JP2005531913A - プラズマパラメータの非侵入性の測定と解析のための方法と装置 - Google Patents

プラズマパラメータの非侵入性の測定と解析のための方法と装置 Download PDF

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Publication number
JP2005531913A
JP2005531913A JP2004519601A JP2004519601A JP2005531913A JP 2005531913 A JP2005531913 A JP 2005531913A JP 2004519601 A JP2004519601 A JP 2004519601A JP 2004519601 A JP2004519601 A JP 2004519601A JP 2005531913 A JP2005531913 A JP 2005531913A
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JP
Japan
Prior art keywords
antenna
sensor
plasma process
coupled
plasma
Prior art date
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Withdrawn
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JP2004519601A
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English (en)
Japanese (ja)
Inventor
パーソンズ、リチャード
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of JP2005531913A publication Critical patent/JP2005531913A/ja
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32963—End-point detection

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
JP2004519601A 2002-07-03 2003-06-18 プラズマパラメータの非侵入性の測定と解析のための方法と装置 Withdrawn JP2005531913A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39310302P 2002-07-03 2002-07-03
PCT/US2003/019040 WO2004006285A1 (en) 2002-07-03 2003-06-18 Method and apparatus for non-invasive measurement and analysis of plasma parameters

Publications (1)

Publication Number Publication Date
JP2005531913A true JP2005531913A (ja) 2005-10-20

Family

ID=30115545

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004519601A Withdrawn JP2005531913A (ja) 2002-07-03 2003-06-18 プラズマパラメータの非侵入性の測定と解析のための方法と装置

Country Status (6)

Country Link
US (1) US20050145334A1 (zh)
JP (1) JP2005531913A (zh)
CN (1) CN1666315A (zh)
AU (1) AU2003281421A1 (zh)
TW (1) TWI230996B (zh)
WO (1) WO2004006285A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007036139A (ja) * 2005-07-29 2007-02-08 Sharp Corp プラズマ処理装置およびプラズマクリーニング終点検出方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7115210B2 (en) * 2004-02-02 2006-10-03 International Business Machines Corporation Measurement to determine plasma leakage
WO2006135515A1 (en) * 2005-06-10 2006-12-21 Bird Technologies Group Inc. System and method for analyzing power flow in semiconductor plasma generation systems
US11670488B2 (en) * 2020-01-10 2023-06-06 COMET Technologies USA, Inc. Fast arc detecting match network
US12027351B2 (en) * 2020-01-10 2024-07-02 COMET Technologies USA, Inc. Plasma non-uniformity detection
GB202005828D0 (en) * 2020-04-21 2020-06-03 Univ Dublin City Electromagnetic field signal acquisition system for high signal-t-noise ratios, and electrical noise immunity
GB202016105D0 (en) 2020-10-09 2020-11-25 Univ Dublin City Non-invasive measurement of plasma systems

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0224930B1 (en) * 1985-12-06 1993-01-27 Fujisawa Pharmaceutical Co., Ltd. Tablet printing machine
US5705940A (en) * 1990-07-16 1998-01-06 Raytheon Company Logic family for digitally controlled analog monolithic microwave integrated circuits
US6057805A (en) * 1996-08-19 2000-05-02 Emc Test Systems, L.P. Broad band shaped element antenna
GB9620151D0 (en) * 1996-09-27 1996-11-13 Surface Tech Sys Ltd Plasma processing apparatus
US5895531A (en) * 1996-12-13 1999-04-20 Compuvac Systems, Inc. Apparatus and polymerization gun for coating objects by vacuum deposit
EP1025276A1 (en) * 1997-09-17 2000-08-09 Tokyo Electron Limited Device and method for detecting and preventing arcing in rf plasma systems
US6450116B1 (en) * 1999-04-22 2002-09-17 Applied Materials, Inc. Apparatus for exposing a substrate to plasma radicals
WO2002015649A2 (en) * 2000-08-17 2002-02-21 Tokyo Electron Limited Close coupled match structure for rf drive electrode
US6631693B2 (en) * 2001-01-30 2003-10-14 Novellus Systems, Inc. Absorptive filter for semiconductor processing systems
AU2003239392A1 (en) * 2002-05-29 2003-12-19 Tokyo Electron Limited Method and system for data handling, storage and manipulation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007036139A (ja) * 2005-07-29 2007-02-08 Sharp Corp プラズマ処理装置およびプラズマクリーニング終点検出方法

Also Published As

Publication number Publication date
AU2003281421A1 (en) 2004-01-23
TW200409262A (en) 2004-06-01
CN1666315A (zh) 2005-09-07
WO2004006285A1 (en) 2004-01-15
US20050145334A1 (en) 2005-07-07
TWI230996B (en) 2005-04-11

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