatus, exposure apparatus, and device manufacturing method Download PDFInfo
- Publication number
- TW200813643A TW200813643A TW096117076A TW96117076A TW200813643A TW 200813643 A TW200813643 A TW 200813643A TW 096117076 A TW096117076 A TW 096117076A TW 96117076 A TW96117076 A TW 96117076A TW 200813643 A TW200813643 A TW 200813643A
- Authority
- TW
- Taiwan
- Prior art keywords
- coil
- movable
- exposure
- region
- drive
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000005259 measurement Methods 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 30
- 238000003491 array Methods 0.000 claims description 12
- 238000012545 processing Methods 0.000 claims description 4
- 238000013208 measuring procedure Methods 0.000 claims description 2
- 230000004907 flux Effects 0.000 description 31
- 238000005339 levitation Methods 0.000 description 18
- 238000009826 distribution Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052770 Uranium Inorganic materials 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000009977 dual effect Effects 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- IJJWOSAXNHWBPR-HUBLWGQQSA-N 5-[(3as,4s,6ar)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]-n-(6-hydrazinyl-6-oxohexyl)pentanamide Chemical compound N1C(=O)N[C@@H]2[C@H](CCCCC(=O)NCCCCCC(=O)NN)SC[C@@H]21 IJJWOSAXNHWBPR-HUBLWGQQSA-N 0.000 description 1
- 208000029152 Small face Diseases 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000004091 panning Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Linear Motors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006139465A JP2007312516A (ja) | 2006-05-18 | 2006-05-18 | 駆動装置、露光装置及びデバイス製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200813643A true TW200813643A (en) | 2008-03-16 |
Family
ID=38711360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096117076A TW200813643A (en) | 2006-05-18 | 2007-05-14 | Driving apparatus, exposure apparatus, and device manufacturing method |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7508099B2 (enExample) |
| JP (1) | JP2007312516A (enExample) |
| KR (1) | KR100872082B1 (enExample) |
| TW (1) | TW200813643A (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5416104B2 (ja) * | 2007-06-27 | 2014-02-12 | ブルックス オートメーション インコーポレイテッド | セルフベアリングモータ用位置フィードバック |
| KR101496654B1 (ko) | 2007-06-27 | 2015-02-27 | 브룩스 오토메이션 인코퍼레이티드 | 리프트 능력 및 감소된 코깅 특성들을 가지는 전동기 고정자 |
| US8283813B2 (en) | 2007-06-27 | 2012-10-09 | Brooks Automation, Inc. | Robot drive with magnetic spindle bearings |
| KR101660894B1 (ko) | 2007-06-27 | 2016-10-10 | 브룩스 오토메이션 인코퍼레이티드 | 다차원 위치 센서 |
| US9752615B2 (en) | 2007-06-27 | 2017-09-05 | Brooks Automation, Inc. | Reduced-complexity self-bearing brushless DC motor |
| US8823294B2 (en) | 2007-06-27 | 2014-09-02 | Brooks Automation, Inc. | Commutation of an electromagnetic propulsion and guidance system |
| WO2009012396A2 (en) | 2007-07-17 | 2009-01-22 | Brooks Automation, Inc. | Substrate processing apparatus with motors integral to chamber walls |
| US8358039B2 (en) | 2008-10-17 | 2013-01-22 | Massachusetts Institute Of Technology | High-scan rate positioner for scanned probe microscopy |
| NL2006714A (en) * | 2010-06-07 | 2011-12-08 | Asml Netherlands Bv | Displacement device, lithographic apparatus and positioning method. |
| US8593016B2 (en) * | 2010-12-03 | 2013-11-26 | Sri International | Levitated micro-manipulator system |
| NL2022467B1 (en) * | 2019-01-28 | 2020-08-18 | Prodrive Tech Bv | Position sensor for long stroke linear permanent magnet motor |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6228146A (ja) * | 1985-07-26 | 1987-02-06 | Hiroshi Teramachi | リニアモ−タ付ｘｙテ−ブル |
| DE19601018A1 (de) * | 1995-01-27 | 1996-08-01 | Zeiss Carl Fa | Linear verstellbarer Präzisionstisch |
| JP3815750B2 (ja) * | 1995-10-09 | 2006-08-30 | キヤノン株式会社 | ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法 |
| JP3155936B2 (ja) | 1997-06-26 | 2001-04-16 | キヤノン株式会社 | リニアモータとステージ装置及びこれを用いた走査型露光装置やデバイス製造方法 |
| JPH1198811A (ja) * | 1997-09-24 | 1999-04-09 | Canon Inc | リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法 |
| JPH11287880A (ja) * | 1998-04-01 | 1999-10-19 | Canon Inc | ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法 |
| JP3907357B2 (ja) * | 1998-11-12 | 2007-04-18 | キヤノン株式会社 | 段差付きコイル製造方法 |
| JP2001118773A (ja) * | 1999-10-18 | 2001-04-27 | Nikon Corp | ステージ装置及び露光装置 |
| JP2001230305A (ja) * | 2000-02-18 | 2001-08-24 | Canon Inc | 支持装置 |
| JP4474020B2 (ja) * | 2000-06-23 | 2010-06-02 | キヤノン株式会社 | 移動装置及び露光装置 |
| JP2003022960A (ja) * | 2001-07-09 | 2003-01-24 | Canon Inc | ステージ装置及びその駆動方法 |
| EP1300932B1 (en) * | 2001-10-05 | 2013-12-18 | Canon Kabushiki Kaisha | Linear motor, stage apparatus, and exposure apparatus |
| JP3977086B2 (ja) * | 2002-01-18 | 2007-09-19 | キヤノン株式会社 | ステージシステム |
| JP4323759B2 (ja) * | 2002-05-27 | 2009-09-02 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP3849932B2 (ja) * | 2002-08-12 | 2006-11-22 | キヤノン株式会社 | 移動ステージ装置 |
| US6841956B2 (en) * | 2002-09-17 | 2005-01-11 | Nikon Corporation | Actuator to correct for off center-of-gravity line of force |
| JP2004172557A (ja) * | 2002-11-22 | 2004-06-17 | Canon Inc | ステージ装置及びその制御方法 |
| JP4227452B2 (ja) * | 2002-12-27 | 2009-02-18 | キヤノン株式会社 | 位置決め装置、及びその位置決め装置を利用した露光装置 |
| JP4194383B2 (ja) * | 2003-02-13 | 2008-12-10 | キヤノン株式会社 | リニアモータ |
| JP2005005393A (ja) * | 2003-06-10 | 2005-01-06 | Canon Inc | ステージ装置、露光装置、およびデバイス製造方法 |
| JP2005142501A (ja) * | 2003-11-10 | 2005-06-02 | Canon Inc | ステージ装置および露光装置ならびにデバイス製造方法 |
| JP2005253179A (ja) * | 2004-03-03 | 2005-09-15 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
| JP4418699B2 (ja) * | 2004-03-24 | 2010-02-17 | キヤノン株式会社 | 露光装置 |
| JP2005327993A (ja) * | 2004-05-17 | 2005-11-24 | Canon Inc | 位置決め装置、露光装置及びデバイス製造方法 |
| JP2005353969A (ja) * | 2004-06-14 | 2005-12-22 | Canon Inc | 露光装置 |
-
2006
- 2006-05-18 JP JP2006139465A patent/JP2007312516A/ja active Pending
-
2007
- 2007-05-10 US US11/746,797 patent/US7508099B2/en not_active Expired - Fee Related
- 2007-05-14 TW TW096117076A patent/TW200813643A/zh unknown
- 2007-05-16 KR KR1020070047380A patent/KR100872082B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007312516A (ja) | 2007-11-29 |
| KR20070112001A (ko) | 2007-11-22 |
| KR100872082B1 (ko) | 2008-12-05 |
| US7508099B2 (en) | 2009-03-24 |
| US20070267920A1 (en) | 2007-11-22 |
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