TWI315356B - Composite structure body - Google Patents

Composite structure body

Info

Publication number
TWI315356B
TWI315356B TW095137582A TW95137582A TWI315356B TW I315356 B TWI315356 B TW I315356B TW 095137582 A TW095137582 A TW 095137582A TW 95137582 A TW95137582 A TW 95137582A TW I315356 B TWI315356 B TW I315356B
Authority
TW
Taiwan
Prior art keywords
composite structure
structure body
composite
Prior art date
Application number
TW095137582A
Other languages
English (en)
Chinese (zh)
Other versions
TW200734485A (en
Inventor
Junichi Iwasawa
Ryoichi Nishimizu
Hironori Hatono
Hiroaki Ashizawa
Original Assignee
Toto Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd filed Critical Toto Ltd
Publication of TW200734485A publication Critical patent/TW200734485A/zh
Application granted granted Critical
Publication of TWI315356B publication Critical patent/TWI315356B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Compositions Of Oxide Ceramics (AREA)
TW095137582A 2005-10-12 2006-10-12 Composite structure body TWI315356B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005298223 2005-10-12
JP2006274848A JP5093745B2 (ja) 2005-10-12 2006-10-06 複合構造物

Publications (2)

Publication Number Publication Date
TW200734485A TW200734485A (en) 2007-09-16
TWI315356B true TWI315356B (en) 2009-10-01

Family

ID=37942756

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095137582A TWI315356B (en) 2005-10-12 2006-10-12 Composite structure body

Country Status (6)

Country Link
US (1) US7897268B2 (OSRAM)
JP (1) JP5093745B2 (OSRAM)
KR (1) KR100983952B1 (OSRAM)
CN (1) CN101283118B (OSRAM)
TW (1) TWI315356B (OSRAM)
WO (1) WO2007043520A1 (OSRAM)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6084464B2 (ja) * 2010-12-01 2017-02-22 株式会社東芝 プラズマエッチング装置用部品およびプラズマエッチング装置用部品の製造方法
TW201334035A (zh) * 2011-10-06 2013-08-16 Greene Tweed Of Delaware 抗電漿蝕刻膜，承載抗電漿蝕刻膜之物品及相關的方法
US9988702B2 (en) * 2012-05-22 2018-06-05 Kabushiki Kaisha Toshiba Component for plasma processing apparatus and method for manufacturing component for plasma processing apparatus
JP5656036B2 (ja) * 2013-03-28 2015-01-21 Toto株式会社 複合構造物
JP5888458B2 (ja) * 2014-06-26 2016-03-22 Toto株式会社 耐プラズマ性部材及びその製造方法
JP2016008352A (ja) * 2014-06-26 2016-01-18 Toto株式会社 耐プラズマ性部材
JP6808168B2 (ja) * 2015-12-24 2021-01-06 Toto株式会社 耐プラズマ性部材
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts
CN113260732A (zh) * 2018-12-05 2021-08-13 京瓷株式会社 等离子体处理装置用构件和具备它的等离子体处理装置
CN113728124B (zh) * 2019-04-26 2023-12-05 京瓷株式会社 等离子体处理装置用构件及等离子体处理装置
KR102490570B1 (ko) * 2022-05-23 2023-01-20 주식회사 코미코 희토류 금속 화합물 분말의 열처리 공정을 이용하여 저 명도의 내플라즈마성 코팅막의 제조방법 및 이에 의해 형성된 내플라즈마성 코팅막
TW202409316A (zh) * 2022-08-19 2024-03-01 日商Ａｇｃ股份有限公司 釔質保護膜及其製造方法以及構件

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3655402B2 (ja) 1996-09-03 2005-06-02 日本放送協会 光メモリ材料およびその製造方法
JP3265481B2 (ja) * 1999-04-23 2002-03-11 独立行政法人産業技術総合研究所 脆性材料超微粒子成形体の低温成形法
CN1243848C (zh) * 1999-10-12 2006-03-01 东陶机器株式会社 复合构造物及其制作方法和制作装置
JP4205912B2 (ja) 2002-08-13 2009-01-07 時田シーブイディーシステムズ株式会社 透明な酸化イットリウム膜とその製造方法
JP4006535B2 (ja) 2003-11-25 2007-11-14 独立行政法人産業技術総合研究所 半導体または液晶製造装置部材およびその製造方法
JP3864958B2 (ja) * 2004-02-02 2007-01-10 東陶機器株式会社 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
JP2005217349A (ja) 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
JP2005217350A (ja) 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
TW200724506A (en) * 2005-10-07 2007-07-01 Ohara Kk Inorganic composition
JP2007109828A (ja) * 2005-10-12 2007-04-26 Toto Ltd 耐プラズマ性部材
JP2007109827A (ja) * 2005-10-12 2007-04-26 Toto Ltd 静電チャック

Also Published As

Publication number Publication date
US20090233126A1 (en) 2009-09-17
US7897268B2 (en) 2011-03-01
WO2007043520A1 (ja) 2007-04-19
KR20080044335A (ko) 2008-05-20
JP5093745B2 (ja) 2012-12-12
CN101283118B (zh) 2011-04-20
CN101283118A (zh) 2008-10-08
KR100983952B1 (ko) 2010-09-27
JP2007131943A (ja) 2007-05-31
TW200734485A (en) 2007-09-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees