AU2003281421A1 - Method and apparatus for non-invasive measurement and analysis of plasma parameters - Google Patents

Method and apparatus for non-invasive measurement and analysis of plasma parameters

Info

Publication number
AU2003281421A1
AU2003281421A1 AU2003281421A AU2003281421A AU2003281421A1 AU 2003281421 A1 AU2003281421 A1 AU 2003281421A1 AU 2003281421 A AU2003281421 A AU 2003281421A AU 2003281421 A AU2003281421 A AU 2003281421A AU 2003281421 A1 AU2003281421 A1 AU 2003281421A1
Authority
AU
Australia
Prior art keywords
analysis
invasive measurement
plasma parameters
plasma
parameters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003281421A
Inventor
Richard Parsons
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2003281421A1 publication Critical patent/AU2003281421A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32963—End-point detection
AU2003281421A 2002-07-03 2003-06-18 Method and apparatus for non-invasive measurement and analysis of plasma parameters Abandoned AU2003281421A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US39310302P 2002-07-03 2002-07-03
US60/393,103 2002-07-03
PCT/US2003/019040 WO2004006285A1 (en) 2002-07-03 2003-06-18 Method and apparatus for non-invasive measurement and analysis of plasma parameters

Publications (1)

Publication Number Publication Date
AU2003281421A1 true AU2003281421A1 (en) 2004-01-23

Family

ID=30115545

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003281421A Abandoned AU2003281421A1 (en) 2002-07-03 2003-06-18 Method and apparatus for non-invasive measurement and analysis of plasma parameters

Country Status (6)

Country Link
US (1) US20050145334A1 (en)
JP (1) JP2005531913A (en)
CN (1) CN1666315A (en)
AU (1) AU2003281421A1 (en)
TW (1) TWI230996B (en)
WO (1) WO2004006285A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7115210B2 (en) * 2004-02-02 2006-10-03 International Business Machines Corporation Measurement to determine plasma leakage
US7885774B2 (en) * 2005-06-10 2011-02-08 Bird Technologies Group Inc. System and method for analyzing power flow in semiconductor plasma generation systems
JP2007036139A (en) * 2005-07-29 2007-02-08 Sharp Corp Plasma treatment equipment and method for detecting plasma cleaning end
US11670488B2 (en) * 2020-01-10 2023-06-06 COMET Technologies USA, Inc. Fast arc detecting match network
US20210217587A1 (en) * 2020-01-10 2021-07-15 COMET Technologies USA, Inc. Plasma non-uniformity detection
GB202005828D0 (en) * 2020-04-21 2020-06-03 Univ Dublin City Electromagnetic field signal acquisition system for high signal-t-noise ratios, and electrical noise immunity
GB202016105D0 (en) 2020-10-09 2020-11-25 Univ Dublin City Non-invasive measurement of plasma systems

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3687632T2 (en) * 1985-12-06 1993-05-19 Fujisawa Pharmaceutical Co PRINTING DEVICE FOR PASTILLES.
US5705940A (en) * 1990-07-16 1998-01-06 Raytheon Company Logic family for digitally controlled analog monolithic microwave integrated circuits
US6057805A (en) * 1996-08-19 2000-05-02 Emc Test Systems, L.P. Broad band shaped element antenna
GB9620151D0 (en) * 1996-09-27 1996-11-13 Surface Tech Sys Ltd Plasma processing apparatus
US5895531A (en) * 1996-12-13 1999-04-20 Compuvac Systems, Inc. Apparatus and polymerization gun for coating objects by vacuum deposit
EP1025276A1 (en) * 1997-09-17 2000-08-09 Tokyo Electron Limited Device and method for detecting and preventing arcing in rf plasma systems
US6450116B1 (en) * 1999-04-22 2002-09-17 Applied Materials, Inc. Apparatus for exposing a substrate to plasma radicals
AU2001279199A1 (en) * 2000-08-17 2002-02-25 Tokyo Electron Limited Close coupled match structure for rf drive electrode
US6631693B2 (en) * 2001-01-30 2003-10-14 Novellus Systems, Inc. Absorptive filter for semiconductor processing systems
AU2003239392A1 (en) * 2002-05-29 2003-12-19 Tokyo Electron Limited Method and system for data handling, storage and manipulation

Also Published As

Publication number Publication date
TWI230996B (en) 2005-04-11
US20050145334A1 (en) 2005-07-07
TW200409262A (en) 2004-06-01
CN1666315A (en) 2005-09-07
WO2004006285A1 (en) 2004-01-15
JP2005531913A (en) 2005-10-20

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase