JP2006510046A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2006510046A5 JP2006510046A5 JP2004559365A JP2004559365A JP2006510046A5 JP 2006510046 A5 JP2006510046 A5 JP 2006510046A5 JP 2004559365 A JP2004559365 A JP 2004559365A JP 2004559365 A JP2004559365 A JP 2004559365A JP 2006510046 A5 JP2006510046 A5 JP 2006510046A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- composition
- depositing
- substrate
- field emission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000151 deposition Methods 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 239000002245 particle Substances 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
Claims (5)
- (a)少なくとも1種のポジ画像形成性フォトポリマー系と、(b)約1〜約70体積%の粒子とを含んでなるポジ画像形成性粒子充填フォトレジスト組成物。
- 請求項1に記載の組成物を含んでなる電界放出フィルム。
- 請求項20に記載のフィルムを含んでなる電界放出トライオード、電界放出ディスプレイ、照明装置または真空電子装置。
- (a)請求項1に記載の組成物を基板上にフィルムとして堆積させ;
(b)フィルムを放射線に画像どおりに露光してその露光部分および未露光部分を形成せしめ;そして
(c)露光部分を除去して現像画像を形成せしめる
ことを含んでなる基板上に画像を形成する方法。 - (a)請求項1に記載の第1の組成物を基板上に第1のフィルムとして堆積させ;
(b)請求項1に記載の第2の組成物を第1のフィルム上に第2のフィルムとして堆積させ;
(c)第1および第2のフィルムを放射線に画像どおりに露光して露光部分および未露光部分を形成せしめ;
(d)露光部分を除去して現像画像を形成せしめる
ことを含んでなる多層パターン化構造体を形成する方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43139202P | 2002-12-06 | 2002-12-06 | |
PCT/US2003/038810 WO2004053593A2 (en) | 2002-12-06 | 2003-12-05 | Positive imageable thick film compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006510046A JP2006510046A (ja) | 2006-03-23 |
JP2006510046A5 true JP2006510046A5 (ja) | 2007-02-01 |
Family
ID=32507722
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004559365A Pending JP2006510046A (ja) | 2002-12-06 | 2003-12-05 | ポジ画像形成性厚膜組成物 |
Country Status (7)
Country | Link |
---|---|
US (2) | US20040170925A1 (ja) |
EP (1) | EP1567917A2 (ja) |
JP (1) | JP2006510046A (ja) |
KR (1) | KR20050084150A (ja) |
CN (1) | CN1742233A (ja) |
AU (1) | AU2003293441A1 (ja) |
WO (1) | WO2004053593A2 (ja) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004047166A2 (en) * | 2002-11-15 | 2004-06-03 | E.I. Du Pont De Nemours And Company | Process for using protective layers in the fabrication of electronic devices |
GB0227902D0 (en) * | 2002-11-29 | 2003-01-08 | Ingenia Holdings Ltd | Template |
US8298754B2 (en) * | 2003-11-25 | 2012-10-30 | Murata Manufacturing Co., Ltd. | Method for forming thick film pattern, method for manufacturing electronic component, and photolithography photosensitive paste |
US7402373B2 (en) * | 2004-02-05 | 2008-07-22 | E.I. Du Pont De Nemours And Company | UV radiation blocking protective layers compatible with thick film pastes |
KR101042667B1 (ko) * | 2004-07-05 | 2011-06-20 | 주식회사 동진쎄미켐 | 포토레지스트 조성물 |
KR20060090520A (ko) * | 2005-02-07 | 2006-08-11 | 삼성전자주식회사 | 감광성 수지 및 상기 감광성 수지로 이루어진 패턴을포함하는 박막 표시판 및 그 제조 방법 |
US7524606B2 (en) | 2005-04-11 | 2009-04-28 | Az Electronic Materials Usa Corp. | Nanocomposite photoresist composition for imaging thick films |
US7247419B2 (en) | 2005-04-11 | 2007-07-24 | Az Electronic Materials Usa Corp. | Nanocomposite photosensitive composition and use thereof |
JP4861767B2 (ja) | 2005-07-26 | 2012-01-25 | 富士フイルム株式会社 | ポジ型レジスト組成物およびそれを用いたパターン形成方法 |
KR101166016B1 (ko) * | 2006-04-26 | 2012-07-19 | 삼성에스디아이 주식회사 | 전자 방출원 형성용 조성물, 이로부터 제조된 전자 방출원및 상기 전자 방출원을 구비한 전자 방출 소자 |
JP4751773B2 (ja) * | 2006-06-09 | 2011-08-17 | 太陽ホールディングス株式会社 | 光硬化性組成物及びそれを用いて形成した焼成物パターン |
KR101423801B1 (ko) * | 2006-11-28 | 2014-07-25 | 도쿄 오카 고교 가부시키가이샤 | 후막용 화학증폭형 포지티브형 포토레지스트 조성물, 후막용 화학증폭형 드라이 필름 및 후막 레지스트 패턴의 제조 방법 |
KR101034346B1 (ko) * | 2006-12-22 | 2011-05-16 | 주식회사 엘지화학 | 탄소 나노 튜브를 통한 내열성 개선의 감광성 수지 조성물 |
US8310069B2 (en) * | 2007-10-05 | 2012-11-13 | Texas Instruements Incorporated | Semiconductor package having marking layer |
KR20100097146A (ko) * | 2007-11-15 | 2010-09-02 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 탄소 나노튜브의 보호 |
US20110012035A1 (en) * | 2009-07-15 | 2011-01-20 | Texas Instruments Incorporated | Method for Precision Symbolization Using Digital Micromirror Device Technology |
US20130189524A1 (en) * | 2012-01-19 | 2013-07-25 | Brewer Science Inc. | Viscous fugitive polymer-based carbon nanotube coatings |
TWI585522B (zh) * | 2012-08-31 | 2017-06-01 | 富士軟片股份有限公司 | 感光性樹脂組成物、硬化物及其製造方法、樹脂圖案的製造方法、硬化膜、液晶顯示裝置、有機el顯示裝置、以及觸控面板顯示裝置 |
TW201421154A (zh) * | 2012-10-26 | 2014-06-01 | Fujifilm Corp | 感光性樹脂組成物、硬化物及其製造方法、樹脂圖案製造方法、硬化膜、有機el顯示裝置、液晶顯示裝置以及觸控面板顯示裝置 |
WO2014150577A1 (en) | 2013-03-15 | 2014-09-25 | Sinovia Technologies | Photoactive transparent conductive films, method of making them and touch sensitive device comprising said films |
JP6564196B2 (ja) * | 2014-03-20 | 2019-08-21 | 東京応化工業株式会社 | 厚膜用化学増幅型ポジ型感光性樹脂組成物 |
WO2018213432A1 (en) * | 2017-05-17 | 2018-11-22 | Formlabs, Inc. | Techniques for casting from additively fabricated molds and related systems and methods |
Family Cites Families (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5915394B2 (ja) * | 1978-08-31 | 1984-04-09 | 富士通株式会社 | 厚膜微細パタ−ン生成方法 |
DD234196A3 (de) * | 1983-02-09 | 1986-03-26 | Ptnjj Npo Elektronpribor | Fotoempfindliche dielektrische mischung |
JPS6232453A (ja) * | 1985-08-06 | 1987-02-12 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト用現像液 |
US4939070A (en) * | 1986-07-28 | 1990-07-03 | Brunsvold William R | Thermally stable photoresists with high sensitivity |
US5256836A (en) * | 1989-06-09 | 1993-10-26 | Toshiba Lighting & Technology Corporation | Thick film hybrid circuit board device and method of manufacturing the same |
US4985332A (en) * | 1990-04-10 | 1991-01-15 | E. I. Du Pont De Nemours And Company | Resist material with carbazole diazonium salt acid generator and process for use |
JP2670711B2 (ja) * | 1990-05-29 | 1997-10-29 | 富士写真フイルム株式会社 | ネガ型感光性樹脂組成物用現像液 |
DE69130701T2 (de) * | 1990-10-29 | 1999-08-26 | Toyo Gosei Kogyo Kk | Lichtempfindliches gefärbtes Harz, farbiges Bild, Verfahren zur Herstellung von Farbfiltern und Verfahren zur Herstellung einer Schwarzmatrix |
US5164286A (en) * | 1991-02-01 | 1992-11-17 | Ocg Microelectronic Materials, Inc. | Photoresist developer containing fluorinated amphoteric surfactant |
US6074893A (en) * | 1993-09-27 | 2000-06-13 | Sumitomo Metal Industries, Ltd. | Process for forming fine thick-film conductor patterns |
NL9301908A (nl) * | 1993-11-04 | 1995-06-01 | Spiro Research Bv | Werkwijze en inrichting voor het ontluchten van een vloeistof in een in hoofdzaak gesloten vloeistofcirculatiesysteem. |
US6060207A (en) * | 1994-07-11 | 2000-05-09 | Kabushiki Kaisha Toshiba | Photosensitive material |
US5506090A (en) * | 1994-09-23 | 1996-04-09 | Minnesota Mining And Manufacturing Company | Process for making shoot and run printing plates |
JPH08148787A (ja) * | 1994-11-21 | 1996-06-07 | Sumitomo Kinzoku Ceramics:Kk | 厚膜ペースト |
DE69614502D1 (de) * | 1995-09-29 | 2001-09-20 | Nippon Kayaku Kk | Aktinische strahlungshärtbare und wärmestrahlungsabweisende harzzusammensetzung und damit beschichteter film |
US5879856A (en) * | 1995-12-05 | 1999-03-09 | Shipley Company, L.L.C. | Chemically amplified positive photoresists |
US5942367A (en) * | 1996-04-24 | 1999-08-24 | Shin-Etsu Chemical Co., Ltd. | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group |
JP3297324B2 (ja) * | 1996-10-30 | 2002-07-02 | 富士通株式会社 | レジスト組成物、レジストパターンの形成方法及び半導体装置の製造方法 |
US6323361B1 (en) * | 1997-04-17 | 2001-11-27 | Corning Inc. | Photocurable halofluorinated acrylates |
JPH10340666A (ja) * | 1997-06-09 | 1998-12-22 | Futaba Corp | 電界電子放出素子 |
US6291129B1 (en) * | 1997-08-29 | 2001-09-18 | Kabushiki Kaisha Toshiba | Monomer, high molecular compound and photosensitive composition |
US6399279B1 (en) * | 1998-01-16 | 2002-06-04 | Mitsubishi Chemical Corporation | Method for forming a positive image |
KR100594768B1 (ko) * | 1998-03-12 | 2006-07-03 | 후지 샤신 필름 가부시기가이샤 | 포지티브 감광성 조성물 |
KR100571313B1 (ko) * | 1998-03-17 | 2006-04-17 | 후지 샤신 필름 가부시기가이샤 | 포지티브 감광성 조성물 |
US6558871B1 (en) * | 1998-03-20 | 2003-05-06 | Nippon Soda Co. Ltd. | Photocurable composition containing iodonium salt compound |
US6294270B1 (en) * | 1998-12-23 | 2001-09-25 | 3M Innovative Properties Company | Electronic circuit device comprising an epoxy-modified aromatic vinyl-conjugated diene block copolymer |
US6455234B1 (en) * | 1999-05-04 | 2002-09-24 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
KR20010051350A (ko) * | 1999-11-01 | 2001-06-25 | 이시마루 기미오, 다께우찌 마사아끼 | 활성 입자, 감광성 수지 조성물 및 패턴 형성 방법 |
US7449081B2 (en) * | 2000-06-21 | 2008-11-11 | E. I. Du Pont De Nemours And Company | Process for improving the emission of electron field emitters |
US6534235B1 (en) * | 2000-10-31 | 2003-03-18 | Kansai Research Institute, Inc. | Photosensitive resin composition and process for forming pattern |
TW583503B (en) * | 2000-12-01 | 2004-04-11 | Kansai Paint Co Ltd | Method of forming conductive pattern |
JP3914386B2 (ja) * | 2000-12-28 | 2007-05-16 | 株式会社ルネサステクノロジ | フォトマスク、その製造方法、パターン形成方法および半導体装置の製造方法 |
JP4317330B2 (ja) * | 2001-02-07 | 2009-08-19 | 富士フイルム株式会社 | 感光性平版印刷版の製版方法 |
US6656667B2 (en) * | 2001-03-14 | 2003-12-02 | United Microelectronics Corp. | Multiple resist layer photolithographic process |
US6613499B2 (en) * | 2001-06-12 | 2003-09-02 | Macronix International Co., Ltd. | Development method for manufacturing semiconductors |
US7008754B2 (en) * | 2001-09-11 | 2006-03-07 | Daiken Chemical Co., Ltd. | Method for forming image on object surface including circuit substrate |
US20030070559A1 (en) * | 2001-10-15 | 2003-04-17 | Victor Robert J. | Vegetable and related food products steamer cooker |
US20030073042A1 (en) * | 2001-10-17 | 2003-04-17 | Cernigliaro George J. | Process and materials for formation of patterned films of functional materials |
KR100646793B1 (ko) * | 2001-11-13 | 2006-11-17 | 삼성전자주식회사 | 씬너 조성물 |
JP2003195517A (ja) * | 2001-12-14 | 2003-07-09 | Shipley Co Llc | フォトレジスト用現像液 |
JP2003195518A (ja) * | 2001-12-14 | 2003-07-09 | Shipley Co Llc | フォトレジスト用現像液 |
US6900003B2 (en) * | 2002-04-12 | 2005-05-31 | Shipley Company, L.L.C. | Photoresist processing aid and method |
US6769945B2 (en) * | 2002-08-24 | 2004-08-03 | Industrial Technology Research Institute | Method of growing isomeric carbon emitters onto triode structure of field emission display |
US6798127B2 (en) * | 2002-10-09 | 2004-09-28 | Nano-Proprietary, Inc. | Enhanced field emission from carbon nanotubes mixed with particles |
WO2004047166A2 (en) * | 2002-11-15 | 2004-06-03 | E.I. Du Pont De Nemours And Company | Process for using protective layers in the fabrication of electronic devices |
US20040140861A1 (en) * | 2002-11-15 | 2004-07-22 | Alvarez Robby L. | High temperature superconducting mini-filter resonator configuration with low sensitivity to variations in substrate thickness and resonator patterning |
EP1586112B1 (en) * | 2003-01-22 | 2006-12-27 | E.I. du Pont de Nemours and Company | Binder diffusion patterning of a thick film paste layer |
JP4040544B2 (ja) * | 2003-06-27 | 2008-01-30 | 東京応化工業株式会社 | レジスト用現像液組成物およびレジストパターンの形成方法 |
US7186498B2 (en) * | 2003-10-02 | 2007-03-06 | Willi-Kurt Gries | Alkaline developer for radiation sensitive compositions |
US7125648B2 (en) * | 2003-12-19 | 2006-10-24 | Fuji Photo Film Co., Ltd. | Method for forming images |
US7402373B2 (en) * | 2004-02-05 | 2008-07-22 | E.I. Du Pont De Nemours And Company | UV radiation blocking protective layers compatible with thick film pastes |
CN1973247A (zh) * | 2004-05-27 | 2007-05-30 | 纳幕尔杜邦公司 | 光聚合物保护层的显影剂 |
-
2003
- 2003-12-04 US US10/728,210 patent/US20040170925A1/en not_active Abandoned
- 2003-12-05 WO PCT/US2003/038810 patent/WO2004053593A2/en active Application Filing
- 2003-12-05 KR KR1020057010117A patent/KR20050084150A/ko not_active Application Discontinuation
- 2003-12-05 JP JP2004559365A patent/JP2006510046A/ja active Pending
- 2003-12-05 CN CNA2003801092354A patent/CN1742233A/zh active Pending
- 2003-12-05 AU AU2003293441A patent/AU2003293441A1/en not_active Abandoned
- 2003-12-05 EP EP03790390A patent/EP1567917A2/en not_active Withdrawn
-
2008
- 2008-03-05 US US12/042,772 patent/US20080166666A1/en not_active Abandoned
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2006510046A5 (ja) | ||
JP2007534012A5 (ja) | ||
JP2005508268A5 (ja) | ||
JP2008516418A5 (ja) | ||
JP2003167333A5 (ja) | ||
JP2994556B2 (ja) | ホトレジスト剥離方法 | |
JP2006520104A5 (ja) | ||
JP2008292975A5 (ja) | ||
JP2011529583A5 (ja) | ||
JP2000036931A5 (ja) | ||
JP2006215545A5 (ja) | ||
EP1998364A3 (en) | Semiconductor thin film forming system | |
JP2005509177A5 (ja) | ||
JP2005526989A5 (ja) | ||
TW200737300A (en) | Reflexible photo-mask blank, manufacturing method thereof, reflexible photomask, and manufacturing method of semiconductor apparatus | |
JP2009509292A5 (ja) | ||
JP2001056564A (ja) | 光重合性記録要素およびフレキソ印刷版作製方法 | |
JP2003270791A5 (ja) | ||
JP2003280202A5 (ja) | ||
JP2000231194A5 (ja) | ||
JP2005509176A5 (ja) | ||
JP2000298345A5 (ja) | ||
EP0838717A3 (en) | Dual purpose camera for photographic and digital images | |
JP2001330957A5 (ja) | ||
JP2005136289A5 (ja) |