JP2007123513A - Precise substrate storing container - Google Patents

Precise substrate storing container Download PDF

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JP2007123513A
JP2007123513A JP2005313063A JP2005313063A JP2007123513A JP 2007123513 A JP2007123513 A JP 2007123513A JP 2005313063 A JP2005313063 A JP 2005313063A JP 2005313063 A JP2005313063 A JP 2005313063A JP 2007123513 A JP2007123513 A JP 2007123513A
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light
container body
precision substrate
container
lid
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JP4519056B2 (en
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Yoshiaki Fujimori
義昭 藤森
Toshiyuki Kamata
俊行 鎌田
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a precise substrate storing container capable of detecting a container body etc., regardless of whether a precise substrate is stored or not, dispensing with the necessity to allow the most part of the container body etc., to be opaque, and keeping the function of a sensor for detecting the precise substrate. <P>SOLUTION: The precise substrate storing container includes the transparent container body 1 for storing by arrayal the plurality of precise substrates composed of a semiconductor wafer, and a freely attachable/detachable lid body for opening/closing the open front of the container body 1 so as to be sealable. Light shielding areas 40 are respectively formed on the bottom surface and ceiling of the container body 1, by which the light transmittance of light 31 radiated to a light receiving element 33 from the light emitting element 32 of a photoelectric sensor 30 arranged in the division chamber 21 of a work device 20 is attenuated by not less than 10%. Since the light shielding areas 40 for shielding the light 31 are molded on the bottom surface and ceiling of the container body 1, there is no trouble in the detection of the photoelectric sensor 30 even when the container body 1 is transparent. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、半導体ウェーハ、ガラス基板、フォトマスク、アルミディスク等からなる精密基板を収納する精密基板収納容器に関するものである。   The present invention relates to a precision substrate storage container for storing a precision substrate made of a semiconductor wafer, a glass substrate, a photomask, an aluminum disk or the like.

従来の精密基板収納容器は、図示しないが、半導体ウェーハからなる複数枚の精密基板を整列収納する容器本体と、この容器本体の開口した正面をシール可能に開閉する着脱自在の蓋体と、この蓋体に設けられ、外部からの操作により容器本体の開口した正面に嵌合した蓋体を施錠あるいは解錠する施錠機構とを備えて構成され、半導体の生産工程で精密基板の出し入れに使用されている(特許文献1、2、3参照)。   Although not shown, a conventional precision substrate storage container includes a container main body for aligning and storing a plurality of precision substrates made of semiconductor wafers, a detachable lid for opening and closing the open front of the container main body, It is equipped with a locking mechanism that locks or unlocks the lid fitted to the open front of the container body by an external operation, and is used for loading and unloading precision substrates in the semiconductor production process (See Patent Documents 1, 2, and 3).

精密基板収納容器の容器本体は、蓋体を取り外すことなく精密基板を視認できるよう光透過性を有する透明の樹脂を使用して成形され、背面壁には、精密基板の後部を支持するリヤリテーナが上下方向に複数並設されており、両側壁には、精密基板を支持する左右一対のティースが上下方向に並設されている。また、蓋体の内面には、精密基板の前部を支持するフロントリテーナが上下方向に複数並設されている。   The container body of the precision substrate storage container is molded using a transparent resin having light transmittance so that the precision substrate can be seen without removing the lid, and a rear retainer for supporting the rear portion of the precision substrate is provided on the back wall. A plurality of teeth are arranged in the vertical direction, and a pair of left and right teeth supporting the precision substrate are arranged in the vertical direction on both side walls. Further, a plurality of front retainers for supporting the front portion of the precision substrate are arranged in the vertical direction on the inner surface of the lid.

半導体の生産工程は、例えばアニーリング等の熱処理工程、CVDによる成膜工程、レジスト塗布工程、エッチング工程、露光工程等があげられ、これらの工程には、精密基板収納容器の容器本体を搭載する各種の加工装置が使用されている。この加工装置には、発光部と受光部との間の光線が容器本体に遮蔽されることにより、精密基板収納容器の存在の有無を検知する光電センサ(透過フォトセンサ又は透過型センサともいう)が装着され、この光電センサで精密基板収納容器の存在が検知されることにより、精密基板収納容器が次のステップに投入される。   The semiconductor production process includes, for example, a heat treatment process such as annealing, a film formation process by CVD, a resist coating process, an etching process, an exposure process, and the like. In these processes, various types of mounting a container body of a precision substrate storage container are provided. The processing equipment is used. In this processing apparatus, a photoelectric sensor (also referred to as a transmissive photosensor or a transmissive sensor) that detects the presence or absence of a precision substrate storage container by shielding the light beam between the light emitting section and the light receiving section by the container body. When the presence of the precision substrate storage container is detected by this photoelectric sensor, the precision substrate storage container is put into the next step.

光電センサは、例えば波長670〜680nmの発光ダイオード等が使用され、間隔をおいて相対向する発光部と受光部とが加工装置の上下方向、水平方向、あるいは斜め方向に適宜設置されている。
特開2004‐342844号公報 特開2000‐159288号公報 特開2003‐174081号公報
For example, a light-emitting diode having a wavelength of 670 to 680 nm is used as the photoelectric sensor, and a light-emitting portion and a light-receiving portion facing each other at an interval are appropriately installed in the vertical direction, horizontal direction, or diagonal direction of the processing apparatus.
JP 2004-342844 A JP 2000-159288 A Japanese Patent Laid-Open No. 2003-174081

従来における精密基板収納容器は、以上のように容器本体が透明の樹脂を使用して成形されているので、光線の遮蔽を利用する光電センサの検知に支障を来たし、特に容器本体に精密基板が収納されていない場合には、検知できないことがあった。
係る問題を解消するには、容器本体に不透明領域を形成すれば良いが、そうすると、光電センサの設置箇所が加工装置の上下方向、水平方向、あるいは斜め方向と一定しないので、容器本体の大部分を不透明に形成しなければならないという大きな問題が新たに生じることとなる。さらに、容器本体の大部分を不透明に形成すると、精密基板の有無を検出する別工場のセンサが機能しなくなったり、検出が困難になるおそれがある。
In the conventional precision substrate storage container, since the container body is formed using a transparent resin as described above, it interferes with the detection of the photoelectric sensor utilizing light shielding, and in particular, the precision substrate is provided on the container body. If it is not stored, it may not be detected.
In order to solve such a problem, it is sufficient to form an opaque region in the container body. However, since the installation location of the photoelectric sensor is not constant in the vertical direction, horizontal direction, or diagonal direction of the processing apparatus, most of the container body A new problem arises in that it must be formed opaque. Furthermore, if most of the container body is made opaque, a sensor in another factory that detects the presence or absence of a precision substrate may not function or may be difficult to detect.

本発明は上記に鑑みなされたもので、精密基板の収納の有無にかかわらず容器本体等を検知することができ、しかも、容器本体等の大部分を不透明にする必要がなく、精密基板を検出するセンサの機能を維持することのできる精密基板収納容器を提供することを目的としている。   The present invention has been made in view of the above, and can detect a container body or the like regardless of whether or not a precision substrate is stored. Moreover, it is not necessary to make most of the container body opaque and detect a precision substrate. An object of the present invention is to provide a precision substrate storage container capable of maintaining the function of a sensor.

本発明においては上記課題を解決するため、精密基板を収納する容器本体と、この容器本体の開口部を開閉する蓋体とを備え、これら容器本体と蓋体のうち少なくとも容器本体に光透過性を付与し、センサの発光部と受光部との間の光線が容器本体あるいは蓋体の一部に遮蔽されることにより、存在の有無が検知されるものであって、
容器本体あるいは蓋体に、センサの発光部から照射された光線の光線透過率を10%以上減衰させる遮光領域を設けたことを特徴としている。
In order to solve the above-described problems, the present invention includes a container main body that stores a precision substrate and a lid that opens and closes the opening of the container main body, and at least the container main body of the container main body and the lid is light transmissive. The presence or absence of presence is detected by shielding the light beam between the light emitting part and the light receiving part of the sensor by a part of the container body or the lid,
The container main body or the lid is provided with a light shielding region that attenuates the light transmittance of light emitted from the light emitting part of the sensor by 10% or more.

なお、遮光領域を、表面粗さがRy(最大高さ)35〜150μmのしぼ加工(texture、texturing)面とすることができる。
また、遮光領域を、表面粗さがRy35〜70μmのしぼ加工面とすることができる。
また、遮光領域を、レーザマーキングにより形成することができる。
また、遮光領域を、凹凸面を有するマーキングを施すことにより形成することもできる。
さらに、遮光領域を、容器本体あるいは蓋体の一部に遮光性の基材を貼り着けることにより形成することができる。
The light-shielding region can be a textured or textured surface having a surface roughness of Ry (maximum height) of 35 to 150 μm.
Further, the light shielding region can be a grained surface having a surface roughness of Ry 35 to 70 μm.
Further, the light shielding region can be formed by laser marking.
Further, the light shielding region can be formed by applying markings having an uneven surface.
Furthermore, the light shielding region can be formed by attaching a light shielding base material to a part of the container body or the lid.

ここで、特許請求の範囲における精密基板には、単数複数の半導体ウェーハ(200mmウェーハ、300mmウェーハ、450mmウェーハ等)、ガラス基板、フォトマスク、アルミディスク等が含まれる。この精密基板は、容器本体に直接収納されても良いが、固定キャリアに搭載された状態で間接的に収納されても良い。また、蓋体は、透明の有無や施錠機構内蔵の有無を特に問うものではない。遮光領域は、容器本体の任意の箇所に形成可能な手段により円形、楕円形、三角形、矩形、多角形等に形成されることが好ましい。   Here, the precision substrate in the claims includes a plurality of semiconductor wafers (200 mm wafer, 300 mm wafer, 450 mm wafer, etc.), a glass substrate, a photomask, an aluminum disk, and the like. The precision substrate may be stored directly in the container body, but may be stored indirectly in a state of being mounted on a fixed carrier. Further, the lid does not particularly ask whether it is transparent or not and has a built-in locking mechanism. The light shielding region is preferably formed in a circular shape, an elliptical shape, a triangular shape, a rectangular shape, a polygonal shape, or the like by means that can be formed at an arbitrary location on the container body.

遮光領域は、しぼ加工面の他、超音波や加熱転写等により形成される光散乱面、着色樹脂、タルク、マイカ、ガラス繊維、炭素繊維等でも良い。この遮光領域は、センサの光線を適切に減衰、遮蔽できるのを条件に、容器本体の底面、天井、正面、背面、側壁等に単数複数形成することができる。基材には、各種のシートやフィルムが含まれる。さらに、精密基板収納容器は、300mmウェーハ対応のフロントオープンボックスタイプ、FOUPタイプ、FOSBタイプでも良いし、200mmウェーハ等対応のトップオープンボックスタイプでも良い。   The light-shielding region may be a light-scattering surface, a light scattering surface formed by ultrasonic waves or heat transfer, colored resin, talc, mica, glass fiber, carbon fiber, or the like. A plurality of the light shielding regions can be formed on the bottom surface, the ceiling, the front surface, the back surface, the side walls, and the like of the container body on condition that the light rays of the sensor can be appropriately attenuated and shielded. The base material includes various sheets and films. Further, the precision substrate storage container may be a front open box type corresponding to a 300 mm wafer, a FOUP type or a FOSB type, or a top open box type corresponding to a 200 mm wafer or the like.

本発明によれば、精密基板収納容器の容器本体及び又は蓋体に形成された遮光領域がセンサから照射された光線を減衰するので、容器本体及び又は蓋体が透明でも、センサの検知に支障を来たすのを防ぐことができる。   According to the present invention, since the light shielding region formed on the container body and / or lid of the precision substrate storage container attenuates the light beam emitted from the sensor, the detection of the sensor is hindered even if the container body and / or lid is transparent. Can be prevented.

本発明によれば、精密基板の収納の有無にかかわらず、容器本体等を検知することができるという効果がある。また、容器本体等の大部分を不透明にする必要がないので、精密基板を検出するセンサの機能を維持することができる。
また、遮光領域を、金型を使用した表面粗さRy35〜150μmのしぼ加工面とすれば、遮光領域を備えた複雑な形状の容器本体あるいは蓋体を容易、かつ大量に製造することができる。
According to the present invention, there is an effect that a container body or the like can be detected regardless of whether a precision substrate is stored. In addition, since it is not necessary to make most of the container body and the like opaque, it is possible to maintain the function of the sensor that detects the precision substrate.
Moreover, if the light-shielding area is a grained surface having a surface roughness Ry of 35 to 150 μm using a mold, a complicatedly shaped container body or lid body having the light-shielding area can be manufactured easily and in large quantities. .

また、遮光領域をレーザマーキングにより形成するようにすれば、版下等が不要になるので、コストダウンを図ることができ、作業効率、生産性、精密性等を向上させることができる。
また、遮光領域を、凹凸面を有するマーキングを超音波加工機器等を使用して形成するようにすれば、汚水や煙等が出ないので、無公害加工を実現することができ、遮光領域を美しく形成することも可能となる。
さらに、遮光領域を、容器本体あるいは蓋体の一部に遮光性の基材を貼り着けることにより形成するようにすれば、ユーザの仕様に素早く対応したり、製造方法の多様化を図ることも可能となる。
In addition, if the light shielding region is formed by laser marking, it is not necessary to use a plate or the like, so that the cost can be reduced, and work efficiency, productivity, precision, and the like can be improved.
Moreover, if the marking having the uneven surface is formed by using an ultrasonic processing device or the like, since no sewage or smoke is generated, pollution-free processing can be realized, and the light shielding region can be reduced. It is possible to form beautifully.
Furthermore, if the light-shielding region is formed by attaching a light-shielding base material to a part of the container body or lid, it is possible to respond quickly to user specifications and diversify the manufacturing method. It becomes possible.

以下、図面を参照して本発明の好ましい実施の形態を説明すると、本実施形態における精密基板収納容器は、図1や図2に示すように、図示しない半導体ウェーハからなる複数枚の精密基板を整列収納する透明の容器本体1と、この容器本体1の開口した正面をシール可能に開閉する着脱自在の蓋体10と、この蓋体10に内蔵され、外部からの操作により容器本体1の開口した正面に嵌合した蓋体10を施錠あるいは解錠する施錠機構とを備え、容器本体1の底面と天井とに、加工装置20に設置された光電センサ30の発光素子32から受光素子33に照射された光線31の光線透過率を20%以上減衰させる略矩形の遮光領域40をそれぞれ形成するようにしている。   Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. As shown in FIG. 1 and FIG. 2, a precision substrate storage container in this embodiment includes a plurality of precision substrates made of semiconductor wafers (not shown). A transparent container body 1 to be arranged and stored, a detachable lid body 10 that opens and closes the front face of the container body 1 that can be sealed, and an opening of the container body 1 that is built in the lid body 10 and is operated from the outside. And a locking mechanism that locks or unlocks the lid 10 fitted to the front surface. The light receiving element 33 from the light emitting element 32 of the photoelectric sensor 30 installed in the processing apparatus 20 is provided on the bottom surface and the ceiling of the container body 1. A substantially rectangular light shielding region 40 is formed to attenuate the light transmittance of the irradiated light beam 31 by 20% or more.

精密基板は、例えば口径300mm(12インチ)の半導体ウェーハ、具体的にはシリコンウェーハからなり、回路の形成される表面が鏡面に形成されており、周縁部に位置決めや整列を容易にするオリフラやノッチが選択的に形成される。   The precision substrate is made of, for example, a semiconductor wafer having a diameter of 300 mm (12 inches), specifically a silicon wafer, and the surface on which the circuit is formed is formed in a mirror surface. A notch is selectively formed.

容器本体1と蓋体10とは、蓋体10を取り外すことなく精密基板を外部から視認できるよう透明性、耐衝撃性、耐熱性が良好なポリカーボネートを用いて透明に成形されることが好ましいが、光学特性や透明性に優れるシクロオレフィンポリマーやポリエーテルイミド等により透明に成形されても良い。   The container body 1 and the lid body 10 are preferably molded transparently using polycarbonate having good transparency, impact resistance and heat resistance so that the precision substrate can be visually recognized from the outside without removing the lid body 10. Alternatively, it may be formed transparently with a cycloolefin polymer, polyetherimide, or the like having excellent optical properties and transparency.

容器本体1は、正面の開口した光透過性のフロントオープンボックス構造に射出成形され、底面の前後部や後部には、三角形を描くよう複数の位置決め具2が間隔をおいて配設されており、天井の中央部には、搬送ロボットに把持されるフランジ3が着脱自在に装着される。   The container body 1 is injection-molded into a light-transmitting front open box structure with an opening on the front, and a plurality of positioning tools 2 are arranged at intervals on the front and rear and rear portions of the bottom surface so as to draw a triangle. The flange 3 gripped by the transport robot is detachably attached to the center of the ceiling.

容器本体1の開口した正面は、幅方向外側に張り出されて蓋体嵌合用のリム部4に膨出成形され、このリム部4の内周面上下には、左右一対の係止穴が間隔をおいて穿孔される。容器本体1の背面壁の内面には、精密基板の後部周縁を水平に支持する複数のリヤリテーナが上下方向に並設され、両側壁の内面には、精密基板を水平に支持する左右一対のティースが上下方向に並設される。   The open front of the container body 1 is projected outward in the width direction and bulged to the rim portion 4 for fitting the lid, and a pair of left and right locking holes are formed on the upper and lower inner peripheral surfaces of the rim portion 4. Perforated at intervals. On the inner surface of the back wall of the container body 1, a plurality of rear retainers that horizontally support the rear peripheral edge of the precision substrate are arranged in parallel in the vertical direction, and a pair of left and right teeth that horizontally support the precision substrate are disposed on the inner surfaces of both side walls. Are juxtaposed in the vertical direction.

蓋体10は、容器本体1のリム部4に嵌合する断面皿形で略矩形の筐体と、この筐体の開口した正面を覆う略矩形のカバープレート11とを備え、筐体の周壁外面には、リム部4の内周面に圧接してシールするエンドレスのシールガスケットが嵌合されており、筐体の背面には、精密基板の前部周縁を水平に支持する弾性のフロントリテーナが上下方向に複数並設される。   The lid 10 includes a substantially rectangular casing having a dish-shaped cross section that fits into the rim portion 4 of the container body 1 and a substantially rectangular cover plate 11 that covers the front surface of the casing that is open. An endless seal gasket that presses and seals against the inner peripheral surface of the rim portion 4 is fitted to the outer surface, and an elastic front retainer that horizontally supports the front peripheral edge of the precision substrate on the rear surface of the housing. Are arranged in parallel in the vertical direction.

施錠機構は、図示しないが、例えば蓋体10の筐体正面に軸支され、外部からの操作で回転する左右一対の回転プレートと、各回転プレートに回転可能に連結軸支され、回転プレートの回転に基づき筐体の上下方向に進退動する上下一対の進退動プレートと、各進退動プレートの先端部に回転可能に連結軸支され、筐体周壁の貫通口を介しリム部4の係止穴に干渉する出没可能な複数の係止爪とを備え、SEMI規格E62に準拠して構成される。   Although not shown, for example, the locking mechanism is pivotally supported on the front surface of the housing of the lid 10, for example, a pair of left and right rotating plates that are rotated by an external operation, and rotatably coupled to each rotating plate. A pair of upper and lower advancing and retracting plates that move forward and backward in the vertical direction of the casing based on the rotation, and a pivotally connected pivotally supported at the tip of each of the advancing and retracting plates, and locking the rim portion 4 through a through-hole in the peripheral wall of the casing It has a plurality of retractable locking claws that interfere with the hole, and is configured in accordance with SEMI standard E62.

加工装置20は、例えば熱処理工程、成膜工程、レジスト塗布工程、エッチング工程、露光工程等で精密基板に各種の加工を施す装置からなり、搬送エリアとクリーンエリアとを区画する区画室21を備えており、この区画室21の立面壁22には、容器本体1に対して蓋体10を着脱するオープナが装着されるとともに、容器本体1の開口した正面と連通する矩形の貫通口23が形成される(図2参照)。区画室21の立面壁22からは容器本体1を水平に搭載する略板形のステージ24が搬送エリア方向に水平に突出し、このステージ24上には、容器本体1の複数の位置決め具2と嵌合する複数の位置決めピン25が立設される。   The processing device 20 includes a device that performs various processings on a precision substrate in, for example, a heat treatment process, a film forming process, a resist coating process, an etching process, an exposure process, and the like, and includes a partition chamber 21 that partitions a transfer area and a clean area. An opener for attaching / detaching the lid body 10 to / from the container body 1 is attached to the vertical wall 22 of the compartment 21, and a rectangular through-hole 23 communicating with the open front of the container body 1 is provided. Formed (see FIG. 2). A substantially plate-shaped stage 24 that horizontally mounts the container body 1 protrudes horizontally from the elevation wall 22 of the compartment 21 in the direction of the transfer area. On the stage 24, a plurality of positioning tools 2 of the container body 1 and A plurality of positioning pins 25 to be fitted are erected.

光電センサ30は、図2に示すように、光線31を照射する発光ダイオード等の発光素子32と、この発光素子32からの光線31を受光する受光素子33とを斜め上下方向に間隔をおいた対向状態に備え、加工装置20の区画室21に設置される。この光電センサ30には、赤外線タイプや光ファイバタイプ等があるが、いずれのタイプでも良い。   As shown in FIG. 2, the photoelectric sensor 30 has a light emitting element 32 such as a light emitting diode that irradiates a light beam 31 and a light receiving element 33 that receives the light beam 31 from the light emitting element 32 in an oblique vertical direction. It is installed in the compartment 21 of the processing apparatus 20 in preparation for the facing state. The photoelectric sensor 30 includes an infrared type and an optical fiber type, and any type may be used.

発光素子32は、加工装置20の立面壁22に斜め下向きに埋没設置され、容器本体1の天井前部から底面後部を介し受光素子33に光線31を照射する。受光素子33は、加工装置20のステージ24に斜め上向きに埋没設置され、ステージ24に容器本体1が搭載された場合にその底面後部付近に近接する。   The light emitting element 32 is installed obliquely downward on the vertical wall 22 of the processing apparatus 20 and irradiates the light receiving element 33 with the light beam 31 from the front of the ceiling of the container body 1 through the rear of the bottom. The light receiving element 33 is embedded in the stage 24 of the processing apparatus 20 obliquely upward, and when the container main body 1 is mounted on the stage 24, the light receiving element 33 is close to the vicinity of the rear portion of the bottom surface.

複数の遮光領域40は、図1や図2に示すように、例えば表面粗さがRy(最大高さ(基準長さ毎の最低谷底から最大山頂までの高さ))35〜150μmのしぼ加工面からなり、容器本体1の成形時にその天井前部と底面後部とにそれぞれ部分的に一体成形されており、光電センサ30の発光素子32から照射された光線31の光線透過率を10%以上、好ましくは20%以上、特に検知の安定化の観点から30%以上減衰させ、光電センサ30の検知を確実化するよう機能する。   As shown in FIG. 1 and FIG. 2, the plurality of light shielding regions 40 have a surface roughness of, for example, Ry (maximum height (the height from the lowest valley bottom to the highest mountain peak for each reference length)) of 35 to 150 μm. The container body 1 is partly integrally formed with the front part of the ceiling and the rear part of the bottom surface when the container body 1 is formed. The light transmittance of the light beam 31 emitted from the light emitting element 32 of the photoelectric sensor 30 is 10% or more. Preferably, it is attenuated by 20% or more, particularly 30% or more from the viewpoint of stabilization of detection, and functions to ensure detection of the photoelectric sensor 30.

遮光領域40の表面粗さがRy35〜150μmの範囲なのは、35未満の場合には、光電センサ30の光線31を十分に低減することができず、精密基板収納容器の検知に支障を来たすおそれがあるからである。逆に、150μmを超える場合には、金型からの離型時に損傷したり、離型が困難になり、しかも、パーティクルが付着しやすくなり、洗浄後の乾燥処理に時間を要するからである。   The surface roughness of the light shielding region 40 is in the range of Ry35 to 150 μm. If the surface roughness is less than 35, the light beam 31 of the photoelectric sensor 30 cannot be sufficiently reduced, and the detection of the precision substrate storage container may be hindered. Because there is. On the other hand, when the thickness exceeds 150 μm, it is damaged at the time of releasing from the mold, or it becomes difficult to release, and particles are likely to adhere, and it takes time for the drying process after cleaning.

なお、表面粗さは、例えば(株)ミツトヨ製の測定機(商品名:サーフテスト501)を使用してJIS B0601‐1994に準じ測定することができる。また、透過率は、(株)コニカミノルタ製の分光測色計を使用してJIS K7105に準じ測定することができる。   The surface roughness can be measured according to JIS B0601-1994, for example, using a measuring machine (trade name: Surf Test 501) manufactured by Mitutoyo Corporation. The transmittance can be measured according to JIS K7105 using a spectrocolorimeter manufactured by Konica Minolta.

遮光領域40は、容器本体1用の金型に凹凸加工された微細なしぼ地により転写形成される。この遮光領域40の形成範囲は、予め判明している光電センサ30の光線31のスポット径や種類、配置状態、検出限界に応じて適宜設定されることが好ましいが、区画室21のステージ24に搭載されたときの寸法差を考慮し、受光素子33の検出範囲に安全率(例えば1.5)をかけた大きさ・範囲が最適である。   The light-shielding region 40 is transferred and formed by a fine embossed surface that has been concavo-convex processed on the mold for the container body 1. The formation range of the light shielding region 40 is preferably set as appropriate according to the spot diameter, type, arrangement state, and detection limit of the light beam 31 of the photoelectric sensor 30 that has been previously determined. Considering the dimensional difference when mounted, the size / range obtained by multiplying the detection range of the light receiving element 33 by a safety factor (for example, 1.5) is optimal.

上記構成において、加工装置20のステージ24に精密基板収納容器の容器本体1がセットされると、光電センサ30の発光素子32と受光素子33との間に容器本体1が介在するが、この際、光線31が容器本体1の遮光領域40に遮蔽されたり、低減されるので、精密基板収納容器の存在の有無が明確に検知される。   In the above configuration, when the container body 1 of the precision substrate storage container is set on the stage 24 of the processing apparatus 20, the container body 1 is interposed between the light emitting element 32 and the light receiving element 33 of the photoelectric sensor 30. Since the light beam 31 is shielded or reduced by the light shielding region 40 of the container body 1, the presence or absence of the precision substrate storage container is clearly detected.

上記構成によれば、容器本体1の底面と天井とに、光線31を遮蔽する遮光領域40を部分的に成形するので、容器本体1が透明でも、光電センサ30の検知に支障を来たすことが全くない。また、精密基板の収納の有無にかかわらず、精密基板収納容器を確実に検知することができる。また、容器本体1の大部分を不透明に形成する必要もなく、精密基板の有無を検出する別工場のセンサの機能障害等をきわめて有効に防止することができる。さらに、容器本体1を射出成形する金型に加工されたしぼ地により遮光領域40を形成するので、生産性、品質安定性、応用性等の著しい向上が期待できる。   According to the said structure, since the light-shielding area | region 40 which shields the light ray 31 is partially shape | molded in the bottom face and ceiling of the container main body 1, even if the container main body 1 is transparent, it may interfere with the detection of the photoelectric sensor 30. Not at all. In addition, the precision substrate storage container can be reliably detected regardless of whether the precision substrate is stored. Further, it is not necessary to make most of the container body 1 opaque, and it is possible to effectively prevent the functional failure of a sensor in another factory that detects the presence or absence of a precision substrate. Furthermore, since the light-shielding region 40 is formed by a texture formed into a mold for injection-molding the container body 1, significant improvements in productivity, quality stability, applicability, and the like can be expected.

なお、遮光領域40のしぼ加工面は、容器本体1と蓋体10における内壁面と外壁面の一方に設ければ、遮光効果が得られるが、外壁面側である発光側に設けることが好ましい。また、相対向する内壁面と外壁面とにしぼ加工をそれぞれ施せば、より大きな効果を得ることができる。   In addition, if the surface of the light shielding area 40 is provided on one of the inner wall surface and the outer wall surface of the container main body 1 and the lid body 10, a light blocking effect can be obtained, but it is preferable to provide the surface on the light emitting side which is the outer wall surface side. . Further, if the inner wall surface and the outer wall surface that face each other are subjected to the bobbing process, a greater effect can be obtained.

次に、図3ないし図6は本発明の第2の実施形態を示すもので、この場合には、容器本体1の両側壁下部に、相対向する遮光領域40をレーザマーキング装置50のレーザマーキングによりそれぞれ矩形に形成し、間隔をおいて左右水平方向に対向配置された光電センサ30の光線透過率を10%以上、好ましくは20%以上、検知の安定化の観点から30%以上減衰させるようにしている。   Next, FIGS. 3 to 6 show a second embodiment of the present invention. In this case, opposite light shielding regions 40 are formed at the lower portions of both side walls of the container body 1. The light transmittance of the photoelectric sensors 30 that are respectively formed in a rectangular shape and are opposed to each other in the horizontal direction at an interval is attenuated by 10% or more, preferably 20% or more, and 30% or more from the viewpoint of stabilization of detection. I have to.

遮光領域40は、容器本体1の表面がレーザマーキングにより粗されることで形成されるが、この形成の際、バーコード(図6参照)41、数値、ロゴ、模様等が適宜形成される。その他の部分については、上記実施形態と同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、ユーザの仕様に迅速に対応したり、製造方法の多様化が期待できる他、印字のための版下等が不要なので、コストダウンを図ることができ、しかも、作業効率、生産性、精密性の著しい向上が可能になるのは明らかである。
The light shielding region 40 is formed by roughening the surface of the container body 1 by laser marking. At the time of this formation, a bar code (see FIG. 6) 41, a numerical value, a logo, a pattern, and the like are appropriately formed. The other parts are the same as those in the above embodiment, and the description thereof is omitted.
In this embodiment, the same effect as the above embodiment can be expected, and it is possible to respond quickly to user specifications and diversify the manufacturing method. In addition, there is no need for a composition for printing, so the cost is reduced. Obviously, it is possible to significantly improve work efficiency, productivity, and precision.

次に、図7は本発明の第3の実施形態を示すもので、この場合には、超音波による転写治具51や熱溶着機等を使用して凹凸面を有するマーキングを施すことにより、容器本体1の一部に遮光領域40を部分的に形成するようにしている。
遮光領域40は凹凸面を有するが、この凹凸面は、光電センサ30の光線31を乱反射させる各種の形状、例えば連続した三角錐模様や四角錐模様等の形状とされる。その他の部分については、上記実施形態と同様であるので説明を省略する。
Next, FIG. 7 shows a third embodiment of the present invention. In this case, by applying a marking having a concavo-convex surface using an ultrasonic transfer jig 51 or a thermal welding machine, A light shielding region 40 is partially formed in a part of the container body 1.
The light shielding region 40 has an uneven surface, and the uneven surface has various shapes that diffusely reflect the light beam 31 of the photoelectric sensor 30, for example, a continuous triangular pyramid pattern or a quadrangular pyramid pattern. The other parts are the same as those in the above embodiment, and the description thereof is omitted.

本実施形態においても上記実施形態と同様の作用効果が期待でき、ユーザの仕様に迅速に対応したり、製造方法の多様化が期待できる。また、超音波による転写治具51を使用すれば、汚水や煙が出ないので、無公害加工を実現することができ、しかも、遮光領域40を美しく形成したり、高精度化を図ることができるのは明らかである。   In the present embodiment, the same effects as those in the above-described embodiment can be expected, and it is possible to respond quickly to user specifications and to diversify the manufacturing method. Further, if the transfer jig 51 using ultrasonic waves is used, no sewage or smoke is generated, so that pollution-free processing can be realized, and the light-shielding region 40 can be formed beautifully or the accuracy can be improved. Obviously you can.

次に、図8は本発明の第4の実施形態を示すもので、この場合には、遮光領域40を、容器本体1の一部に遮光性を有する別体の基材42を貼着することにより形成するようにしている。   Next, FIG. 8 shows a fourth embodiment of the present invention. In this case, a light shielding region 40 is attached to a part of the container body 1 and a separate base material 42 having light shielding properties is attached. It is made to form by.

遮光性の基材42は、例えば光電センサ30の光線31を遮蔽するシート、フィルム、紙、ラベル等からなり、着色やロゴの有無を特に問うものではない。このような基材42は、粘着層43を利用して容器本体1に部分的に直接粘着されたり、超音波溶着機や熱溶着機等により容器本体1の任意の箇所に設けられる。その他の部分については、上記実施形態と同様であるので説明を省略する。
本実施形態においても上記実施形態と同様の作用効果が期待でき、しかも、ユーザの仕様に迅速に対応したり、製造方法の多様化が期待できるのは明らかである。
The light-shielding base material 42 is made of, for example, a sheet, a film, paper, a label, or the like that shields the light beam 31 of the photoelectric sensor 30 and does not particularly ask for coloring or logos. Such a base material 42 is partially adhered directly to the container main body 1 using the adhesive layer 43, or is provided at an arbitrary position of the container main body 1 by an ultrasonic welding machine, a heat welding machine or the like. The other parts are the same as those in the above embodiment, and the description thereof is omitted.
In the present embodiment, it is obvious that the same operational effects as those of the above embodiment can be expected, and that it is possible to respond quickly to user specifications and to diversify the manufacturing method.

なお、上記実施形態では蓋体10に施錠機構を設けたが、容器本体1と蓋体10とに複数の係止部材を配設し、施錠機構を省略しても良い。また、施錠機構の進退動プレートと係止爪とを一体化しても良い。また、上記実施形態では遮光領域40を、容器本体1用の金型に加工されたしぼ地により転写形成したが、金型を入れ子構造にしたり、しぼ地を有しない金型と交換可能なしぼ地を有する金型とを用意し、必要に応じて交換するようにしても良い。   In the above-described embodiment, the locking mechanism is provided on the lid body 10, but a plurality of locking members may be provided on the container body 1 and the lid body 10, and the locking mechanism may be omitted. Further, the advance / retreat plate of the locking mechanism and the locking claw may be integrated. Further, in the above embodiment, the light shielding region 40 is transferred and formed by the crease processed into the mold for the container body 1. However, the proof can be replaced with a mold having a nested structure or having no crease. A mold having a ground may be prepared and replaced as necessary.

また、遮光領域40を、容器本体1用の金型に加工されたしぼ地により転写形成するのではなく、エッチング法やサンドブラスト法により後加工したり、粘着シートに所定の粗さのしぼを形成し、この粘着シートを容器本体1の任意の箇所に粘着しても良い。こうすれば、金型に何ら加工を施す必要がなく、しかも、ユーザの仕様に対応する迅速な対応が大いに期待できる。   In addition, the shading area 40 is not transferred and formed by a crease processed into a mold for the container body 1, but is post-processed by an etching method or a sand blast method, or a squeeze having a predetermined roughness is formed on an adhesive sheet. And you may adhere this adhesive sheet to the arbitrary locations of the container main body 1. FIG. In this way, there is no need to perform any processing on the mold, and a quick response corresponding to the user's specifications can be greatly expected.

また、容器本体1用の金型に、遮光領域40用の紙や基材42をインサートして容器本体1と遮光領域40を一体成形することも可能である。また、遮光領域40を最初に形成し、その後、遮光領域40以外の領域をインサート成形したり、二色成形して容器本体1を形成することも可能である。また、容器本体1と蓋体10とに、光電センサ30の発光素子32から照射された光線の光線透過率を10%以上減衰させる遮光領域40をそれぞれ設けることも可能である。   It is also possible to insert the paper for the light shielding region 40 and the base material 42 into the mold for the container main body 1 so that the container main body 1 and the light shielding region 40 are integrally formed. It is also possible to form the container body 1 by first forming the light-shielding region 40 and then insert-molding regions other than the light-shielding region 40 or two-color molding. Moreover, it is also possible to provide each of the container body 1 and the lid 10 with a light shielding region 40 that attenuates the light transmittance of the light emitted from the light emitting element 32 of the photoelectric sensor 30 by 10% or more.

また、上記実施形態では容器本体1に遮光領域40を形成したが、何らこれに限定されるものではなく、蓋体10に遮光領域40を形成することもできる。また、遮光領域40を、光電センサ30の発光素子32から発光される光線31の波長領域を吸収可能な材料により形成することもできる。さらに、容器本体1と蓋体10の遮光領域40を、光電センサ30の発光素子32から発光される光線31の波長領域を吸収可能な材料によりそれぞれ形成することもできる。   In the above embodiment, the light shielding region 40 is formed in the container body 1, but the invention is not limited to this, and the light shielding region 40 can be formed in the lid 10. The light shielding region 40 can also be formed of a material that can absorb the wavelength region of the light beam 31 emitted from the light emitting element 32 of the photoelectric sensor 30. Furthermore, the light shielding region 40 of the container body 1 and the lid 10 can be formed of a material that can absorb the wavelength region of the light beam 31 emitted from the light emitting element 32 of the photoelectric sensor 30.

本発明に係る精密基板収納容器の実施形態を示す斜視説明図である。It is a perspective explanatory view showing an embodiment of a precision substrate storage container concerning the present invention. 本発明に係る精密基板収納容器の実施形態を示す側面説明図である。It is side explanatory drawing which shows embodiment of the precision substrate storage container which concerns on this invention. 本発明に係る精密基板収納容器の第2の実施形態を示す斜視説明図である。It is perspective explanatory drawing which shows 2nd Embodiment of the precision substrate storage container which concerns on this invention. 本発明に係る精密基板収納容器の第2の実施形態を示す背面説明図である。It is back surface explanatory drawing which shows 2nd Embodiment of the precision substrate storage container which concerns on this invention. 本発明に係る精密基板収納容器の第2の実施形態におけるレーザマーキング装置を示す説明図である。It is explanatory drawing which shows the laser marking apparatus in 2nd Embodiment of the precision substrate storage container which concerns on this invention. 本発明に係る精密基板収納容器の第2の実施形態におけるバーコード付きの遮光領域を示す説明図である。It is explanatory drawing which shows the light-shielding area | region with a barcode in 2nd Embodiment of the precision substrate storage container which concerns on this invention. 本発明に係る精密基板収納容器の第3の実施形態を示す説明図である。It is explanatory drawing which shows 3rd Embodiment of the precision substrate storage container which concerns on this invention. 本発明に係る精密基板収納容器の第4の実施形態を示す説明図である。It is explanatory drawing which shows 4th Embodiment of the precision substrate storage container which concerns on this invention.

符号の説明Explanation of symbols

1 容器本体
4 リム部
10 蓋体
20 加工装置
21 区画室
24 ステージ
30 光電センサ(センサ)
31 光線
32 発光素子(発光部)
33 受光素子(受光部)
40 遮光領域
41 バーコード
42 基材
43 粘着層
DESCRIPTION OF SYMBOLS 1 Container body 4 Rim part 10 Lid 20 Processing apparatus 21 Compartment room 24 Stage 30 Photoelectric sensor (sensor)
31 Light 32 Light emitting element (light emitting part)
33 Light receiving element (light receiving part)
40 light shielding area 41 bar code 42 base material 43 adhesive layer

Claims (5)

精密基板を収納する容器本体と、この容器本体の開口部を開閉する蓋体とを備え、これら容器本体と蓋体のうち少なくとも容器本体に光透過性を付与し、センサの発光部と受光部との間の光線が容器本体あるいは蓋体の一部に遮蔽されることにより、存在の有無が検知される精密基板収納容器であって、
容器本体あるいは蓋体に、センサの発光部から照射された光線の光線透過率を10%以上減衰させる遮光領域を設けたことを特徴とする精密基板収納容器。
A container main body for storing the precision substrate; and a lid for opening and closing the opening of the container main body. The light emitting unit and the light receiving unit of the sensor are provided to provide light transparency to at least the container main body of the container main body and the lid. Is a precision substrate storage container in which the presence or absence of presence is detected by shielding the light beam between and a part of the container body or the lid,
A precision substrate storage container, wherein a light shielding region for attenuating light transmittance of light emitted from a light emitting part of a sensor by 10% or more is provided in a container main body or a lid.
遮光領域を、表面粗さがRy35〜150μmのしぼ加工面とした請求項1記載の精密基板収納容器。   The precision substrate storage container according to claim 1, wherein the light-shielding area is a grained surface having a surface roughness of Ry 35 to 150 μm. 遮光領域を、レーザマーキングにより形成した請求項1記載の精密基板収納容器。   The precision substrate storage container according to claim 1, wherein the light shielding region is formed by laser marking. 遮光領域を、凹凸面を有するマーキングを施すことにより形成した請求項1記載の精密基板収納容器。 The precision substrate storage container according to claim 1, wherein the light shielding region is formed by applying markings having an uneven surface. 遮光領域を、容器本体あるいは蓋体の一部に遮光性の基材を貼り着けることにより形成した請求項1記載の精密基板収納容器。

2. The precision substrate storage container according to claim 1, wherein the light shielding region is formed by attaching a light shielding base material to a part of the container main body or the lid.

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