JP2006206413A5 - - Google Patents

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Publication number
JP2006206413A5
JP2006206413A5 JP2005023945A JP2005023945A JP2006206413A5 JP 2006206413 A5 JP2006206413 A5 JP 2006206413A5 JP 2005023945 A JP2005023945 A JP 2005023945A JP 2005023945 A JP2005023945 A JP 2005023945A JP 2006206413 A5 JP2006206413 A5 JP 2006206413A5
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JP
Japan
Prior art keywords
fine particles
silica fine
treated silica
treated
methanol
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JP2005023945A
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English (en)
Japanese (ja)
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JP2006206413A (ja
JP4758655B2 (ja
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Priority to JP2005023945A priority Critical patent/JP4758655B2/ja
Priority claimed from JP2005023945A external-priority patent/JP4758655B2/ja
Publication of JP2006206413A publication Critical patent/JP2006206413A/ja
Publication of JP2006206413A5 publication Critical patent/JP2006206413A5/ja
Application granted granted Critical
Publication of JP4758655B2 publication Critical patent/JP4758655B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005023945A 2005-01-31 2005-01-31 表面処理シリカ微粒子 Expired - Fee Related JP4758655B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005023945A JP4758655B2 (ja) 2005-01-31 2005-01-31 表面処理シリカ微粒子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005023945A JP4758655B2 (ja) 2005-01-31 2005-01-31 表面処理シリカ微粒子

Publications (3)

Publication Number Publication Date
JP2006206413A JP2006206413A (ja) 2006-08-10
JP2006206413A5 true JP2006206413A5 (https=) 2007-08-16
JP4758655B2 JP4758655B2 (ja) 2011-08-31

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ID=36963658

Family Applications (1)

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JP2005023945A Expired - Fee Related JP4758655B2 (ja) 2005-01-31 2005-01-31 表面処理シリカ微粒子

Country Status (1)

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JP (1) JP4758655B2 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5230067B2 (ja) * 2005-12-28 2013-07-10 株式会社トクヤマ 表面被覆シリカ、およびその製造方法
JP4431605B2 (ja) * 2007-08-09 2010-03-17 シャープ株式会社 トナーの製造方法、トナー、二成分現像剤、現像装置および画像形成装置
WO2010038538A1 (ja) * 2008-10-01 2010-04-08 日本アエロジル株式会社 疎水性シリカ微粒子及び電子写真用トナー組成物
JP5504600B2 (ja) * 2008-10-01 2014-05-28 日本アエロジル株式会社 疎水性シリカ微粒子及び電子写真用トナー組成物
JP5230457B2 (ja) * 2009-01-14 2013-07-10 株式会社トクヤマ 親水性乾式シリカの保存方法
JP5468463B2 (ja) * 2010-05-11 2014-04-09 電気化学工業株式会社 表面改質球状シリカ粉末及びその製造方法
JP2012027142A (ja) * 2010-07-21 2012-02-09 Nippon Aerosil Co Ltd 電子写真用トナー用外添剤及び電子写真用トナー
US8722293B2 (en) 2012-01-31 2014-05-13 Fuji Xerox Co., Ltd. Electrostatic charge image developing toner, electrostatic charge image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method
JP6582776B2 (ja) 2015-09-14 2019-10-02 富士ゼロックス株式会社 シリカ粒子、及びシリカ粒子の製造方法
JP2017142398A (ja) 2016-02-10 2017-08-17 富士ゼロックス株式会社 静電荷像現像用トナー、静電荷像現像剤、トナーカートリッジ、プロセスカートリッジ、画像形成装置、及び、画像形成方法
JP6648547B2 (ja) 2016-02-10 2020-02-14 富士ゼロックス株式会社 静電荷像現像剤、現像剤カートリッジ、プロセスカートリッジ、画像形成装置、及び、画像形成方法
JP6658044B2 (ja) 2016-02-10 2020-03-04 富士ゼロックス株式会社 静電荷像現像用トナー、静電荷像現像剤、トナーカートリッジ、プロセスカートリッジ、画像形成装置、及び、画像形成方法
JP6642077B2 (ja) 2016-02-10 2020-02-05 富士ゼロックス株式会社 静電荷像現像用トナー、静電荷像現像剤、トナーカートリッジ、プロセスカートリッジ、画像形成装置、及び、画像形成方法
JP6610317B2 (ja) 2016-02-10 2019-11-27 富士ゼロックス株式会社 静電荷像現像用トナー、静電荷像現像剤、トナーカートリッジ、プロセスカートリッジ、画像形成装置、及び、画像形成方法
WO2019069535A1 (ja) 2017-10-04 2019-04-11 株式会社アドマテックス シリコーン被覆フィラー及びその製造方法並びに樹脂組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4321901B2 (ja) * 1999-03-19 2009-08-26 株式会社トクヤマ 疎水性シリカの製造方法
JP4828032B2 (ja) * 2001-03-05 2011-11-30 株式会社トクヤマ 疎水性シリカ粉末およびその製造方法
JP5230051B2 (ja) * 2002-09-11 2013-07-10 株式会社トクヤマ 微小溶融シリカ粒子
JP2004168559A (ja) * 2002-11-15 2004-06-17 Nippon Aerosil Co Ltd 高分散高疎水性シリカ粉末とその製造方法

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