JP2006019435A5 - - Google Patents

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Publication number
JP2006019435A5
JP2006019435A5 JP2004194770A JP2004194770A JP2006019435A5 JP 2006019435 A5 JP2006019435 A5 JP 2006019435A5 JP 2004194770 A JP2004194770 A JP 2004194770A JP 2004194770 A JP2004194770 A JP 2004194770A JP 2006019435 A5 JP2006019435 A5 JP 2006019435A5
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JP
Japan
Prior art keywords
magnetic
charged particle
particle beam
exposure apparatus
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004194770A
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English (en)
Japanese (ja)
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JP2006019435A (ja
JP4468753B2 (ja
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Application filed filed Critical
Priority to JP2004194770A priority Critical patent/JP4468753B2/ja
Priority claimed from JP2004194770A external-priority patent/JP4468753B2/ja
Publication of JP2006019435A publication Critical patent/JP2006019435A/ja
Publication of JP2006019435A5 publication Critical patent/JP2006019435A5/ja
Application granted granted Critical
Publication of JP4468753B2 publication Critical patent/JP4468753B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004194770A 2004-06-30 2004-06-30 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 Expired - Fee Related JP4468753B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004194770A JP4468753B2 (ja) 2004-06-30 2004-06-30 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004194770A JP4468753B2 (ja) 2004-06-30 2004-06-30 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006019435A JP2006019435A (ja) 2006-01-19
JP2006019435A5 true JP2006019435A5 (enExample) 2007-08-16
JP4468753B2 JP4468753B2 (ja) 2010-05-26

Family

ID=35793428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004194770A Expired - Fee Related JP4468753B2 (ja) 2004-06-30 2004-06-30 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4468753B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4913521B2 (ja) * 2006-09-29 2012-04-11 キヤノン株式会社 荷電粒子線装置及びデバイス製造方法
JP5230148B2 (ja) * 2007-09-04 2013-07-10 キヤノン株式会社 荷電粒子線描画装置及びデバイス製造方法
TWI477925B (zh) * 2011-10-04 2015-03-21 紐富來科技股份有限公司 Multi - beam charged particle beam mapping device and multi - beam charged particle beam rendering method
WO2018173829A1 (ja) * 2017-03-22 2018-09-27 株式会社ニコン 露光装置、露光方法、及び、デバイス製造方法
WO2024154184A1 (ja) 2023-01-16 2024-07-25 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置

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