JP2007232930A - フォーカス合わせ装置及びフォーカス合わせ方法 - Google Patents

フォーカス合わせ装置及びフォーカス合わせ方法 Download PDF

Info

Publication number
JP2007232930A
JP2007232930A JP2006052995A JP2006052995A JP2007232930A JP 2007232930 A JP2007232930 A JP 2007232930A JP 2006052995 A JP2006052995 A JP 2006052995A JP 2006052995 A JP2006052995 A JP 2006052995A JP 2007232930 A JP2007232930 A JP 2007232930A
Authority
JP
Japan
Prior art keywords
focus
image
sensor
optical system
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006052995A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007232930A5 (enExample
Inventor
Hiroshi Inoue
広 井上
Tomohide Watanabe
智英 渡辺
Satoshi Endo
智 遠藤
Masami Ikeda
正己 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Nuflare Technology Inc
Original Assignee
Toshiba Corp
Nuflare Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Nuflare Technology Inc filed Critical Toshiba Corp
Priority to JP2006052995A priority Critical patent/JP2007232930A/ja
Priority to TW096102702A priority patent/TW200732811A/zh
Priority to KR1020070019298A priority patent/KR100878082B1/ko
Priority to US11/679,411 priority patent/US7394048B2/en
Publication of JP2007232930A publication Critical patent/JP2007232930A/ja
Priority to KR1020080101608A priority patent/KR20080097167A/ko
Publication of JP2007232930A5 publication Critical patent/JP2007232930A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B13/00—Viewfinders; Focusing aids for cameras; Means for focusing for cameras; Autofocus systems for cameras
    • G03B13/32—Means for focusing
    • G03B13/34—Power focusing
    • G03B13/36—Autofocus systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2006052995A 2006-02-28 2006-02-28 フォーカス合わせ装置及びフォーカス合わせ方法 Pending JP2007232930A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2006052995A JP2007232930A (ja) 2006-02-28 2006-02-28 フォーカス合わせ装置及びフォーカス合わせ方法
TW096102702A TW200732811A (en) 2006-02-28 2007-01-24 Focusing device, focusing method and a pattern inspecting apparatus
KR1020070019298A KR100878082B1 (ko) 2006-02-28 2007-02-27 패턴 검사 장치 및 패턴 검사 방법
US11/679,411 US7394048B2 (en) 2006-02-28 2007-02-27 Focusing device, focusing method and a pattern inspecting apparatus
KR1020080101608A KR20080097167A (ko) 2006-02-28 2008-10-16 패턴 검사 장치 및 패턴 검사 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006052995A JP2007232930A (ja) 2006-02-28 2006-02-28 フォーカス合わせ装置及びフォーカス合わせ方法

Publications (2)

Publication Number Publication Date
JP2007232930A true JP2007232930A (ja) 2007-09-13
JP2007232930A5 JP2007232930A5 (enExample) 2008-11-06

Family

ID=38443088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006052995A Pending JP2007232930A (ja) 2006-02-28 2006-02-28 フォーカス合わせ装置及びフォーカス合わせ方法

Country Status (4)

Country Link
US (1) US7394048B2 (enExample)
JP (1) JP2007232930A (enExample)
KR (2) KR100878082B1 (enExample)
TW (1) TW200732811A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9557277B2 (en) 2012-10-23 2017-01-31 Nuflare Technology, Inc. Inspection apparatus and inspection method

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5498044B2 (ja) * 2009-03-26 2014-05-21 株式会社東芝 自動焦点調節機構及び光学画像取得装置
US8488117B2 (en) * 2010-10-10 2013-07-16 Applied Materials Israel, Ltd. Inspection system and method for fast changes of focus
JP5923026B2 (ja) * 2012-10-31 2016-05-24 浜松ホトニクス株式会社 画像取得装置及び画像取得方法
JP6433888B2 (ja) * 2013-04-26 2018-12-05 浜松ホトニクス株式会社 画像取得装置、試料の合焦点情報を取得する方法及びシステム
US10495446B2 (en) * 2015-06-29 2019-12-03 Kla-Tencor Corporation Methods and apparatus for measuring height on a semiconductor wafer
CN115561255B (zh) * 2021-07-02 2025-07-15 深圳中科飞测科技股份有限公司 检测设备及检测方法、检测系统及存储介质

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0949965A (ja) * 1995-08-08 1997-02-18 Nikon Corp 焦点位置検出装置
JPH11215425A (ja) * 1998-01-26 1999-08-06 Nachi Fujikoshi Corp 自動焦点合わせ方法及びその装置
JP2005202092A (ja) * 2004-01-15 2005-07-28 Hitachi Kokusai Electric Inc 合焦点検出方法及びそれを用いた光学顕微鏡
JP2005338255A (ja) * 2004-05-25 2005-12-08 Olympus Corp オートフォーカス装置およびそれを用いた顕微鏡

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6026311A (ja) * 1983-07-22 1985-02-09 Nippon Kogaku Kk <Nikon> 暗視野顕微鏡用焦点検出装置
JPH11271597A (ja) 1998-03-25 1999-10-08 Nikon Corp 焦点位置検出装置
JP2007322482A (ja) * 2006-05-30 2007-12-13 Nuflare Technology Inc フォーカス合わせ装置、フォーカス合わせ方法及び検査装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0949965A (ja) * 1995-08-08 1997-02-18 Nikon Corp 焦点位置検出装置
JPH11215425A (ja) * 1998-01-26 1999-08-06 Nachi Fujikoshi Corp 自動焦点合わせ方法及びその装置
JP2005202092A (ja) * 2004-01-15 2005-07-28 Hitachi Kokusai Electric Inc 合焦点検出方法及びそれを用いた光学顕微鏡
JP2005338255A (ja) * 2004-05-25 2005-12-08 Olympus Corp オートフォーカス装置およびそれを用いた顕微鏡

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9557277B2 (en) 2012-10-23 2017-01-31 Nuflare Technology, Inc. Inspection apparatus and inspection method

Also Published As

Publication number Publication date
KR20070089611A (ko) 2007-08-31
KR100878082B1 (ko) 2009-01-13
KR20080097167A (ko) 2008-11-04
US20070200051A1 (en) 2007-08-30
TWI325996B (enExample) 2010-06-11
US7394048B2 (en) 2008-07-01
TW200732811A (en) 2007-09-01

Similar Documents

Publication Publication Date Title
CN107683400B (zh) 用于测量在半导体晶片上的高度的方法及设备
KR100878082B1 (ko) 패턴 검사 장치 및 패턴 검사 방법
JP4760564B2 (ja) パターン形状の欠陥検出方法及び検出装置
TWI528029B (zh) Focus position adjustment method and inspection method
US7514660B2 (en) Focusing apparatus, focusing method, and inspection apparatus
CN111819596B (zh) 组合模拟及光学显微术以确定检验模式的方法和系统
JP4664871B2 (ja) 自動焦点検出装置
JPH10267628A (ja) ３次元形状検出方法およびその装置並びに基板の製造方法
CN106772923A (zh) 基于倾斜狭缝的自动对焦方法和系统
WO2010113228A1 (ja) 検査装置及び検査方法
KR101122798B1 (ko) 포토마스크의 패턴 특성 검출 장치 및 포토마스크의 패턴 특성 검출 방법
JP2009293957A (ja) パターン欠陥検査装置及び検査方法
JPH0735964B2 (ja) 間隔測定装置
JP2007256273A (ja) 異物検査方法、および異物検査装置
KR102790734B1 (ko) 다중 수집 채널로부터의 정보의 결합에 의한 디자인 대 웨이퍼 이미지 상관 관계
JP2004144610A (ja) ウェハ欠陥検査装置
JP6732680B2 (ja) マップ作成方法、マスク検査方法およびマスク検査装置
JP2007232930A5 (enExample)
JP2017198607A (ja) パターン欠陥検査方法およびパターン欠陥検査装置
JP2010243815A (ja) 焦点検出機構及び焦点検出方法
JPH11264800A (ja) 検査装置
KR101846189B1 (ko) 자동 초점 조절 장치 및 그 방법
JP7079569B2 (ja) 検査方法
JP2010139419A (ja) 形状測定装置
JP2010114363A (ja) 偏光特性の計測方法、計測装置、露光装置及びデバイス製造方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080918

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080918

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20101224

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110104

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110307

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20110510

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110810

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20110928

A912 Re-examination (zenchi) completed and case transferred to appeal board

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20111118

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120820