JP2006319065A5 - - Google Patents

Download PDF

Info

Publication number
JP2006319065A5
JP2006319065A5 JP2005138949A JP2005138949A JP2006319065A5 JP 2006319065 A5 JP2006319065 A5 JP 2006319065A5 JP 2005138949 A JP2005138949 A JP 2005138949A JP 2005138949 A JP2005138949 A JP 2005138949A JP 2006319065 A5 JP2006319065 A5 JP 2006319065A5
Authority
JP
Japan
Prior art keywords
wafer
exposure apparatus
plate
liquid
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005138949A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006319065A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005138949A priority Critical patent/JP2006319065A/ja
Priority claimed from JP2005138949A external-priority patent/JP2006319065A/ja
Publication of JP2006319065A publication Critical patent/JP2006319065A/ja
Publication of JP2006319065A5 publication Critical patent/JP2006319065A5/ja
Withdrawn legal-status Critical Current

Links

JP2005138949A 2005-05-11 2005-05-11 露光装置 Withdrawn JP2006319065A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005138949A JP2006319065A (ja) 2005-05-11 2005-05-11 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005138949A JP2006319065A (ja) 2005-05-11 2005-05-11 露光装置

Publications (2)

Publication Number Publication Date
JP2006319065A JP2006319065A (ja) 2006-11-24
JP2006319065A5 true JP2006319065A5 (https=) 2008-08-07

Family

ID=37539476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005138949A Withdrawn JP2006319065A (ja) 2005-05-11 2005-05-11 露光装置

Country Status (1)

Country Link
JP (1) JP2006319065A (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009054784A (ja) 2007-08-27 2009-03-12 Canon Inc 補助板およびそれを有する露光装置
JP2010251745A (ja) * 2009-04-10 2010-11-04 Asml Netherlands Bv 液浸リソグラフィ装置及びデバイス製造方法
JP6155581B2 (ja) * 2012-09-14 2017-07-05 株式会社ニコン 露光装置、露光方法、デバイス製造方法
JP6418281B2 (ja) * 2017-06-07 2018-11-07 株式会社ニコン 露光装置
JP2019032552A (ja) * 2018-10-10 2019-02-28 株式会社ニコン 露光装置、露光方法、デバイス製造方法

Similar Documents

Publication Publication Date Title
US9021611B2 (en) Beam pen lithography
US8137997B2 (en) Method and system for tone inverting of residual layer tolerant imprint lithography
JP2005085789A5 (https=)
JP2005005707A5 (https=)
JP2007504678A5 (https=)
CN104937697B (zh) 曝光装置
JP2010093298A5 (https=)
WO2010030018A3 (en) Pattern forming method and device production method
DE602004011860D1 (de) Methode und Vorrichtung für modellgestützte Plazierung phasenbalancierter Hilfsstrukturen für optische Lithographie mit Auflösungsgrenzen unterhalb der Belichtungswellenlänge
TW200741361A (en) Photolithographic systems and methods for producing sub-diffraction-limited features
SG141385A1 (en) Lithographic apparatus and device manufacturing method
JP2005268759A5 (https=)
JP2013229475A (ja) 異物除去方法
JP2006270057A5 (https=)
JP2006319065A5 (https=)
JP2005136289A5 (https=)
JP2006041302A5 (https=)
JP2011023425A5 (https=)
CN100517064C (zh) 大面积微压印专用超平整度软模具的制作方法
CN1776527A (zh) 用于纳米印刷光刻技术的气动方法和装置
JP2020508478A (ja) 微細加工プロセスのための液体マスク
JP2005256090A5 (https=)
TW201544447A (zh) 用於凸印一奈米結構之方法及裝置
JP2009182364A5 (https=)
JP2009210295A5 (https=)