JP2007081233A - レーザ発振装置 - Google Patents

レーザ発振装置 Download PDF

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Publication number
JP2007081233A
JP2007081233A JP2005268845A JP2005268845A JP2007081233A JP 2007081233 A JP2007081233 A JP 2007081233A JP 2005268845 A JP2005268845 A JP 2005268845A JP 2005268845 A JP2005268845 A JP 2005268845A JP 2007081233 A JP2007081233 A JP 2007081233A
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JP
Japan
Prior art keywords
crystal
laser
film
dielectric
wavelength conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005268845A
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English (en)
Japanese (ja)
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JP2007081233A5 (enExample
Inventor
Taizo Kono
泰造 江野
Masayuki Momiuchi
正幸 籾内
Yoshiaki Goto
義明 後藤
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Topcon Corp
Original Assignee
Topcon Corp
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Filing date
Publication date
Application filed by Topcon Corp filed Critical Topcon Corp
Priority to JP2005268845A priority Critical patent/JP2007081233A/ja
Priority to US11/483,952 priority patent/US20070071041A1/en
Publication of JP2007081233A publication Critical patent/JP2007081233A/ja
Publication of JP2007081233A5 publication Critical patent/JP2007081233A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/109—Frequency multiplication, e.g. harmonic generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383—Parallel arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G02F1/3542—Multipass arrangements, i.e. arrangements to make light pass multiple times through the same element, e.g. using an enhancement cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/025—Constructional details of solid state lasers, e.g. housings or mountings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/0405—Conductive cooling, e.g. by heat sinks or thermo-electric elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/042—Arrangements for thermal management for solid state lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/0602—Crystal lasers or glass lasers
    • H01S3/0604—Crystal lasers or glass lasers in the form of a plate or disc
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08086—Multiple-wavelength emission
    • H01S3/0809—Two-wavelenghth emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813—Configuration of resonator
    • H01S3/0815—Configuration of resonator having 3 reflectors, e.g. V-shaped resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/082—Construction or shape of optical resonators or components thereof comprising three or more reflectors defining a plurality of resonators, e.g. for mode selection or suppression
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/1022—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Lasers (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
JP2005268845A 2005-09-15 2005-09-15 レーザ発振装置 Pending JP2007081233A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005268845A JP2007081233A (ja) 2005-09-15 2005-09-15 レーザ発振装置
US11/483,952 US20070071041A1 (en) 2005-09-15 2006-07-10 Laser oscillation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005268845A JP2007081233A (ja) 2005-09-15 2005-09-15 レーザ発振装置

Publications (2)

Publication Number Publication Date
JP2007081233A true JP2007081233A (ja) 2007-03-29
JP2007081233A5 JP2007081233A5 (enExample) 2008-10-30

Family

ID=37893876

Family Applications (1)

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Country Status (2)

Country Link
US (1) US20070071041A1 (enExample)
JP (1) JP2007081233A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006310743A (ja) * 2005-03-31 2006-11-09 Topcon Corp レーザ発振装置
WO2008123534A1 (ja) 2007-03-27 2008-10-16 Ube Industries, Ltd. 燃料部品用成形材料及びそれを用いた燃料部品
WO2010024213A1 (ja) * 2008-08-26 2010-03-04 アイシン精機株式会社 テラヘルツ波発生装置およびテラヘルツ波発生方法
WO2012088786A1 (zh) * 2010-12-30 2012-07-05 北京中视中科光电技术有限公司 蓝光激光器
WO2012088787A1 (zh) * 2010-12-30 2012-07-05 北京中视中科光电技术有限公司 绿光激光器
JP2012169506A (ja) * 2011-02-16 2012-09-06 Shimadzu Corp 小型固体レーザ素子
US11881676B2 (en) * 2019-01-31 2024-01-23 L3Harris Technologies, Inc. End-pumped Q-switched laser

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9859676B2 (en) 2015-12-18 2018-01-02 Sharp Kabushiki Kaisha Light source configured for stabilization relative to external operating conditions
DE102020122484B4 (de) * 2020-08-27 2022-03-24 Trumpf Laser- Und Systemtechnik Gmbh Strahltransformator
US20230029200A1 (en) * 2021-07-22 2023-01-26 Coherent, Inc. Actively cooled end-pumped solid-state laser gain medium

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05335679A (ja) * 1992-05-29 1993-12-17 Nippon Columbia Co Ltd 半導体レーザ励起固体レーザ装置
JPH10256638A (ja) * 1997-03-13 1998-09-25 Ricoh Co Ltd 固体レーザ装置
JPH114029A (ja) * 1997-06-12 1999-01-06 Nec Corp 励起型固体レーザ装置
JPH114030A (ja) * 1997-06-12 1999-01-06 Nec Corp 励起型固体レーザ装置
JP2001210895A (ja) * 2000-01-25 2001-08-03 Fuji Photo Film Co Ltd 固体レーザーおよびその製造方法
JP2002543597A (ja) * 1999-04-23 2002-12-17 コボルト・アクチエボラーグ 光学装置
JP2005057043A (ja) * 2003-08-04 2005-03-03 Topcon Corp 固体レーザ装置及び波長変換光学部材の製造方法
JP2005332989A (ja) * 2004-05-20 2005-12-02 Topcon Corp レーザ発振装置
JP2007519234A (ja) * 2003-12-24 2007-07-12 コミツサリア タ レネルジー アトミーク 移送表面上における素子の組付

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4860304A (en) * 1988-02-02 1989-08-22 Massachusetts Institute Of Technology Solid state microlaser
US5256164A (en) * 1988-02-02 1993-10-26 Massachusetts Institute Of Technology Method of fabricating a microchip laser
US5680412A (en) * 1995-07-26 1997-10-21 Demaria Electrooptics Systems, Inc. Apparatus for improving the optical intensity induced damage limit of optical quality crystals
JP2000261101A (ja) * 1999-03-09 2000-09-22 Fuji Photo Film Co Ltd 波長変換装置
US6611342B2 (en) * 2001-01-08 2003-08-26 Optellios, Inc. Narrow band polarization encoder
US7251265B2 (en) * 2004-03-10 2007-07-31 Tektronix, Inc. Micro-cavity laser having increased sensitivity

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05335679A (ja) * 1992-05-29 1993-12-17 Nippon Columbia Co Ltd 半導体レーザ励起固体レーザ装置
JPH10256638A (ja) * 1997-03-13 1998-09-25 Ricoh Co Ltd 固体レーザ装置
JPH114029A (ja) * 1997-06-12 1999-01-06 Nec Corp 励起型固体レーザ装置
JPH114030A (ja) * 1997-06-12 1999-01-06 Nec Corp 励起型固体レーザ装置
JP2002543597A (ja) * 1999-04-23 2002-12-17 コボルト・アクチエボラーグ 光学装置
JP2001210895A (ja) * 2000-01-25 2001-08-03 Fuji Photo Film Co Ltd 固体レーザーおよびその製造方法
JP2005057043A (ja) * 2003-08-04 2005-03-03 Topcon Corp 固体レーザ装置及び波長変換光学部材の製造方法
JP2007519234A (ja) * 2003-12-24 2007-07-12 コミツサリア タ レネルジー アトミーク 移送表面上における素子の組付
JP2005332989A (ja) * 2004-05-20 2005-12-02 Topcon Corp レーザ発振装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006310743A (ja) * 2005-03-31 2006-11-09 Topcon Corp レーザ発振装置
WO2008123534A1 (ja) 2007-03-27 2008-10-16 Ube Industries, Ltd. 燃料部品用成形材料及びそれを用いた燃料部品
WO2010024213A1 (ja) * 2008-08-26 2010-03-04 アイシン精機株式会社 テラヘルツ波発生装置およびテラヘルツ波発生方法
JP2010054636A (ja) * 2008-08-26 2010-03-11 Aisin Seiki Co Ltd テラヘルツ波発生装置およびテラヘルツ波発生方法
US8497490B2 (en) 2008-08-26 2013-07-30 Aisin Seiki Kabushiki Kaisha Terahertz wave generation device and method for generating terahertz wave
WO2012088786A1 (zh) * 2010-12-30 2012-07-05 北京中视中科光电技术有限公司 蓝光激光器
WO2012088787A1 (zh) * 2010-12-30 2012-07-05 北京中视中科光电技术有限公司 绿光激光器
JP2012169506A (ja) * 2011-02-16 2012-09-06 Shimadzu Corp 小型固体レーザ素子
US11881676B2 (en) * 2019-01-31 2024-01-23 L3Harris Technologies, Inc. End-pumped Q-switched laser

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