JP2004342844A - Precise substrate storing container - Google Patents

Precise substrate storing container Download PDF

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Publication number
JP2004342844A
JP2004342844A JP2003137654A JP2003137654A JP2004342844A JP 2004342844 A JP2004342844 A JP 2004342844A JP 2003137654 A JP2003137654 A JP 2003137654A JP 2003137654 A JP2003137654 A JP 2003137654A JP 2004342844 A JP2004342844 A JP 2004342844A
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main body
container body
container
container main
precision substrate
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JP2003137654A
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Japanese (ja)
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JP4282369B2 (en
Inventor
Masato Hosoi
正人 細井
Toshiyuki Kamata
俊行 鎌田
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a precise substrate storing container in which liquid is prevented from remaining in a different component, drying work from being delayed, residual liquid from intruding into a container main body and contamination from being expanded, and operability is not deteriorated. <P>SOLUTION: The container is provided with: a transparent container main body 1 arraying and storing semiconductor wafers, a lid body opening/closing the container main body 1; a plurality of fitting parts 30 and 30A arranged on exposed upper and lower faces of the container main body 1, a robotic handle 40 which is freely attachably/detachably engaged with the fitting part 30 on the upper face of the container main body; and a bottom plate which is freely attachably/detachably engaged with the fitting part on the lower surface of the container main body. A crimp 70 whose average surface roughness is 10a to 100a is formed in regions where cleaning liquid tends to remain in a plurality of the fitting parts 30 and 30A. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は、シリコンやガラスからなる半導体ウェーハやマスクガラス等の精密基板の収納、輸送、保管、加工等に使用される精密基板収納容器に関するものである。
【0002】
【従来の技術】
近年、半導体業界では生産量をより一層向上させるため、口径300mm以上の大口径のシリコンウェーハやガラスウェーハからなる精密基板が使用され始めている。この大口径の精密基板は、縦横いずれに支持しても自重で撓んでしまうので、破損しないよう精密基板収納容器に収納して安全に取り扱うことが求められる。
【0003】
この種の精密基板収納容器は、図示しないが、複数枚の精密基板を整列収納するフロントオープンボックスタイプの容器本体と、この容器本体の開口した正面を開閉する蓋体と、これら容器本体と蓋体との間に介在されてシールを形成するエンドレスのシールガスケットとから構成されている(特許文献1参照)。このような構成の精密基板収納容器は、使用に際しては、超純水やイソピルアルコール等からなる専用の洗浄液で洗浄され、表面の汚れが除去された後に精密基板が収納されて搬送や保管等に用いられる。
【0004】
ところで、精密基板収納容器の容器本体には、自動搬送、精密基板の識別、手動操作の便宜を図るため、別部品としてロボティックハンドル、ボトムプレート、一対のマニュアルハンドルが装着される。このため、容器本体の露出した表面には取付部が、別部品には被取付部がそれぞれ形成され、これら取付部と被取付部とが相互に嵌合することにより、ロボティックハンドル、ボトムプレート、一対のマニュアルハンドルが装着される。取付部と被取付部とは、例えば複数のL字形やU字形の係止片等を並べ備えた構造に成形されたり、あるいは一方が開口し、他方が閉塞した袋小路構造に成形される。
【0005】
【特許文献1】
特開2000−159288号公報
【0006】
【発明が解決しようとする課題】
従来の精密基板収納容器は、以上のように別部品に被取付部が単に形成されている関係上、洗浄して乾燥させる場合には、別部品の被取付部に洗浄液の水滴が残存して乾燥作業を遅延化させたり、あるいは残存した水滴が容器本体の内部に浸入して汚染を拡大させるという問題がある。
このような問題を解消するには、容器本体から別部品を取り外して個々に洗浄すれば良いが、そうすると、別部品の着脱という余分な作業が必要不可欠となり、作業性や生産性の悪化を招くこととなる。さらに、取付部や被取付部が袋小路等の複雑な構造で水切れ性の悪い場合、期待するほどの効果を得ることができない。
【0007】
本発明は、上記に鑑みなされたもので、別部品に液体が残存して乾燥作業を遅延させたり、あるいは残存した液体が容器本体に浸入して汚染を拡大させるおそれがなく、しかも、作業性等の悪化を招くことのない精密基板収納容器を提供することを目的としている。
【0008】
【課題を解決するための手段】
本発明においては、上記課題を達成するため、精密基板を収納する容器本体に別部品を取り付けるものであって、
容器本体及び又は別部品の液体の残存しやすい領域に、しぼを形成したことを特徴としている。
なお、容器本体の表面に設けられる取付部と、別部品に形成されて容器本体の取付部に取り付けられる被取付部と、容器本体の取付部及び又は別部品の被取付部の液体の残存しやすい領域に形成されるしぼとを含んでなることが好ましい。
また、容器本体の取付部付近にしぼを形成してその平均表面粗さを10a〜100aとすることが好ましい。
【0009】
ここで特許請求の範囲における精密基板には、少なくとも電気、電子、半導体の分野で使用される6インチや8インチの半導体ウェーハ(シリコンウェーハ等)、マスクガラス、液晶セル、石英ガラス、マスク基板等の基板が含まれ、単数複数を特に問わない。容器本体には、少なくとも正面の開口したフロントオープンボックス、上下面や前後面の開口したオープンボックスやキャリア等が含まれる。この容器本体には、必要に応じて蓋体を取り付けたり、帯電処理を施すことができる。また、別部品としては、少なくともロボティックハンドル、ボトムプレート、単数複数のマニュアルハンドル、容器本体の側部下方に着脱自在に取り付けられる単数複数のサイドレール等があげられる。
【0010】
取付部や被取付部は、例えば単数複数のC字形、J字形、L字形、U字形、V字形の係止片等を備えた形状、あり溝付きの嵌め合わせ形状、あるいは挟み込み形状等に形成される。これらは、袋小路構造でも良いし、そうでなくても良い。取付部は、容器本体の露出した上下前後左右面に適宜設けられる。しぼ(texture)とは、しぼ模様ともいい、成形品の袋小路の表面、平坦な表面、窪んだ表面等にデザイン模様として付けられる皮、梨地、岩目、幾何学模様、木目、布目、凹凸等の模様をいう。このしぼは、取付部やその付近の液体の残存しやすい領域、被取付部やその付近の液体の残存しやすい領域に形成される。さらに、精密基板収納容器は、少なくとも半導体の製造に使用されるキャリア、工程間搬送キャリア(FOUP)、出荷用のFOSBとして利用することができる。
【0011】
本発明によれば、容器本体と別部品の洗浄液の溜まりやすい領域に、撥水機能のしぼを形成するので、洗浄液の溜まりやすい領域が洗浄液に濡れにくく、洗浄液がはじかれることとなり、洗浄後の乾燥作業時に別部品等に洗浄液が溜まるのを抑制することができる。したがって、乾燥時間を短縮し、残った洗浄液が容器本体内に浸入して汚染を拡大させるのを防ぐことができる。
【0012】
【発明の実施の形態】
以下、図面を参照して本発明の好ましい実施形態を説明すると、本実施形態における精密基板収納容器は、図1ないし図7に示すように、口径300mmの半導体ウェーハを収納する透視可能な透明な容器本体1と、この容器本体1を開閉する蓋体10と、これら容器本体1と蓋体10との間に介在されてシールを形成する枠形のシールガスケット20と、容器本体1の露出した上下面にそれぞれ配設される複数の取付部30・30Aと、容器本体上面の取付部30に着脱自在に嵌合されるロボティックハンドル40と、容器本体下面の取付部30Aに着脱自在に嵌合されるボトムプレート50とを備え、複数の取付部30・30Aにおける洗浄液の残存しやすい表面領域に、所定の粗さのしぼ70をそれぞれ形成するようにしている。
【0013】
容器本体1は、図1に示すように、軽量性や成形性等に優れるポリカーボネート、シクロオレフィンポリマー、ポリエーテルイミド等の合成樹脂を使用して正面のみ開口したフロントオープンボックスタイプに射出成形され、図示しない複数枚(例えば、13枚、25枚、26枚)の半導体ウェーハを上下方向に所定のピッチで整列収納するよう機能する。この容器本体1は、変形しないよう十分な強度、剛性、寸法安定性が確保され、AGV(Auto Guided Vehiole)からなる自動搬送装置の正常な動作を保障する。
【0014】
容器本体1の内部両側には、相対向する支持ユニット2がそれぞれ対設され、この一対の支持ユニット2の対向面には、複数の支持リブ3が所定のピッチで上下方向にそれぞれ並設されており、相対する複数の支持リブ3に半導体ウェーハの側部周縁が水平に支持される。また、容器本体1の正面周縁は外方向に徐々に拡大してフランジ4を形成し、容器本体1の外部両側には、フランジ4の後方近傍に位置する被係止部5がそれぞれ突設されるとともに、掴持操作用のマニュアルハンドル6がそれぞれ着脱自在に装着される。各マニュアルハンドル6は、例えばL字形やU字形等に形成され、係合爪と係合溝、あるいは凹凸構造等を用いて容器本体1の外部側面における取付部に被取付部を介して装着される。
【0015】
容器本体1の下面(底面)の前部両側と後部中央とには図2に示すように、図示しない加工装置の位置決めピンと嵌合する位置決め具7がそれぞれ一体的、あるいは着脱自在の別体として配設され、この複数の位置決め具7が精密基板収納容器を加工装置に位置決めし、この状態で精密基板収納容器から加工装置に半導体ウェーハがローディングされたり、アンローディングされることとなる。各位置決め具7は、耐磨耗性等に優れるポリプロピレン、ポリカーボネート、ポリブチレンテレフタレート、ポリエーテルエーテルケトン、ポリエーテルイミド等を使用して平面略小判形に成形され、下方に向かうにしたがい徐々に広がる断面略逆V字形の溝が切り欠かれる。
【0016】
ここで加工装置とは、精密基板収納容器を位置決めして蓋体10を自動的に外したり、位置決めされた精密基板収納容器から半導体ウェーハをローディングし、別の工程内容器に移し替える装置、あるいは蓋体10が取り外された精密基板収納容器から半導体ウェーハをローディングし、半導体ウェーハに酸化膜形成、フォトレジスト塗布、露光、エッチング、洗浄、薄膜形成等の各種処理を行う装置に半導体ウェーハを供給する装置をいう。
【0017】
蓋体10は、図1に示すように、容器本体1の開口した正面に対応する嵌合可能な略矩形に形成され、容器本体1の開口を着脱自在に開閉するよう機能する。この蓋体10の内面(容器本体1の背面に対向する面)には、縦長のフロントリテーナ11が着脱自在に装着され、このフロントリテーナ11には、複数の支持リブが所定のピッチで上下方向に並設されており、この複数の支持リブに半導体ウェーハの前部周縁が水平に支持される。
【0018】
蓋体10の周縁部にはシールガスケット20が突起や溝等を介して着脱自在に嵌合され、このシールガスケット20が容器本体正面の内周部に圧接されることによりシール機能を発揮する。このシールガスケット20は、例えばポリオレフィン系やポリエステル系の各種熱可塑性エラストマー、フッ素ゴム、シリコーンゴム等を用いて成形される。好ましくは、半導体ウェーハを汚染させる有機成分の発生が少なく、JISのK6301Aの測定方法による硬度が80°以下となる材料を用いて成形される。また、蓋体10の左右両側部には、U字形の切り欠きを備えた係止片13がそれぞれ回転可能に軸支され、各係止片13の切り欠きが容器本体1の被係止部5に嵌合係止することにより、蓋体10が容器本体1の開口を閉鎖して被覆する。
【0019】
なお、本実施形態では単に蓋体10を示すが、何らこれに限定されるものではない。例えば、蓋体10に、外部からの操作で動作するラッチ機構を内蔵し、蓋体10の装着時にラッチ機構の複数の係止爪を蓋体10の周縁部からそれぞれ突出させ、各係止爪を容器本体正面の内周面上下に穿孔した複数の係止穴に嵌入係止させ、容器本体1の正面を覆う蓋体10を固定するようにしても良い。
【0020】
取付部30は、図3に示すように、容器本体1の露出した上面中央付近に平面略逆U字形に形成される。この取付部30は、容器本体1の上面に間隔をおいて対設される一対のガイドレール31を備え、この一対のガイドレール31のフロント側間に、ストッパ機能を有する突き当たり壁32が一体形成される。一対のガイドレール31は、図3や図4に示すように、リア側からフロント側に向かうにしたがい徐々に幅が狭まるよう内側に向けて傾斜配置され、各ガイドレール31が断面逆L字形に形成される。このような構造の取付部30は、一対のガイドレール31間のリア側から嵌入されるロボティックハンドル40をフロント側にスライドさせ、突き当たり壁32にロボティックハンドル40を当接させて位置決め固定する。
【0021】
取付部30Aは、図6や図7に示すように、容器本体1の露出した下面の後部両側に形成される。この取付部30Aは、容器本体1の下面に間隔をおいて対設される一対の保持レール33を備え、各保持レール33がL字形に形成されており、各保持レール33のリア側が開口形成されるとともに、フロント側が閉塞形成される。このような構造の取付部30Aは、一対の保持レール33間のリア側から嵌入されるボトムプレート50をフロント側にスライドさせ、位置決め固定する。
【0022】
ロボティックハンドル40は、図4に示すように、図示しない天井搬送機に把持される平面矩形の把持板41と、断面L字形に形成されて把持板41の裏面両側部からそれぞれ伸長形成される一対の脚42とから断面略π字の別部品として成形され、被取付部である各脚42の自由端部がガイドレール31の屈曲辺内に嵌合される。
【0023】
ボトムプレート50は、図5に示すように、識別領域である容器本体1の下面後方に近接対向するベース板51と、このベース板51の後端部に立設されて容器本体1の背面の一部(識別領域)に対向する壁板59と、ベース板51と壁板59のいずれかに保持機構を介し選択的に支持されてRFIDシステムの応答器(図示せず)を嵌合収容するホルダ60とから別部品として構成される。このボトムプレート50は、ポリプロピレン、ポリカーボネート、ポリブチレンテレフタレート等を用いて成形される。
【0024】
ボトムプレート50のベース板51は、図5に示すように、多角形の平板からなり、前端部中央から後方にかけて略半小判形の回避溝52が切り欠かれており、この回避溝52が容器本体1の後部の位置決め具7に後方から嵌合してボトムプレート50が位置決め具7に不当に干渉するのを規制する。このベース板51には、複数のキャップ孔53が所定の間隔で丸く穿孔され、この複数のキャップ孔53には、加工装置が半導体ウェーハの仕様(例えば、半導体ウェーハの枚数等)を識別するための図示しないキャップが必要に応じ、選択的に挿入される。ベース板51の左右両側部には、被取付部54がそれぞれ配設され、各被取付部54が容器本体1の取付部30Aに着脱自在に嵌合するよう機能する。
【0025】
被取付部54は、図2、図5、図7に示すように、例えばベース板51の側部に張り出し形成される本体55と、この本体55の前部外側から前方に伸びるストッパ突起56と、本体55の前部内側から前方にストッパ突起56よりも細長く伸びる可撓性の首片57と、この首片57の先端部外側に略三角形状に形成される脱落防止突起58と、ストッパ突起56と首片57との間に区画形成される切り欠き空間とから成形される。ストッパ突起56と脱落防止突起58とは、保持レール33の長片内側に位置して短片を挟持し、この挟持により容器本体1にボトムプレート50が強固に装着される。
【0026】
ボトムプレート50の壁板59は、横長の矩形に形成され、容器本体1に対向しない対向面にバーコード領域が形成される。このバーコード領域には、バーコードが貼着されたり、バーコードがポケットを介し着脱自在に挿入される。
【0027】
ホルダ60は、所定の熱可塑性樹脂を使用して中空の略半円柱形、断面略U字形等に形成され、背面や側部等に複数の水切り孔が所定の間隔で穿孔されており、この複数の水切り孔が洗浄時の水切り性を向上させたり、応答器の有無やその破損の有無を視覚的に把握させる。このホルダ60の内部には、応答器の脱落を規制する抜け落ち防止爪が突設される。ホルダ60の開口面の左右両側部には、単数複数のフランジ4がそれぞれ外方向に突設され、各フランジ4が保持機構に着脱自在に係止される。
【0028】
応答器は、一般的にはアンテナ、送受信器、及びメモリーを備えて円筒形に形成され、表面がガラスや合成樹脂等により被覆保護されており、ホルダ60に嵌合されて半導体ウェーハのロット、工程内の加工、あるいは処理経過を記憶するよう機能する。
【0029】
しぼ70は、図4や図7に示すように、複数の取付部30・30Aにおける洗浄液の残存しやすい領域、換言すれば、ガイドレール31と保持レール33の表面やその付近に、JIS B 0601−2001に基づく平均表面粗さ(Ra)が10a(10μm)〜100a(100μm)、好ましくは30a〜70a、より好ましくは50a(50μm)となるようそれぞれ梨地状に形成され、洗浄後の水切り性を向上させる。
【0030】
しぼ70の平均表面粗さ(Ra)が10a〜100aの範囲なのは、10a未満の場合には、洗浄後の水切り性を向上させることができないからである。逆に、100aを超える場合には、しぼ70の表面が擦れて脱離したり、しぼ70の凹凸部にパーティクルが付着しやすくなるからである。このようなしぼ70は、容器本体用の金型のキャビティに放電加工やサンドブラスト加工を施し、これを成形時に転写することにより、形成される。
【0031】
上記構成によれば、取付部30・30Aにおける洗浄液の残存しやすい領域に、撥水作用を営む粗面のしぼ70を形成するので、洗浄後の乾燥作業時にロボティックハンドル40やボトムプレート50の被取付部54に洗浄液の水滴が溜まるのをきわめて有効に抑制防止することができる。したがって、乾燥作業の迅速化を図ることができ、しかも、残存した水滴が容器本体1の内部に浸入して汚染を拡大させることがない。さらに、容器本体1から別部品であるロボティックハンドル40やボトムプレート50を取り外して個々に洗浄する必要がないので、別部品の着脱という余分な作業が不要となり、作業性や生産性の著しい向上を図ることができる。
【0032】
なお、上記実施形態では容器本体下面の取付部30Aに小型のボトムプレート50を着脱自在に嵌合したが、何らこれに限定されるものではない。例えば、ボトムプレート50を大型に形成してその両側部を容器本体1の下面両側部から露出させ、このボトムプレート50の両側部に容器本体1の側壁に対向する対向板をそれぞれ立て設け、各対向板にマニュアルハンドル6を着脱自在に取り付けても良い。
【0033】
【実施例】
以下、本発明に係る精密基板収納容器の実施例について比較例と共に説明する。
実施例1
先ず、図1に示す精密基板収納容器のマニュアルハンドル、ロボティックハンドル、ボトムプレートの取付部に、JIS B 0601−2001に基づく平均表面粗さが50aのしぼを形成した。これを純水で洗浄し、スピン装置により約400rpmの回転を1分間加え、その後、精密基板収納容器表面の水滴残りの状況を目視で確認した。こうして水滴残りの状況を確認したら、60℃に設定した乾燥機に精密基板収納容器をセットし、水滴のない完全な乾燥に要する時間を計測して表1にまとめた。計測はN=5で行った。
【0034】
実施例2
図1に示す精密基板収納容器のマニュアルハンドル、ロボティックハンドル、ボトムプレートの取付部に、JIS B 0601−2001に基づく平均表面粗さが10aのしぼを形成した。その他の部分については、実施例1と同様とした。
【0035】
比較例1
同図に示す精密基板収納容器のマニュアルハンドル、ロボティックハンドル、ボトムプレートの取付部に、しぼを形成しないこととし、その他の部分については実施例1と同様とした。
比較例2
同図に示す精密基板収納容器のマニュアルハンドル、ロボティックハンドル、ボトムプレートの取付部に、JIS B 0601−2001に基づく平均表面粗さが5aのしぼを形成した。その他の部分については、実施例1と同様とした。
【0036】
【表1】

Figure 2004342844
【0037】
【発明の効果】
以上のように本発明によれば、別部品に液体が残存して乾燥作業を遅延させたり、あるいは残存した液体が容器本体に浸入して汚染を拡大させるおそれがないという効果がある。また、別部品の取り付け取り外しという余分な作業を特に必要としないので、作業性等を向上させることができる。
【図面の簡単な説明】
【図1】本発明に係る精密基板収納容器の実施形態を示す全体斜視説明図である。
【図2】本発明に係る精密基板収納容器の実施形態における容器本体を示す底面図である。
【図3】本発明に係る精密基板収納容器の実施形態における容器本体を示す平面図である。
【図4】本発明に係る精密基板収納容器の実施形態における取付部とロボティックハンドルとを示す模式断面説明図である。
【図5】本発明に係る精密基板収納容器の実施形態におけるボトムプレートを示す斜視説明図である。
【図6】本発明に係る精密基板収納容器の実施形態における容器本体からボトムプレートを取り外した状態を示す底面図である。
【図7】本発明に係る精密基板収納容器の実施形態における容器本体とボトムプレートとの関係を示す説明図である。
【符号の説明】
1 容器本体
6 マニュアルハンドル(別部品)
10 蓋体
30 取付部
30A 取付部
31 ガイドレール(取付部)
33 保持レール(取付部)
40 ロボティックハンドル(別部品)
42 脚(被取付部)
50 ボトムプレート(別部品)
54 被取付部
55 本体
56 ストッパ突起
57 首片
58 脱落防止突起
70 しぼ[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a precision substrate storage container used for storing, transporting, storing, and processing precision substrates such as semiconductor wafers and mask glass made of silicon or glass.
[0002]
[Prior art]
In recent years, in the semiconductor industry, precision substrates made of large-diameter silicon wafers or glass wafers having a diameter of 300 mm or more have begun to be used in order to further improve production. Since the large-diameter precision substrate is bent by its own weight even if it is supported vertically and horizontally, it is required to store it in a precision substrate storage container and handle it safely so as not to be damaged.
[0003]
Although not shown, this type of precision substrate storage container includes a front open box type container body for aligning and storing a plurality of precision substrates, a lid body for opening and closing the open front of the container body, and a container body and a lid. And an endless seal gasket that forms a seal by being interposed between the body and the body (see Patent Document 1). When used, the precision substrate storage container with such a configuration is washed with a special cleaning liquid made of ultrapure water, isopropyl alcohol, etc., and after the surface dirt is removed, the precision substrate is stored and transported or stored. Used for
[0004]
Incidentally, a robotic handle, a bottom plate, and a pair of manual handles are attached to the container body of the precision substrate storage container as separate components in order to facilitate automatic conveyance, precision substrate identification, and manual operation. For this reason, a mounting portion is formed on the exposed surface of the container body, and a mounted portion is formed on another component, and the mounting portion and the mounted portion are fitted to each other to form the robotic handle, the bottom plate, and the like. , A pair of manual handles are mounted. The attaching portion and the attached portion are formed into a structure having, for example, a plurality of L-shaped or U-shaped locking pieces arranged side by side, or are formed into a blind alley structure in which one is opened and the other is closed.
[0005]
[Patent Document 1]
JP 2000-159288 A
[Problems to be solved by the invention]
In the conventional precision substrate storage container, since the portion to be attached is simply formed on another component as described above, when washing and drying, water droplets of the cleaning liquid remain on the portion to be attached of another component. There is a problem that the drying operation is delayed or the remaining water droplets penetrate into the inside of the container body to increase contamination.
In order to solve such a problem, it is only necessary to remove the separate parts from the container body and wash them individually. However, in such a case, extra work of attaching and detaching the separate parts becomes indispensable, and the workability and productivity are deteriorated. It will be. Further, when the mounting portion or the mounting portion is a complicated structure such as a blind alley or the like and the drainage property is poor, the expected effect cannot be obtained.
[0007]
The present invention has been made in view of the above, and there is no danger that the liquid remains in another part to delay the drying operation, or that the remaining liquid penetrates into the container body to expand the contamination, and furthermore, the workability is improved. It is an object of the present invention to provide a precision substrate storage container that does not cause deterioration of the precision substrate storage container.
[0008]
[Means for Solving the Problems]
In the present invention, in order to achieve the above object, a separate component is attached to the container body that stores the precision substrate,
It is characterized in that a grain is formed in a region of the container main body and / or another part where the liquid tends to remain.
The mounting portion provided on the surface of the container main body, the mounted portion formed on a separate component and mounted on the mounting portion of the container main body, and the liquid remaining on the mounting portion of the container main body and / or the mounted portion of the separate component. It is preferable to include a grain formed in an easy-to-make area.
Further, it is preferable that a crimp is formed in the vicinity of the mounting portion of the container body so that the average surface roughness is 10a to 100a.
[0009]
Here, the precision substrate in the claims includes at least a 6-inch or 8-inch semiconductor wafer (such as a silicon wafer), a mask glass, a liquid crystal cell, a quartz glass, a mask substrate, etc. used in the fields of electricity, electronics, and semiconductors. The substrate is not particularly limited. The container body includes at least a front open box with an open front, an open box and a carrier with open upper, lower, front and rear surfaces. A lid can be attached to the container body, or a charging process can be performed as necessary. Further, the separate parts include at least a robotic handle, a bottom plate, a plurality of manual handles, and a plurality of side rails detachably attached below the side of the container body.
[0010]
The mounting portion and the mounting portion are formed into a shape having a plurality of C-shaped, J-shaped, L-shaped, U-shaped, V-shaped locking pieces, a dovetailed fitting shape, a sandwiching shape, or the like. Is done. These may or may not have a blind alley structure. The mounting portions are provided as appropriate on the exposed upper, lower, front, rear, left and right surfaces of the container body. Texture is also referred to as a grain pattern, and is used as a design pattern on the surface, flat surface, or depressed surface of a blind alley of a molded product, such as leather, satin finish, rock grain, geometric pattern, wood grain, cloth grain, or unevenness. Say the pattern. The grain is formed in a region where the liquid is likely to remain near the mounting portion, and in a region where the liquid is likely to remain near the mounting portion and the vicinity thereof. Further, the precision substrate storage container can be used as at least a carrier used for manufacturing semiconductors, an inter-process carrier (FOUP), and a FOSB for shipping.
[0011]
According to the present invention, since a grain having a water-repellent function is formed in a region where the cleaning liquid of the container main body and another part is easily collected, the region where the cleaning liquid easily collects is less likely to be wet with the cleaning liquid, and the cleaning liquid is repelled. During the drying operation, the accumulation of the cleaning liquid on another part or the like can be suppressed. Therefore, the drying time can be shortened, and it is possible to prevent the remaining cleaning liquid from entering the container body and expanding the contamination.
[0012]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. As shown in FIGS. 1 to 7, a precision substrate storage container according to the present embodiment is a transparent transparent transparent glass for storing a semiconductor wafer having a diameter of 300 mm. The container body 1, a lid 10 for opening and closing the container body 1, a frame-shaped seal gasket 20 interposed between the container body 1 and the lid 10 to form a seal, and the container body 1 exposed. A plurality of mounting portions 30 and 30A respectively provided on the upper and lower surfaces, a robotic handle 40 removably fitted to the mounting portion 30 on the upper surface of the container main body, and a removably fitted to the mounting portion 30A on the lower surface of the container main body. And a bottom plate 50 to be combined, and a grain 70 having a predetermined roughness is formed in each of the plurality of mounting portions 30 and 30A in a surface area where the cleaning liquid easily remains.
[0013]
As shown in FIG. 1, the container body 1 is injection-molded into a front open box type having an opening only on the front side using a synthetic resin such as polycarbonate, cycloolefin polymer, or polyetherimide having excellent lightness and moldability. It functions so that a plurality of semiconductor wafers (not shown, for example, 13, 25, and 26) are arranged and stored at a predetermined pitch in the vertical direction. The container body 1 has sufficient strength, rigidity, and dimensional stability so as not to be deformed, and ensures a normal operation of an automatic transport device including an AGV (Auto Guided Vehicle).
[0014]
Opposing support units 2 are provided on opposite sides of the inside of the container body 1, respectively, and a plurality of support ribs 3 are arranged on the opposing surfaces of the pair of support units 2 at a predetermined pitch in the vertical direction. The side peripheral edge of the semiconductor wafer is horizontally supported by a plurality of opposing support ribs 3. In addition, the front peripheral edge of the container body 1 gradually expands outward to form a flange 4, and on both outer sides of the container body 1, locked portions 5 located near the rear of the flange 4 are protrudingly provided. At the same time, the manual handles 6 for gripping operation are respectively detachably mounted. Each manual handle 6 is formed in, for example, an L-shape or a U-shape, and is attached to an attachment portion on the outer side surface of the container body 1 via an attachment portion using an engagement claw and an engagement groove, or an uneven structure. You.
[0015]
As shown in FIG. 2, positioning tools 7 that fit with positioning pins of a processing device (not shown) are integrally or detachably provided separately on both sides of the front part and the center of the rear part of the lower surface (bottom surface) of the container body 1. The plurality of positioning tools 7 are arranged to position the precision substrate storage container in the processing device, and in this state, the semiconductor wafer is loaded or unloaded from the precision substrate storage container to the processing device. Each positioning tool 7 is formed into a substantially flat oval shape using polypropylene, polycarbonate, polybutylene terephthalate, polyetheretherketone, polyetherimide, or the like, which is excellent in abrasion resistance and the like, and gradually spreads downward. A groove having a substantially inverted V-shaped cross section is cut out.
[0016]
Here, the processing device is a device that positions the precision substrate storage container and automatically removes the lid 10 or loads a semiconductor wafer from the positioned precision substrate storage container and transfers the semiconductor wafer to another process container, or The semiconductor wafer is loaded from the precision substrate storage container from which the lid 10 has been removed, and the semiconductor wafer is supplied to an apparatus that performs various processes such as oxide film formation, photoresist coating, exposure, etching, cleaning, and thin film formation on the semiconductor wafer. Refers to a device.
[0017]
As shown in FIG. 1, the lid 10 is formed in a substantially rectangular shape that can be fitted and corresponds to the open front surface of the container body 1, and functions to removably open and close the opening of the container body 1. A vertically long front retainer 11 is detachably mounted on the inner surface of the lid 10 (the surface facing the back surface of the container body 1). The front retainer 11 has a plurality of support ribs at a predetermined pitch in a vertical direction. The front peripheral edge of the semiconductor wafer is horizontally supported by the plurality of support ribs.
[0018]
A seal gasket 20 is detachably fitted to the peripheral portion of the lid 10 via protrusions, grooves, and the like, and the seal gasket 20 exerts a sealing function by being pressed against the inner peripheral portion of the front surface of the container body. The seal gasket 20 is formed using, for example, various thermoplastic elastomers such as polyolefin or polyester, fluorine rubber, silicone rubber, and the like. Preferably, it is formed using a material that generates a small amount of organic components that contaminate the semiconductor wafer and has a hardness of 80 ° or less according to the measuring method of JIS K6301A. A locking piece 13 having a U-shaped notch is rotatably supported on each of the left and right sides of the lid 10, and the notch of each locking piece 13 is a locked portion of the container body 1. The cover 10 closes and covers the opening of the container body 1 by fitting and locking to the cover 5.
[0019]
In this embodiment, the lid 10 is merely shown, but the present invention is not limited to this. For example, the lid 10 has a built-in latch mechanism that is operated by an external operation, and when the lid 10 is mounted, a plurality of locking claws of the latch mechanism are protruded from the peripheral edge of the lid 10 respectively. May be fitted and locked in a plurality of locking holes drilled on the upper and lower inner peripheral surfaces of the front surface of the container body, and the lid 10 covering the front surface of the container body 1 may be fixed.
[0020]
As shown in FIG. 3, the mounting portion 30 is formed in a substantially inverted U-shape in the plane near the center of the exposed upper surface of the container body 1. The mounting portion 30 includes a pair of guide rails 31 provided at an interval on the upper surface of the container body 1, and an abutting wall 32 having a stopper function is integrally formed between the front sides of the pair of guide rails 31. Is done. As shown in FIG. 3 and FIG. 4, the pair of guide rails 31 are inclined inward toward the inside so that the width gradually decreases from the rear side to the front side, and each of the guide rails 31 has an inverted L-shaped cross section. It is formed. In the mounting portion 30 having such a structure, the robotic handle 40 fitted from the rear side between the pair of guide rails 31 is slid to the front side, and the robotic handle 40 is brought into contact with the abutting wall 32 to be positioned and fixed. .
[0021]
As shown in FIGS. 6 and 7, the mounting portions 30 </ b> A are formed on both sides of the rear portion of the exposed lower surface of the container body 1. The mounting portion 30A includes a pair of holding rails 33 which are provided on the lower surface of the container body 1 at intervals, and each holding rail 33 is formed in an L-shape, and an opening is formed on the rear side of each holding rail 33. At the same time, the front side is closed. The mounting portion 30A having such a structure slides the bottom plate 50 fitted from the rear side between the pair of holding rails 33 to the front side to position and fix the bottom plate 50.
[0022]
As shown in FIG. 4, the robotic handle 40 has a flat rectangular gripping plate 41 gripped by a ceiling transfer device (not shown), and has an L-shaped cross section, and extends from both sides of the back surface of the gripping plate 41. The pair of legs 42 are formed as separate parts having a substantially π-shaped cross section, and the free ends of the legs 42 as fitting portions are fitted into the bent sides of the guide rail 31.
[0023]
As shown in FIG. 5, the bottom plate 50 includes a base plate 51 that is opposed to the lower surface of the container body 1, which is an identification area, and a rear surface of the base plate 51. A wall plate 59 facing a part (identification region) is selectively supported via a holding mechanism on one of the base plate 51 and the wall plate 59 to fit and accommodate a transponder (not shown) of the RFID system. It is configured as a separate part from the holder 60. The bottom plate 50 is formed using polypropylene, polycarbonate, polybutylene terephthalate, or the like.
[0024]
As shown in FIG. 5, the base plate 51 of the bottom plate 50 is formed of a polygonal flat plate, and a substantially semi-oval avoiding groove 52 is cut out from the center of the front end to the rear. The bottom plate 50 is fitted to the positioning tool 7 at the rear of the main body 1 from the rear to prevent the bottom plate 50 from unduly interfering with the positioning tool 7. A plurality of cap holes 53 are formed in the base plate 51 at predetermined intervals in a round shape. The plurality of cap holes 53 are used by a processing apparatus to identify the specifications of the semiconductor wafer (for example, the number of semiconductor wafers). (Not shown) is selectively inserted as necessary. Attachment portions 54 are provided on both left and right sides of the base plate 51, and each attachment portion 54 functions so as to be detachably fitted to the attachment portion 30A of the container body 1.
[0025]
As shown in FIGS. 2, 5, and 7, the mounted portion 54 includes, for example, a main body 55 that is formed to project from a side portion of the base plate 51, and a stopper protrusion 56 that extends forward from an outside of a front portion of the main body 55. A flexible neck piece 57 extending forward from the inside of the front part of the main body 55 to be narrower than the stopper projection 56; a substantially triangular falling prevention projection 58 formed outside the tip of the neck piece 57; It is formed from a notch space defined and formed between 56 and the neck piece 57. The stopper projection 56 and the falling-off prevention projection 58 are located inside the long piece of the holding rail 33 and hold the short piece. With this holding, the bottom plate 50 is firmly attached to the container body 1.
[0026]
The wall plate 59 of the bottom plate 50 is formed in a horizontally long rectangle, and a barcode area is formed on an opposing surface that does not oppose the container body 1. In this barcode area, a barcode is stuck or a barcode is removably inserted through a pocket.
[0027]
The holder 60 is formed in a hollow substantially semi-cylindrical shape, a substantially U-shaped cross section, or the like using a predetermined thermoplastic resin, and a plurality of drainage holes are formed at predetermined intervals on a back surface, side portions, and the like. A plurality of drain holes improve drainability during washing, and visually indicate the presence or absence of a transponder and whether or not it is damaged. Inside the holder 60, a stopper for preventing falling off of the transponder is projected. A plurality of flanges 4 are respectively provided on both right and left sides of the opening surface of the holder 60 so as to protrude outward, and each flange 4 is detachably engaged with the holding mechanism.
[0028]
The transponder is generally formed in a cylindrical shape with an antenna, a transceiver, and a memory, and the surface is covered and protected by glass, synthetic resin, or the like. It functions to store the processing in the process or the progress of the processing.
[0029]
As shown in FIGS. 4 and 7, the grain 70 is formed in a region where the cleaning liquid easily remains in the plurality of attachment portions 30, 30 A, in other words, in the surface of the guide rail 31 and the holding rail 33 and in the vicinity thereof, JIS B 0601. Each of them is formed in a satin pattern so that the average surface roughness (Ra) based on -2001 is 10 a (10 μm) to 100 a (100 μm), preferably 30 a to 70 a, more preferably 50 a (50 μm), and the drainage property after washing. Improve.
[0030]
The reason why the average surface roughness (Ra) of the grain 70 is in the range of 10a to 100a is that if it is less than 10a, drainage after washing cannot be improved. Conversely, if it exceeds 100a, the surface of the grain 70 is rubbed and detached, and particles easily adhere to the uneven portions of the grain 70. Such a grain 70 is formed by subjecting a cavity of a mold for a container body to electric discharge machining or sand blasting, and transferring this at the time of molding.
[0031]
According to the above configuration, the roughened grain 70 having a water-repellent effect is formed in the region where the cleaning liquid easily remains in the mounting portions 30 and 30A. It is possible to extremely effectively suppress and prevent the accumulation of the water droplets of the cleaning liquid on the attached portion 54. Therefore, it is possible to speed up the drying operation, and further, it is possible to prevent the remaining water droplets from entering the inside of the container main body 1 and expanding the contamination. Furthermore, since it is not necessary to remove the robotic handle 40 and the bottom plate 50 as separate components from the container body 1 and individually clean them, an extra operation of attaching and detaching the separate components is not required, and workability and productivity are remarkably improved. Can be achieved.
[0032]
In the above embodiment, the small bottom plate 50 is detachably fitted to the mounting portion 30A on the lower surface of the container body, but the present invention is not limited to this. For example, the bottom plate 50 is formed in a large size, and both sides thereof are exposed from both sides of the lower surface of the container main body 1. Opposing plates facing the side walls of the container main body 1 are provided on both sides of the bottom plate 50, respectively. The manual handle 6 may be detachably attached to the facing plate.
[0033]
【Example】
Hereinafter, examples of the precision substrate storage container according to the present invention will be described together with comparative examples.
Example 1
First, a grain having an average surface roughness of 50a based on JIS B 0601-2001 was formed on the mounting portion of the manual handle, robotic handle, and bottom plate of the precision substrate storage container shown in FIG. This was washed with pure water and rotated at about 400 rpm for 1 minute by a spin device, and thereafter, the condition of water droplets remaining on the surface of the precision substrate storage container was visually checked. After confirming the state of remaining water droplets, the precision substrate storage container was set in a dryer set at 60 ° C., and the time required for complete drying without water droplets was measured and summarized in Table 1. The measurement was performed at N = 5.
[0034]
Example 2
A grain having an average surface roughness of 10a based on JIS B 0601-2001 was formed on the attachment portion of the manual handle, the robotic handle, and the bottom plate of the precision substrate storage container shown in FIG. The other parts were the same as in Example 1.
[0035]
Comparative Example 1
No grain was formed on the attachment portion of the manual handle, the robotic handle, and the bottom plate of the precision substrate storage container shown in the same drawing, and the other portions were the same as in Example 1.
Comparative Example 2
A grain having an average surface roughness of 5a based on JIS B 0601-2001 was formed on the attachment portion of the manual handle, robotic handle, and bottom plate of the precision substrate storage container shown in FIG. The other parts were the same as in Example 1.
[0036]
[Table 1]
Figure 2004342844
[0037]
【The invention's effect】
As described above, according to the present invention, there is an effect that there is no danger that the liquid remains in another part to delay the drying operation, or that the remaining liquid infiltrates the container body to expand the contamination. In addition, since extra work of attaching and detaching another component is not particularly required, workability and the like can be improved.
[Brief description of the drawings]
FIG. 1 is an overall perspective explanatory view showing an embodiment of a precision substrate storage container according to the present invention.
FIG. 2 is a bottom view showing a container main body in the embodiment of the precision substrate storage container according to the present invention.
FIG. 3 is a plan view showing a container main body in the embodiment of the precision substrate storage container according to the present invention.
FIG. 4 is a schematic cross-sectional explanatory view showing a mounting portion and a robotic handle in the embodiment of the precision substrate storage container according to the present invention.
FIG. 5 is a perspective explanatory view showing a bottom plate in the embodiment of the precision substrate storage container according to the present invention.
FIG. 6 is a bottom view showing a state in which a bottom plate is removed from a container main body in the embodiment of the precision substrate storage container according to the present invention.
FIG. 7 is an explanatory view showing a relationship between a container body and a bottom plate in the embodiment of the precision substrate storage container according to the present invention.
[Explanation of symbols]
1 Container body 6 Manual handle (separate part)
10 Lid 30 Mounting part 30A Mounting part 31 Guide rail (mounting part)
33 Holding rail (mounting part)
40 Robotic handle (separate part)
42 legs (attached part)
50 Bottom plate (separate parts)
54 Attached part 55 Main body 56 Stopper protrusion 57 Neck piece 58 Fall prevention protrusion 70 Grain

Claims (3)

精密基板を収納する容器本体に別部品を取り付ける精密基板収納容器であって、
容器本体及び又は別部品の液体の残存しやすい領域に、しぼを形成したことを特徴とする精密基板収納容器。
A precision substrate storage container for attaching another component to a container body for storing a precision substrate,
A precision substrate storage container characterized in that a grain is formed in a region where a liquid is likely to remain in the container body and / or another component.
容器本体の表面に設けられる取付部と、別部品に形成されて容器本体の取付部に取り付けられる被取付部と、容器本体の取付部及び又は別部品の被取付部の液体の残存しやすい領域に形成されるしぼとを含んでなる請求項1記載の精密基板収納容器。An attachment portion provided on the surface of the container body, an attached portion formed on a separate part and attached to the attachment portion of the container body, and an area where the liquid is likely to remain in the attachment portion of the container body and / or the attached portion of the separate part. 2. The precision substrate storage container according to claim 1, further comprising: a grain formed on said substrate. 容器本体の取付部付近にしぼを形成してその平均表面粗さを10a〜100aとした請求項2記載の精密基板収納容器。3. The precision substrate storage container according to claim 2, wherein a crimp is formed in the vicinity of the mounting portion of the container body to have an average surface roughness of 10a to 100a.
JP2003137654A 2003-05-15 2003-05-15 Precision substrate storage container Expired - Lifetime JP4282369B2 (en)

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JP2007123513A (en) * 2005-10-27 2007-05-17 Shin Etsu Polymer Co Ltd Precise substrate storing container
JP2008068888A (en) * 2006-09-13 2008-03-27 Shin Etsu Polymer Co Ltd Holding member of identification component, and substrate storage container
US7357256B2 (en) 2005-03-31 2008-04-15 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer pod with working sheet holder
KR100847465B1 (en) 2006-03-30 2008-07-21 도쿄엘렉트론가부시키가이샤 Method for handling and transferring a wafer case, and holding part used therefor
JP2009124063A (en) * 2007-11-19 2009-06-04 Shin Etsu Polymer Co Ltd Retainer and container for receiving substrate
CN103227116A (en) * 2013-03-29 2013-07-31 日月光半导体制造股份有限公司 Light-transmitting casing, manufacturing method thereof and optical module employing light-transmitting casing
JP2015012222A (en) * 2013-07-01 2015-01-19 信越ポリマー株式会社 Substrate housing container
WO2015025410A1 (en) * 2013-08-22 2015-02-26 ミライアル株式会社 Substrate storing container
JP2021028936A (en) * 2019-08-09 2021-02-25 信越ポリマー株式会社 Substrate storage container

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7357256B2 (en) 2005-03-31 2008-04-15 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer pod with working sheet holder
CN100394575C (en) * 2005-03-31 2008-06-11 台湾积体电路制造股份有限公司 Wafer transfer box
JP4519056B2 (en) * 2005-10-27 2010-08-04 信越ポリマー株式会社 Precision substrate storage container
JP2007123513A (en) * 2005-10-27 2007-05-17 Shin Etsu Polymer Co Ltd Precise substrate storing container
KR100847465B1 (en) 2006-03-30 2008-07-21 도쿄엘렉트론가부시키가이샤 Method for handling and transferring a wafer case, and holding part used therefor
JP2008068888A (en) * 2006-09-13 2008-03-27 Shin Etsu Polymer Co Ltd Holding member of identification component, and substrate storage container
JP2009124063A (en) * 2007-11-19 2009-06-04 Shin Etsu Polymer Co Ltd Retainer and container for receiving substrate
CN103227116A (en) * 2013-03-29 2013-07-31 日月光半导体制造股份有限公司 Light-transmitting casing, manufacturing method thereof and optical module employing light-transmitting casing
JP2015012222A (en) * 2013-07-01 2015-01-19 信越ポリマー株式会社 Substrate housing container
WO2015025410A1 (en) * 2013-08-22 2015-02-26 ミライアル株式会社 Substrate storing container
JP6067123B2 (en) * 2013-08-22 2017-01-25 ミライアル株式会社 Substrate storage container
US10580674B2 (en) 2013-08-22 2020-03-03 Miraial Co., Ltd. Substrate storing container
JP2021028936A (en) * 2019-08-09 2021-02-25 信越ポリマー株式会社 Substrate storage container
JP7333224B2 (en) 2019-08-09 2023-08-24 信越ポリマー株式会社 Substrate storage container

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