JP2006259439A - 分波素子および分波方法 - Google Patents
分波素子および分波方法 Download PDFInfo
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- JP2006259439A JP2006259439A JP2005078702A JP2005078702A JP2006259439A JP 2006259439 A JP2006259439 A JP 2006259439A JP 2005078702 A JP2005078702 A JP 2005078702A JP 2005078702 A JP2005078702 A JP 2005078702A JP 2006259439 A JP2006259439 A JP 2006259439A
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005078702A JP2006259439A (ja) | 2005-03-18 | 2005-03-18 | 分波素子および分波方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005078702A JP2006259439A (ja) | 2005-03-18 | 2005-03-18 | 分波素子および分波方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006259439A true JP2006259439A (ja) | 2006-09-28 |
| JP2006259439A5 JP2006259439A5 (enExample) | 2008-02-21 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005078702A Withdrawn JP2006259439A (ja) | 2005-03-18 | 2005-03-18 | 分波素子および分波方法 |
Country Status (1)
| Country | Link |
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| JP (1) | JP2006259439A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018179866A (ja) * | 2017-04-19 | 2018-11-15 | 株式会社ミツトヨ | 光学式エンコーダ |
| DE102018124314A1 (de) * | 2018-10-02 | 2020-04-02 | Carl Zeiss Smt Gmbh | Vorrichtung zur Bestimmung der Belichtungsenergie bei der Belichtung eines Elements in einem optischen System, insbesondere für die Mikrolithographie |
-
2005
- 2005-03-18 JP JP2005078702A patent/JP2006259439A/ja not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018179866A (ja) * | 2017-04-19 | 2018-11-15 | 株式会社ミツトヨ | 光学式エンコーダ |
| DE102018002259B4 (de) * | 2017-04-19 | 2025-12-04 | Mitutoyo Corporation | Optische Kodiereinrichtung und Kodierverfahren |
| DE102018124314A1 (de) * | 2018-10-02 | 2020-04-02 | Carl Zeiss Smt Gmbh | Vorrichtung zur Bestimmung der Belichtungsenergie bei der Belichtung eines Elements in einem optischen System, insbesondere für die Mikrolithographie |
| DE102018124314B4 (de) * | 2018-10-02 | 2020-10-22 | Carl Zeiss Smt Gmbh | Vorrichtung zur Bestimmung der Belichtungsenergie bei der Belichtung eines Elements in einem optischen System, insbesondere für die Mikrolithographie |
| DE102018124314B9 (de) * | 2018-10-02 | 2020-12-31 | Carl Zeiss Smt Gmbh | Vorrichtung zur Bestimmung der Belichtungsenergie bei der Belichtung eines Elements in einem optischen System, insbesondere für die Mikrolithographie |
| US11079604B2 (en) | 2018-10-02 | 2021-08-03 | Carl Zeiss Smt Gmbh | Device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography |
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