JP2006100568A - 走査型投影露光装置及びマイクロデバイスの製造方法 - Google Patents

走査型投影露光装置及びマイクロデバイスの製造方法 Download PDF

Info

Publication number
JP2006100568A
JP2006100568A JP2004284921A JP2004284921A JP2006100568A JP 2006100568 A JP2006100568 A JP 2006100568A JP 2004284921 A JP2004284921 A JP 2004284921A JP 2004284921 A JP2004284921 A JP 2004284921A JP 2006100568 A JP2006100568 A JP 2006100568A
Authority
JP
Japan
Prior art keywords
projection optical
mask
optical unit
scanning
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004284921A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006100568A5 (enExample
Inventor
Masanori Kato
正紀 加藤
Kenji Shimizu
賢二 清水
Satoyuki Watanabe
智行 渡辺
Manabu Toguchi
学 戸口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2004284921A priority Critical patent/JP2006100568A/ja
Publication of JP2006100568A publication Critical patent/JP2006100568A/ja
Publication of JP2006100568A5 publication Critical patent/JP2006100568A5/ja
Pending legal-status Critical Current

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004284921A 2004-09-29 2004-09-29 走査型投影露光装置及びマイクロデバイスの製造方法 Pending JP2006100568A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004284921A JP2006100568A (ja) 2004-09-29 2004-09-29 走査型投影露光装置及びマイクロデバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004284921A JP2006100568A (ja) 2004-09-29 2004-09-29 走査型投影露光装置及びマイクロデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2006100568A true JP2006100568A (ja) 2006-04-13
JP2006100568A5 JP2006100568A5 (enExample) 2007-10-25

Family

ID=36240083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004284921A Pending JP2006100568A (ja) 2004-09-29 2004-09-29 走査型投影露光装置及びマイクロデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP2006100568A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7864293B2 (en) * 2005-01-25 2011-01-04 Nikon Corporation Exposure apparatus, exposure method, and producing method of microdevice
CN112015055A (zh) * 2019-05-31 2020-12-01 佳能株式会社 曝光装置和物品制造方法
JP2022022912A (ja) * 2020-07-10 2022-02-07 キヤノン株式会社 露光装置および物品製造方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0888164A (ja) * 1994-09-20 1996-04-02 Nikon Corp 投影露光装置
JPH09298151A (ja) * 1996-05-02 1997-11-18 Nikon Corp 投影露光装置
JPH11260712A (ja) * 1998-03-12 1999-09-24 Nikon Corp 露光装置及び方法
JPH11307415A (ja) * 1998-04-16 1999-11-05 Nikon Corp 露光方法および露光装置
JP2000072365A (ja) * 1998-09-01 2000-03-07 Matsushita Electric Works Ltd エレベータ乗場の気密構造
JP2000331923A (ja) * 1999-05-24 2000-11-30 Nikon Corp 投影光学系およびその結像特性調整方法並びに投影露光装置
JP2003309053A (ja) * 2002-04-12 2003-10-31 Nikon Corp 露光装置及び露光方法
JP2004172471A (ja) * 2002-11-21 2004-06-17 Nikon Corp 露光方法及び露光装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0888164A (ja) * 1994-09-20 1996-04-02 Nikon Corp 投影露光装置
JPH09298151A (ja) * 1996-05-02 1997-11-18 Nikon Corp 投影露光装置
JPH11260712A (ja) * 1998-03-12 1999-09-24 Nikon Corp 露光装置及び方法
JPH11307415A (ja) * 1998-04-16 1999-11-05 Nikon Corp 露光方法および露光装置
JP2000072365A (ja) * 1998-09-01 2000-03-07 Matsushita Electric Works Ltd エレベータ乗場の気密構造
JP2000331923A (ja) * 1999-05-24 2000-11-30 Nikon Corp 投影光学系およびその結像特性調整方法並びに投影露光装置
JP2003309053A (ja) * 2002-04-12 2003-10-31 Nikon Corp 露光装置及び露光方法
JP2004172471A (ja) * 2002-11-21 2004-06-17 Nikon Corp 露光方法及び露光装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7864293B2 (en) * 2005-01-25 2011-01-04 Nikon Corporation Exposure apparatus, exposure method, and producing method of microdevice
CN112015055A (zh) * 2019-05-31 2020-12-01 佳能株式会社 曝光装置和物品制造方法
CN112015055B (zh) * 2019-05-31 2024-02-06 佳能株式会社 曝光装置和物品制造方法
JP2022022912A (ja) * 2020-07-10 2022-02-07 キヤノン株式会社 露光装置および物品製造方法

Similar Documents

Publication Publication Date Title
TWI402627B (zh) 曝光裝置與曝光方法以及微元件的製造方法
CN101218482B (zh) 面位置检测装置、曝光装置及曝光方法
TWI440990B (zh) Exposure method and apparatus, and component manufacturing method
JP2004327660A (ja) 走査型投影露光装置、露光方法及びデバイス製造方法
US20090042115A1 (en) Exposure apparatus, exposure method, and electronic device manufacturing method
JP5622068B2 (ja) 面位置検出装置、露光装置、およびデバイスの製造方法
US8149385B2 (en) Alignment unit and exposure apparatus
JP2007052214A (ja) 走査型露光装置及びマイクロデバイスの製造方法
US6426508B1 (en) Surface-position detection device, a projection exposure apparatus using the device, and a device manufacturing method using the apparatus
US6654099B2 (en) Scanning exposure apparatus, scanning exposure method and mask
JPH06232027A (ja) 投影露光装置
JP4760019B2 (ja) 露光装置及びデバイスの製造方法
CN100549835C (zh) 曝光装置与曝光方法以及微元件的制造方法
JP2006100568A (ja) 走査型投影露光装置及びマイクロデバイスの製造方法
JP4729899B2 (ja) 走査型投影露光装置、マスクステージの走り補正方法及びマイクロデバイスの製造方法
JP5622126B2 (ja) 面位置検出装置、露光装置、およびデバイスの製造方法
JP5699419B2 (ja) 露光方法及び露光装置並びにデバイス製造方法
JP2007279113A (ja) 走査型露光装置及びデバイスの製造方法
CN107430357A (zh) 曝光装置、平面显示器的制造方法、元件制造方法、及曝光方法
WO2013168456A1 (ja) 面位置計測装置、露光装置、およびデバイス製造方法
JP4543913B2 (ja) 露光装置及びマイクロデバイスの製造方法
JP4807100B2 (ja) 露光装置、露光方法及びデバイス製造方法
JP5007538B2 (ja) 露光装置、デバイスの製造方法及び露光方法
JP2005026615A (ja) ステージ装置及び露光装置、計測方法
JP2011248125A (ja) 露光方法、露光装置、マスク及びデバイス製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070828

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070906

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100407

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100420

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100621

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101124

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20110322