JP2006135111A - 波面収差測定装置、露光装置、及びデバイス製造方法 - Google Patents

波面収差測定装置、露光装置、及びデバイス製造方法 Download PDF

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Publication number
JP2006135111A
JP2006135111A JP2004322997A JP2004322997A JP2006135111A JP 2006135111 A JP2006135111 A JP 2006135111A JP 2004322997 A JP2004322997 A JP 2004322997A JP 2004322997 A JP2004322997 A JP 2004322997A JP 2006135111 A JP2006135111 A JP 2006135111A
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JP
Japan
Prior art keywords
lens
test
light
optical system
interferometer according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004322997A
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English (en)
Japanese (ja)
Other versions
JP2006135111A5 (enExample
Inventor
Osamu Konouchi
修 此内
Fukuyuki Kuramoto
福之 蔵本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004322997A priority Critical patent/JP2006135111A/ja
Priority to US11/267,561 priority patent/US7276717B2/en
Publication of JP2006135111A publication Critical patent/JP2006135111A/ja
Publication of JP2006135111A5 publication Critical patent/JP2006135111A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2004322997A 2004-11-05 2004-11-05 波面収差測定装置、露光装置、及びデバイス製造方法 Withdrawn JP2006135111A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004322997A JP2006135111A (ja) 2004-11-05 2004-11-05 波面収差測定装置、露光装置、及びデバイス製造方法
US11/267,561 US7276717B2 (en) 2004-11-05 2005-11-04 Measuring apparatus, exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004322997A JP2006135111A (ja) 2004-11-05 2004-11-05 波面収差測定装置、露光装置、及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006135111A true JP2006135111A (ja) 2006-05-25
JP2006135111A5 JP2006135111A5 (enExample) 2007-12-06

Family

ID=36315389

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004322997A Withdrawn JP2006135111A (ja) 2004-11-05 2004-11-05 波面収差測定装置、露光装置、及びデバイス製造方法

Country Status (2)

Country Link
US (1) US7276717B2 (enExample)
JP (1) JP2006135111A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008263091A (ja) * 2007-04-12 2008-10-30 Nikon Corp 光洗浄部材、メンテナンス方法、洗浄方法、露光方法及び露光装置、並びにデバイス製造方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101240775B1 (ko) * 2006-09-12 2013-03-07 칼 짜이스 에스엠테 게엠베하 소수성 코팅을 갖는 액침 리소그래피용 광학 장치 및 이를 포함하는 투영 노광 장치
JP2008108852A (ja) * 2006-10-24 2008-05-08 Canon Inc 投影露光装置、光学部品及びデバイス製造方法
US7608808B2 (en) * 2006-11-07 2009-10-27 Canon Kabushiki Kaisha Injection-locked pulsed laser with high wavelength stability
CN100462773C (zh) * 2007-06-22 2009-02-18 哈尔滨工业大学 运用Zernike系数精确确定激光收发同轴基准的方法
CN102252833B (zh) * 2011-06-24 2013-01-23 北京理工大学 大口径大动态范围准直系统波前质量检测装置
CN102252832B (zh) * 2011-06-24 2012-10-03 北京理工大学 大口径准直系统波前质量检测装置和方法
CN103471522B (zh) * 2012-12-07 2016-03-02 南通大学 检测范围广的凹非球面的实时检测方法
CN103196391A (zh) * 2013-04-16 2013-07-10 北京理工大学 一种近抛物面的环形凹非球面的快速面形检测方法
JP6188521B2 (ja) * 2013-10-02 2017-08-30 株式会社日立エルジーデータストレージ 光計測装置
CN103616802B (zh) * 2013-11-23 2015-04-15 华中科技大学 一种光刻机投影物镜波像差的测量方法
JP6690217B2 (ja) * 2015-03-09 2020-04-28 セイコーエプソン株式会社 光源装置及びプロジェクター
ES2892402T3 (es) 2017-08-01 2022-02-04 Gilead Sciences Inc Formas cristalinas de ((S)-((((2R,5R)-5-(6-amino-9H-purin-9-il)-4-fluoro-2,5-dihidrofuran-2-il)oxi)metil)(fenoxi)fosforil)-L-alaninato de etilo para tratar infecciones virales

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3796368B2 (ja) 1999-03-24 2006-07-12 キヤノン株式会社 投影露光装置
JP3796369B2 (ja) 1999-03-24 2006-07-12 キヤノン株式会社 干渉計を搭載した投影露光装置
JP2001074605A (ja) 1999-08-31 2001-03-23 Nikon Corp 波面収差測定装置
JP2002071513A (ja) 2000-08-28 2002-03-08 Nikon Corp 液浸系顕微鏡対物レンズ用干渉計および液浸系顕微鏡対物レンズの評価方法
JP4921644B2 (ja) 2001-02-27 2012-04-25 オリンパス株式会社 波面測定装置および波面測定方法
KR20050085026A (ko) * 2002-12-10 2005-08-29 가부시키가이샤 니콘 광학 소자 및 그 광학 소자를 사용한 투영 노광 장치
JP4343545B2 (ja) 2003-02-14 2009-10-14 キヤノン株式会社 測定方法
JP4416540B2 (ja) 2003-03-07 2010-02-17 キヤノン株式会社 収差測定方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008263091A (ja) * 2007-04-12 2008-10-30 Nikon Corp 光洗浄部材、メンテナンス方法、洗浄方法、露光方法及び露光装置、並びにデバイス製造方法

Also Published As

Publication number Publication date
US20060097205A1 (en) 2006-05-11
US7276717B2 (en) 2007-10-02

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