JP2006009152A - 高速原子層堆積装置及び使用方法 - Google Patents
高速原子層堆積装置及び使用方法 Download PDFInfo
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- JP2006009152A JP2006009152A JP2005184930A JP2005184930A JP2006009152A JP 2006009152 A JP2006009152 A JP 2006009152A JP 2005184930 A JP2005184930 A JP 2005184930A JP 2005184930 A JP2005184930 A JP 2005184930A JP 2006009152 A JP2006009152 A JP 2006009152A
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- 238000000034 method Methods 0.000 title claims abstract description 166
- 238000000231 atomic layer deposition Methods 0.000 title claims abstract description 51
- 230000008569 process Effects 0.000 claims abstract description 141
- 238000012545 processing Methods 0.000 claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 238000000151 deposition Methods 0.000 claims abstract description 46
- 238000002347 injection Methods 0.000 claims abstract description 43
- 239000007924 injection Substances 0.000 claims abstract description 43
- 239000007789 gas Substances 0.000 claims description 184
- 239000010408 film Substances 0.000 claims description 9
- 239000012159 carrier gas Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- -1 trimethylvinylsilyl Chemical group 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 4
- CHPZKNULDCNCBW-UHFFFAOYSA-N gallium nitrate Chemical compound [Ga+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O CHPZKNULDCNCBW-UHFFFAOYSA-N 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 claims description 3
- 238000000429 assembly Methods 0.000 claims description 3
- 230000000712 assembly Effects 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 3
- VJDVOZLYDLHLSM-UHFFFAOYSA-N diethylazanide;titanium(4+) Chemical compound [Ti+4].CC[N-]CC.CC[N-]CC.CC[N-]CC.CC[N-]CC VJDVOZLYDLHLSM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052756 noble gas Inorganic materials 0.000 claims description 3
- MNWRORMXBIWXCI-UHFFFAOYSA-N tetrakis(dimethylamido)titanium Chemical compound CN(C)[Ti](N(C)C)(N(C)C)N(C)C MNWRORMXBIWXCI-UHFFFAOYSA-N 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- WSWMGHRLUYADNA-UHFFFAOYSA-N 7-nitro-1,2,3,4-tetrahydroquinoline Chemical compound C1CCNC2=CC([N+](=O)[O-])=CC=C21 WSWMGHRLUYADNA-UHFFFAOYSA-N 0.000 claims description 2
- YYKBKTFUORICGA-UHFFFAOYSA-N CCN(CC)[Ta](=NC(C)(C)C)(N(CC)CC)N(CC)CC Chemical compound CCN(CC)[Ta](=NC(C)(C)C)(N(CC)CC)N(CC)CC YYKBKTFUORICGA-UHFFFAOYSA-N 0.000 claims description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 claims description 2
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 claims description 2
- 229910002651 NO3 Inorganic materials 0.000 claims description 2
- 229910007926 ZrCl Inorganic materials 0.000 claims description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 claims description 2
- 229940044658 gallium nitrate Drugs 0.000 claims description 2
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 claims description 2
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 claims description 2
- 235000005074 zinc chloride Nutrition 0.000 claims description 2
- 239000011592 zinc chloride Substances 0.000 claims description 2
- 238000012544 monitoring process Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 abstract description 13
- 239000000243 solution Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 description 61
- 239000000463 material Substances 0.000 description 15
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 3
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- NLLZTRMHNHVXJJ-UHFFFAOYSA-J titanium tetraiodide Chemical compound I[Ti](I)(I)I NLLZTRMHNHVXJJ-UHFFFAOYSA-J 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 241000219492 Quercus Species 0.000 description 1
- 241000220317 Rosa Species 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005112 continuous flow technique Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45536—Use of plasma, radiation or electromagnetic fields
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C23C16/45525—Atomic layer deposition [ALD]
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
- C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45574—Nozzles for more than one gas
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Abstract
【解決手段】処理チャンバ(100)と、前記処理チャンバ内に設けられた基板ホルダ(120)と、前記処理チャンバ(100)に、第1のプロセスガス及び第2のプロセスガスを供給するように構成されたガス注入装置(140)とを含む、原子層堆積(ALD)を実行する処理システム(100)。前記ガス注入装置(140)は、前記第1のプロセスガス及び第2のプロセスガスを、前記処理チャンバ(100)の第1の位置及び第2の位置から導入するように構成されており、前記第1のプロセスガス及び第2のプロセスガスの少なくとも一方は、前記第1の位置と第2の位置とから、交互にかつ連続に導入される。
【選択図】 図1
Description
Claims (25)
- 基板上に膜を堆積する原子層堆積システムであって、
処理チャンバと、
前記処理チャンバに組み合わされ、かつ前記基板を支持するように構成された基板ホルダと、
前記処理チャンバに組み合わされ、かつ前記処理チャンバ内を排気するように構成された排気装置と、
前記処理チャンバに組み合わされ、かつ前記処理チャンバ内にプラズマを生成するように構成されたプラズマ源と、
前記処理チャンバに組み合わされ、かつ第1のプロセスガス及び第2のプロセスガスを、前記処理チャンバの第1の位置及び第2の位置から導入するように構成されたガス注入装置と、
前記原子層堆積システムに結合され、前記第1のプロセスガス及び前記第2のプロセスガスのうちの少なくとも一方が、前記第1の位置と前記第2の位置とから、交互にかつ連続して導入されるように、前記ガス注入装置を制御するように構成されたコントローラとを具備する原子層堆積システム。 - 前記コントローラは、前記第1のプロセスガス及び前記第2のプロセスガスの前記処理チャンバへの前記導入を調節することと、モニタリングすることと、制御することとのうちの少なくとも1つを実行するように構成されている請求項1に記載の原子層堆積システム。
- 前記コントローラは、前記第1のプロセスガスが、第1の期間に、前記第1の位置から導入され、その後、第2の期間に、前記第2の位置から導入されるように、前記ガス注入装置を制御する請求項1に記載の原子層堆積システム。
- 前記コントローラは、前記第1のプロセスガス及び前記第2のプロセスガスが、第1の期間に、前記第1の位置から導入され、その後、第2の期間に、前記第2の位置から導入されるように、前記ガス注入装置を制御する請求項1に記載の原子層堆積システム。
- 前記コントローラは、前記第1のプロセスガスが、第1の期間に、前記第1の位置から導入され、かつ前記第2のプロセスガスが、第2の期間に、前記第1の位置から導入され、その後、前記第1のプロセスガスが、第3の期間に、前記第2の位置から導入され、かつ前記第2のプロセスガスが、第4の期間に、前記第2の位置から導入されるように、前記ガス注入装置を制御する請求項1に記載の原子層堆積システム。
- 前記ガス注入装置は、
前記処理チャンバの周囲に配設され、かつ前記第1のプロセスガスを注入するように構成されたガス注入オリフィスからなる第1のセットと、
前記処理チャンバの周囲に配設され、かつ前記第2のプロセスガスを注入するように構成されたガス注入オリフィスからなる第2のセットとを備えている請求項1に記載の原子層堆積システム。 - 前記ガス注入装置は、2つ以上のノズルアセンブリを備え、前記ノズルアセンブリの各々が、前記第1のプロセスガスを導入するように構成された第1のガス注入弁と、第1のガスラインと、第1のガス注入オリフィスとを、前記第2のプロセスガスを導入するように構成された第2のガス注入弁と、第2のガスラインと、第2のガス注入オリフィスとを含んでいる請求項1に記載の原子層堆積システム。
- 前記基板ホルダは、前記基板を目標の温度まで加熱するように構成されている請求項1に記載の原子層堆積システム。
- 前記基板ホルダは、前記基板を、約40℃から約450℃の範囲の温度に加熱するように構成されている請求項8に記載の原子層堆積システム。
- 前記基板ホルダは、前記基板の温度を、高められた温度に制御するように構成されている請求項1に記載の原子層堆積システム。
- 前記基板ホルダは、電気的バイアスを前記基板に結合するように構成されている請求項1に記載の原子層堆積システム。
- 前記基板ホルダは、パルス状の電気的バイアスを前記基板に結合するように構成されている請求項1に記載の原子層堆積システム。
- 前記ガス注入装置は、前記第1のプロセスガス及び前記第2のプロセスガスを、前記第1の位置及び前記第2の位置に注入するように構成されたパルス状に注入するガス注入弁を備えている請求項1に記載の原子層堆積システム。
- 前記パルス状に注入するガス注入弁は、ソレノイドバルブを備えている請求項13に記載の原子層堆積システム。
- 前記ガス注入装置は、WF6、W(CO)6、TaCl5、PDEAT(ペンタキス(ジエチルアミド)タンタル)、PEMAT(ペンタキス(エチルメチルアミド)タンタル)、TaBr5、TBTDET(t−ブチルイミノ・トリス(ジエチルアミノ)タンタル)、六フッ化モリブデン、Cu(TMVS)(hfac)、(トリメチルビニルシリル)ヘキサフルオロアセチルアセトナト銅(I)、CuCl、Zr(NO3)4、ZrCl4、Hf(NO3)4、HfCl4、五塩化ニオブ、二塩化亜鉛、Si(NO3)4、SiCl4、ジクロロシラン、Ti(NO3)、TiCl4、Til4、テトラキス(ジエチルアミノ)チタン、テトラキス(ジメチルアミノ)チタン、三塩化アルミニウム、トリメチルアルミニウム、硝酸ガリウム、トリメチルガリウム及びCrオキソ硝酸からなる群から選択された前記第1のプロセスガスを供給するように構成されている請求項1に記載の原子層堆積システム。
- 前記ガス注入装置は、H2、N2、O2、H2O、NH3、またはH2O2のうちの少なくとも1つとして前記第2のプロセスガスを供給するように構成されている請求項1に記載の原子層堆積システム。
- 前記第1のプロセスガスは、さらにキャリヤガスを含んでいる請求項1に記載の原子層堆積システム。
- 前記キャリヤガスは、希ガスを含んでいる請求項17に記載の原子層堆積システム。
- 前記第2のプロセスガスは、さらにキャリヤガスを含んでいる請求項1に記載の原子層堆積システム。
- 前記キャリヤガスは、希ガスを含んでいる請求項19に記載のシステム。
- プラズマアシスト原子層堆積プロセスを用いて、基板上に薄膜を堆積する方法であって、
前記プラズマアシスト原子層堆積プロセスを容易にするように構成された処理チャンバ内に、前記基板を配置することと、
第1のプロセスガスを、前記処理チャンバ内の第1の位置から導入することと、
前記第1の位置から第2のプロセスガスを導入することと、
前記第1のプロセスガスを、前記処理チャンバ内の第2の位置から導入することと、
前記第2の位置から前記第2のプロセスガスを導入することとを具備し、
前記第1のプロセスガス及び前記第2のプロセスガスのうちの少なくとも一方が、前記第1の位置と前記第2の位置とから、交互にかつ連続して導入される方法。 - 前記第1のプロセスガスを前記第1の位置から導入することは、第1の期間に行われ、その後、前記第1のプロセスガスが、第2の期間に前記第2の位置から導入される請求項21に記載の方法。
- 前記第1のプロセスガスを前記第1の位置から導入すること、及び前記第2のプロセスガスを前記第1の位置から導入することは、第1の期間に行われ、その後、前記第1のプロセスガスを前記第2の位置から導入すること、及び前記第2のプロセスガスを前記第2の位置から導入することが、第2の期間に行われる請求項21に記載の方法。
- 前記第1のプロセスガスを前記第1の位置から導入することは、第1の期間に行われ、前記第2のプロセスガスを前記第1の位置から導入することは、第2の期間に行われ、その後、第3の期間に、前記第1のプロセスガスが前記第2の位置から導入され、第4の期間に、前記第2のプロセスガスが前記第2の位置から導入される請求項21に記載の方法。
- 処理チャンバと基板ホルダとを有する原子層堆積システムであって、
第1のプロセスガスを、前記処理チャンバの第1の位置及び第2の位置から導入する手段と、
第2のプロセスガスを、前記処理チャンバの前記第1の位置及び前記第2の位置から導入する手段と、
前記処理チャンバ内にプラズマを生成する手段と、
前記第1のプロセスガス及び前記第2のプロセスガスの少なくとも一方を、前記第1の位置と前記第2の位置とから、交互にかつ連続に導入する手段とを具備する原子層堆積システム。
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007239103A (ja) * | 2006-03-08 | 2007-09-20 | Tokyo Electron Ltd | 処理システムのためのシーリングのデバイスおよび方法 |
JP2009007670A (ja) * | 2007-06-19 | 2009-01-15 | Air Products & Chemicals Inc | 金属ケイ素窒化物の被着方法 |
WO2012039833A2 (en) * | 2010-09-24 | 2012-03-29 | Applied Materials, Inc. | Low temperature silicon carbide deposition process |
KR101333924B1 (ko) * | 2006-07-31 | 2013-11-27 | 텍사스 인스트루먼츠 인코포레이티드 | 에칭 방법, 컴퓨터 판독 가능한 기록 매체, 및 플라즈마 처리 시스템 |
JPWO2012137949A1 (ja) * | 2011-04-08 | 2014-07-28 | 東京エレクトロン株式会社 | 窒化物半導体の製造方法、窒化物半導体、およびiii−v族窒化物の成膜方法 |
EP3119921A1 (fr) * | 2014-03-21 | 2017-01-25 | ALTATECH Semiconductor | Procédé de dépôt en phase gazeuse |
JP2019145803A (ja) * | 2019-03-13 | 2019-08-29 | 東芝デバイス&ストレージ株式会社 | 半導体装置の製造方法 |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060000802A1 (en) * | 2004-06-30 | 2006-01-05 | Ajay Kumar | Method and apparatus for photomask plasma etching |
US20070190670A1 (en) * | 2006-02-10 | 2007-08-16 | Forest Carl A | Method of making ferroelectric and dielectric layered superlattice materials and memories utilizing same |
US7670432B2 (en) * | 2006-03-08 | 2010-03-02 | Tokyo Electron Limited | Exhaust system for a vacuum processing system |
US20070235319A1 (en) * | 2006-04-07 | 2007-10-11 | Tokyo Electron Limited | Multi-processing using an ionized physical vapor deposition (ipvd) system |
JP4866658B2 (ja) * | 2006-05-23 | 2012-02-01 | 東京エレクトロン株式会社 | 半導体製造装置 |
US20080260967A1 (en) * | 2007-04-17 | 2008-10-23 | Hyungsuk Alexander Yoon | Apparatus and method for integrated surface treatment and film deposition |
US20080260963A1 (en) * | 2007-04-17 | 2008-10-23 | Hyungsuk Alexander Yoon | Apparatus and method for pre and post treatment of atomic layer deposition |
US7909961B2 (en) * | 2006-10-30 | 2011-03-22 | Applied Materials, Inc. | Method and apparatus for photomask plasma etching |
US7943005B2 (en) | 2006-10-30 | 2011-05-17 | Applied Materials, Inc. | Method and apparatus for photomask plasma etching |
US7879401B2 (en) * | 2006-12-22 | 2011-02-01 | The Regents Of The University Of Michigan | Organic vapor jet deposition using an exhaust |
US8486191B2 (en) * | 2009-04-07 | 2013-07-16 | Asm America, Inc. | Substrate reactor with adjustable injectors for mixing gases within reaction chamber |
JP5869923B2 (ja) * | 2012-03-09 | 2016-02-24 | 株式会社日立国際電気 | 半導体装置の製造方法、基板処理方法、基板処理装置およびプログラム |
KR102003768B1 (ko) | 2012-11-13 | 2019-07-26 | 삼성디스플레이 주식회사 | 기상 증착 장치 및 유기 발광 표시 장치 제조 방법 |
US9275869B2 (en) * | 2013-08-02 | 2016-03-01 | Lam Research Corporation | Fast-gas switching for etching |
US10100407B2 (en) * | 2014-12-19 | 2018-10-16 | Lam Research Corporation | Hardware and process for film uniformity improvement |
FI126970B (en) * | 2014-12-22 | 2017-08-31 | Picosun Oy | Atomic layer cultivation in which the first and second species of source materials are present simultaneously |
US10256075B2 (en) * | 2016-01-22 | 2019-04-09 | Applied Materials, Inc. | Gas splitting by time average injection into different zones by fast gas valves |
JP7305555B2 (ja) * | 2017-12-27 | 2023-07-10 | 株式会社半導体エネルギー研究所 | 薄膜製造装置 |
US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
JP7296699B2 (ja) * | 2018-07-02 | 2023-06-23 | 東京エレクトロン株式会社 | ガス供給システム、プラズマ処理装置およびガス供給システムの制御方法 |
US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
JP7451540B2 (ja) | 2019-01-22 | 2024-03-18 | アプライド マテリアルズ インコーポレイテッド | パルス状電圧波形を制御するためのフィードバックループ |
US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
JP6922959B2 (ja) * | 2019-09-20 | 2021-08-18 | 株式会社明電舎 | 酸化膜形成装置 |
US11848176B2 (en) | 2020-07-31 | 2023-12-19 | Applied Materials, Inc. | Plasma processing using pulsed-voltage and radio-frequency power |
US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
US20220399185A1 (en) | 2021-06-09 | 2022-12-15 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US11776788B2 (en) | 2021-06-28 | 2023-10-03 | Applied Materials, Inc. | Pulsed voltage boost for substrate processing |
US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
US11694876B2 (en) | 2021-12-08 | 2023-07-04 | Applied Materials, Inc. | Apparatus and method for delivering a plurality of waveform signals during plasma processing |
US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
CN115125583A (zh) * | 2022-06-29 | 2022-09-30 | 广东臻鼎环境科技有限公司 | 酸性蚀刻废液电解及再生液和氯气回用远程监控管理方法 |
WO2024101775A1 (ko) * | 2022-11-07 | 2024-05-16 | 주식회사 넥서스비 | 산화갈륨용 하이브리드 증착 장치 및 이를 이용한 하이브리드 증착 방법 |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03264672A (ja) * | 1990-03-14 | 1991-11-25 | Hitachi Ltd | 半導体装置の製造方法 |
JPH04361531A (ja) * | 1991-06-10 | 1992-12-15 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH06314660A (ja) * | 1993-03-04 | 1994-11-08 | Mitsubishi Electric Corp | 薄膜形成法及びその装置 |
JP2000357687A (ja) * | 1999-06-15 | 2000-12-26 | Toshiba Corp | 半導体装置の製造方法およびプラズマcvd装置 |
JP2002069651A (ja) * | 2000-06-24 | 2002-03-08 | Ips Ltd | Ald薄膜蒸着装置及び蒸着方法 |
WO2002071463A1 (en) * | 2001-03-02 | 2002-09-12 | Tokyo Electron Limited | Shower head gas injection apparatus with secondary high pressure pulsed gas injection |
JP2003077864A (ja) * | 2001-09-03 | 2003-03-14 | Tokyo Electron Ltd | 成膜方法 |
JP2003234346A (ja) * | 2001-12-06 | 2003-08-22 | Canon Sales Co Inc | 半導体装置の製造方法 |
JP2003347218A (ja) * | 2002-05-28 | 2003-12-05 | Renesas Technology Corp | ガス処理装置および半導体装置の製造方法 |
JP2004134466A (ja) * | 2002-10-08 | 2004-04-30 | Hitachi Kokusai Electric Inc | 基板処埋装置 |
JP2004158499A (ja) * | 2002-11-01 | 2004-06-03 | Air Water Inc | 成膜装置 |
JP2004244661A (ja) * | 2003-02-12 | 2004-09-02 | Denso Corp | 薄膜の製造方法 |
WO2005088692A1 (ja) * | 2004-03-12 | 2005-09-22 | Hitachi Kokusai Electric Inc. | 基板処理装置および半導体装置の製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2653633B1 (fr) * | 1989-10-19 | 1991-12-20 | Commissariat Energie Atomique | Dispositif de traitement chimique assiste par un plasma de diffusion. |
JP3253675B2 (ja) * | 1991-07-04 | 2002-02-04 | 株式会社東芝 | 荷電ビーム照射装置及び方法 |
US5368685A (en) * | 1992-03-24 | 1994-11-29 | Hitachi, Ltd. | Dry etching apparatus and method |
JP3468859B2 (ja) * | 1994-08-16 | 2003-11-17 | 富士通株式会社 | 気相処理装置及び気相処理方法 |
US6071572A (en) * | 1996-10-15 | 2000-06-06 | Applied Materials, Inc. | Forming tin thin films using remote activated specie generation |
US6185839B1 (en) * | 1998-05-28 | 2001-02-13 | Applied Materials, Inc. | Semiconductor process chamber having improved gas distributor |
US6383954B1 (en) * | 1999-07-27 | 2002-05-07 | Applied Materials, Inc. | Process gas distribution for forming stable fluorine-doped silicate glass and other films |
US6676760B2 (en) * | 2001-08-16 | 2004-01-13 | Appiled Materials, Inc. | Process chamber having multiple gas distributors and method |
US7323231B2 (en) * | 2003-10-09 | 2008-01-29 | Micron Technology, Inc. | Apparatus and methods for plasma vapor deposition processes |
-
2004
- 2004-06-25 US US10/875,949 patent/US7740704B2/en not_active Expired - Fee Related
-
2005
- 2005-06-24 JP JP2005184930A patent/JP4713241B2/ja not_active Expired - Fee Related
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03264672A (ja) * | 1990-03-14 | 1991-11-25 | Hitachi Ltd | 半導体装置の製造方法 |
JPH04361531A (ja) * | 1991-06-10 | 1992-12-15 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH06314660A (ja) * | 1993-03-04 | 1994-11-08 | Mitsubishi Electric Corp | 薄膜形成法及びその装置 |
JP2000357687A (ja) * | 1999-06-15 | 2000-12-26 | Toshiba Corp | 半導体装置の製造方法およびプラズマcvd装置 |
JP2002069651A (ja) * | 2000-06-24 | 2002-03-08 | Ips Ltd | Ald薄膜蒸着装置及び蒸着方法 |
WO2002071463A1 (en) * | 2001-03-02 | 2002-09-12 | Tokyo Electron Limited | Shower head gas injection apparatus with secondary high pressure pulsed gas injection |
JP2003077864A (ja) * | 2001-09-03 | 2003-03-14 | Tokyo Electron Ltd | 成膜方法 |
JP2003234346A (ja) * | 2001-12-06 | 2003-08-22 | Canon Sales Co Inc | 半導体装置の製造方法 |
JP2003347218A (ja) * | 2002-05-28 | 2003-12-05 | Renesas Technology Corp | ガス処理装置および半導体装置の製造方法 |
JP2004134466A (ja) * | 2002-10-08 | 2004-04-30 | Hitachi Kokusai Electric Inc | 基板処埋装置 |
JP2004158499A (ja) * | 2002-11-01 | 2004-06-03 | Air Water Inc | 成膜装置 |
JP2004244661A (ja) * | 2003-02-12 | 2004-09-02 | Denso Corp | 薄膜の製造方法 |
WO2005088692A1 (ja) * | 2004-03-12 | 2005-09-22 | Hitachi Kokusai Electric Inc. | 基板処理装置および半導体装置の製造方法 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007239103A (ja) * | 2006-03-08 | 2007-09-20 | Tokyo Electron Ltd | 処理システムのためのシーリングのデバイスおよび方法 |
KR101333924B1 (ko) * | 2006-07-31 | 2013-11-27 | 텍사스 인스트루먼츠 인코포레이티드 | 에칭 방법, 컴퓨터 판독 가능한 기록 매체, 및 플라즈마 처리 시스템 |
JP2009007670A (ja) * | 2007-06-19 | 2009-01-15 | Air Products & Chemicals Inc | 金属ケイ素窒化物の被着方法 |
WO2012039833A2 (en) * | 2010-09-24 | 2012-03-29 | Applied Materials, Inc. | Low temperature silicon carbide deposition process |
WO2012039833A3 (en) * | 2010-09-24 | 2012-05-10 | Applied Materials, Inc. | Low temperature silicon carbide deposition process |
US9040127B2 (en) | 2010-09-24 | 2015-05-26 | Applied Materials, Inc. | Low temperature silicon carbide deposition process |
JPWO2012137949A1 (ja) * | 2011-04-08 | 2014-07-28 | 東京エレクトロン株式会社 | 窒化物半導体の製造方法、窒化物半導体、およびiii−v族窒化物の成膜方法 |
EP3119921A1 (fr) * | 2014-03-21 | 2017-01-25 | ALTATECH Semiconductor | Procédé de dépôt en phase gazeuse |
JP2017512914A (ja) * | 2014-03-21 | 2017-05-25 | アルタテック セミコンダクターAltatech Semiconductor | 気相堆積プロセス |
JP2019145803A (ja) * | 2019-03-13 | 2019-08-29 | 東芝デバイス&ストレージ株式会社 | 半導体装置の製造方法 |
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US20050284370A1 (en) | 2005-12-29 |
US7740704B2 (en) | 2010-06-22 |
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