JP2006309220A5 - - Google Patents
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- Publication number
- JP2006309220A5 JP2006309220A5 JP2006110728A JP2006110728A JP2006309220A5 JP 2006309220 A5 JP2006309220 A5 JP 2006309220A5 JP 2006110728 A JP2006110728 A JP 2006110728A JP 2006110728 A JP2006110728 A JP 2006110728A JP 2006309220 A5 JP2006309220 A5 JP 2006309220A5
- Authority
- JP
- Japan
- Prior art keywords
- lens
- projection objective
- image
- refractive index
- objective according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims 9
- 239000000463 material Substances 0.000 claims 9
- 230000003287 optical effect Effects 0.000 claims 8
- 210000001747 pupil Anatomy 0.000 claims 8
- 230000005855 radiation Effects 0.000 claims 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 101000728490 Homo sapiens Tether containing UBX domain for GLUT4 Proteins 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 102100029773 Tether containing UBX domain for GLUT4 Human genes 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 2
- 239000007787 solid Substances 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims 1
- 229910020068 MgAl Inorganic materials 0.000 claims 1
- JEHVHULVYXPDBB-UHFFFAOYSA-N [O-2].[Sr+2].[O-2].[Mg+2] Chemical compound [O-2].[Sr+2].[O-2].[Mg+2] JEHVHULVYXPDBB-UHFFFAOYSA-N 0.000 claims 1
- UQYQVPOTZORXPY-UHFFFAOYSA-N calcium strontium oxygen(2-) Chemical compound [O-2].[Ca+2].[O-2].[Sr+2] UQYQVPOTZORXPY-UHFFFAOYSA-N 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- UAMZXLIURMNTHD-UHFFFAOYSA-N dialuminum;magnesium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[Mg+2].[Al+3].[Al+3] UAMZXLIURMNTHD-UHFFFAOYSA-N 0.000 claims 1
- 239000002019 doping agent Substances 0.000 claims 1
- 238000007654 immersion Methods 0.000 claims 1
- 239000011344 liquid material Substances 0.000 claims 1
- 230000005499 meniscus Effects 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- 102220047090 rs6152 Human genes 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000011343 solid material Substances 0.000 claims 1
- 229910052596 spinel Inorganic materials 0.000 claims 1
- 239000011029 spinel Substances 0.000 claims 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US67587505P | 2005-04-29 | 2005-04-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006309220A JP2006309220A (ja) | 2006-11-09 |
| JP2006309220A5 true JP2006309220A5 (enExample) | 2009-04-23 |
Family
ID=37476107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006110728A Pending JP2006309220A (ja) | 2005-04-29 | 2006-04-13 | 投影対物レンズ |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7557996B2 (enExample) |
| JP (1) | JP2006309220A (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW538256B (en) * | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US7466489B2 (en) | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| WO2005059645A2 (en) | 2003-12-19 | 2005-06-30 | Carl Zeiss Smt Ag | Microlithography projection objective with crystal elements |
| KR101150037B1 (ko) | 2004-01-14 | 2012-07-02 | 칼 짜이스 에스엠티 게엠베하 | 반사굴절식 투영 대물렌즈 |
| US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US7463422B2 (en) | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
| US7712905B2 (en) | 2004-04-08 | 2010-05-11 | Carl Zeiss Smt Ag | Imaging system with mirror group |
| US7310131B2 (en) * | 2005-08-02 | 2007-12-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP1963901A2 (en) * | 2005-12-22 | 2008-09-03 | Corning Incorporated | Submersive doublet for high numerical aperture optical system |
| US7557997B2 (en) | 2006-09-28 | 2009-07-07 | Nikon Corporation | Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element |
| EP1998223A2 (de) * | 2007-01-23 | 2008-12-03 | Carl Zeiss SMT AG | Projektionsobjektiv für die Lithographie |
| DE102007062894A1 (de) | 2007-01-23 | 2008-07-24 | Carl Zeiss Smt Ag | Projektionsobjektiv für die Lithographie |
| US20080259308A1 (en) * | 2007-04-18 | 2008-10-23 | Carl Zeiss Smt Ag | Projection objective for microlithography |
| JP5224218B2 (ja) * | 2007-07-23 | 2013-07-03 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の光学システム |
| DE102007043896A1 (de) | 2007-09-14 | 2009-04-02 | Carl Zeiss Smt Ag | Mikrooptik zur Messung der Position eines Luftbildes |
| KR101510493B1 (ko) * | 2007-10-02 | 2015-04-08 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피용 투사 대물렌즈 |
| DE102009011329A1 (de) | 2009-03-05 | 2010-09-09 | Carl Zeiss Smt Ag | Kompaktes katadioptrisches Projektionsobjektiv für die Immersionslithographie sowie Projektionsbelichtungsverfahren |
| TW201202743A (en) * | 2010-07-13 | 2012-01-16 | Kuo-Ching Chiang | High resolution image capture device and the lens set thereof |
| JP7737105B2 (ja) * | 2021-07-06 | 2025-09-10 | 信越化学工業株式会社 | 再生インプリントモールドの製造方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9622349D0 (en) * | 1996-10-28 | 1997-01-08 | Therefore Limited | Hand held computer and communications apparatus |
| JP4717974B2 (ja) | 1999-07-13 | 2011-07-06 | 株式会社ニコン | 反射屈折光学系及び該光学系を備える投影露光装置 |
| TW538256B (en) | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
| JP2001228401A (ja) | 2000-02-16 | 2001-08-24 | Canon Inc | 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法 |
| JP4245286B2 (ja) | 2000-10-23 | 2009-03-25 | 株式会社ニコン | 反射屈折光学系および該光学系を備えた露光装置 |
| JP2003114387A (ja) | 2001-10-04 | 2003-04-18 | Nikon Corp | 反射屈折光学系および該光学系を備える投影露光装置 |
| US6912042B2 (en) | 2002-03-28 | 2005-06-28 | Carl Zeiss Smt Ag | 6-mirror projection objective with few lenses |
| SG10201405231YA (en) | 2003-05-06 | 2014-09-26 | Nippon Kogaku Kk | Projection optical system, exposure apparatus, and exposure method |
| JP2005115127A (ja) * | 2003-10-09 | 2005-04-28 | Nikon Corp | 反射屈折投影光学系、露光装置及び露光方法 |
| JP4880869B2 (ja) * | 2003-08-28 | 2012-02-22 | 株式会社ニコン | レンズ系及び投影露光装置 |
| US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| US7385764B2 (en) * | 2003-12-15 | 2008-06-10 | Carl Zeiss Smt Ag | Objectives as a microlithography projection objective with at least one liquid lens |
| EP1697798A2 (en) | 2003-12-15 | 2006-09-06 | Carl Zeiss SMT AG | Projection objective having a high aperture and a planar end surface |
| JP2006113533A (ja) * | 2004-08-03 | 2006-04-27 | Nikon Corp | 投影光学系、露光装置、および露光方法 |
| US20060198029A1 (en) * | 2005-03-01 | 2006-09-07 | Karl-Heinz Schuster | Microlithography projection objective and projection exposure apparatus |
| MX2017002606A (es) | 2014-08-28 | 2017-09-19 | Total Sa | Sistema y metodo para extraer gas de un pozo. |
-
2006
- 2006-04-13 JP JP2006110728A patent/JP2006309220A/ja active Pending
- 2006-04-28 US US11/412,925 patent/US7557996B2/en not_active Expired - Fee Related
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