JP2007131943A5 - - Google Patents
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- Publication number
- JP2007131943A5 JP2007131943A5 JP2006274848A JP2006274848A JP2007131943A5 JP 2007131943 A5 JP2007131943 A5 JP 2007131943A5 JP 2006274848 A JP2006274848 A JP 2006274848A JP 2006274848 A JP2006274848 A JP 2006274848A JP 2007131943 A5 JP2007131943 A5 JP 2007131943A5
- Authority
- JP
- Japan
- Prior art keywords
- yttrium oxide
- composite
- composite structure
- fine particles
- polycrystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 12
- 239000000443 aerosol Substances 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 4
- 239000010419 fine particle Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 239000000470 constituent Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims 5
- 239000004973 liquid crystal related substance Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006274848A JP5093745B2 (ja) | 2005-10-12 | 2006-10-06 | 複合構造物 |
| CN2006800375538A CN101283118B (zh) | 2005-10-12 | 2006-10-10 | 复合结构物 |
| PCT/JP2006/320203 WO2007043520A1 (ja) | 2005-10-12 | 2006-10-10 | 複合構造物 |
| KR1020087008410A KR100983952B1 (ko) | 2005-10-12 | 2006-10-10 | 복합구조물 |
| US12/083,065 US7897268B2 (en) | 2005-10-12 | 2006-10-10 | Composite structure |
| TW095137582A TWI315356B (en) | 2005-10-12 | 2006-10-12 | Composite structure body |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005298223 | 2005-10-12 | ||
| JP2005298223 | 2005-10-12 | ||
| JP2006274848A JP5093745B2 (ja) | 2005-10-12 | 2006-10-06 | 複合構造物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007131943A JP2007131943A (ja) | 2007-05-31 |
| JP2007131943A5 true JP2007131943A5 (OSRAM) | 2011-02-17 |
| JP5093745B2 JP5093745B2 (ja) | 2012-12-12 |
Family
ID=37942756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006274848A Expired - Fee Related JP5093745B2 (ja) | 2005-10-12 | 2006-10-06 | 複合構造物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7897268B2 (OSRAM) |
| JP (1) | JP5093745B2 (OSRAM) |
| KR (1) | KR100983952B1 (OSRAM) |
| CN (1) | CN101283118B (OSRAM) |
| TW (1) | TWI315356B (OSRAM) |
| WO (1) | WO2007043520A1 (OSRAM) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103348454B (zh) * | 2010-12-01 | 2016-04-06 | 株式会社东芝 | 等离子体蚀刻装置部件及其制造方法 |
| TW201334035A (zh) * | 2011-10-06 | 2013-08-16 | Greene Tweed Of Delaware | 抗電漿蝕刻膜，承載抗電漿蝕刻膜之物品及相關的方法 |
| JP6117195B2 (ja) * | 2012-05-22 | 2017-04-19 | 株式会社東芝 | プラズマ処理装置用部品およびプラズマ処理装置用部品の製造方法 |
| JP5656036B2 (ja) * | 2013-03-28 | 2015-01-21 | Toto株式会社 | 複合構造物 |
| JP5888458B2 (ja) * | 2014-06-26 | 2016-03-22 | Toto株式会社 | 耐プラズマ性部材及びその製造方法 |
| JP2016008352A (ja) * | 2014-06-26 | 2016-01-18 | Toto株式会社 | 耐プラズマ性部材 |
| JP6808168B2 (ja) * | 2015-12-24 | 2021-01-06 | Toto株式会社 | 耐プラズマ性部材 |
| US11047035B2 (en) | 2018-02-23 | 2021-06-29 | Applied Materials, Inc. | Protective yttria coating for semiconductor equipment parts |
| CN113260732A (zh) * | 2018-12-05 | 2021-08-13 | 京瓷株式会社 | 等离子体处理装置用构件和具备它的等离子体处理装置 |
| KR102612290B1 (ko) * | 2019-04-26 | 2023-12-11 | 교세라 가부시키가이샤 | 플라스마 처리 장치용 부재 및 플라스마 처리 장치 |
| KR102490570B1 (ko) * | 2022-05-23 | 2023-01-20 | 주식회사 코미코 | 희토류 금속 화합물 분말의 열처리 공정을 이용하여 저 명도의 내플라즈마성 코팅막의 제조방법 및 이에 의해 형성된 내플라즈마성 코팅막 |
| TW202409316A (zh) * | 2022-08-19 | 2024-03-01 | 日商Ａｇｃ股份有限公司 | 釔質保護膜及其製造方法以及構件 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3655402B2 (ja) | 1996-09-03 | 2005-06-02 | 日本放送協会 | 光メモリ材料およびその製造方法 |
| JP3265481B2 (ja) * | 1999-04-23 | 2002-03-11 | 独立行政法人産業技術総合研究所 | 脆性材料超微粒子成形体の低温成形法 |
| KR100724070B1 (ko) * | 1999-10-12 | 2007-06-04 | 도토기키 가부시키가이샤 | 복합 구조물 및 그의 제조방법과 제조장치 |
| JP4205912B2 (ja) | 2002-08-13 | 2009-01-07 | 時田シーブイディーシステムズ株式会社 | 透明な酸化イットリウム膜とその製造方法 |
| JP4006535B2 (ja) | 2003-11-25 | 2007-11-14 | 独立行政法人産業技術総合研究所 | 半導体または液晶製造装置部材およびその製造方法 |
| JP2005217349A (ja) * | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
| JP2005217350A (ja) | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
| JP3864958B2 (ja) * | 2004-02-02 | 2007-01-10 | 東陶機器株式会社 | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
| TW200724506A (en) * | 2005-10-07 | 2007-07-01 | Ohara Kk | Inorganic composition |
| JP2007109827A (ja) * | 2005-10-12 | 2007-04-26 | Toto Ltd | 静電チャック |
| JP2007109828A (ja) * | 2005-10-12 | 2007-04-26 | Toto Ltd | 耐プラズマ性部材 |
-
2006
- 2006-10-06 JP JP2006274848A patent/JP5093745B2/ja not_active Expired - Fee Related
- 2006-10-10 US US12/083,065 patent/US7897268B2/en not_active Expired - Fee Related
- 2006-10-10 WO PCT/JP2006/320203 patent/WO2007043520A1/ja not_active Ceased
- 2006-10-10 CN CN2006800375538A patent/CN101283118B/zh not_active Expired - Fee Related
- 2006-10-10 KR KR1020087008410A patent/KR100983952B1/ko not_active Expired - Fee Related
- 2006-10-12 TW TW095137582A patent/TWI315356B/zh not_active IP Right Cessation
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