JP2006206413A5 - - Google Patents

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JP2006206413A5
JP2006206413A5 JP2005023945A JP2005023945A JP2006206413A5 JP 2006206413 A5 JP2006206413 A5 JP 2006206413A5 JP 2005023945 A JP2005023945 A JP 2005023945A JP 2005023945 A JP2005023945 A JP 2005023945A JP 2006206413 A5 JP2006206413 A5 JP 2006206413A5
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fine particles
silica fine
treated silica
treated
methanol
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JP2005023945A
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JP2006206413A (en
JP4758655B2 (en
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シリコーンオイルにて処理された平均一次粒子径が５０〜２００ｎｍである表面処理シリカ微粒子であり、該表面処理シリカ微粒子のメタノール滴定法による疎水化度が６５容量％以上であり、且つメタノール濃度が６０容量％のメタノール水における浮遊率が９０％以上であることを特徴とする表面処理シリカ微粒子。   Surface-treated silica fine particles having an average primary particle size of 50 to 200 nm treated with silicone oil, the degree of hydrophobicity of the surface-treated silica fine particles by a methanol titration method is 65% by volume or more, and the methanol concentration is 60 Surface-treated silica fine particles characterized by having a buoyancy ratio of 90% or more in a volume% methanol water. 該表面処理シリカ微粒子の原体シリカ微粒子に対する小角Ｘ線散乱測定において、解析対象範囲５０ｎｍ〜１５０ｎｍのフラクタル形状パラメータα１及び解析対象範囲１５０ｎｍ〜３５３ｎｍのフラクタル形状パラメータα２が下記式（１）及び（２）：
−０．００６８Ｓ＋２．５４８≦α１≦−０．００６８Ｓ＋３．７４８（１）
−０．００１１Ｓ＋１．１５８≦α２≦−０．００１１Ｓ＋２．０５８（２）
（上記式中、Ｓは原体シリカ微粒子のＢＥＴ比表面積（ｍ２／ｇ）を示す。）
で示される条件を満足していることを特徴とする請求項１記載の表面処理シリカ微粒子。 In the small-angle X-ray scattering measurement of the surface-treated silica fine particles with respect to the raw silica fine particles, the fractal shape parameter α 1 in the analysis target range 50 nm to 150 nm and the fractal shape parameter α 2 in the analysis target range 150 nm to 353 nm are expressed by the following formula (1) and (2):
−0.0068S + 2.548 ≦ α 1 ≦ −0.0068S + 3.748 (1)
−0.0011S + 1.158 ≦ α 2 ≦ −0.0011S + 2.058 (2)
(In the above formula, S represents the BET specific surface area (m 2 / g) of the active silica fine particles.)
The surface-treated silica fine particles according to claim 1, which satisfy the condition represented by: 前記表面処理シリカ微粒子において、炭素量Ｃ１（％）及びクロロホルム抽出後の炭素量Ｃ２（％）との差（ΔＣ（％））が、０．５〜３．０の範囲内であることを特徴とする請求項１又は２記載の表面処理シリカ微粒子。 In the surface-treated silica fine particles, the carbon content C 1 (%) and the difference between the amount of carbon C 2 (%) of the chloroform extraction Dego (ΔC (%)) is in the range of 0.5 to 3.0 The surface-treated silica fine particles according to claim 1 or 2, wherein the surface-treated silica fine particles are present. 請求項１〜３記載の何れか一項に記載の表面処理シリカ微粒子よりなる電子写真用トナー外添剤。   An electrophotographic toner external additive comprising the surface-treated silica fine particles according to any one of claims 1 to 3.
JP2005023945A 2005-01-31 2005-01-31 Surface-treated silica fine particles Active JP4758655B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005023945A JP4758655B2 (en) 2005-01-31 2005-01-31 Surface-treated silica fine particles

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Application Number Priority Date Filing Date Title
JP2005023945A JP4758655B2 (en) 2005-01-31 2005-01-31 Surface-treated silica fine particles

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JP2006206413A JP2006206413A (en) 2006-08-10
JP2006206413A5 true JP2006206413A5 (en) 2007-08-16
JP4758655B2 JP4758655B2 (en) 2011-08-31

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Families Citing this family (15)

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JP5230067B2 (en) * 2005-12-28 2013-07-10 株式会社トクヤマ Surface-coated silica and method for producing the same
JP4431605B2 (en) * 2007-08-09 2010-03-17 シャープ株式会社 Toner manufacturing method, toner, two-component developer, developing device, and image forming apparatus
ES2784739T3 (en) * 2008-10-01 2020-09-30 Nippon Aerosil Co Ltd Hydrophobic Silica Fine Particles and Electrophotographic Toner Composition
JP5504600B2 (en) * 2008-10-01 2014-05-28 日本アエロジル株式会社 Hydrophobic silica fine particles and electrophotographic toner composition
JP5230457B2 (en) * 2009-01-14 2013-07-10 株式会社トクヤマ Storage method of hydrophilic dry silica
JP5468463B2 (en) * 2010-05-11 2014-04-09 電気化学工業株式会社 Surface-modified spherical silica powder and method for producing the same
JP2012027142A (en) * 2010-07-21 2012-02-09 Nippon Aerosil Co Ltd External additive for electrophotographic toner and electrophotographic toner
US8722293B2 (en) 2012-01-31 2014-05-13 Fuji Xerox Co., Ltd. Electrostatic charge image developing toner, electrostatic charge image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method
JP6582776B2 (en) 2015-09-14 2019-10-02 富士ゼロックス株式会社 Silica particles and method for producing silica particles
JP6648547B2 (en) 2016-02-10 2020-02-14 富士ゼロックス株式会社 Electrostatic image developer, developer cartridge, process cartridge, image forming apparatus, and image forming method
JP6658044B2 (en) 2016-02-10 2020-03-04 富士ゼロックス株式会社 Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method
JP6610317B2 (en) 2016-02-10 2019-11-27 富士ゼロックス株式会社 Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method
JP6642077B2 (en) 2016-02-10 2020-02-05 富士ゼロックス株式会社 Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method
JP2017142398A (en) 2016-02-10 2017-08-17 富士ゼロックス株式会社 Toner for electrostatic charge image development, electrostatic charge image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method
CN110536866B (en) 2017-10-04 2020-10-30 株式会社亚都玛科技 Silicone-coated filler, method for producing same, and resin composition

Family Cites Families (4)

* Cited by examiner, † Cited by third party
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JP4321901B2 (en) * 1999-03-19 2009-08-26 株式会社トクヤマ Method for producing hydrophobic silica
JP4828032B2 (en) * 2001-03-05 2011-11-30 株式会社トクヤマ Hydrophobic silica powder and method for producing the same
JP5230051B2 (en) * 2002-09-11 2013-07-10 株式会社トクヤマ Fine fused silica particles
JP2004168559A (en) * 2002-11-15 2004-06-17 Nippon Aerosil Co Ltd Highly dispersible, highly hydrophobic silica powder and its manufacturing process

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