JP2006270127A5 - - Google Patents
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- Publication number
- JP2006270127A5 JP2006270127A5 JP2006173071A JP2006173071A JP2006270127A5 JP 2006270127 A5 JP2006270127 A5 JP 2006270127A5 JP 2006173071 A JP2006173071 A JP 2006173071A JP 2006173071 A JP2006173071 A JP 2006173071A JP 2006270127 A5 JP2006270127 A5 JP 2006270127A5
- Authority
- JP
- Japan
- Prior art keywords
- absorption peak
- nno
- silicon crystal
- intensity
- nitrogen concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 68
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 53
- 229910052710 silicon Inorganic materials 0.000 claims 53
- 239000010703 silicon Substances 0.000 claims 53
- 238000010521 absorption reaction Methods 0.000 claims 47
- 239000013078 crystal Substances 0.000 claims 39
- 229910052757 nitrogen Inorganic materials 0.000 claims 34
- 238000000034 method Methods 0.000 claims 27
- 230000007547 defect Effects 0.000 claims 17
- 238000006243 chemical reaction Methods 0.000 claims 11
- 238000010438 heat treatment Methods 0.000 claims 11
- 235000012431 wafers Nutrition 0.000 claims 11
- 238000000862 absorption spectrum Methods 0.000 claims 10
- 238000004519 manufacturing process Methods 0.000 claims 4
- 239000002131 composite material Substances 0.000 claims 3
- 238000000691 measurement method Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 238000011156 evaluation Methods 0.000 claims 1
- 230000005070 ripening Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006173071A JP4346629B2 (ja) | 2001-08-29 | 2006-06-22 | シリコン結晶中の窒素濃度測定方法、シリコン結晶内窒素濃度算出用の換算係数の決定方法、シリコンウエハの製造方法、及び半導体装置の製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001259446 | 2001-08-29 | ||
| JP2006173071A JP4346629B2 (ja) | 2001-08-29 | 2006-06-22 | シリコン結晶中の窒素濃度測定方法、シリコン結晶内窒素濃度算出用の換算係数の決定方法、シリコンウエハの製造方法、及び半導体装置の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002074870A Division JP3876175B2 (ja) | 2001-08-29 | 2002-03-18 | シリコン結晶中の窒素濃度測定方法、窒素濃度測定用換算表の作成方法、シリコンウエハの製造方法、及び半導体装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006270127A JP2006270127A (ja) | 2006-10-05 |
| JP2006270127A5 true JP2006270127A5 (https=) | 2006-11-16 |
| JP4346629B2 JP4346629B2 (ja) | 2009-10-21 |
Family
ID=37205668
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006173071A Expired - Fee Related JP4346629B2 (ja) | 2001-08-29 | 2006-06-22 | シリコン結晶中の窒素濃度測定方法、シリコン結晶内窒素濃度算出用の換算係数の決定方法、シリコンウエハの製造方法、及び半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4346629B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12584869B2 (en) * | 2021-02-26 | 2026-03-24 | Honeywell Limited | Boehmite detection and warning system, and concentration indicator for LiB separator sheet manufacturing |
| CN113884462A (zh) * | 2021-09-28 | 2022-01-04 | 西安奕斯伟材料科技有限公司 | 一种氮掺杂单晶硅中氮元素的测量方法及系统 |
-
2006
- 2006-06-22 JP JP2006173071A patent/JP4346629B2/ja not_active Expired - Fee Related
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