JP2006194878A5 - - Google Patents

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Publication number
JP2006194878A5
JP2006194878A5 JP2006002870A JP2006002870A JP2006194878A5 JP 2006194878 A5 JP2006194878 A5 JP 2006194878A5 JP 2006002870 A JP2006002870 A JP 2006002870A JP 2006002870 A JP2006002870 A JP 2006002870A JP 2006194878 A5 JP2006194878 A5 JP 2006194878A5
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JP
Japan
Prior art keywords
substrate
etching
measurement
light beam
etch depth
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JP2006002870A
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English (en)
Japanese (ja)
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JP5392972B2 (ja
JP2006194878A (ja
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Priority claimed from US11/031,400 external-priority patent/US20060154388A1/en
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Publication of JP2006194878A publication Critical patent/JP2006194878A/ja
Publication of JP2006194878A5 publication Critical patent/JP2006194878A5/ja
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Publication of JP5392972B2 publication Critical patent/JP5392972B2/ja
Expired - Fee Related legal-status Critical Current
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JP2006002870A 2005-01-08 2006-01-10 透明基板のための統合計測チャンバ Expired - Fee Related JP5392972B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/031,400 US20060154388A1 (en) 2005-01-08 2005-01-08 Integrated metrology chamber for transparent substrates
US11/031,400 2005-01-08

Publications (3)

Publication Number Publication Date
JP2006194878A JP2006194878A (ja) 2006-07-27
JP2006194878A5 true JP2006194878A5 (enExample) 2009-03-05
JP5392972B2 JP5392972B2 (ja) 2014-01-22

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JP2006002870A Expired - Fee Related JP5392972B2 (ja) 2005-01-08 2006-01-10 透明基板のための統合計測チャンバ

Country Status (5)

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US (2) US20060154388A1 (enExample)
EP (1) EP1679548A1 (enExample)
JP (1) JP5392972B2 (enExample)
KR (1) KR101252068B1 (enExample)
TW (1) TWI375288B (enExample)

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