JP2006030966A - 描画方法および装置 - Google Patents

描画方法および装置 Download PDF

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Publication number
JP2006030966A
JP2006030966A JP2005160768A JP2005160768A JP2006030966A JP 2006030966 A JP2006030966 A JP 2006030966A JP 2005160768 A JP2005160768 A JP 2005160768A JP 2005160768 A JP2005160768 A JP 2005160768A JP 2006030966 A JP2006030966 A JP 2006030966A
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Japan
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exposure
heads
head
pixel
pixels
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Pending
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JP2005160768A
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English (en)
Japanese (ja)
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JP2006030966A5 (enExample
Inventor
Katsuto Sumi
克人 角
Kazumasa Suzuki
一誠 鈴木
Kazuteru Kowada
一輝 古和田
Takashi Fukui
隆史 福井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
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Fuji Photo Film Co Ltd
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Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP2005160768A priority Critical patent/JP2006030966A/ja
Publication of JP2006030966A publication Critical patent/JP2006030966A/ja
Publication of JP2006030966A5 publication Critical patent/JP2006030966A5/ja
Pending legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2005160768A 2004-06-17 2005-05-31 描画方法および装置 Pending JP2006030966A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005160768A JP2006030966A (ja) 2004-06-17 2005-05-31 描画方法および装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004179587 2004-06-17
JP2005160768A JP2006030966A (ja) 2004-06-17 2005-05-31 描画方法および装置

Publications (2)

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JP2006030966A true JP2006030966A (ja) 2006-02-02
JP2006030966A5 JP2006030966A5 (enExample) 2006-03-23

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ID=35897322

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JP2005160768A Pending JP2006030966A (ja) 2004-06-17 2005-05-31 描画方法および装置

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JP (1) JP2006030966A (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006112137A1 (ja) * 2005-03-31 2006-10-26 Fujifilm Corporation パターン形成方法
JP2006306006A (ja) * 2005-03-31 2006-11-09 Fuji Photo Film Co Ltd 描画装置および描画方法
WO2006129535A1 (ja) * 2005-05-31 2006-12-07 Fujifilm Corporation 描画方法および装置
WO2006137241A1 (ja) * 2005-06-22 2006-12-28 Fujifilm Corporation パターン形成方法
WO2007000885A1 (ja) * 2005-06-28 2007-01-04 Fujifilm Corporation 永久パターン形成方法
WO2007007818A1 (en) * 2005-07-12 2007-01-18 Fujifilm Corporation Method for manufacturing internal cell structure, internal cell structure, and display device
JP2008070506A (ja) * 2006-09-13 2008-03-27 Dainippon Screen Mfg Co Ltd パターン描画装置およびパターン描画方法
CN119126502A (zh) * 2024-11-04 2024-12-13 深圳市先地图像科技有限公司 激光扫描成像过程中像素行调整方法、系统及相关设备

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10232362A (ja) * 1997-02-20 1998-09-02 Asahi Optical Co Ltd レーザ描画装置
JP2000267295A (ja) * 1999-03-15 2000-09-29 Fujitsu Ltd 露光方法及びその装置
JP2001255664A (ja) * 2000-03-14 2001-09-21 Fuji Photo Film Co Ltd 画像露光方法
JP2003122030A (ja) * 2001-08-08 2003-04-25 Pentax Corp 多重露光描画装置および多重露光描画方法
JP2003195512A (ja) * 2001-12-28 2003-07-09 Pentax Corp 多重露光描画装置および多重露光描画方法
JP2004009595A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光ヘッド及び露光装置
JP2005003762A (ja) * 2003-06-10 2005-01-06 Fuji Photo Film Co Ltd 画素位置特定方法、画像ずれ補正方法、および画像形成装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10232362A (ja) * 1997-02-20 1998-09-02 Asahi Optical Co Ltd レーザ描画装置
JP2000267295A (ja) * 1999-03-15 2000-09-29 Fujitsu Ltd 露光方法及びその装置
JP2001255664A (ja) * 2000-03-14 2001-09-21 Fuji Photo Film Co Ltd 画像露光方法
JP2003122030A (ja) * 2001-08-08 2003-04-25 Pentax Corp 多重露光描画装置および多重露光描画方法
JP2003195512A (ja) * 2001-12-28 2003-07-09 Pentax Corp 多重露光描画装置および多重露光描画方法
JP2004009595A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光ヘッド及び露光装置
JP2005003762A (ja) * 2003-06-10 2005-01-06 Fuji Photo Film Co Ltd 画素位置特定方法、画像ずれ補正方法、および画像形成装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006112137A1 (ja) * 2005-03-31 2006-10-26 Fujifilm Corporation パターン形成方法
JP2006306006A (ja) * 2005-03-31 2006-11-09 Fuji Photo Film Co Ltd 描画装置および描画方法
WO2006129535A1 (ja) * 2005-05-31 2006-12-07 Fujifilm Corporation 描画方法および装置
WO2006137241A1 (ja) * 2005-06-22 2006-12-28 Fujifilm Corporation パターン形成方法
WO2007000885A1 (ja) * 2005-06-28 2007-01-04 Fujifilm Corporation 永久パターン形成方法
WO2007007818A1 (en) * 2005-07-12 2007-01-18 Fujifilm Corporation Method for manufacturing internal cell structure, internal cell structure, and display device
JP2008070506A (ja) * 2006-09-13 2008-03-27 Dainippon Screen Mfg Co Ltd パターン描画装置およびパターン描画方法
CN119126502A (zh) * 2024-11-04 2024-12-13 深圳市先地图像科技有限公司 激光扫描成像过程中像素行调整方法、系统及相关设备

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