JP2007158132A5 - - Google Patents

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Publication number
JP2007158132A5
JP2007158132A5 JP2005352727A JP2005352727A JP2007158132A5 JP 2007158132 A5 JP2007158132 A5 JP 2007158132A5 JP 2005352727 A JP2005352727 A JP 2005352727A JP 2005352727 A JP2005352727 A JP 2005352727A JP 2007158132 A5 JP2007158132 A5 JP 2007158132A5
Authority
JP
Japan
Prior art keywords
layer
compound semiconductor
group iii
iii nitride
nitride compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005352727A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007158132A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005352727A priority Critical patent/JP2007158132A/ja
Priority claimed from JP2005352727A external-priority patent/JP2007158132A/ja
Priority to DE102006035487A priority patent/DE102006035487A1/de
Priority to US11/633,623 priority patent/US20070141753A1/en
Publication of JP2007158132A publication Critical patent/JP2007158132A/ja
Publication of JP2007158132A5 publication Critical patent/JP2007158132A5/ja
Withdrawn legal-status Critical Current

Links

JP2005352727A 2005-06-12 2005-12-06 Ｉｉｉ族窒化物系化合物半導体素子及びその製造方法 Withdrawn JP2007158132A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005352727A JP2007158132A (ja) 2005-12-06 2005-12-06 Ｉｉｉ族窒化物系化合物半導体素子及びその製造方法
DE102006035487A DE102006035487A1 (de) 2005-12-06 2006-12-05 Gruppe III/Nitrid-basierte Verbindungshalbleitervorrichtung und dessen Herstellungsverfahren
US11/633,623 US20070141753A1 (en) 2005-06-12 2006-12-05 Group III nitride based compound semiconductor device and producing method for the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005352727A JP2007158132A (ja) 2005-12-06 2005-12-06 Ｉｉｉ族窒化物系化合物半導体素子及びその製造方法

Publications (2)

Publication Number Publication Date
JP2007158132A JP2007158132A (ja) 2007-06-21
JP2007158132A5 true JP2007158132A5 (enExample) 2008-05-15

Family

ID=38056178

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005352727A Withdrawn JP2007158132A (ja) 2005-06-12 2005-12-06 Ｉｉｉ族窒化物系化合物半導体素子及びその製造方法

Country Status (3)

Country Link
US (1) US20070141753A1 (enExample)
JP (1) JP2007158132A (enExample)
DE (1) DE102006035487A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007040295A1 (en) * 2005-10-04 2007-04-12 Seoul Opto Device Co., Ltd. (al, ga, in)n-based compound semiconductor and method of fabricating the same
KR101081193B1 (ko) 2009-10-15 2011-11-07 엘지이노텍 주식회사 반도체 발광소자 및 그 제조방법
DE102011011862A1 (de) * 2011-02-21 2012-08-23 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung einer Vielzahl optoelektronischer Halbleiterchips
KR101466832B1 (ko) * 2013-06-28 2014-11-28 코닝정밀소재 주식회사 유기발광소자
JP7345524B2 (ja) * 2021-07-30 2023-09-15 日機装株式会社 半導体発光素子および半導体発光素子の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10247747A (ja) * 1997-03-05 1998-09-14 Toshiba Corp 半導体発光素子およびその製造方法
US6071795A (en) * 1998-01-23 2000-06-06 The Regents Of The University Of California Separation of thin films from transparent substrates by selective optical processing
US6657300B2 (en) * 1998-06-05 2003-12-02 Lumileds Lighting U.S., Llc Formation of ohmic contacts in III-nitride light emitting devices
JP2000091636A (ja) * 1998-09-07 2000-03-31 Rohm Co Ltd 半導体発光素子の製法
DE60234330D1 (de) * 2001-04-12 2009-12-24 Nichia Corp Halbleiterelement aus galliumnitridzusammensetzung
US6995032B2 (en) * 2002-07-19 2006-02-07 Cree, Inc. Trench cut light emitting diodes and methods of fabricating same
KR100497890B1 (ko) * 2002-08-19 2005-06-29 엘지이노텍 주식회사 질화물 반도체 발광소자 및 그 제조방법
DE10245631B4 (de) * 2002-09-30 2022-01-20 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Halbleiterbauelement
JPWO2004042832A1 (ja) * 2002-11-06 2006-03-09 サンケン電気株式会社 半導体発光素子及びその製造方法
US7141828B2 (en) * 2003-03-19 2006-11-28 Gelcore, Llc Flip-chip light emitting diode with a thermally stable multiple layer reflective p-type contact
DE10351028B4 (de) * 2003-10-31 2005-09-08 Infineon Technologies Ag Halbleiter-Bauteil sowie dafür geeignetes Herstellungs-/Montageverfahren
US7008861B2 (en) * 2003-12-11 2006-03-07 Cree, Inc. Semiconductor substrate assemblies and methods for preparing and dicing the same
US20050167837A1 (en) * 2004-01-21 2005-08-04 International Business Machines Corporation Device with area array pads for test probing
KR100586955B1 (ko) * 2004-03-31 2006-06-07 삼성전기주식회사 질화물 반도체 발광소자의 제조방법
EP1749308A4 (en) * 2004-04-28 2011-12-28 Verticle Inc SEMICONDUCTOR COMPONENTS WITH VERTICAL STRUCTURE
CN100561758C (zh) * 2004-10-22 2009-11-18 首尔Opto仪器股份有限公司 氮化镓化合物半导体发光元件及其制造方法

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