JP2005519433A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005519433A5 JP2005519433A5 JP2003573666A JP2003573666A JP2005519433A5 JP 2005519433 A5 JP2005519433 A5 JP 2005519433A5 JP 2003573666 A JP2003573666 A JP 2003573666A JP 2003573666 A JP2003573666 A JP 2003573666A JP 2005519433 A5 JP2005519433 A5 JP 2005519433A5
- Authority
- JP
- Japan
- Prior art keywords
- piece
- button
- cathode
- button member
- front surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/091,351 US20030168609A1 (en) | 2002-03-06 | 2002-03-06 | Indirectly heated button cathode for an ion source |
| US10/259,827 US6878946B2 (en) | 2002-09-30 | 2002-09-30 | Indirectly heated button cathode for an ion source |
| PCT/GB2003/000733 WO2003075305A2 (en) | 2002-03-06 | 2003-02-20 | Indirectly heated button cathode for an ion source |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005519433A JP2005519433A (ja) | 2005-06-30 |
| JP2005519433A5 true JP2005519433A5 (cg-RX-API-DMAC7.html) | 2009-02-12 |
| JP4271584B2 JP4271584B2 (ja) | 2009-06-03 |
Family
ID=27791187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003573666A Expired - Fee Related JP4271584B2 (ja) | 2002-03-06 | 2003-02-20 | イオン源の為の間接加熱ボタン型カソード |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1481413A2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4271584B2 (cg-RX-API-DMAC7.html) |
| AU (1) | AU2003208427A1 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2003075305A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6878946B2 (en) | 2002-09-30 | 2005-04-12 | Applied Materials, Inc. | Indirectly heated button cathode for an ion source |
| US6984831B2 (en) | 2004-03-05 | 2006-01-10 | Varian Semiconductor Equipment Associates, Inc. | Gas flow restricting cathode system for ion implanter and related method |
| KR101726185B1 (ko) * | 2014-11-20 | 2017-04-13 | 주식회사 밸류엔지니어링 | 이온주입기용 전자방출 캐소드 |
| TWI725384B (zh) * | 2019-02-22 | 2021-04-21 | 力晶積成電子製造股份有限公司 | 半導體離子植入機的離子源頭結構 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2242986C3 (de) * | 1972-09-01 | 1981-05-07 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Glühkathode |
| JPS5853460B2 (ja) * | 1981-12-14 | 1983-11-29 | 株式会社東芝 | ホロ−カソ−ド放電装置 |
| US5374828A (en) * | 1993-09-15 | 1994-12-20 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Electron reversal ionizer for detection of trace species using a spherical cathode |
| US5703372A (en) * | 1996-10-30 | 1997-12-30 | Eaton Corporation | Endcap for indirectly heated cathode of ion source |
| US7276847B2 (en) * | 2000-05-17 | 2007-10-02 | Varian Semiconductor Equipment Associates, Inc. | Cathode assembly for indirectly heated cathode ion source |
-
2003
- 2003-02-20 EP EP03706715A patent/EP1481413A2/en not_active Withdrawn
- 2003-02-20 WO PCT/GB2003/000733 patent/WO2003075305A2/en not_active Ceased
- 2003-02-20 AU AU2003208427A patent/AU2003208427A1/en not_active Abandoned
- 2003-02-20 JP JP2003573666A patent/JP4271584B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7138768B2 (en) | Indirectly heated cathode ion source | |
| US7586101B2 (en) | Ion sources for ion implantation apparatus | |
| JP5212760B2 (ja) | イオン注入装置用のイオン源およびそのためのリペラ | |
| US8702920B2 (en) | Repeller structure and ion source | |
| US5703372A (en) | Endcap for indirectly heated cathode of ion source | |
| US8072149B2 (en) | Unbalanced ion source | |
| US20060169915A1 (en) | Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms | |
| JPH10134728A (ja) | イオン注入機用のイオン源とそのカソード構造 | |
| US6878946B2 (en) | Indirectly heated button cathode for an ion source | |
| EP1299895B1 (en) | Cathode assembly for indirectly heated cathode ion source | |
| CN112086331A (zh) | 电子枪 | |
| JP4271584B2 (ja) | イオン源の為の間接加熱ボタン型カソード | |
| JP2024064927A (ja) | イオン源カソード | |
| US10468220B1 (en) | Indirectly heated cathode ion source assembly | |
| US10217600B1 (en) | Indirectly heated cathode ion source assembly | |
| US20030168609A1 (en) | Indirectly heated button cathode for an ion source | |
| TW202027119A (zh) | 具有圓柱狀電弧室的間接加熱式陰極離子源 | |
| JPH1125872A (ja) | イオン発生装置 | |
| JPH08264143A (ja) | イオン源 | |
| JPH10255675A (ja) | 負イオン源 | |
| CN111739774A (zh) | 离子源 | |
| JPH069040U (ja) | イオン源 | |
| JP2025100107A (ja) | ホローカソード |