JP2005524104A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005524104A5 JP2005524104A5 JP2004500121A JP2004500121A JP2005524104A5 JP 2005524104 A5 JP2005524104 A5 JP 2005524104A5 JP 2004500121 A JP2004500121 A JP 2004500121A JP 2004500121 A JP2004500121 A JP 2004500121A JP 2005524104 A5 JP2005524104 A5 JP 2005524104A5
- Authority
- JP
- Japan
- Prior art keywords
- groove
- axis
- lithographic
- substrate
- radial distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims 17
- 239000000758 substrate Substances 0.000 claims 12
- 238000001459 lithography Methods 0.000 claims 7
- 239000000463 material Substances 0.000 claims 4
- 230000005855 radiation Effects 0.000 claims 3
- 239000002344 surface layer Substances 0.000 claims 3
- 238000004590 computer program Methods 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE0201242A SE522183C2 (sv) | 2002-04-24 | 2002-04-24 | Förfarande, anordning och datorprogramprodukt för litografi |
| US37504702P | 2002-04-25 | 2002-04-25 | |
| PCT/SE2003/000654 WO2003091805A1 (en) | 2002-04-24 | 2003-04-24 | Method, device and computer program product for lithography |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010246532A Division JP5248574B2 (ja) | 2002-04-24 | 2010-11-02 | リソグラフィ装置及び方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005524104A JP2005524104A (ja) | 2005-08-11 |
| JP2005524104A5 true JP2005524104A5 (enExample) | 2006-04-13 |
Family
ID=29272466
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004500121A Pending JP2005524104A (ja) | 2002-04-24 | 2003-04-24 | リソグラフィ装置、方法およびコンピュータプログラムプロダクト |
| JP2010246532A Expired - Lifetime JP5248574B2 (ja) | 2002-04-24 | 2010-11-02 | リソグラフィ装置及び方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010246532A Expired - Lifetime JP5248574B2 (ja) | 2002-04-24 | 2010-11-02 | リソグラフィ装置及び方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7468784B2 (enExample) |
| EP (1) | EP1497698A1 (enExample) |
| JP (2) | JP2005524104A (enExample) |
| CN (1) | CN1313884C (enExample) |
| AU (1) | AU2003224565A1 (enExample) |
| WO (1) | WO2003091805A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006070555A1 (ja) * | 2004-12-28 | 2006-07-06 | Pioneer Corporation | ビーム記録方法及び装置 |
| JP4542953B2 (ja) | 2005-06-10 | 2010-09-15 | 株式会社東芝 | 磁気ディスク媒体および磁気記録再生装置 |
| JP4746677B2 (ja) * | 2006-11-06 | 2011-08-10 | パイオニア株式会社 | ディスク原盤製造方法 |
| WO2010013348A1 (ja) * | 2008-08-01 | 2010-02-04 | パイオニア株式会社 | 電子ビーム記録装置及びその制御装置並びに制御方法 |
| JP5191542B2 (ja) | 2008-08-01 | 2013-05-08 | パイオニア株式会社 | 電子ビーム記録装置及びその制御装置並びに制御方法 |
| JP5059231B2 (ja) | 2010-05-18 | 2012-10-24 | オリンパスメディカルシステムズ株式会社 | 医療装置 |
| DE102017110241A1 (de) * | 2017-05-11 | 2018-11-15 | Nanoscribe Gmbh | Verfahren zum Erzeugen einer 3D-Struktur mittels Laserlithographie sowie Computerprogrammprodukt |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61160929A (ja) * | 1985-01-09 | 1986-07-21 | Toshiba Corp | 荷電ビ−ム露光方法 |
| JPH01214120A (ja) * | 1988-02-23 | 1989-08-28 | Nippon Telegr & Teleph Corp <Ntt> | パタン形成方法 |
| US5040165A (en) * | 1988-03-03 | 1991-08-13 | Hitachi Maxell, Ltd. | Optical information recording medium and method of fabricating the same |
| JPH0239515A (ja) * | 1988-07-29 | 1990-02-08 | Fujitsu Ltd | 荷電ビーム露光方法 |
| JPH0298848A (ja) * | 1988-10-04 | 1990-04-11 | Fuji Photo Film Co Ltd | 情報記録媒体の製造方法 |
| DE69031212T2 (de) | 1990-03-23 | 1998-01-29 | Ushio Electric Inc | Randbelichtungsverfahren für Halbleiterscheiben |
| US5854671A (en) * | 1993-05-28 | 1998-12-29 | Nikon Corporation | Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure |
| KR100369067B1 (ko) * | 1996-03-19 | 2003-04-03 | 삼성에스디아이 주식회사 | 칼라음극선관의비발광흡수막노광장치 |
| US6252845B1 (en) * | 1997-08-05 | 2001-06-26 | Matsushita Electric Industrial Co., Ltd. | High density optical disk, apparatus for reproducing optical disk and method for producing optical disk master |
| JPH1186346A (ja) * | 1997-09-09 | 1999-03-30 | Sony Corp | 光ディスク、光ディスクの製造方法及び光ディスク原盤の製造方法 |
| TW449672B (en) | 1997-12-25 | 2001-08-11 | Nippon Kogaku Kk | Process and apparatus for manufacturing photomask and method of manufacturing the same |
| US5981962A (en) * | 1998-01-09 | 1999-11-09 | International Business Machines Corporation | Distributed direct write lithography system using multiple variable shaped electron beams |
| JP2000011464A (ja) * | 1998-06-29 | 2000-01-14 | Fujitsu Ltd | 電子ビーム照射方法及び装置 |
| US6694503B2 (en) * | 2000-02-03 | 2004-02-17 | Gakkohojin Ritsumeikan | Processing device and method of processing material with ultraviolet light or light of shorter wavelength than ultraviolet light |
| JP2001236646A (ja) * | 2000-02-22 | 2001-08-31 | Pioneer Electronic Corp | 情報記録装置ならびに情報記録方法 |
| JP2002116531A (ja) * | 2000-10-11 | 2002-04-19 | Hitachi Ltd | マスクの製造方法 |
| US7914711B2 (en) * | 2002-01-24 | 2011-03-29 | Dphi Acquisitions, Inc. | Use of mother stamper for optical disk molding |
-
2003
- 2003-04-24 WO PCT/SE2003/000654 patent/WO2003091805A1/en not_active Ceased
- 2003-04-24 JP JP2004500121A patent/JP2005524104A/ja active Pending
- 2003-04-24 AU AU2003224565A patent/AU2003224565A1/en not_active Abandoned
- 2003-04-24 CN CNB03809147XA patent/CN1313884C/zh not_active Expired - Fee Related
- 2003-04-24 US US10/512,274 patent/US7468784B2/en not_active Expired - Lifetime
- 2003-04-24 EP EP03721234A patent/EP1497698A1/en not_active Withdrawn
-
2010
- 2010-11-02 JP JP2010246532A patent/JP5248574B2/ja not_active Expired - Lifetime
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2005524104A5 (enExample) | ||
| JP5248574B2 (ja) | リソグラフィ装置及び方法 | |
| JP2016134444A5 (enExample) | ||
| TWI630464B (zh) | Light irradiation device | |
| JP3394602B2 (ja) | 高速原子線を用いた加工方法 | |
| WO2011115139A1 (ja) | 電子ビーム露光方法および電子ビーム露光装置 | |
| US6717161B1 (en) | Apparatus and method providing substantially uniform irradiation of surfaces of elongated objects with a high level of irradiance | |
| JP5298236B2 (ja) | 局所露光装置及び局所露光方法 | |
| JP2009185255A5 (enExample) | ||
| JP2006019434A5 (enExample) | ||
| KR100787701B1 (ko) | 리소그래피용 방법, 장치 및 컴퓨터 판독가능한 기록 매체 | |
| JPH05253535A (ja) | 回転塗布方法 | |
| JPH0145626B2 (enExample) | ||
| JPH0348200A (ja) | シンクロトロン放射光利用装置及びその方法 | |
| JP2003279699A (ja) | 電子線照射処理装置 | |
| TWI803746B (zh) | 遮蔽器裝置、曝光裝置、膜形成裝置及物品製造方法 | |
| JPS62112779A (ja) | イオンビ−ムスパツタ表面処理装置 | |
| JP2012128413A (ja) | 露光方法及び露光装置 | |
| JP2022023392A5 (enExample) | ||
| JP2002233813A (ja) | 硬化皮膜の形成方法、紫外線照射装置および硬化皮膜形成装置 | |
| JP2011145507A5 (enExample) | ||
| JPH03257170A (ja) | 粒子線および光線の大面積照射方法 | |
| JPH0691066B2 (ja) | 感光性有機樹脂膜の形成方法 | |
| JP3567404B2 (ja) | 電磁波による表面処理方法 | |
| SU938339A1 (ru) | Способ электронолитографии |