JP4271584B2 - イオン源の為の間接加熱ボタン型カソード - Google Patents
イオン源の為の間接加熱ボタン型カソード Download PDFInfo
- Publication number
- JP4271584B2 JP4271584B2 JP2003573666A JP2003573666A JP4271584B2 JP 4271584 B2 JP4271584 B2 JP 4271584B2 JP 2003573666 A JP2003573666 A JP 2003573666A JP 2003573666 A JP2003573666 A JP 2003573666A JP 4271584 B2 JP4271584 B2 JP 4271584B2
- Authority
- JP
- Japan
- Prior art keywords
- piece
- button
- cathode
- button member
- front surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/091,351 US20030168609A1 (en) | 2002-03-06 | 2002-03-06 | Indirectly heated button cathode for an ion source |
| US10/259,827 US6878946B2 (en) | 2002-09-30 | 2002-09-30 | Indirectly heated button cathode for an ion source |
| PCT/GB2003/000733 WO2003075305A2 (en) | 2002-03-06 | 2003-02-20 | Indirectly heated button cathode for an ion source |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005519433A JP2005519433A (ja) | 2005-06-30 |
| JP2005519433A5 JP2005519433A5 (cg-RX-API-DMAC7.html) | 2009-02-12 |
| JP4271584B2 true JP4271584B2 (ja) | 2009-06-03 |
Family
ID=27791187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003573666A Expired - Fee Related JP4271584B2 (ja) | 2002-03-06 | 2003-02-20 | イオン源の為の間接加熱ボタン型カソード |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1481413A2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4271584B2 (cg-RX-API-DMAC7.html) |
| AU (1) | AU2003208427A1 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2003075305A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6878946B2 (en) | 2002-09-30 | 2005-04-12 | Applied Materials, Inc. | Indirectly heated button cathode for an ion source |
| US6984831B2 (en) | 2004-03-05 | 2006-01-10 | Varian Semiconductor Equipment Associates, Inc. | Gas flow restricting cathode system for ion implanter and related method |
| KR101726185B1 (ko) * | 2014-11-20 | 2017-04-13 | 주식회사 밸류엔지니어링 | 이온주입기용 전자방출 캐소드 |
| TWI725384B (zh) * | 2019-02-22 | 2021-04-21 | 力晶積成電子製造股份有限公司 | 半導體離子植入機的離子源頭結構 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2242986C3 (de) * | 1972-09-01 | 1981-05-07 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Glühkathode |
| JPS5853460B2 (ja) * | 1981-12-14 | 1983-11-29 | 株式会社東芝 | ホロ−カソ−ド放電装置 |
| US5374828A (en) * | 1993-09-15 | 1994-12-20 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Electron reversal ionizer for detection of trace species using a spherical cathode |
| US5703372A (en) * | 1996-10-30 | 1997-12-30 | Eaton Corporation | Endcap for indirectly heated cathode of ion source |
| US7276847B2 (en) * | 2000-05-17 | 2007-10-02 | Varian Semiconductor Equipment Associates, Inc. | Cathode assembly for indirectly heated cathode ion source |
-
2003
- 2003-02-20 EP EP03706715A patent/EP1481413A2/en not_active Withdrawn
- 2003-02-20 WO PCT/GB2003/000733 patent/WO2003075305A2/en not_active Ceased
- 2003-02-20 AU AU2003208427A patent/AU2003208427A1/en not_active Abandoned
- 2003-02-20 JP JP2003573666A patent/JP4271584B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003075305A3 (en) | 2003-11-27 |
| AU2003208427A8 (en) | 2003-09-16 |
| EP1481413A2 (en) | 2004-12-01 |
| WO2003075305A2 (en) | 2003-09-12 |
| AU2003208427A1 (en) | 2003-09-16 |
| JP2005519433A (ja) | 2005-06-30 |
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